Patents Assigned to ASML Netherlands
  • Inspection Apparatus and Associated Method and Monitoring and Control System
    Publication number: 20110231167
    Abstract: A method, a lithographic apparatus, and a computer-readable medium provide a model of a metrology tool to determine a measurement error and/or covariance of particular parameters, such as the critical dimension and the sidewall angle, of a number of targets, such as gratings. The model can include at least one measurement error source. The method can include using a metrology tool to measure each target and using the model to determine the measurement error of the measured parameters of the particular target when measured by said metrology tool. The value of the measured parameter along with the corresponding measurement error is then determined in the metrology tool output for each particular target, and can be used in exposure focus and dose control in a lithographic process.
    Type: Application
    Filed: March 14, 2011
    Publication date: September 22, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Hugo Augustinus Joseph CRAMER, Patricius Aloysius Jacobus Tinnemans
  • COVER FOR A SUBSTRATE TABLE, SUBSTRATE TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD
    Publication number: 20110228248
    Abstract: A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.
    Type: Application
    Filed: March 14, 2011
    Publication date: September 22, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Niek Jacobus Johannes Roset, Alexander Nikolov Zdravkov, Jan Willem Stouwdam, Bernardus Lambertus Johannes Bijl
  • LITHOGRAPHIC APPARATUS, COVER FOR USE IN A LITHOGRAPHIC APPARATUS AND METHOD FOR DESIGNING A COVER FOR USE IN A LITHOGRAPHIC APPARATUS
    Publication number: 20110228238
    Abstract: A lithographic apparatus having a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of a substrate table and/or a substrate located in a recess of the substrate table, a cover including a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.
    Type: Application
    Filed: March 14, 2011
    Publication date: September 22, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Niek Jacobus Johannes ROSET, Nicolaas TEN KATE, Sergei SHULEPOV, Raymond Wilhelmus Louis LAFARRE
  • Inspection Method For Lithography
    Publication number: 20110229830
    Abstract: The present invention relates to an inspection apparatus and method which include projecting a measurement radiation beam onto a target on a substrate in order to measure the radiation reflected from the target and obtain information related to properties of the substrate. In the present embodiments, the measurement spot, which is the focused beam on the substrate, is larger than the target. Information regarding the radiation reflected from the target is kept and information regarding the radiation reflected from the surface around the target is eliminated. This is done either by having no reflecting (or no specularly reflecting) surfaces around the target or by having known structures around the target, the information from which may be recognized and removed from the total reflected beam.
    Type: Application
    Filed: September 8, 2009
    Publication date: September 22, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Kaustuve Bhattacharyya, Arie Jeffrey Den Boef, Marcus Adrianus Van De Kerkhof, Maurits Van Der Schaar
  • Lithographic apparatus and device manufacturing method
    Patent number: 8023101
    Abstract: An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.
    Type: Grant
    Filed: May 17, 2007
    Date of Patent: September 20, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Martinus Hendrikus Antonius Leenders, Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Michel Riepen, Sergei Shulepov
  • Device manufacturing method, lithographic system, lithographic apparatus and design for manufacturing system
    Patent number: 8021809
    Abstract: In an embodiment, a device manufacturing method for transferring a pattern from a patterning device onto a substrate includes receiving a design layout information associated with a device, determining the pattern from the design layout information, providing the pattern to a patterning device, determining feed-forward requirement data from the design layout information, wherein the feed-forward requirement data includes at least first feed-forward requirement data related to a first location in the pattern and second feed-forward requirement data related to a second location in the pattern, determining a transfer condition from at least at least the first and the second feed-forward requirement data; and transferring a portion of the pattern from the patterning device onto the substrate based at least in part on the transfer condition.
    Type: Grant
    Filed: December 29, 2008
    Date of Patent: September 20, 2011
    Assignee: ASML Netherlands B.V.
    Inventor: Adrianus Cornelis Johannes Van Dijk
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110222039
    Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An optical element of the projection system is adjustable. The lithographic apparatus includes a controller to control the adjustable optical element. The controller is arranged to drive the optical element so as to at least partly compensate for a magnification resulting from a bending of the patterning device.
    Type: Application
    Filed: March 9, 2011
    Publication date: September 15, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Christiaan Louis VALENTIN, Antonius Franciscus Johannes DE GROOT, Robert-Han MUNNIG SCHMIDT, Johannes Petrus Martinus Bernardus VERMEULEN, Bartholomeus Catharina Thomas VAN BREE
  • RADIATION SYSTEM, RADIATION COLLECTOR, RADIATION BEAM CONDITIONING SYSTEM, SPECTRAL PURITY FILTER FOR RADIATION SYSTEM AND METHOD FOR FORMING A SPECTRAL PURITY FILTER
    Publication number: 20110223543
    Abstract: A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.
    Type: Application
    Filed: May 5, 2009
    Publication date: September 15, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Wilhelmus Petrus De Boeij, Antonius Johannes Josephus Van Dijsseldonk, Erik Roelof Loopstra, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20110222032
    Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
    Type: Application
    Filed: March 11, 2011
    Publication date: September 15, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas TEN KATE, Johannes Henricus Wilhelmus JACOBS, Joost Jeroen OTTENS, Bastiaan Andreas Wilhelmus Hubertus KNARREN, Thibault Simon Mathieu LAURENT, Robbert Jan VOOGD, Giovanni Francisco NINO, Johan Gertrudis Cornelis KUNNEN, Marinus Jan REMIE
  • RADIATION SOURCE APPARATUS, LITHOGRAPHIC APPARATUS, METHOD OF GENERATING AND DELIVERING RADIATION AND METHOD FOR MANUFACTURING A DEVICE
    Publication number: 20110222040
    Abstract: A contaminant trap is used in an EUV radiation source apparatus. An EUV radiation beam is generated and focused through a low pressure gaseous atmosphere into a virtual source point. The EUV radiation creates a plasma in the low pressure hydrogen atmosphere through which it passes. A contaminant trap including electrodes is located in or around radiation beam as it approaches the virtual source point. A DC biasing source is connected to the electrodes to create an electric field oriented to deflect out of the beam path contaminant particles that have been negatively charged by the plasma. Additional RF electrodes and/or an ionizer enhance the plasma to increase the charging of the particles. The deflecting electrodes can be operated with RF bias for a short time, to ensure dissipation of the enhanced plasma.
    Type: Application
    Filed: March 11, 2011
    Publication date: September 15, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Jens Arno STEINHOFF, Vadim Yevgenyevich BANINE, Richard Joseph BRULS, Erik Roelof LOOPSTRA, Hendrik Antony Johannes NEERHOF, Adrianus Johannes Maria VAN DIJK, Andrei Mikhailovich YAKUNIN, Luigi SCACCABAROZZI
  • Radiation Detector
    Publication number: 20110220806
    Abstract: A radiation detector detects radiation. The radiation detector includes a plurality of Faraday cups. Each Faraday cup being provided with a cover. Each cover comprising a window arrangement through which the radiation may pass into the Faraday cup. The window arrangement of each cover being different for each Faraday cup. Each Faraday cup housing a target configured to emit photoelectrons if the radiation is incident upon the target.
    Type: Application
    Filed: August 19, 2010
    Publication date: September 15, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Wilhelmus Jacobus Maria Rooijakkers, Martijn Gerard Dominique Wehrens
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110222035
    Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.
    Type: Application
    Filed: May 26, 2011
    Publication date: September 15, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Koen Jacobus Johannes Maria ZAAL, Joost Jeroen OTTENS
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110222044
    Abstract: A level sensor configured to measure a height level of a substrate arranged in a measurement position is disclosed. The level sensor comprises a projection unit to project multiple measurement beams on multiple measurement locations on the substrate, a detection unit to receive the measurement beams after reflection on the substrate, and a processing unit to calculate a height level on the basis of the reflected measurement beams received by the detection unit, wherein the projection unit and the detection unit are arranged next to the substrate, when the substrate is arranged in the measurement position.
    Type: Application
    Filed: March 10, 2011
    Publication date: September 15, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventor: William Peter VAN DRENT
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110222045
    Abstract: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed, the apparatus including a substrate table constructed to hold a substrate, a first clamping system configured to clamp the substrate table to a substrate table support structure, and a second clamping system configured to clamp a substrate to the substrate table after the substrate table has been clamped to the substrate table support structure.
    Type: Application
    Filed: May 24, 2011
    Publication date: September 15, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Rene Theodorus Petrus COMPEN, Oleg VOZNYI, Martijn HOUBEN, Majid EL BOUCHAIBI, Franciscus Johannes Maria BOEKHOLT, Remko WAKKER
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20110222029
    Abstract: A detector to measure a property of radiation is disclosed. The detector comprises first and second luminescent uniaxial crystals each having an optic axis, the optic axis of the first uniaxial crystal being arranged such that it is substantially perpendicular to the optic axis of the second uniaxial crystal.
    Type: Application
    Filed: March 10, 2011
    Publication date: September 15, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Roland Pieter STOLK, Paul Van Der Veen
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20110222033
    Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
    Type: Application
    Filed: March 11, 2011
    Publication date: September 15, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Ten Kate, Johannes Henricus Wilhelmus Jacobs, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Thibault Simon Mathieu Laurent, Robbert Jan Voogd, Giovanni Francisco Nino, Johan Gertrudis Cornelis Kunnen, Marinus Jan Remie
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110222036
    Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.
    Type: Application
    Filed: May 26, 2011
    Publication date: September 15, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Koen Jacobus Johannes Maria ZAAL, Joost Jeroen Ottens
  • LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS CLEANING METHOD
    Publication number: 20110222034
    Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.
    Type: Application
    Filed: May 18, 2011
    Publication date: September 15, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marco Koert STAVENGA, Hans Jansen, Peter Franciscus Wanten, Johannes Wilhelmus Jacobus Leonardus Culjpers, Raymond Gerardus Marius Beeren
  • Lithographic method
    Patent number: 8017310
    Abstract: A method of providing a pattern on a substrate is disclosed. The method includes providing a layer of photoresist on the substrate, providing a layer of top coating over the layer of photoresist, lithographically exposing the photoresist layer and developing the photoresist to form a structure, covering the structure with a coating layer, inducing a chemical reaction between the photoresist and the coating layer, which reaction does not occur in the top coating, to form regions of modified coating layer, and removing unmodified coating layer to leave behind a patterned structure formed from the regions of modified coating layer.
    Type: Grant
    Filed: February 2, 2007
    Date of Patent: September 13, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Richard Franciscus Johannes Van Haren, Ewoud Vreugdenhil
  • Lithographic apparatus and device manufacturing method
    Patent number: 8018573
    Abstract: Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume/damper to compensate for pressure fluctuation.
    Type: Grant
    Filed: February 22, 2005
    Date of Patent: September 13, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Marco Koert Stavenga, Martinus Cornelis Maria Verhagen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen