Patents Assigned to ASML Netherlands
  • Structures and methods for reducing aberration in optical systems
    Patent number: 7738172
    Abstract: An optical imaging system for producing an optical image includes one or more powered optical elements with polarization aberration that degrade said optical image; and a polarization rotation system configured to reduce the contributions of the polarization aberration to the degradation of said optical image. The optical system may be used in a photolithography tool to pattern substrates such as semiconductor substrates and thereby produce semiconductor devices.
    Type: Grant
    Filed: September 26, 2008
    Date of Patent: June 15, 2010
    Assignee: ASML Netherlands B.V.
    Inventor: James P. McGuire, Jr.
  • Lithographic attribute enhancement
    Patent number: 7738075
    Abstract: A method, computer program product, and apparatus configured to improve attribute uniformity of a substrate is disclosed. In an embodiment, the method involves calculating corrective data based on measured values of an attribute of a substrate processed by a lithographic exposure apparatus, the corrective data configured to at least partially correct non-uniformity of the values of the substrate attribute by controlling the temperature generated by a zone of a thermal plate used to heat or cool the substrate, and making the corrective data available to the thermal plate.
    Type: Grant
    Filed: May 23, 2005
    Date of Patent: June 15, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Todd D. Hiar, Theodore A. Paxton, Todd J. Davis, Cassandra M. Owen
  • Radiation beam pulse trimming
    Patent number: 7738079
    Abstract: A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.
    Type: Grant
    Filed: November 14, 2006
    Date of Patent: June 15, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Oscar Franciscus Jozephus Noordman, Henri Johannes Petrus Vink, Huibert Visser
  • Debris mitigation system and lithographic apparatus
    Patent number: 7737418
    Abstract: A debris mitigation system for trapping debris coming from a tin debris-generating radiation source is provided. The debris mitigating system includes a debris barrier comprising a plurality of foils, and a cleaning system constructed and arranged to clean the foils. The cleaning system includes a supply unit to provide a liquid alloy to the foils to dissolve and flush trapped debris from the foils. The alloy includes gallium, indium, tin, or any combination thereof.
    Type: Grant
    Filed: December 27, 2006
    Date of Patent: June 15, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Wouter Anthon Soer
  • Lithographic apparatus and device manufacturing method utilizing a flat panel display handler with conveyor device and substrate handler
    Patent number: 7738081
    Abstract: A lithographic apparatus can include an illumination system that conditions a radiation beam, a patterning device that modulates the radiation beam, a substrate table that supports a substrate, and a projection system that projects the modulated radiation beam onto a target portion of the substrate. The lithographic apparatus can also include a substrate handler that loads and/or unloads a substrate on/from the substrate table. The substrate handler supports the substrate in a support plane and can include a conveyor device for moving the substrate in a direction substantially parallel to the support plane. The conveyor device can include a gripping device configured to push or pull the substrate in the indicated direction and a driving device for driving the gripping device in the indicated direction.
    Type: Grant
    Filed: May 6, 2005
    Date of Patent: June 15, 2010
    Assignee: ASML Netherlands B.V.
    Inventor: Hernes Jacobs
  • Contamination barrier with expandable lamellas
    Patent number: 7737425
    Abstract: A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to block at least part of the support structure from being hit by radiation or debris from the radiation source.
    Type: Grant
    Filed: May 16, 2007
    Date of Patent: June 15, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Levinus Pieter Bakker, Marcel Mathijs Theodore Marie Dierichs, Johannes Maria Freriks, Frank Jeroen Pieter Schuurmans, Jakob Vijfvinkel, Wilhelmus Josephus Box
  • Lithographic apparatus and device manufacturing method
    Patent number: 7738074
    Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
    Type: Grant
    Filed: July 14, 2004
    Date of Patent: June 15, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Streefkerk, Antonius Theodorus Anna Maria Derksen, Joeri Lof, Klaus Simon, Alexander Straaijer
  • Patterning device utilizing sets of stepped mirrors and method of using same
    Patent number: 7738077
    Abstract: A system and method are used to independently control multiple parameters of a patterned beam. This can be performed using a patterning device configured to pattern a beam of radiation comprising a controller and an array of stepped mirrors. The array comprises a plurality of sets of four of the stepped mirrors that are controlled with respect to each other. Adjacent ones of the stepped mirrors in each of the sets have perpendicular axes of rotation and perpendicular steps. In one example, the patterning device is used to patterned the beam of radiation, which patterned beam is projected onto an object. For example, the object can be a substrate (e.g., semiconductor substrate or flat panel display substrate) or a display device.
    Type: Grant
    Filed: July 31, 2006
    Date of Patent: June 15, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Patricius Aloysius Jacobus Tinnemans
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100143832
    Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table. The gap size is reduced using an edge member which may be, for example, a ring known as a BES (Bubble Extraction System) ring. Information regarding the shape and/or cross-sectional dimension (e.g., diameter) of the substrate, or information regarding the size of the gap, is transmitted to a controller that controls the edge member in order for the edge member, for example, to be reduced to an appropriate size to reduce the gap as much as possible, desirably without compressing the edge of the substrate. Alternatively or additionally, the gap may be reduced by moving the substrate and/or edge member adjacent the edge of a surface of the substrate table.
    Type: Application
    Filed: December 7, 2009
    Publication date: June 10, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Martijn HOUBEN
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100141915
    Abstract: A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate table; a sensor configured to measure an exposure parameter using a measuring beam projected through the liquid; and a correction system configured to determine an offset based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter.
    Type: Application
    Filed: January 27, 2010
    Publication date: June 10, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Bob Streefkerk
  • MEMBER WITH A CLEANING SURFACE AND A METHOD OF REMOVING CONTAMINATION
    Publication number: 20100141910
    Abstract: A member with a cleaning surface for use in capturing particles in a lithographic apparatus is disclosed. The particles are captured by a plurality of projections which are arranged in a pattern. A sensor can be used to detect contaminant particles in the pattern.
    Type: Application
    Filed: December 2, 2009
    Publication date: June 10, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcus Theodoor Wilhelmus VAN DER HEIJDEN, Mark Drewes Boerema, Matthias Ruhm, Mario Putz
  • METHOD OF FORMING A MARKER, SUBSTRATE HAVING A MARKER AND DEVICE MANUFACTURING METHOD
    Publication number: 20100140816
    Abstract: A marker, for example an alignment marker or an overlay marker is formed in two steps. First, a pattern of two chemically distinct feature types having a pitch comparable to product features is formed. This pattern is then masked by resist in the form of the desired marker, which has a larger pitch than the pattern. Finally, one of the two feature types is selectively etched in the open areas. The result is a marker with a large pitch suitable to be read with long wavelength radiation but the edges of the features are defined in an exposure step having a pitch comparable to the product features.
    Type: Application
    Filed: November 17, 2009
    Publication date: June 10, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Richard Johannes Franciscus Van Haren, Maurits Van der Schaar
  • RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS
    Publication number: 20100141909
    Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.
    Type: Application
    Filed: November 27, 2007
    Publication date: June 10, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arnoud Cornelis Wassink, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Theodorus Petrus Maria Cadee, Vladimir Mihailòvitch Krivtsun, Derk Jan Wilfred Klunder, Maarten Marinus Johannes Wilhelmus Van Herpen, Paul Peter Anna Antonius Brom, Wouter Anthon Soer, Denis Alexandrovich Glushkov
  • Device and Method for Transmission Image Sensing
    Publication number: 20100141920
    Abstract: A device for transmission image sensing for sensing an aerial image in a lithographic exposure apparatus comprises a projection system arranged to form, at an image side of the projection system, an aerial image of an object mark. The device further comprises a detector comprising a slit pattern having features corresponding to at least a part of the aerial image. The slit pattern is arranged to be exposed to the aerial image. The detector is further being arranged to detect detection radiation transmitted by the slit pattern; wherein d<0.85 ?/NA, where d represents the dimension of the smallest feature of the slit pattern, ? represents the intended wavelength of the detection radiation, and NA, which is larger than 1, represents the numerical aperture of the image side.
    Type: Application
    Filed: February 19, 2010
    Publication date: June 10, 2010
    Applicant: ASML Netherlands B.V.
    Inventor: Bearrach MOEST
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100141918
    Abstract: A lithographic apparatus includes a radiation system having reflective optical elements constructed and arranged to condition a beam of radiation. The reflective optical elements include a first faceted mirror constructed and arranged to generate a plurality of source images on a second mirror. The lithographic apparatus also includes a facet mask constructed and arranged to selectively mask one or more of the facets of the first faceted mirror. The facet mask includes a masking blade selectively interposable into the beam.
    Type: Application
    Filed: February 19, 2010
    Publication date: June 10, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Marcel Mathijs Theodore Marie Dierichs, Hans Van Der Laan, Hendrikus Robertus Marie Van Greevenbroek
  • LITHOGRAPHIC APPARATUS AND POSITIONING APPARATUS
    Publication number: 20100141914
    Abstract: A lithographic apparatus includes a movable first object, and a heat exchanger including a heat exchanging body, the heat exchanging body including a material with electro-caloric or magneto-caloric properties and configured to affect the temperature of the first object by exchanging heat with the movable first object, and a generator configured to supply an electromagnetic field to the heat exchanging body to change the temperature of the heat exchanging body in order to cool or heat the first object.
    Type: Application
    Filed: November 16, 2009
    Publication date: June 10, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Noud Jan GILISSEN, Theodorus Petrus Maria Cadee
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD WITH DOUBLE EXPOSURE OVERLAY CONTROL
    Publication number: 20100141916
    Abstract: A device manufacturing method includes a transfer of a pattern from a patterning device onto a substrate. The device manufacturing method further includes transferring a pattern of a main mark to a base layer for forming an alignment mark; depositing a pattern receiving layer on the base layer; in a first lithographic process, aligning, by using the main mark, a first mask that includes a first pattern and a local mark pattern, and transferring the first pattern and the local mark pattern to the pattern receiving layer; aligning, by using the local mark pattern, a second mask including a second pattern relative to the pattern receiving layer; and in a second lithographic process, transferring the second pattern to the pattern receiving layer; the first and second patterns being configured to form an assembled pattern.
    Type: Application
    Filed: February 12, 2010
    Publication date: June 10, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Maurits VAN DER SCHAAR, Richard Johannes Franciscus VAN HAREN
  • IMPRINT LITHOGRAPHY
    Publication number: 20100139862
    Abstract: A method for manufacturing a working template for use in imprint lithography is disclosed, which in an embodiment, involves contacting a first target region of an imprintable medium on a working template substrate with a master template to form a first imprint in the medium, the imprint defining a part of a working template pattern, separating the master template from the imprinted medium, contacting a second target region of the medium with the master template to form a second imprint in the medium, the second imprint defining a further part of the working template pattern, and separating the master template from the imprinted medium.
    Type: Application
    Filed: February 12, 2010
    Publication date: June 10, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich KOLESNYCHENKO, Helmar Van Santen, Yvonne Kruijt-Stegeman
  • Method for exposing a substrate and lithographic projection apparatus
    Patent number: 7732110
    Abstract: A method for exposing a resist layer on a substrate to an image of a pattern on a mask is disclosed whereby, after starting exposure and before completing exposure, a controlled amount of contrast loss is introduced by a controller in the image at the resist layer by changing during exposure the position of the substrate holder. The contrast loss affects the pitch dependency of the resolution of a lithographic projection apparatus, and its control is used to match pitch dependency of resolution between different lithographic projection apparatus.
    Type: Grant
    Filed: February 25, 2009
    Date of Patent: June 8, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Jozef Maria Finders, Judocus Marie Dominicus Stoeldraijer, Johannes Wilhelmus De Klerk
  • Lithographic apparatus and device manufacturing method
    Patent number: 7733459
    Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.
    Type: Grant
    Filed: August 24, 2004
    Date of Patent: June 8, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Marco Koert Stavenga, Bob Streefkerk, Martinus Cornelis Maria Verhagen, Lejla Seuntiens-Gruda