Abstract: A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution.
Type:
Application
Filed:
June 15, 2011
Publication date:
October 6, 2011
Applicant:
ASML Netherlands B.V.
Inventors:
Theodore A. PAXTON, Todd J. DAVIS, Todd D. HIAR, Cassandra May OWEN, Steven George HANSEN, James J. HUNTER
Abstract: A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.
Type:
Application
Filed:
June 14, 2011
Publication date:
October 6, 2011
Applicant:
ASML NETHERLANDS B.V.
Inventors:
Joost Jeroen OTTENS, Noud Jan Gilissen, Martinus Hendrikus Antonius Leenders, Koen Jacobus Johannes Maria Zaal
Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap for trapping material emanating from the radiation source. The rotation contaminant trap includes a multiple number of elements extending in a radial direction from a common rotation trap axis and being arranged for allowing contaminant material emanating from the radiation source to deposit during propagation of the radiation beam in the radiation system. The radiation system further includes a contaminant catch for receiving contaminant material particles from the rotation trap elements, the contaminant catch having a constitution, during operation of the radiation, for retaining said contaminant material particles.
Type:
Application
Filed:
October 8, 2009
Publication date:
October 6, 2011
Applicant:
ASML NETHERLANDS B.V.
Inventors:
Olav Waldemar Vladimir Frijns, Johannes Christiaan Leonardus Franken, Kurt Gielissen
Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; at least three substrate tables that are each constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the substrate tables are moveable in a common moving area extending substantially in a plane perpendicular to the patterned radiation beam, the moving area comprising at least three working locations of which at least one working location is arranged for exposure of the substrate to the patterned radiation beam and at least one working location is arranged for non-exposure purposes.
Type:
Application
Filed:
March 17, 2011
Publication date:
October 6, 2011
Applicant:
ASML NETHERLANDS B.V.
Inventors:
Theodorus Petrus Maria Cadee, Jan Jaap Kuit, Johannes Catharinus Hubertus Mulkens, Koen Jacobus Johannes Maria Zaal
Abstract: A method for forming a mark structure on a substrate comprising a plurality of lines. The lines extend parallel to each other in a first direction and are arranged with a pitch between each pair of lines that is directed in a second direction perpendicular to the first direction. The pitch between each pair of selected lines differs from the pitch between each other pair of selected lines.
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
Inventors:
Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
Abstract: A transmissive fly's eye integrator is disclosed that includes a first array of lenses and a second array of lenses. The first array of lenses and second array of lenses together form a fly's eye integrator, and the first array of lenses and second array of lenses comprise lenses which have a diameter selected from the range of 5 ?m-50 ?m, and a radius of curvature selected from the range of 25 ?m-2500 ?m.
Abstract: A pulse modifier, and associated lithographic apparatus and a method for manufacturing a device, is disclosed. The pulse modifier is configured to receive an input pulse of radiation and further configured to emit a plurality of corresponding output pulse portions of radiation, wherein the respective pulse portions are respectively mirrored about an axis transverse to the optical axis and mirrored about a point of the optical axis of the pulse portions.
Abstract: A device manufacturing method includes a transfer of a pattern from a patterning device onto a substrate. The device manufacturing method further includes transferring a pattern of a main mark to a base layer for forming an alignment mark; depositing a pattern receiving layer on the base layer; in a first lithographic process, aligning, by using the main mark, a first mask that includes a first pattern and a local mark pattern, and transferring the first pattern and the local mark pattern to the pattern receiving layer; aligning, by using the local mark pattern, a second mask including a second pattern relative to the pattern receiving layer; and in a second lithographic process, transferring the second pattern to the pattern receiving layer; the first and second patterns being configured to form an assembled pattern.
Type:
Grant
Filed:
February 17, 2011
Date of Patent:
October 4, 2011
Assignee:
ASML Netherlands B.V.
Inventors:
Maurits Van Der Schaar, Richard Johannes Franciscus Van Haren
Abstract: A carrier substrate is provided with a layer of PDMS and curing agent on one side of the carrier substrate. The PDMS and curing agent can be arranged to receive and adhere to a lithographic substrate. The carrier substrate can be dimensioned such that the combined carrier substrate and lithographic substrate may be handled by a conventional lithographic apparatus.
Type:
Grant
Filed:
November 24, 2008
Date of Patent:
October 4, 2011
Assignee:
ASML Netherlands B.V.
Inventors:
Wilhelmus Johannes Maria De Laat, Cheng-Qun Gui, Peter Theodorus Maria Giesen, Paulus Wilhelmus Leonardus Van Dijk, Erwin Rinaldo Meinders, Maria Peter
Abstract: An angularly resolved scatterometer uses a broadband radiation source and an acousto-optical tunable filter to select one or more narrowband components from the broadband beam emitted by the source for use in measurements. A feedback loop can be used to control the intensity of the selected narrowband components to reduce noise.
Abstract: An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.
Type:
Application
Filed:
June 6, 2011
Publication date:
September 29, 2011
Applicant:
ASML NETHERLANDS B.V.
Inventors:
Martinus Hendrikus Antonius Leenders, Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Michel Riepen, Sergei Shulepov
Abstract: An imprint lithography apparatus is disclosed which includes a pattern fixing system configured to use actinic radiation to fix a pattern provided in a layer of imprintable medium by an imprint lithography template, and an inspection system configured to use inspection radiation to inspect an element constituting or, in use, being located within, the imprint lithography apparatus. The imprint lithography apparatus is configured such that the pattern fixing system and the inspection system are provided, in use, with, respectively, actinic radiation and inspection radiation from a single source of radiation.
Type:
Application
Filed:
March 23, 2011
Publication date:
September 29, 2011
Applicant:
ASML NETHERLANDS B.V.
Inventors:
Sander Frederik Wuister, Vadim Yevgenyevich Banine
Abstract: A heat pipe to maintain an object at a substantially uniform temperature is disclosed. The heat pipe includes a chamber containing a liquid reservoir and a vapor space, part of the chamber being defined by a condensing surface, and a liquid transporter to apply a force additional to gravity to liquid to transport liquid away from the condensing surface towards the reservoir, wherein the condensing surface is shaped such that condensed liquid moves along it towards the liquid transporter.
Type:
Application
Filed:
September 27, 2010
Publication date:
September 29, 2011
Applicant:
ASML Netherlands B.V.
Inventors:
Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Joost Jeroen Ottens, Hrishikesh Patel, Gerrit Van Donk, Johannes Van Es
Abstract: A method including mixing using a mixer a first component and a second component to form a liquid before supply to a space between the projection system and a substrate, measuring a property of the liquid using a measuring device and making the feedback available to a controller, based on the feedback, controlling with the controller a physical property of the liquid by controlling the amount of the first and/or second component used to form the liquid, supplying the liquid to the space between the projection system and the substrate, and projecting a patterned beam of radiation, using the projection system, through the liquid onto a target portion of the substrate.
Inventors:
Matthew Lipson, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Catharinus Hubertus Mulkens, Bob Streefkerk, Ronald Wilklow, Roel De Jonge
Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.
Type:
Grant
Filed:
March 28, 2006
Date of Patent:
September 27, 2011
Assignee:
Asml Netherlands B.V.
Inventors:
Nicolaas Rudolf Kemper, Sjoerd Nicolaas Lambertus Donders, Joost Jeroen Ottens, Edwin Cornelis Kadijk, Sergei Shulepov
Abstract: A gas curtain is provided to separate a component of a lithographic apparatus from contaminated gas. The gas curtain is supplied by an opening. The opening is at a boundary of a protection environment with which a surface of the component comes into contact. The gas curtain may separate the component from a moving part of the apparatus.
Abstract: An imprint lithography method is disclosed that includes, after imprinting an imprint lithography template into a layer of imprintable medium to form a pattern in that imprintable medium and fixing that pattern to form a patterned layer of imprintable medium, adding etch resistant material (i.e. a hard mask) to a part of the patterned layer of imprintable medium to reduce a difference between an intended topography and an actual topography of that part of the patterned layer of imprintable medium.
Type:
Application
Filed:
March 18, 2011
Publication date:
September 22, 2011
Applicant:
ASML NETHERLANDS B.V.
Inventors:
Sander Frederik Wuister, Vadim Yevgenyevich Banine, Arie Jeffrey Den Boef, Yvonne Wendela Kruijt-Stegeman, Tatyana Viktorovna Rakhimova, Dmitriy Viktorovich Lopaev, Denis Alexandrovich Glushkov, Andrei Mikhailovich Yakunin, Roelof Koole
Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
Type:
Application
Filed:
May 31, 2011
Publication date:
September 22, 2011
Applicant:
ASML NETHERLANDS B.V.
Inventors:
Joeri LOF, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
Abstract: Liquid is supplied to a space between a projection system of a lithographic apparatus and a substrate, but there is a space between the liquid and the substrate. An evanescent field may be formed between the liquid and the substrate allowing some photons to expose the substrate. Due to the refractive index of the liquid, the resolution of the system may be improved and liquid on the substrate may be avoided.
Type:
Grant
Filed:
March 11, 2008
Date of Patent:
September 27, 2011
Assignee:
ASML Netherlands B.V.
Inventors:
Aleksey Yurievich Kolesnychenko, Jan Evert Van Der Werp