Patents Assigned to ASML Netherlands
  • Free electron laser
    Patent number: 10381796
    Abstract: A free electron laser FEL comprises an undulator 24 generating coherent EUV radiation receiving an upstream electron beam EB2 and emitting a downstream electron beam EB4 and at least an electron source 21a, 21b operable to produce an upstream electron beam EB1, EB2 comprising bunches of electrons. A beam path is configured to direct the upstream electron beam through: a linear accelerator system (LINAC) comprising at least a first and a second linear accelerators 22a, 22b, a bunch compressor 28b, and said undulator 24.
    Type: Grant
    Filed: November 29, 2016
    Date of Patent: August 13, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Petrus Wilhelmus Smorenburg, Johannes Antonius Gerardus Akkermans
  • METHOD OF DETERMINING AN OPTIMAL FOCUS HEIGHT FOR A METROLOGY APPARATUS
    Publication number: 20190242782
    Abstract: Methods of determining an optimal focus height are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a target are obtained. Each application of the metrology process includes illuminating the target with a radiation spot and detecting radiation redirected by the target. The applications of the metrology process include applications at different nominal focus heights. The measurement data includes, for each application of the metrology process, at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method includes determining an optimal focus height for the metrology process using the obtained measurement data.
    Type: Application
    Filed: January 22, 2019
    Publication date: August 8, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Mariya Vyacheslavivna MEDVEDYEVA, Anagnostis TSIATMAS, Hugo Augustinus Joseph CRAMER, Martinus Hubertus Maria VAN WEERT, Bastiaan Onne FAGGINGER AUER, Xiaoxin SHANG, Johan Maria VAN BOXMEER, Bert VERSTRAETEN
  • A MEASUREMENT SUBSTRATE, A MEASUREMENT METHOD AND A MEASUREMENT SYSTEM
    Publication number: 20190243257
    Abstract: A method of measuring wear of a substrate holder that is configured to hold a production substrate, the method includes: clamping a measurement substrate to the substrate holder; and measuring strain in the measurement substrate to generate a measurement result. The measurement substrate may have a body having dimensions similar to that of the production substrate; and a strain sensor in the body configured to measure strain in a peripheral portion of the measurement substrate.
    Type: Application
    Filed: September 8, 2017
    Publication date: August 8, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Tiannan GUAN, Jingshi LI, Miao YU
  • LEVEL SENSOR APPARATUS, METHOD OF MEASURING TOPOGRAPHICAL VARIATION ACROSS A SUBSTRATE, METHOD OF MEASURING VARIATION OF A PHYSICAL PARAMETER RELATED TO A LITHOGRAPHIC PROCESS, AND LITHOGRAPHIC APPARATUS
    Publication number: 20190243259
    Abstract: A method of determining topographical variation across a substrate on which one or more patterns have been applied. The method includes obtaining measured topography data representing a topographical variation across a substrate on which one or more patterns have been applied by a lithographic process; and combining the measured topography data with knowledge relating to intra-die topology to obtain derived topography data having a resolution greater than the resolution of the measured topography data. Also disclosed is a corresponding level sensor apparatus and lithographic apparatus having such a level sensor apparatus, and a more general method of determining variation of a physical parameter from first measurement data of variation of the physical parameter across the substrate and intra-die measurement data of higher resolution than the first measurement data and combining these.
    Type: Application
    Filed: June 22, 2017
    Publication date: August 8, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Wim Tjibbo TEL, Frank STAALS, Martin Jules Marie-Emile DE NIVELLE, Tanbir HASAN
  • SUBSTRATE TABLE, A LITHOGRAPHIC APPARATUS AND A METHOD FOR MANUFACTURING A DEVICE USING A LITHOGRAPHIC APPARATUS
    Publication number: 20190243256
    Abstract: A table for a lithographic apparatus, the table having an encoder plate located on the table, a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table, and a fluid extraction system with an opening in the surface of the gap to extract liquid from the gap.
    Type: Application
    Filed: February 8, 2019
    Publication date: August 8, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Takeshi KANEKO, Joost Jeroen OTTENS, Raymond Wilhelmus Louis LAFARRE
  • Metrology Methods, Radiation Source, Metrology Apparatus and Device Manufacturing Method
    Publication number: 20190246480
    Abstract: A target structure (T) made by lithography or used in lithography is inspected by irradiating the structure at least a first time with EUV radiation (304) generated by inverse Compton scattering. Radiation (308) scattered by the target structure in reflection or transmission is detected (312) and properties of the target structure are calculated by a processor (340) based on the detected scattered radiation. The radiation may have a first wavelength in the EUV range of 0.1 nm to 125 nm. Using the same source and controlling an electron energy, the structure may be irradiated multiple times with different wavelengths within the EUV range, and/or with shorter (x-ray) wavelengths and/or with longer (UV, visible) wavelengths. By rapid switching of electron energy in the inverse Compton scattering source, irradiation at different wavelengths can be performed several times per second.
    Type: Application
    Filed: April 18, 2019
    Publication date: August 8, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Alexey Olegovich POLYAKOV, Richard QUINTANILHA, Vadim Yevgenyevich BANINE, Coen Adrianus VERSCHUREN
  • SELECTING A SET OF LOCATIONS ASSOCIATED WITH A MEASUREMENT OR FEATURE ON A SUBSTRATE
    Publication number: 20190243252
    Abstract: A method for selecting an optimal set of locations for a measurement or feature on a substrate, the method includes: defining a first candidate solution of locations, defining a second candidate solution with locations based on modification of a coordinate in a solution domain of the first candidate solution, and selecting the first and/or second candidate solution as the optimal solution according to a constraint associated with the substrate.
    Type: Application
    Filed: September 21, 2017
    Publication date: August 8, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Pierluigi FRISCO, Svetla Petrova MATOVA, Jochem Sebastiaan WILDENBERG
  • Electron Beam Transport System
    Publication number: 20190246486
    Abstract: An electron beam transport system for controlling the position of two different electron beams comprises: a main electron beam transport module; a first input electron beam transport module; a second input electron beam transport module; and a controller. The main electron beam transport module comprises a beam monitoring device disposed at a measurement position. The first input electron beam transport module comprises a first actuator for applying a perturbation to a transverse position of a first electron beam at a first actuation point. The second input electron beam transport module comprises a second actuator for applying a perturbation to a transverse position of a second electron beam at a second actuation point. The controller is operable to receive a signal from the beam monitoring device and to send control signals to the first actuator and the second actuator.
    Type: Application
    Filed: September 18, 2017
    Publication date: August 8, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Roelof Harm KLUNDER, Gijsbertus Geert PGORTER, Johannes Aldegonda Theodoras Marie VAN DEN HOMBERG
  • Hotspot aware dose correction
    Patent number: 10372043
    Abstract: A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method including: obtaining a relationship of a characteristic of one or more features in the portion with respect to dose; obtaining a value of the characteristic; and obtaining a target dose based on the value of the characteristic and the relationship.
    Type: Grant
    Filed: December 11, 2015
    Date of Patent: August 6, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Gang Chen, Te-Sheng Wang
  • Metrology method and apparatus, computer program and lithographic system
    Patent number: 10369752
    Abstract: Disclosed are a method, computer program and associated apparatuses for metrology. The method includes acquiring inspection data comprising a plurality of inspection data elements, each inspection data element having been obtained by inspection of a corresponding target structure formed using a lithographic process; and performing an unsupervised cluster analysis on said inspection data, thereby partitioning said inspection data into a plurality of clusters in accordance with a metric. In an embodiment, a cluster representative can be identified for each cluster. The cluster representative may be reconstructed and the reconstruction used to approximate the other members of the cluster.
    Type: Grant
    Filed: April 26, 2016
    Date of Patent: August 6, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Seyed Iman Mossavat, Adriaan Johan Van Leest
  • Method of calibrating a reluctance actuator assembly, reluctance actuator and lithographic apparatus comprising such reluctance actuator
    Patent number: 10372045
    Abstract: A reluctance actuator assembly comprising a reluctance actuator, a flux sensor to measure a magnetic flux in a gap of the reluctance actuator, and a flux amplifier to drive an actuator coil of the reluctance actuator based on a flux set point and the flux measured by the flux sensor. A method comprising providing to the flux amplifier a flux setpoint, the flux setpoint comprising a time constant component and a sinusoidally varying component at an excitation frequency, measuring a force generated by the reluctance actuator in response to the flux setpoint, and calibrating the reluctance actuator assembly from the measured force.
    Type: Grant
    Filed: August 26, 2013
    Date of Patent: August 6, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Antonius Gerardus Akkermans, Bas Pieter Lemmen, Sjoerd Martijn Huiberts, Joeri Lof, Petrus Theodorus Rutgers, Sven Antoin Johan Hol, Harmeet Singh, Peter Michel Silvester Maria Heijmans
  • Substrate table, a lithographic apparatus and a device manufacturing method
    Patent number: 10372044
    Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.
    Type: Grant
    Filed: December 28, 2017
    Date of Patent: August 6, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Ten Kate, Raymond Wilhelmus Louis Lafarre
  • MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID
    Publication number: 20190235391
    Abstract: A measurement apparatus and method for determining a substrate grid describing a deformation of a substrate prior to exposure of the substrate in a lithographic apparatus configured to fabricate one or more features on the substrate. Position data for a plurality of first features and/or a plurality of second features on the substrate is obtained. Asymmetry data for at least a feature of the plurality of first features and/or the plurality of second features is obtained. The substrate grid based on the position data and the asymmetry data is determined. The substrate grid and asymmetry data are passed to the lithographic apparatus for controlling at least part of an exposure process to fabricate one or more features on the substrate.
    Type: Application
    Filed: December 21, 2018
    Publication date: August 1, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Franciscus Godefridus Casper BIJNEN, Edo Maria Hulsebos, Henricus Johannes Lambertus Megens, Robert John Socha, Youping Zhang
  • LITHOGRAPHIC METHOD
    Publication number: 20190235392
    Abstract: A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
    Type: Application
    Filed: June 29, 2017
    Publication date: August 1, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andre Bernardus JEUNINK, Laurentius Johannes Adrianus VAN BOKHOVEN, Stan Henricus VAN DER MEULEN, Yang-Shan HUANG, Federico LA TORRE, Barry MOEST, Stefan Carolus Jacobus Antonius KEIJ, Enno VAN DEN BRINK, Christine Henriette SCHOUTEN, Hoite Pieter Theodoor TOLSMA
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20190235395
    Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
    Type: Application
    Filed: April 5, 2019
    Publication date: August 1, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20190235398
    Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.
    Type: Application
    Filed: February 25, 2019
    Publication date: August 1, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jan Steven Christiaan WESTERLAKEN, Gerardus Arnoldus Hendricus Franciscus JANSSEN, Peter Paul STEIJAERT, Engelbertus Antonius Fransiscus VAN DER PASCH, Franciscus VAN DE MAST
  • METHOD OF PATTERNING AT LEAST A LAYER OF A SEMICONDUCTOR DEVICE
    Publication number: 20190235394
    Abstract: A method of patterning of at least a layer in a semiconductor device, the method including a patterning step by a patterning means, wherein the patterned layer comprises sensing radiation transmissive portions and sensing radiation blocking portions.
    Type: Application
    Filed: January 25, 2019
    Publication date: August 1, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Reinder Teun PLUG, Maurits VAN DER SCHAAR
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A HEATER
    Publication number: 20190235397
    Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
    Type: Application
    Filed: April 5, 2019
    Publication date: August 1, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Theodorus Petrus Maria CADEE, Johannes Henricus Wilhelmus JACOBS, Nicolaas TEN KATE, Erik Roelof LOOPSTRA, Aschwin Lodewijk Hendricus Johannes VAN MEER, Jeroen Johannes Sophia Maria MERTENS, Christianus Gerardus Maria DE MOL, Marcel Johannus Elisabeth Hubertus MUITJENS, Antonius Johannus VAN DER NET, Joost Jeroen OTTENS, Johannes Anna QUAEDACKERS, Maria Elisabeth REUHMAN-HUISKEN, Marco Koert STAVENGA, Patricius Aloysius Jacobus TINNEMANS, Martinus Cornelis Maria VERHAGEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Frederik Eduard DE JONG, Koen GOORMAN, Boris MENCHTCHIKOV, Herman BOOM, Stoyan NIHTIANOV, Richard MOERMAN, Martin Frans Pierre SMEETS, Bart Leonard Peter SCHOONDERMARK, Franciscus Johannes Joseph JANSSEN, Michel RIEPEN
  • Apparatus and method for manufacturing a pellicle, and a pellicle
    Patent number: 10365558
    Abstract: An apparatus for manufacturing a pellicle, the apparatus comprising: a stressing assembly for stressing a film; and a substrate support for supporting a substrate, the stressing assembly and the substrate support being capable of relative movement so as to bring the substrate into contact with the film when the film is stressed.
    Type: Grant
    Filed: November 19, 2014
    Date of Patent: July 30, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Maarten Mathijs Marinus Jansen, Juan Diego Arias Espinoza, Johannes Peterus Henricus De Kuster
  • Control system, positioning system, lithographic apparatus and device manufacturing method
    Patent number: 10365567
    Abstract: A control system configured to control a parameter of a dynamic system, wherein the parameter depends on an output signal. The control system comprises a set-point generator and a feedforward, wherein the set-point generator is arranged to provide a set-point signal to the feedforward. The feedforward is arranged to provide the output signal based on the set-point signal, wherein the feedforward is arranged to perform a non-linear operation on the set-point signal. The non-linear operation is based on a non-linear functional relationship between the output signal and the parameter.
    Type: Grant
    Filed: May 19, 2016
    Date of Patent: July 30, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Jeroen Johannes Theodorus Hendrikus De Best, Wilhelmus Henricus Theodorus Maria Aangenent, Stan Henricus Van Der Meulen