Patents Assigned to ASML Netherlands
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Publication number: 20110032505Abstract: A robot positions a workpiece within a vacuum chamber of a lithographic apparatus. A first component of the robot is located within a vacuum chamber to position a workpiece along a translational axis. A shaft supports the first component such that an axis of symmetry of the shaft is perpendicular to the translational axis, and a second component rotates the shaft about the axis of symmetry and moves the shaft in a direction parallel to the axis of symmetry. The second component includes a gas bearing configured to introduce gas along a circumferential surface of the shaft and a scavenging seal configured to evacuate the gas introduced by the second component gas bearing. The robot substantially reduces, or eliminates the out-gassing of hydrocarbon molecules in a range from about 0 to 200 a.m.u., thus rendering the robot suitable for use in extreme ultra-violet (EUV) photolithography applications.Type: ApplicationFiled: April 22, 2009Publication date: February 10, 2011Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Robert Gabriël Maria Lansbergen, George Hilary Harrold, Matthew James Van Doren
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Publication number: 20110032497Abstract: A conduit system for a lithographic apparatus is disclosed, the conduit system including a conduit configured to guide a liquid or liquid-gas mixture, and a gas injection nozzle configured to introduce a gas in the liquid or liquid-gas mixture to at least partially absorb pressure peaks or waves in the liquid or liquid-gas mixture. In an embodiment, the gas injection nozzle may be arranged in a pump of the conduit system. The pump further includes a pump inlet, a pump outlet and a pump chamber between the pump inlet and the pump outlet arranged for compression of the liquid or liquid-gas mixture.Type: ApplicationFiled: October 25, 2010Publication date: February 10, 2011Applicant: ASML Netherlands B.V.Inventors: Martinus Wilhelmus VAN DEN HEUVEL, Johannes Christiaan Leonardus Franken, Josephus Cornelius Johannes Antonius Vugts
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Publication number: 20110031866Abstract: A patterned beam of radiation is projected onto a substrate. A reflective optical element is used to help form the radiation beam from radiation emitted from a plasma region of a plasma source. In the plasma source, a plasma current is generated in the plasma region. To reduce damage to the reflective optical element, a magnetic field is applied in the plasma region with at least a component directed along a direction of the plasma current. This axial magnetic field helps limit the collapse of the Z-pinch region of the plasma. By limiting the collapse, the number of fast ions emitted may be reduced.Type: ApplicationFiled: October 19, 2010Publication date: February 10, 2011Applicant: ASML Netherlands B.V.Inventors: Vladimir Vitalevitch IVANOV, Vadim Yevgenyevich BANINE, Konstantin Nikolaevitch KOSHELEV
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Publication number: 20110032500Abstract: The measurement of two separately polarized beams (Ix, Iy) upon diffraction from a substrate (W) in order to determine properties of the substrate is disclosed. Circularly or elliptically polarized radiation is passed via a variable phase retarder in order to change the phase of one of two orthogonally polarized radiation beams with respect to the other of the two beams. The phase change is dependent on the wavelength of the polarized beam. The relative phases of the two radiation beams and other features of the beams as measured in a detector gives rise to properties of the substrate surface.Type: ApplicationFiled: March 20, 2009Publication date: February 10, 2011Applicant: ASML NETHERLANDS B.V.Inventor: Alexander Straaijer
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Patent number: 7884919Abstract: A device manufacturing method includes transferring a pattern from a patterning device onto a substrate. The method includes bringing the patterning device and the support together, and applying a substantially stationary force between the patterning device and the support to hold the patterning device. The patterning device is now excited by a substantially dynamic force to enable a micro slipping thereof. Then, the patterning device is aligned, and the pattern is transferred from the patterning device onto the substrate. The patterning device may be excited with an alternating acceleration. When the patterning device is excited, the patterning device is allowed to settle with respect to the support, thereby improving a friction therebetween to reduce a risk of slipping or local slipping of the patterning device.Type: GrantFiled: February 9, 2006Date of Patent: February 8, 2011Assignee: ASML Netherlands B.V.Inventors: Peter Hempenius, Marcel Koenraad Marie Baggen, Dirk-Jan Bijvoet, Sjoerd Nicolaas Lambertus Donders, Youssef Karel Maria De Vos
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Patent number: 7884920Abstract: A mirror assembly to interact with a beam of radiation of a lithographic apparatus is disclosed. The mirror assembly includes a mirror, a piezo electric actuator, and a mover structure, the mover structure connected to the mirror, an assembly of the mirror and the mover structure being pivotable about a pivot point, the piezo electric actuator having a contacting surface to establish a slip-stick contact with the mover structure.Type: GrantFiled: June 15, 2007Date of Patent: February 8, 2011Assignee: ASML Netherlands B.V.Inventors: Hermanus Mathias Joannes Rene Soemers, Felix Godfried Peter Peeters
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Publication number: 20110026002Abstract: An EUV radiation generation apparatus includes an optical gain medium configured to produce laser radiation for interaction with a target material to produce an EUV radiation-emitting plasma, and a structure defining an aperture through which the laser radiation may pass. The structure includes a radiation guide having an outer surface constructed and arranged to guide the laser radiation away from the optical gain medium.Type: ApplicationFiled: July 6, 2010Publication date: February 3, 2011Applicant: ASML Netherlands B.V.Inventors: Erik Roelof LOOPSTRA, Gerardus Hubertus Petrus Maria Swinkels, Uwe Bruno Heini Stamm
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Publication number: 20110026001Abstract: A lithographic apparatus including a radiation beam monitoring apparatus, the radiation beam monitoring apparatus including an optical element configured to generate a diffraction pattern, and an imaging detector located after the optical element and not in a focal plane of the optical element such that the imaging detector is capable of detecting a mixture of spatial coherence and divergence of the radiation beam.Type: ApplicationFiled: June 24, 2010Publication date: February 3, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Bert Jan CLAESSENS, Paul Van Der Veen, Herman Philip Godfried
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Publication number: 20110026004Abstract: A positioning system to position a movable object having a body, the positioning system includes an object position measurement system, an object actuator, and an object controller, wherein the positioning system further includes a stiffener to increase the stiffness and/or to damp relative movements within the body of the object, the stiffener including; one or more sensors, wherein each sensor is arranged to determine a measurement signal representative of an internal strain or relative displacement in the body, one or more actuators, wherein each actuator is arranged to exert an actuation force on a part of the body, and at least one controller, configured to provide on the basis of the measurement signal of at least one of the sensors, an actuation signal to at least one of the actuators to increase the stiffness and/or to damp movements within the body.Type: ApplicationFiled: July 6, 2010Publication date: February 3, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Jan VAN EIJK, Engelbertus Antonius Fransiscus Van Der Pasch, Johannes Petrus Martinus Bernardus Vermeulen
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Publication number: 20110025993Abstract: A system to recycle immersion fluid in an immersion fluid lithographic apparatus is described. A recycling path comprising a plurality of parallel paths, each of which has its own parallel liquid treatment unit optimized to treat fluid which is directed through it, is disclosed.Type: ApplicationFiled: October 8, 2010Publication date: February 3, 2011Applicant: ASML NETHERLANDS B.V.Inventor: Johannes Catharinus Hubertus MULKENS
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Publication number: 20110025994Abstract: A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.Type: ApplicationFiled: October 11, 2010Publication date: February 3, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf KEMPER, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Nicolaas TEN KATE, Sergei SHULEPOV
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Publication number: 20110025995Abstract: A capillary passage is formed between a substrate holder and an edge structure. Along the capillary passage are arranged a plurality of electrodes which, when charged, become liquidphilic. The electrodes may be used to split droplets of liquid and pump the liquid along the capillary passage.Type: ApplicationFiled: October 14, 2010Publication date: February 3, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Martinus Hendrikus Antonius LEENDERS, Sjoerd Nicolaas Lambertus DONDERS, Nicolaas Rudolf KEMPER
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Publication number: 20110024651Abstract: A radiation system configured to generate a radiation beam, the radiation system including a chamber including: a radiation source configured to generate radiation; a radiation beam emission aperture; a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture; and a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture, wherein the spectral purity filter is configured to divide the chamber into a high pressure region and a low pressure region.Type: ApplicationFiled: November 7, 2008Publication date: February 3, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Hendrikus Gijsbertus Schimmel, Tjarko Adriaan Rudolf Van Empel, Gerardus Hubertus Petrus Maria Swinkels, Maarten Marinus Johannes Wilhelmus Van Herpen, Dzmitry Labetski
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Publication number: 20110027704Abstract: In a method of determining the focus of a lithographic apparatus used in a lithographic process on a substrate, the lithographic process is used to form a structure on the substrate, the structure having at least one feature which has an asymmetry in the printed profile which varies as a function of the focus of the lithographic apparatus on the substrate. A first image of the periodic structure is formed and detected while illuminating the structure with a first beam of radiation. The first image is formed using a first part of non-zero order diffracted radiation. A second image of the periodic structure is foamed and detected while illuminating the structure with a second beam of radiation. The second image is formed using a second part of the non-zero order diffracted radiation which is symmetrically opposite to the first part in a diffraction spectrum.Type: ApplicationFiled: July 29, 2010Publication date: February 3, 2011Applicant: ASML Netherlands B.V.Inventors: Hugo Augustinus Joseph Cramer, Arie Jeffrey Den Boef, Henricus Johannes Lambertus Megens, Hendrik Jan Hidde Smilde, Andrianus Johannes Hendrikus Schellekens, Michael Kubis
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Publication number: 20110028004Abstract: A mark used in the determination of overlay error comprises sub-features, the sub-features having a smallest pitch approximately equal to the smallest pitch of the product features. The sensitivity to distortions and aberrations is similar as that for the product features. When the mark is developed the sub-features merge and the outline of the larger feature is developed.Type: ApplicationFiled: July 7, 2010Publication date: February 3, 2011Applicant: ASML Netherlands B.V.Inventors: Jiun-Cheng Wang, Richard Johannes Franciscus Van Haren, Maurits Van der Schaar, Hyun-Woo Lee, Reiner Maria Jungblut
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Patent number: 7880861Abstract: A method for synchronizing a plurality of series coupled nodes is described. A master trigger is transmitted through the plurality of series coupled local nodes in a downstream direction from a first node to a last node and retransmitted through the plurality of series coupled nodes in an upstream direction from the last node to the first node. Then, a local synchronization time is calculated at each of the plurality of series coupled nodes based on a differential measurement between the arrival of the master trigger in the downstream direction and the upstream direction. Operations in the local nodes may be synchronized based on the local synchronization time.Type: GrantFiled: August 17, 2007Date of Patent: February 1, 2011Assignee: ASML Netherlands B.V.Inventor: Roel Franciscus Gerardus Pouls
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Patent number: 7879514Abstract: A lithographic method includes patterning a beam of radiation with a patterning device. The patterning device includes at least two image patterning portions and at least two metrology mark patterning portions. The method also includes projecting at least two image portions of the patterned beam of radiation sequentially onto target portions of a substrate such that the projected image portions are substantially adjacent to each other on the substrate and collectively form a composite image on the substrate. The method also includes projecting a metrology mark onto the substrate outside of the area of the composite image at the same time as projecting each of at least two of the image portions, and measuring the alignment of the metrology marks to determine the relative positions of the at least two image portions.Type: GrantFiled: August 4, 2006Date of Patent: February 1, 2011Assignee: ASML Netherlands B.V.Inventors: Geoffrey Norman Phillipps, Cheng-Qun Gui, Rudy Jan Maria Pellens, Paulus Wilhelmus Leonardus Van Dijk
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Patent number: 7880880Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.Type: GrantFiled: December 6, 2005Date of Patent: February 1, 2011Assignee: ASML Netherlands B.V.Inventors: Franciscus Bernardus Maria Van Bilsen, Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse, Andre Bernardus Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Pieter Theodoor Tolsma, Hubertus Johannes Gertrudus Simons, Johny Rutger Schuurhuis, Sicco Ian Schets, Brian Young Bok Lee, Allan Reuben Dunbar
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Patent number: 7878755Abstract: A load lock is constructed and arranged to transfer a substrate between a first environment and a second environment and to maintain each of the first environment and the second environment therein. The load lock includes a load lock chamber provided with at least two mutually distinct substrate supports positioned one above the other. Each of the substrate supports includes a substrate displacement element. The load lock also includes an evacuation device constructed and arranged to evacuate the load lock chamber, and a door constructed and arranged to close the load lock chamber during evacuation and for opening the load lock chamber.Type: GrantFiled: February 1, 2008Date of Patent: February 1, 2011Assignee: ASML Netherlands B.V.Inventors: Albert Jan Hendrik Klomp, Jan Frederik Hoogkamp, Josephus Cornelius Johannes Antonius Vugts, Robert Gordon Livesey, Johannes Hendrikus Gertrudis Franssen
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Patent number: 7880889Abstract: An inspection method is provided to determine a value related to a parameter of a target pattern printed on a substrate by a lithographic process used to manufacture a device layer on a substrate. The inspection method can include using an optical system with a high-NA objective lens, where the high-NA objective lens includes an object plane and a pupil plane. The inspection method can also include providing an aperture member to define at least one obscuration, determining a radial distance between a radially innermost point of each dark area and a nominal center of an image in a pupil plane, and determining an axial distance between the target and an object plane from the determined radial distance.Type: GrantFiled: July 17, 2009Date of Patent: February 1, 2011Assignee: ASML Netherlands B.V.Inventor: Arie Jeffrey Den Boef
