Patents Assigned to ASML Netherlands
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Patent number: 11226568Abstract: A lithographic apparatus comprising a substrate storage module having a controllable environment for protecting lithographically exposed substrates from ambient air. The substrate storage module is configured to store at least twenty substrates and the substrate storage module is an integral part of the lithographic apparatus. The substrate storage module may be used to protect substrates from ambient air during stitched lithographic exposures.Type: GrantFiled: September 27, 2018Date of Patent: January 18, 2022Assignee: ASML Netherlands B.V.Inventors: Paul Van Dongen, Aart Adrianus Van Beuzekom
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Patent number: 11226567Abstract: Methods and associated apparatus for reconstructing a free-form geometry of a substrate, the method including: positioning the substrate on a substrate holder configured to retain the substrate under a retaining force that deforms the substrate from its free-form geometry; measuring a height map of the deformed substrate; and reconstructing the free-form geometry of the deformed substrate based on an expected deformation of the substrate by the retaining force and the measured height map.Type: GrantFiled: August 8, 2018Date of Patent: January 18, 2022Assignee: ASML Netherlands B.V.Inventors: Richard Johannes Franciscus Van Haren, Leon Paul Van Dijk, Ilya Malakhovsky, Ronald Henricus Johannes Otten, Mahdi Sadeghinia
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Patent number: 11226535Abstract: Radiation source assemblies and methods for generating broadened radiation by spectral broadening. A radiation source assembly includes a pump source configured to emit modulated pump radiation at one or more wavelengths. The assembly further has an optical fiber configured to receive the modulated pump radiation emitted by the pump source, the optical fiber including a hollow core extending along at least part of a length of the fiber. The hollow core is configured to guide the received radiation during propagation through the fiber. The radiation emitted by the pump source includes first radiation at a pump wavelength, and the pump source is configured to modulate the first radiation for stimulating spectral broadening in the optical fiber.Type: GrantFiled: September 14, 2020Date of Patent: January 18, 2022Assignee: ASML Netherlands B.V.Inventor: Yongfeng Ni
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Publication number: 20220011681Abstract: A method includes exposing number of fields on a substrate, obtaining data about a field and correcting exposure of the field in subsequent exposures. The method includes defining one or more sub-fields of the field based on the obtained data. Data relating to each sub-field is processed to produce sub-field correction information. A subsequent exposure of the one or more sub-fields is corrected using the sub-field correction information. By controlling a lithographic apparatus by reference to data of a particular sub-field within a field, overlay error can be reduced or minimized for a critical feature, rather than being averaged over the whole field. By controlling a lithographic apparatus with reference to a sub-field rather than only the whole field, a residual error can be reduced in each sub-field.Type: ApplicationFiled: September 23, 2021Publication date: January 13, 2022Applicant: ASML Netherlands B.V.Inventors: Hakki Ergün CEKLI, Xing Lan Liu, Stefan Cornelis Theodorus VAN DER SANDEN, Richard Johannes Franciscus VAN HAREN
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Publication number: 20220011644Abstract: Disclosed is an optical component, being configured to function as an optical frequency converter in a broadband radiation source device. The optical component comprises a gas cell, and a hollow-core photonic crystal fiber at least partially enclosed within said gas cell. The local cavity volume of said gas cell, where said hollow-core photonic crystal fiber is enclosed within the gas cell, comprises a maximum value of 36 cm3 per cm of length of said hollow-core photonic crystal fiber.Type: ApplicationFiled: September 27, 2021Publication date: January 13, 2022Applicant: ASML Netherlands B.V.Inventors: Patrick Sebastian UEBEL, Sebastian Thomas Bauerschmidt, Peter Maximilian Götz
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Patent number: 11221560Abstract: A method of metrology target design is described. The method includes determining a sensitivity of a parameter of a metrology target design to a perturbation of a process parameter for forming, or measuring the formation of, the metrology target, and determining a robustness of the metrology target design based on the sum of the sensitivity multiplied by the perturbation of at least one of the process parameters.Type: GrantFiled: December 19, 2014Date of Patent: January 11, 2022Assignee: ASML Netherlands B.V.Inventors: Guangqing Chen, Wei Liu, Maurits Van der Schaar
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Patent number: 11221565Abstract: The invention provides a level sensor to measure a position of a surface of a substrate, comprising a projection unit arranged to direct a beam of radiation to the surface of the substrate and a detection unit. The detection unit comprises a detection grating arranged to receive the beam of radiation reflected on the surface of the substrate, one or more detectors, one or more optical elements to direct the beam of radiation from the detection grating to the one or more detectors, and a processing unit to determine the position of the surface of the substrate on the basis of the beam of radiation received by the one or more detectors. The detection grating and the one or more optical elements are integrated in a single integrated optical element.Type: GrantFiled: March 13, 2019Date of Patent: January 11, 2022Assignee: ASML Netherlands B.V.Inventors: Simon Reinald Huisman, Marinus Petrus Reijnders
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Patent number: 11222766Abstract: A multi-cell detector may include a first layer having a region of a first conductivity type and a second layer including a plurality of regions of a second conductivity type. The second layer may also include one or more regions of the first conductivity type. The plurality of regions of the second conductivity type may be partitioned from one another by the one or more regions of the first conductivity type of the second layer. The plurality of regions of the second conductivity type may be spaced apart from one or more regions of the first conductivity type in the second layer. The detector may further include an intrinsic layer between the first and second layers.Type: GrantFiled: September 28, 2018Date of Patent: January 11, 2022Assignee: ASML Netherlands B.V.Inventors: Joe Wang, Yongxin Wang, Zhong-Wei Chen, Xuerang Hu
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Patent number: 11223181Abstract: Methods and corresponding apparatus operable to cause an interaction between a drive radiation beam and a medium for generation of emitted radiation by high harmonic generation, the arrangement comprising: an interaction region positioned at an interaction plane and configured to receive the medium; a beam block positioned upstream of the interaction plane at a beam block plane and configured to partially block the drive radiation beam; a beam shaper positioned upstream of the beam block plane at an object plane and configured to control a spatial distribution of the drive radiation beam; and at least one lens positioned upstream of the interaction plane and downstream of the beam block plane, wherein the lens being positioned such that an image of the spatial distribution of the drive radiation beam is formed at the interaction plane.Type: GrantFiled: August 19, 2019Date of Patent: January 11, 2022Assignee: ASML Netherlands B.V.Inventors: Petrus Wilhelmus Smorenburg, Gerrit Jacobus Hendrik Brussaard, David O Dwyer
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Patent number: 11217423Abstract: A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.Type: GrantFiled: March 18, 2019Date of Patent: January 4, 2022Assignee: ASML Netherlands B.V.Inventors: Weiming Ren, Shuai Li, Xuedong Liu, Zhongwei Chen, Jack Jau
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Patent number: 11215736Abstract: A multilayer mirror having a cap with a multilayer structure including a top layer and a series of bilayers each having an absorber layer and a spacer layer, where the materials for the top layer, absorber layers, and spacer layers are chosen to resist blistering.Type: GrantFiled: January 29, 2015Date of Patent: January 4, 2022Assignee: ASML Netherlands B.V.Inventor: Norbert Bowering
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Patent number: 11216938Abstract: Systems and methods for optimal electron beam metrology guidance are disclosed. According to certain embodiments, the method may include receiving an acquired image of a sample, determining a set of image parameters based on an analysis of the acquired image, determining a set of model parameters based on the set of image parameters, generating a set of simulated images based on the set of model parameters. The method may further comprise performing measurement of critical dimensions on the set of simulated images and comparing critical dimension measurements with the set of model parameters to provide a set of guidance parameters based on comparison of information from the set of simulated images and the set of model parameters. The method may further comprise receiving auxiliary information associated with target parameters including critical dimension uniformity.Type: GrantFiled: August 28, 2019Date of Patent: January 4, 2022Assignee: ASML Netherlands B.V.Inventors: Lingling Pu, Wei Fang, Nan Zhao, Wentian Zhou, Teng Wang, Ming Xu
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Publication number: 20210405545Abstract: A defect prediction method for a device manufacturing process involving production substrates processed by a lithographic apparatus, the method including training a classification model using a training set including measured or determined values of a process parameter associated with the production substrates processed by the device manufacturing process and an indication regarding existence of defects associated with the production substrates processed in the device manufacturing process under the values of the process parameter, and producing an output from the classification model that indicates a prediction of a defect for a substrate.Type: ApplicationFiled: September 10, 2021Publication date: December 30, 2021Applicant: ASML Netherlands B.V.Inventors: Scott Anderson Middlebrooks, Willem Maria Julia Marcel Coene, Frank Arnoldus Johannes Maria Driessen, Adrianus Cornelis Matheus Koopman, Markus Gerardus Martinus Maria Van Kraaij
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Publication number: 20210405538Abstract: A method of determining a relationship between a stochastic variation of a characteristic of an aerial image or a resist image and one or more design variables, the method including: measuring values of the characteristic from a plurality of aerial images and/or resist images for each of a plurality of sets of values of the design variables; determining a value of the stochastic variation, for each of the plurality of sets of values of the design variables, from a distribution of the values of the characteristic for that set of values of the design variables; and determining the relationship by fitting one or more parameters from the values of the stochastic variation and the plurality of sets of values of the design variables.Type: ApplicationFiled: August 3, 2021Publication date: December 30, 2021Applicant: ASML Netherlands B.V.Inventor: Steven George HANSEN
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Patent number: 11204557Abstract: Disclosed is a method of measuring focus performance of a lithographic apparatus. The method comprises using the lithographic apparatus to print at least one focus metrology pattern on a substrate, the printed focus metrology pattern comprising at least a first periodic array of features, and using inspection radiation to measure asymmetry between opposite portions of a diffraction spectrum for the first periodic array in the printed focus metrology pattern. A measurement of focus performance is derived based at least in part on the asymmetry measured. The first periodic array comprises a repeating arrangement of a space region having no features and a pattern region having at least one first feature comprising sub-features projecting from a main body and at least one second feature; and wherein the first feature and second feature are in sufficient proximity to be effectively detected as a single feature during measurement. A patterning device comprising said first periodic array is also disclosed.Type: GrantFiled: November 19, 2019Date of Patent: December 21, 2021Assignee: ASML Netherlands B.V.Inventor: Frank Staals
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Patent number: 11204558Abstract: An object stage that includes a first structure and a second structure movable relative to the first structure. The second structure is configured to support an object. The object stage also includes a seal plate movably coupled to the first structure or the second structure, but not both. Further, the object stage includes an actuator configured to move the seal plate such that a substantially constant gap is defined between the seal plate and the first structure or second structure that is not coupled to the seal plate.Type: GrantFiled: July 18, 2018Date of Patent: December 21, 2021Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Yang-Shan Huang, Daniel Nathan Burbank, Marco Koert Stavenga
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Patent number: 11204901Abstract: A method of matching records from a plurality of data sources having variation between them in matching quality of their data, the method including repeatedly matching and filtering records from the data sources to obtain matched records using successively less strict matching rules, the matching rules being defined based on the variation in the matching quality.Type: GrantFiled: April 4, 2017Date of Patent: December 21, 2021Assignee: ASML Netherlands B.V.Inventors: David Evert Song Kook Sigtermans, Nicolaas Hendrik Frank Ploos Van Amstel, Marcel Theodorus Petrus Falise
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Patent number: 11204239Abstract: A diffraction measurement target that has at least a first sub-target and at least a second sub-target, and wherein (1) the first and second sub-targets each include a pair of periodic structures and the first sub-target has a different design than the second sub-target, the different design including the first sub-target periodic structures having a different pitch, feature width, space width, and/or segmentation than the second sub-target periodic structure or (2) the first and second sub-targets respectively include a first and second periodic structure in a first layer, and a third periodic structure is located at least partly underneath the first periodic structure in a second layer under the first layer and there being no periodic structure underneath the second periodic structure in the second layer, and a fourth periodic structure is located at least partly underneath the second periodic structure in a third layer under the second layer.Type: GrantFiled: July 17, 2020Date of Patent: December 21, 2021Assignee: ASML Netherlands B.V.Inventors: Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar, Arie Jeffrey Den Boef, Richard Johannes Franciscus Van Haren, Xing Lan Liu, Johannes Marcus Maria Beltman, Andreas Fuchs, Omer Abubaker Omer Adam, Michael Kubis, Martin Jacobus Johan Jak
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Publication number: 20210389365Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.Type: ApplicationFiled: August 30, 2021Publication date: December 16, 2021Applicant: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus TINNEMANS, Patrick WARNAAR, Vasco Tomas TENNER, Maurits VAN DER SCHAAR
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Publication number: 20210389683Abstract: A method for characterizing post-processing data in terms of individual contributions from processing stations, the post-processing data relating to a manufacturing process for manufacturing integrated circuits on a plurality of substrates using a corresponding processing apparatus for each of a plurality of process steps, at least some of the processing apparatuses each including a plurality of the processing stations, and wherein the combination of processing stations used to process each substrate defines a process thread for the substrate; the method including: obtaining post-processing data associated with processing of the plurality of substrates in a cyclic sequence of processing threads; and determining an individual contribution of a particular processing station by comparing a subset of the post-processing data corresponding to substrates having shared process sub-threads, wherein a process sub-thread describes the process steps of each process thread other than the process step to which the particuType: ApplicationFiled: September 19, 2019Publication date: December 16, 2021Applicant: ASML Netherlands B.V.Inventors: Wim Tjibbo TEL, Ekaterina Mikhailovna VIATKINA, Tom VAN HEMERT