Abstract: An imprinting method is disclosed that involves, in an embodiment, redistributing a volume of imprintable medium in a flowable state over a target portion of a surface of a substrate into regions of differing volume corresponding to regions of differing pattern density of an imprint pattern of a template, contacting the medium while in the flowable state with the template to form the imprint pattern in the medium, subjecting the medium to conditions to change the medium into a substantially non-flowable state, and separating the template from the medium while in the substantially non-flowable state.
Type:
Grant
Filed:
March 16, 2009
Date of Patent:
March 15, 2011
Assignee:
ASML Netherlands B.V.
Inventors:
Erik Roelof Loopstra, Aleksey Yurievich Kolesnychenko, Helmar Van Santen
Abstract: An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a location of each of a plurality of points on the substrate, the measurement system being arranged such that measurements take place through a second liquid, the second liquid not being supplied by the liquid supply system.
Type:
Application
Filed:
October 18, 2010
Publication date:
March 10, 2011
Applicant:
ASML Netherlands B.V.
Inventors:
Johannes Jacobus Matheus BASELMANS, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Bob Streefkerk
Abstract: An immersion lithographic exposure apparatus in which the pH of the top coat of the immersion liquid is chosen so as to maximize the relative speed at which a part of the liquid supply system and the substrate W can be moved relative to each other without collapse of a meniscus extending between those components.
Type:
Grant
Filed:
April 12, 2006
Date of Patent:
March 8, 2011
Assignee:
ASML Netherlands B.V.
Inventors:
Martinus Hendrikus Antonius Leenders, Michel Riepen, Martin Anton Bos
Abstract: A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.
Type:
Grant
Filed:
June 29, 2007
Date of Patent:
March 8, 2011
Assignee:
ASML Netherlands B.V.
Inventors:
Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
Abstract: An encoder-type measurement system is configured to measure a position dependent signal of a movable object, the measurement system including at least one sensor mountable on the movable object a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame. The measurement system further includes a compensation device configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensation device may include a passive or an active damping device and/or a feedback position control system. In an alternative embodiment, the compensation device includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.
Type:
Grant
Filed:
March 29, 2007
Date of Patent:
March 8, 2011
Assignee:
ASML Netherlands B.V.
Inventors:
Marc Wilhelmus Maria Van Der Wijst, Engelbertus Antonius Fransiscus Van Der Pasch, Koen Jacobus Johannes Maria Zaal
Abstract: In a lithographic apparatus, a corrective irradiation procedure is performed using an illumination mode arranged so as to heat a selected part of an element of the projection system near a pupil plane thereof that is relatively unheated during production exposure. The corrective irradiation procedure aims to improve uniformity of optical element heating of the projective system and/or to reduce a phase gradient.
Type:
Grant
Filed:
November 21, 2007
Date of Patent:
March 8, 2011
Assignee:
ASML Netherlands B.V.
Inventors:
Judocus Marie Dominicus Stoeldraijer, Erik Roelof Loopstra, Heine Melle Mulder, Timotheus Franciscus Sengers, Freerk Adriaan Stoffels, Laurentius Catrinus Jorritsma, Reiner Maria Jungblut
Abstract: In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate.
Type:
Application
Filed:
August 26, 2010
Publication date:
March 3, 2011
Applicant:
ASML Netherlands B.V.
Inventors:
Sander Frederik WUISTER, Vadim Yevgenyevich Banine, Johan Frederik Dijksman, Yvonne Wendela Kruijt-Stegeman, Jeroen Herman Lammers, Roelof Koole
Abstract: Scatterometers making use of a Glan-laser polarizer are described. The use of Glan-laser polarizers as described generally results in an improved extinction ratio and use over a greater range of wavelengths when compared with dielectric polarizers.
Abstract: In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate.
Type:
Application
Filed:
November 9, 2010
Publication date:
March 3, 2011
Applicant:
ASML NETHERLANDS B.V.
Inventors:
Stefan Philip Christiaan BELFROID, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Johannes Petrus Maria Smeulers, Arno Willem Frederik Volker, Rene Breeuwer
Abstract: A system and method provides high speed variable attenuators. The attenuators can be used within a lithographic apparatus to control intensity of radiation in one or more correction pulses used to correct a dose of the radiation following an initial pulse of radiation.
Abstract: A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.
Type:
Grant
Filed:
December 20, 2005
Date of Patent:
March 1, 2011
Assignee:
ASML Netherlands B.V.
Inventors:
Vadim Yevgenyevich Banine, Levinus Pieter Bakker, Ralph Kurt, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Peter Cornelis Zalm
Abstract: A lithographic apparatus, comprising a collector being constructed to receive radiation from a radiation source and transmit radiation to an illumination system, wherein the collector is provided with at least one fluid duct, the apparatus including a temperature conditioner to thermally condition the collector utilizing the fluid duct of the collector, the temperature conditioner being configured to feed a first fluid to the fluid duct during a first period, and to feed a second fluid to the fluid duct during at least a second period.
Type:
Grant
Filed:
November 4, 2008
Date of Patent:
March 1, 2011
Assignee:
ASML Netherlands B.V.
Inventors:
Johannes Christiaan Leonardus Franken, Alexander Matthijs Struycken, Leon Joseph Marie Van Den Schoor
Abstract: A method of forming features, e.g. contact holes, at a higher density than is possible with conventional lithographic techniques involves forming an array of sacrificial positive features, conformally depositing a sacrificial layer so that negative features are formed interleaved with the positive features, directionally etching the sacrificial layer and removing the sacrificial features. The result is an array of holes at a higher density than the original sacrificial features. These may then be transferred into the underlying substrate using a desired process. Also, the method may be repeated to create arrays at even higher densities.
Type:
Grant
Filed:
May 17, 2006
Date of Patent:
March 1, 2011
Assignees:
ASML Netherlands B.V., ASML Holding NV
Inventors:
Richard Johannes Franciscus Van Haren, Maurits Van Der Schaar, Ewoud Vreugdenhil, Harry Sewell
Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
Type:
Grant
Filed:
April 14, 2004
Date of Patent:
March 1, 2011
Assignee:
ASML Netherlands B.V.
Inventors:
Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
Abstract: An overlay target on a substrate includes two sets of gratings; the first set having a pitch P1 and the second set having a pitch P2 and each set including a grating with an orientation substantially perpendicular to the first grating of each set. When a layer of resist is to be aligned with the layer below it, the same overlay marks are provided on the upper layer and the relative positions of the overlay targets on the upper layer and the lower layer are compared by shining an overlay beam on to the overlay targets and measuring the diffraction spectrum of the reflected beam. Having two sets of overlay targets with different pitches in gratings enables the measurement of overlay errors that are greater than the pitch of either one of the overlay gratings.
Type:
Grant
Filed:
June 20, 2006
Date of Patent:
March 1, 2011
Assignee:
ASML Netherlands B.V.
Inventors:
Maurits Van Der Schaar, Arie Jeffrey Den Boef, Everhardus Cornelis Mos, Stefan Carolus Jacobus Antonius Keij
Abstract: By proper selection of illumination configuration, mask transmission, and mask bias, complex patterns of contact holes may be imaged with sufficient latitude for manufacturing at minimum half-pitches of k1=0.40 or below. In an embodiment, a method of transferring an image of a mask pattern onto a substrate with a lithographic apparatus is presented. The method includes illuminating a mask pattern of an attenuated phase shift mask with an illumination configuration including on-axis and off-axis components, the off-axis component of the illumination being an annular illumination extending near a pupil edge, and projecting an image of the illuminated mask pattern onto the substrate.
Abstract: The invention relates to a lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, wherein said apparatus is operable to measure higher-order distortions and/or image plane deviations of the patterning device, said apparatus comprising: a device for transmission image detection; and a processor configured and arranged to model higher-order distortions of the patterning device using signals received from the device for transmission image detection; wherein said patterning device has a main imaging field, and a perimeter and said apparatus is operable to model said higher-order distortions using signals resultant from alignment structures comprised in said perimeter and/or in the imaging field.
Type:
Application
Filed:
March 18, 2010
Publication date:
February 24, 2011
Applicant:
ASML NETHERLANDS B.V.
Inventors:
Marcus Adrianus VAN DE KERKHOF, Robertus Cornelis Martinus DE KRUIF
Abstract: In an aspect, an inspection method for detecting the presence or absence of a defect on an object, the object comprising a recess having a physical depth, is disclosed. The method includes directing radiation at the object, the radiation having a wavelength that is substantially equal to twice an optical depth of the recess, detecting radiation that is re-directed by the object or a defect on the object, and determining the presence or absence of a defect from the re-directed radiation.
Type:
Application
Filed:
August 19, 2010
Publication date:
February 24, 2011
Applicant:
ASML Netherlands B.V.
Inventors:
Arie Jeffrey Den Boef, Vadim Yevgenyevich Banine, Sander Frederik Wuister, Luigi Scaccabarozzi
Abstract: An apparatus and method are used to form patterns on a substrate. The apparatus comprises a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams. The patterning device modulates the sub-beams to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters can also be used.
Type:
Application
Filed:
October 29, 2010
Publication date:
February 24, 2011
Applicant:
ASML Netherlands B.V.
Inventors:
Patricius Aloysius Jacobus TINNEMANS, Johannes Jacobus Matheus Baselmans
Abstract: Disclosed is a method of determining higher order distortions of a patterning device of a lithographic apparatus, and associated apparatus. The higher order distortions are measured using the transmission imaging device. In a main embodiment, enhanced reticles are used which may have additional alignment gratings in the perimeter, in the scribe lanes of the image field or in the image field itself.
Type:
Application
Filed:
August 20, 2010
Publication date:
February 24, 2011
Applicant:
ASML NETHERLANDS B.V.
Inventors:
Wilhelmus Maria Corbeij, Marcus Adrianus Van De Kerkhof, Haico Victor Kok