Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
Inventors:
Earl William Ebert, Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
Abstract: Disclosed is an illumination source apparatus comprising a high harmonic generation medium, a pump radiation source and a spatial filter. The pump radiation source emits a beam of pump radiation having a profile comprising no pump radiation in a central region of the beam and excites the high harmonic generation medium so as to generate high harmonic radiation. The pump radiation and the generated high harmonic radiation are spatially separated beyond the focal plane of the beam of pump radiation The spatial filter is located beyond a focal plane of the beam of pump radiation, and blocks the pump radiation. Also disclosed is a method of generating high harmonic measurement radiation optimized for filtration of pump radiation therefrom.
Type:
Application
Filed:
October 19, 2017
Publication date:
May 17, 2018
Applicant:
ASML Netherlands B.V.
Inventors:
Sander Bas ROOBOL, Simon Gijsbert Josephus MATHIJSSEN
Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.
Type:
Grant
Filed:
March 6, 2017
Date of Patent:
May 15, 2018
Assignee:
ASML NETHERLANDS B.V.
Inventors:
Rogier Hendrikus Magdalena Cortie, Nicolaas Ten Kate, Niek Jacobus Johannes Roset, Michel Riepen, Henricus Jozef Castelijns, Cornelius Maria Rops, Jim Vincent Overkamp
Abstract: An apparatus (AS) measures positions of marks (202) on a lithographic substrate (W). An illumination arrangement (940, 962, 964) provides off-axis radiation from at least first and second regions. The first and second source regions are diametrically opposite one another with respect to an optical axis (O) and are limited in angular extent. The regions may be small spots selected according to a direction of periodicity of a mark being measured, or larger segments. Radiation at a selected pair of source regions can be generated by supplying radiation at a single source feed position to a self-referencing interferometer. A modified half wave plate is positioned downstream of the interferometer, which can be used in the position measuring apparatus. The modified half wave plate has its fast axis in one part arranged at 45° to the fast axis in another part diametrically opposite.
Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.
Type:
Grant
Filed:
September 1, 2017
Date of Patent:
May 15, 2018
Assignee:
ASML Netherlands B.V.
Inventors:
Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Haico Victor Kok, Yuri Johannes Gabriël Van De Vijver, Johannes Antonius Maria Van De Wal, Bastiaan Andreas Wilhelmus Hubertus Knarren, Robbert-Jan Voogd, Jan Steven Christiaan Westerlaken, Johannes Hubertus Antonius Van De Rijdt, Allard Eelco Kooiker, Wilhelmina Margareta Jozef Hurkens-Mertens, Yohann Bruno Yvon Teillet
Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
Type:
Grant
Filed:
August 21, 2017
Date of Patent:
May 15, 2018
Assignee:
ASML NETHERLANDS B.V.
Inventors:
Johan Gertrudis Cornelis Kunnen, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
Abstract: A method of displaying a plurality of graphical user interface elements, each graphical user interface element representing a step in a measurement design, setup and/or monitoring process and each graphical user interface element enabling access by the user to further steps in the measurement design, setup and/or monitoring process for the associated step of the graphical user interface element, and displaying an indicator associated with one or more of the plurality of graphical user elements, the indicator indicating that a step in the measurement design, setup and/or monitoring process is not completed and/or that a key performance indicator associated with a step in the measurement design, setup and/or monitoring process has passed a threshold.
Type:
Grant
Filed:
April 7, 2016
Date of Patent:
May 15, 2018
Assignee:
ASML NETHERLANDS B.V.
Inventors:
Everhardus Cornelis Mos, Erik Mathijs Maria Crombag, Ajith Ganesan
Abstract: A lithography system configured to apply a pattern to a substrate, the system including a lithography apparatus configured to expose a layer of the substrate according to the pattern, and a machine learning controller configured to control the lithography system to optimize a property of the pattern, the machine learning controller configured to be trained on the basis of a property measured by a metrology unit configured to measure the property of the exposed pattern in the layer and/or a property associated with exposing the pattern onto the substrate, and to correct lithography system drift by adjusting one or more selected from: the lithography apparatus, a track unit configured to apply the layer on the substrate for lithographic exposure, and/or a control unit configured to control an automatic substrate flow among the track unit, the lithography apparatus, and the metrology unit.
Type:
Grant
Filed:
August 6, 2014
Date of Patent:
May 15, 2018
Assignee:
ASML NETHERLANDS B.V.
Inventors:
Emil Peter Schmitt-Weaver, Wolfgang Henke, Thomas Leo Maria Hoogenboom, Pavel Izikson, Paul Frank Luehrmann, Daan Maurits Slotboom, Jens Staecker, Alexander Ypma
Abstract: Disclosed is a method of measuring a parameter of interest relating to a structure on a substrate, and associated metrology apparatus. The method comprises determining a correction to compensate for the effect of a measurement condition on a measurement signal from a plurality of measurement signals, wherein each of said measurement signals results from a different measurement of the structure performed under a different variation of said measurement condition. The correction is then used in a reconstruction of a mathematical model of said structure to suppress an influence of variations of said measurement condition on the reconstruction.
Type:
Application
Filed:
October 27, 2017
Publication date:
May 10, 2018
Applicant:
ASML Netherlands B.V.
Inventors:
Hugo Augustinus Joseph CRAMER, Bastiaan Onne Fagginger Auer
Abstract: A method including obtaining a fit of data for overlay of a metrology target for a patterning process as a function of a stack difference parameter of the metrology target; and using, by a hardware computer, a slope of the fit (i) to differentiate a metrology target measurement recipe from another metrology target measurement recipe, or (ii) calculate a corrected value of overlay, or (iii) to indicate that an overlay measurement value obtained using the metrology target should be used, or not be used, to configure or modify an aspect of the patterning process, or (iv) any combination selected from (i)-(iii).
Type:
Application
Filed:
November 9, 2017
Publication date:
May 10, 2018
Applicant:
ASML NETHERLANDS B.V.
Inventors:
Aiqin JIANG, Arie Jeffrey Den Boef, Kaustuve Bhattacharyya, Hans Van Der Laan, Bart Visser, Martin Jacobus Johan Jak
Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
Type:
Application
Filed:
January 4, 2018
Publication date:
May 10, 2018
Applicant:
ASML NETHERLANDS B.V.
Inventors:
Christiaan Alexander HOOGENDAM, Antonius Theodorus Anna Maria DERKSEN, Sjoerd Nicolaas Lambertus DONDERS, Joeri LOF, Erik Roelof LOOPSTRA, Johannes Catharinus Hubertus MULKENS, Hans JANSEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Alexander STRAAIJER, Bob STREEFKERK
Abstract: A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.
Type:
Grant
Filed:
July 23, 2015
Date of Patent:
May 8, 2018
Assignee:
ASML NETHERLANDS B.V.
Inventors:
Joannes Theodoor De Smit, Vadim Yevgenyevich Banine, Theodorus Hubertus Josephus Bisschops, Marcel Mathijs Theodore Marie Dierichs, Theodorus Marinus Modderman
Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
Type:
Grant
Filed:
October 23, 2017
Date of Patent:
May 8, 2018
Assignee:
ASML NETHERLANDS B.V.
Inventors:
Jacobus Johannus Leonardus Hendricus Verspay, Hans Jansen, Marco Koert Stavenga
Abstract: A method of adjusting speed and/or routing of a part of a movement plan of a table under an immersion fluid supply system of a lithographic apparatus. The method includes splitting the movement plan of the table into a plurality of discrete movements; determining a risk of a bubble of a size greater than a certain size being present in immersion fluid through which a patterned beam of the lithographic apparatus will pass during a certain discrete movement by determining whether the immersion fluid supply system passes over a position at which immersion fluid leaked from the immersion fluid supply system is present; and adjusting the speed and/or routing of a part of the movement plan corresponding to (i) a discrete movement earlier than a discrete movement for which the risk of a bubble is determined, and/or (ii) a discrete movement for which the risk of a bubble is determined.
Type:
Grant
Filed:
April 29, 2016
Date of Patent:
May 8, 2018
Assignee:
ASML NETHERLANDS B.V.
Inventors:
Cédric Désiré Grouwstra, Nicolaas Rudolf Kemper, Norbertus Josephus Martinus Van Den Nieuwelaar, Dirk De Vries, Hua Li, Marinus Jochemsen
Abstract: A method for improving a lithographic process for imaging a design layout onto a substrate using a lithographic projection apparatus comprising a patterning device, wherein the patterning device deforms from a first state to a second state, the method comprising: determining a deformation of the patterning device from the first state to the second state; determining a compensatory design layout from the design layout and the deformation; wherein the compensatory design layout is such that when the compensatory design layout is generated on the patterning device in the first state, the deformation of the patterning device deforms the compensatory design layout to the design layout.
Abstract: A source collector apparatus for use in a lithographic apparatus includes a fuel droplet generator configured in use to generate a stream of fuel droplets directed from an outlet of the fuel droplet generator towards a plasma formation location. In order to prevent droplet satellites from interfering with plasma formation, a gas supply is provided that in use provides a flow of gas (e.g., hydrogen) that deflects any droplet satellites out of the fuel droplet stream. Additionally, a detection apparatus may be provided as part of a shroud to determine the point at which coalescence of fuel droplets occurs thereby providing an indication of the likelihood of satellite droplets being present in the fuel droplet stream.
Type:
Grant
Filed:
November 3, 2017
Date of Patent:
May 8, 2018
Assignee:
ASML NETHERLANDS B.V.
Inventors:
Niek Antonius Jacobus Maria Kleemans, Denis Alexandrovich Glushkov, Ronald Johannes Hultermans, Benedictus Mathijs Renkens, Gerardus Hubertus Petrus Maria Swinkels, Christiaan Johannes Petrus Verspeek
Abstract: A method of determining exposure dose of a lithographic apparatus used in a lithographic process on a substrate. Using the lithographic process to produce a first structure on the substrate, the first structure having a dose-sensitive feature which has a form that depends on exposure dose of the lithographic apparatus on the substrate. Using the lithographic process to produce a second structure on the substrate, the second structure having a dose-sensitive feature which has a form that depends on the exposure dose of the lithographic apparatus but which has a different sensitivity to the exposure dose than the first structure. Detecting scattered radiation while illuminating the first and second structures with radiation to obtain first and second scatterometer signals. Using the first and second scatterometer signals to determine an exposure dose value used to produce at least one of the first and second structures.
Type:
Grant
Filed:
November 22, 2013
Date of Patent:
May 8, 2018
Assignee:
ASML Netherlands B.V.
Inventors:
Peter Clement Paul Vanoppen, Eric Jos Anton Brouwer, Hugo Augustinus Joseph Cramer, Jan Hendrik Den Besten, Adrianus Franciscus Petrus Engelen, Paul Christiaan Hinnen
Abstract: A method involving providing incident radiation of a first polarization state by an optical component into an interface of an object with an external environment, wherein a surface is provided adjacent the interface and separated by a gap from the interface, detecting, from incident radiation reflected from the interface and from the surface, radiation of a second different polarization state arising from the reflection of incident radiation of the first polarization at the interface as distinct from the radiation of the first polarization state in the reflected radiation, and producing a position signal representative of a relative position between the focus of the optical component and the object.
Type:
Application
Filed:
April 19, 2016
Publication date:
May 3, 2018
Applicant:
ASML Netherlands B.V.
Inventors:
Ferry ZIJP, Duygu AKBULUT, Peter Danny VAN VOORST, Jeroen Johan Maarten VAN DE WIJDEVEN, Koos VAN BERKEL
Abstract: A method including: determining a first simulated partial image formed, by a lithographic projection apparatus, from a first radiation portion propagating along a first group of one or more directions; determining a second simulated partial image formed, by the lithographic projection apparatus, from a second radiation portion propagating along a second group of one or more directions; and determining an image by incoherently adding the first partial image and the second partial image, wherein the first group of one or more directions and the second group of one or more directions are different.
Type:
Application
Filed:
May 13, 2016
Publication date:
May 3, 2018
Applicant:
ASML Netherlands B.V.
Inventors:
Duan-Fu Stephen HSU, Rafael C. HOWELL, Jianjun JIA