Patents Assigned to ASML Netherlands
  • Publication number: 20110085726
    Abstract: A lithographic apparatus has an alignment system including a radiation source configured to convert narrow-band radiation into continuous, flat and broad-band radiation. An acoustically tunable narrow pass-band filter filters the broad-band radiation into narrow-band linearly polarized radiation. The narrow-band radiation may be focused on alignment targets of a wafer so as to enable alignment of the wafer. In an embodiment, the filter is configured to modulate an intensity and wavelength of radiation produced by the radiation source and to have multiple simultaneous pass-bands. The radiation source generates radiation that has high spatial coherence and low temporal coherence.
    Type: Application
    Filed: March 31, 2010
    Publication date: April 14, 2011
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Arie Jeffrey Den Boef, Harry Sewell, Keith William Andresen, Earl William Ebert, JR., Sanjeev Kumar Singh
  • Publication number: 20110085176
    Abstract: A system and method determine an approximate structure of an object on a substrate. This may be applied in model based metrology of microscopic structures to assess critical dimension or overlay performance of a lithographic apparatus. A scatterometer is used to determine approximate structure of an object, such as a grating on a stack, on a substrate. The wafer substrate has an upper layer and an underlying layer. The substrate has a first scatterometry target region, including the grating on a stack object. The grating on a stack is made up of the upper and underlying layers. The upper layer is patterned with a periodic grating. The substrate further has a neighboring second scatterometry target region, where the upper layer is absent. The second region has just the unpatterned underlying layers.
    Type: Application
    Filed: September 16, 2010
    Publication date: April 14, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Hugo Augustinus Joseph Cramer, Henricus Johannes Lambertus Megens
  • Publication number: 20110085162
    Abstract: A method and apparatus is used for inspection of devices to detect processing faults on semiconductor wafers. Illuminating a strip of a die along a scan path with a moving measurement spot. Detecting scattered radiation to obtain an angle-resolved spectrum that is spatially integrated over the strip. Comparing the scattering data with a library of reference spectra, obtained by measurement or calculation. Based on the comparison, determining the presence of a fault of the die at the strip. The measurement spot is scanned across the wafer in a scan path trajectory comprising large (constant) velocity portions and the acquisition of the angle-resolved spectrum is taken, and comparisons are done, at full scan speed. If a long acquisition is performed along a strip across the die in the Y direction, then variation in the acquired spectrum resulting from position variation will primarily depend on the X position of the spot.
    Type: Application
    Filed: September 15, 2010
    Publication date: April 14, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Leonardus Henricus Marie VERSTAPPEN, Arie Jeffrey Den Boef
  • Publication number: 20110085180
    Abstract: A position measurement system configured to measure a position quantity of a movable object in a measurement direction, the system including a radiation source, a beam splitter to split the radiation beam in a measurement beam and a reference beam, a first reflective surface mounted on the movable object to receive the measurement beam, a second reflective surface mounted on a reference object to receive the reference beam, and a detector arranged to receive a first and second reflected beam reflected by the first and second reflective surface, respectively, and configured to provide a signal representative of the position quantity of the movable object based on the first and the second beam, wherein the radiation source and detector are mounted on an object that is different from the movable object and the reference object.
    Type: Application
    Filed: October 12, 2010
    Publication date: April 14, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Ruud Antonius Catharina Maria Beerens, Sjoerd Nicolaas Lambertus Donders, Engelbertus Antonius Fransiscus Van Der Pasch, Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Johannes Petrus Martinus Bernardus Vermeulen
  • Patent number: 7924404
    Abstract: A manifold is provided between an outlet of a fluid supply system for an immersion lithographic apparatus and a separator. The manifold is provided with a pressure sensor which passes the measured pressure in the manifold to a mass flow controller. The mass flow controller controls a leak flow into the manifold based on the measured pressure in the manifold so as to maintain a desired pressure in the manifold.
    Type: Grant
    Filed: August 16, 2007
    Date of Patent: April 12, 2011
    Assignee: ASML Netherlands B.V.
    Inventor: Antonius Johannus Van Der Net
  • Patent number: 7922474
    Abstract: An imprinting method is disclosed that includes applying an imprinting force to a template to cause the template to contact an imprintable medium on a target region of a first surface of a substrate to form an imprint in the medium, during application of the imprinting force, applying a compensating force to a second surface of the substrate which is opposite to the first surface so as to reduce deformation of the substrate caused by the application of the imprinting force, and separating the template from the imprinted medium.
    Type: Grant
    Filed: February 17, 2005
    Date of Patent: April 12, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Yvonne Wendela Kruijt-Stegeman, Henricus Wilhelmus Aloysius Janssen, Aleksey Yurievich Kolesnychenko, Helmar Van Santen
  • Patent number: 7924403
    Abstract: A immersion lithographic apparatus is disclosed in which one or more liquid diverters are positioned in a space surrounded by a liquid confinement structure. A function of the liquid diverter(s) is to hinder the formation of one or more recirculation zones of immersion liquid which may lead to variations in refractive index of the immersion liquid in the space and thereby imaging errors.
    Type: Grant
    Filed: January 12, 2006
    Date of Patent: April 12, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Paulus Martinus Maria Liebregts, Johannes Henricus Wilhelmus Jacobs, Tammo Uitterdijk
  • Patent number: 7924399
    Abstract: An assembly including a conditioning system and an object movable into and/or out of an area to be conditioned is disclosed. The conditioning system has fluid outlet passages to supply conditioning fluid to the area to be conditioned and is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object.
    Type: Grant
    Filed: March 27, 2006
    Date of Patent: April 12, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Ronald Van Der Ham, Tjarko Adriaan Rudolf Van Empel, Herman Vogel, Niek Jacobus Johannes Roset
  • Patent number: 7924406
    Abstract: An illuminator for a lithographic apparatus includes a first illuminator channel, a second illuminator channel, a first switch device, an additional illuminator part and a second switch device. Each of the first and the second illuminator channel includes elements which are adjustable to provide a radiation beam with at least one desired property. The first switch device is configured to receive the radiation beam and arranged to direct the radiation beam between the first and second illuminator channels. The second switch device is arranged to receive the radiation beam from the first and second illuminator channels and direct the radiation beam through the additional illuminator part. The additional illuminator part includes elements which apply at least one additional desired property to the radiation beam.
    Type: Grant
    Filed: June 2, 2006
    Date of Patent: April 12, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Arno Jan Bleeker, Heine Melle Mulder, Oscar Franciscus Jozephus Noordman, Timotheus Franciscus Sengers, Laurentius Catrinus Jorritsma, Mark Trentelman, Gerrit Streutker
  • Publication number: 20110079939
    Abstract: An imprint lithography method is disclosed for forming a patterned layer from an imprintable liquid medium on a substrate by means of an imprint template having a patterned surface. The method involves contacting the patterned surface and imprintable liquid medium together for a filling period. Light emergent (e.g., scattered or reflected) from an interface between the medium and the patterned surface is collected and measured during the filling period to obtain data concerning one or more voids at the interface, and an estimated end time for the filling period is derived from a relationship between the data and time. The method may allow subsequent process steps to be undertaken more rapidly, with reduced risk of defects arising from remnants of unfilled voids. An imprint lithography apparatus and component for putting the method into effect are also disclosed.
    Type: Application
    Filed: October 5, 2010
    Publication date: April 7, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Jeroen Herman LAMMERS, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Roelof Koole
  • Publication number: 20110083113
    Abstract: There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques.
    Type: Application
    Filed: December 9, 2010
    Publication date: April 7, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Jun Ye, Yen-Wen Lu, Yu Cao, Luoqi Chen, Xun Chen
  • Publication number: 20110080573
    Abstract: A multilayer mirror is constructed and arranged to reflect radiation haying a wavelength in the range of 2-8 nm. The multilayer mirror has alternating layers selected from the group consisting of: Cr and Sc layers, Cr and C layers, C and B4C layers, U and B4C layers, Th and B4C layers, C and B9C layers, La and B9C layers, U and B9C layers, Th and B9C layers, La and B layers, C and B layers. U and B layers, and Th and B layers.
    Type: Application
    Filed: May 20, 2009
    Publication date: April 7, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Denis Alexandrovich Glushkov, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Leonid Aizikovitch Sjmaenok, Nikolai Nikolaevich Salaschenko
  • Publication number: 20110080567
    Abstract: A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.
    Type: Application
    Filed: September 29, 2010
    Publication date: April 7, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Kornelis Tijmen HOEKERD, Roelof Frederik De Graaf, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Pieter Jacob Kramer, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Sandra Van Der Graaf, Alexandre Viktorovych Padiy
  • Publication number: 20110075122
    Abstract: A method for positioning a substage, supported by a main stage, relative to a reference object, the substage moveable in a direction between a first and second position relative to the main stage. The method includes positioning the first stage using a passive force system that is activated by positioning the main stage. The passive force system includes two magnet systems, each magnet system being configured to apply a force in the direction to the first stage with respect to the second stage in a non-contact manner, the forces resulting in a resultant force applied to the first stage in the direction by the passive force system. A magnitude and/or a direction of the resultant force depends on the position of the first stage relative to the second stage, and the first stage has a zero-force position between the first and second position in which the resultant force is zero.
    Type: Application
    Filed: August 10, 2010
    Publication date: March 31, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Sven Antoin Johan Hol, Jan Van Eijk, Antonius Fraciscus Johannes De Groot, Johannes Petrus Martinus Bernardus Vermeulen, Geert-Jan Petrus Naaijkens, Marijn Kessels, Daniƫl Godfried Emma Hobbelen
  • Publication number: 20110075154
    Abstract: A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the lithographic apparatus, the method including measuring a position of the moveable support using an interferometer; and calibrating the encoder based on the position of the moveable support measured by the interferometer.
    Type: Application
    Filed: December 9, 2010
    Publication date: March 31, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Erik Roelof LOOPSTRA, Leon Martin Levasier, Rene Oesterholt
  • Publication number: 20110073775
    Abstract: An apparatus and method to determine overlay of a target on a substrate (6) by measuring, in the pupil plane (40) of a high numerical aperture len (L1), an angle-resolved spectrum as a result of radiation being reflected off the substrate. The overlay is determined from the anti-symmetric component of the spectrum, which is formed by subtracting the measured spectrum and a mirror image of the measured spectrum. The measured spectrum may contain only zeroth order reflected radiation from the target.
    Type: Application
    Filed: February 9, 2009
    Publication date: March 31, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Irwan Danni Setija, Maurits Van Der Schaar
  • Publication number: 20110075238
    Abstract: A semiconductor wafer is aligned using a double patterning process. A first resist layer having a first optical characteristic is deposited and foams at least one alignment mark. The first resist layer is developed. A second resist layer having a second optical characteristic is deposited over the first resist layer. The combination of first and second resist layers and alignment mark has a characteristic such that radiation of a pre-determined wavelength incident on the alignment mark produces a first or higher order diffraction as a function of the first and second optical characteristics.
    Type: Application
    Filed: March 24, 2010
    Publication date: March 31, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Harry SEWELL, Mircea Dusa, Richard Johannes Franciscus Van Haren, Manfred Gawein Tenner, Maya Angelova Doytcheva
  • Publication number: 20110075118
    Abstract: A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber.
    Type: Application
    Filed: September 27, 2010
    Publication date: March 31, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Henricus Wilhelmus JACOBS, Nicolaas Ten Kate, Joost Jeroen Ottens, Gerrit Van Donk, Johannes Ven Es
  • Publication number: 20110076351
    Abstract: A method of forming an imprint template using a substrate having an inorganic release layer and a layer of imprintable medium is disclosed. The method includes using a master imprint template to imprint a pattern into the imprintable medium, causing the imprintable medium to solidify, and etching the imprintable medium and the inorganic release layer to form a pattern in the inorganic release layer.
    Type: Application
    Filed: September 27, 2010
    Publication date: March 31, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Sander Frederik WUISTER
  • Publication number: 20110076352
    Abstract: A method of determining an offset between an imprint template and a substrate using an alignment grating on the imprint template and an alignment grating on the substrate is disclosed. The method includes bringing the imprint template alignment grating and the substrate alignment grating sufficiently close together such that they form a composite grating, directing an alignment radiation beam at the composite grating while modulating the relative position of the imprint template and the substrate, detecting the intensity of alignment radiation which is reflected from the composite grating, and determining the offset by analyzing modulation of the detected intensity.
    Type: Application
    Filed: September 27, 2010
    Publication date: March 31, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arie Jeffrey DEN BOEF, Vadim Yevgenyevich BANINE, Andre Bernardus JEUNINK, Sander Frederik WUISTER, Yvonne Wendela KRUIJT-STEGEMAN