Patents Assigned to ASML Netherlands
  • LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND SUBSTRATE EXCHANGING METHOD
    Publication number: 20110242518
    Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; at least three substrate tables that are each constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the substrate tables are moveable in a common moving area extending substantially in a plane perpendicular to the patterned radiation beam, the moving area comprising at least three working locations of which at least one working location is arranged for exposure of the substrate to the patterned radiation beam and at least one working location is arranged for non-exposure purposes.
    Type: Application
    Filed: March 17, 2011
    Publication date: October 6, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Theodorus Petrus Maria Cadee, Jan Jaap Kuit, Johannes Catharinus Hubertus Mulkens, Koen Jacobus Johannes Maria Zaal
  • Lithographic Apparatus, a Radiation System, a Device Manufacturing Method and a Radiation Generating Method
    Publication number: 20110242516
    Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap for trapping material emanating from the radiation source. The rotation contaminant trap includes a multiple number of elements extending in a radial direction from a common rotation trap axis and being arranged for allowing contaminant material emanating from the radiation source to deposit during propagation of the radiation beam in the radiation system. The radiation system further includes a contaminant catch for receiving contaminant material particles from the rotation trap elements, the contaminant catch having a constitution, during operation of the radiation, for retaining said contaminant material particles.
    Type: Application
    Filed: October 8, 2009
    Publication date: October 6, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Olav Waldemar Vladimir Frijns, Johannes Christiaan Leonardus Franken, Kurt Gielissen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110242512
    Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.
    Type: Application
    Filed: May 31, 2011
    Publication date: October 6, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Rudolf KEMPER, Sjoerd Nicolaas Lambertus DONDERS, Joost Jeroen OTTENS, Edwin Cornelis KADIJK, Sergei SHULEPOV
  • REDUCED PITCH MULTIPLE EXPOSURE PROCESS
    Publication number: 20110244401
    Abstract: A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution.
    Type: Application
    Filed: June 15, 2011
    Publication date: October 6, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Theodore A. PAXTON, Todd J. DAVIS, Todd D. HIAR, Cassandra May OWEN, Steven George HANSEN, James J. HUNTER
  • Mark Structure for Coarse Wafer Alignment and Method for Manufacturing Such a Mark Structure
    Publication number: 20110244647
    Abstract: A method for forming a mark structure on a substrate comprising a plurality of lines. The lines extend parallel to each other in a first direction and are arranged with a pitch between each pair of lines that is directed in a second direction perpendicular to the first direction. The pitch between each pair of selected lines differs from the pitch between each other pair of selected lines.
    Type: Application
    Filed: June 15, 2011
    Publication date: October 6, 2011
    Applicant: ASML Netherlands B.V.
    Inventor: Patrick WARNAAR
  • Pulse modifier, lithographic apparatus and device manufacturing method
    Patent number: 8030628
    Abstract: A pulse modifier, and associated lithographic apparatus and a method for manufacturing a device, is disclosed. The pulse modifier is configured to receive an input pulse of radiation and further configured to emit a plurality of corresponding output pulse portions of radiation, wherein the respective pulse portions are respectively mirrored about an axis transverse to the optical axis and mirrored about a point of the optical axis of the pulse portions.
    Type: Grant
    Filed: November 26, 2008
    Date of Patent: October 4, 2011
    Assignee: ASML Netherlands B.V.
    Inventor: Hako Botma
  • Lithographic method and carrier substrate
    Patent number: 8029973
    Abstract: A carrier substrate is provided with a layer of PDMS and curing agent on one side of the carrier substrate. The PDMS and curing agent can be arranged to receive and adhere to a lithographic substrate. The carrier substrate can be dimensioned such that the combined carrier substrate and lithographic substrate may be handled by a conventional lithographic apparatus.
    Type: Grant
    Filed: November 24, 2008
    Date of Patent: October 4, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Wilhelmus Johannes Maria De Laat, Cheng-Qun Gui, Peter Theodorus Maria Giesen, Paulus Wilhelmus Leonardus Van Dijk, Erwin Rinaldo Meinders, Maria Peter
  • Lithographic apparatus and device manufacturing method with double exposure overlay control
    Patent number: 8029953
    Abstract: A device manufacturing method includes a transfer of a pattern from a patterning device onto a substrate. The device manufacturing method further includes transferring a pattern of a main mark to a base layer for forming an alignment mark; depositing a pattern receiving layer on the base layer; in a first lithographic process, aligning, by using the main mark, a first mask that includes a first pattern and a local mark pattern, and transferring the first pattern and the local mark pattern to the pattern receiving layer; aligning, by using the local mark pattern, a second mask including a second pattern relative to the pattern receiving layer; and in a second lithographic process, transferring the second pattern to the pattern receiving layer; the first and second patterns being configured to form an assembled pattern.
    Type: Grant
    Filed: February 17, 2011
    Date of Patent: October 4, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Maurits Van Der Schaar, Richard Johannes Franciscus Van Haren
  • Fly's eye integrator, illuminator, lithographic apparatus and method
    Patent number: 8031404
    Abstract: A transmissive fly's eye integrator is disclosed that includes a first array of lenses and a second array of lenses. The first array of lenses and second array of lenses together form a fly's eye integrator, and the first array of lenses and second array of lenses comprise lenses which have a diameter selected from the range of 5 ?m-50 ?m, and a radius of curvature selected from the range of 25 ?m-2500 ?m.
    Type: Grant
    Filed: October 26, 2009
    Date of Patent: October 4, 2011
    Assignee: ASML Netherlands B.V.
    Inventor: Vadim Yevgenyevich Banine
  • Lithographic apparatus and device manufacturing method
    Patent number: 8031325
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: March 1, 2010
    Date of Patent: October 4, 2011
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
  • Angularly resolved scatterometer
    Patent number: 8031337
    Abstract: An angularly resolved scatterometer uses a broadband radiation source and an acousto-optical tunable filter to select one or more narrowband components from the broadband beam emitted by the source for use in measurements. A feedback loop can be used to control the intensity of the selected narrowband components to reduce noise.
    Type: Grant
    Filed: June 29, 2009
    Date of Patent: October 4, 2011
    Assignee: ASML Netherlands B.V.
    Inventor: Arie Jeffrey Den Boef
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110235008
    Abstract: An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.
    Type: Application
    Filed: June 6, 2011
    Publication date: September 29, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Martinus Hendrikus Antonius Leenders, Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Michel Riepen, Sergei Shulepov
  • IMPRINT LITHOGRAPHY
    Publication number: 20110233825
    Abstract: An imprint lithography apparatus is disclosed which includes a pattern fixing system configured to use actinic radiation to fix a pattern provided in a layer of imprintable medium by an imprint lithography template, and an inspection system configured to use inspection radiation to inspect an element constituting or, in use, being located within, the imprint lithography apparatus. The imprint lithography apparatus is configured such that the pattern fixing system and the inspection system are provided, in use, with, respectively, actinic radiation and inspection radiation from a single source of radiation.
    Type: Application
    Filed: March 23, 2011
    Publication date: September 29, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Sander Frederik Wuister, Vadim Yevgenyevich Banine
  • HEAT PIPE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110232878
    Abstract: A heat pipe to maintain an object at a substantially uniform temperature is disclosed. The heat pipe includes a chamber containing a liquid reservoir and a vapor space, part of the chamber being defined by a condensing surface, and a liquid transporter to apply a force additional to gravity to liquid to transport liquid away from the condensing surface towards the reservoir, wherein the condensing surface is shaped such that condensed liquid moves along it towards the liquid transporter.
    Type: Application
    Filed: September 27, 2010
    Publication date: September 29, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Joost Jeroen Ottens, Hrishikesh Patel, Gerrit Van Donk, Johannes Van Es
  • Lithographic apparatus and device manufacturing method
    Patent number: 8027026
    Abstract: A method including mixing using a mixer a first component and a second component to form a liquid before supply to a space between the projection system and a substrate, measuring a property of the liquid using a measuring device and making the feedback available to a controller, based on the feedback, controlling with the controller a physical property of the liquid by controlling the amount of the first and/or second component used to form the liquid, supplying the liquid to the space between the projection system and the substrate, and projecting a patterned beam of radiation, using the projection system, through the liquid onto a target portion of the substrate.
    Type: Grant
    Filed: January 28, 2011
    Date of Patent: September 27, 2011
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Matthew Lipson, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Catharinus Hubertus Mulkens, Bob Streefkerk, Ronald Wilklow, Roel De Jonge
  • Lithographic apparatus and device manufacturing method
    Patent number: 8027019
    Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.
    Type: Grant
    Filed: March 28, 2006
    Date of Patent: September 27, 2011
    Assignee: Asml Netherlands B.V.
    Inventors: Nicolaas Rudolf Kemper, Sjoerd Nicolaas Lambertus Donders, Joost Jeroen Ottens, Edwin Cornelis Kadijk, Sergei Shulepov
  • IMPRINT LITHOGRAPHY
    Publication number: 20110226735
    Abstract: An imprint lithography method is disclosed that includes, after imprinting an imprint lithography template into a layer of imprintable medium to form a pattern in that imprintable medium and fixing that pattern to form a patterned layer of imprintable medium, adding etch resistant material (i.e. a hard mask) to a part of the patterned layer of imprintable medium to reduce a difference between an intended topography and an actual topography of that part of the patterned layer of imprintable medium.
    Type: Application
    Filed: March 18, 2011
    Publication date: September 22, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Sander Frederik Wuister, Vadim Yevgenyevich Banine, Arie Jeffrey Den Boef, Yvonne Wendela Kruijt-Stegeman, Tatyana Viktorovna Rakhimova, Dmitriy Viktorovich Lopaev, Denis Alexandrovich Glushkov, Andrei Mikhailovich Yakunin, Roelof Koole
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110228241
    Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
    Type: Application
    Filed: May 31, 2011
    Publication date: September 22, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri LOF, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • LITHOGRAPHIC APPARATUS, AN ILLUMINATION SYSTEM, A PROJECTION SYSTEM AND A METHOD OF MANUFACTURING A DEVICE USING A LITHOGRAPHIC APPARATUS
    Publication number: 20110228239
    Abstract: A gas curtain is provided to separate a component of a lithographic apparatus from contaminated gas. The gas curtain is supplied by an opening. The opening is at a boundary of a protection environment with which a surface of the component comes into contact. The gas curtain may separate the component from a moving part of the apparatus.
    Type: Application
    Filed: March 17, 2011
    Publication date: September 22, 2011
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Jeroen Gerard GOSEN, Antonius Johannus Van Der Net, Bart Dinand Paarhuis, Frank Johannes Jacobus Van Boxtel, Jinggao Li
  • Lithographic apparatus and device manufacturing method
    Patent number: RE42741
    Abstract: Liquid is supplied to a space between a projection system of a lithographic apparatus and a substrate, but there is a space between the liquid and the substrate. An evanescent field may be formed between the liquid and the substrate allowing some photons to expose the substrate. Due to the refractive index of the liquid, the resolution of the system may be improved and liquid on the substrate may be avoided.
    Type: Grant
    Filed: March 11, 2008
    Date of Patent: September 27, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Jan Evert Van Der Werp