Patents Assigned to ASML Netherlands
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Patent number: 11022899Abstract: Disclosed is a method of measuring a focus parameter relating to formation of a structure using a lithographic process, and associated metrology device. The method comprises obtaining measurement data relating to a cross-polarized measurement of said structure; and determining a value for said focus parameter based on the measurement data.Type: GrantFiled: November 25, 2019Date of Patent: June 1, 2021Assignee: ASML Netherlands B.V.Inventors: Fahong Li, Sergei Sokolov
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Patent number: 11022900Abstract: Disclosed is an inspection apparatus for use in lithography. It comprises a support for a substrate carrying a plurality of metrology targets; an optical system for illuminating the targets under predetermined illumination conditions and for detecting predetermined portions of radiation diffracted by the targets under the illumination conditions; a processor arranged to calculate from said detected portions of diffracted radiation a measurement of asymmetry for a specific target; and a controller for causing the optical system and processor to measure asymmetry in at least two of said targets which have different known components of positional offset between structures and smaller sub-structures within a layer on the substrate and calculate from the results of said asymmetry measurements a measurement of a performance parameter of the lithographic process for structures of said smaller size. Also disclosed are substrates provided with a plurality of novel metrology targets formed by a lithographic process.Type: GrantFiled: July 16, 2020Date of Patent: June 1, 2021Assignee: ASML Netherlands B.V.Inventors: Simon Gijsbert Josephus Mathijssen, Stefan Hunsche, Markus Gerardus Martinus Maria Van Kraaij
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Patent number: 11022894Abstract: Several methods of reducing one or more pattern displacement errors, contrast loss, best focus shift, tilt of a Bossung curve of a portion of a design layout used in a patterning process for imaging that portion onto a substrate using a lithographic apparatus. The methods include determining or adjusting one or more characteristics of one or more assist features using the one or more rules based on one or more parameters selected from a group consisting of: one or more characteristics of one or more design features in the portion, one or more characteristics of the patterning process, one or more characteristics of the lithographic apparatus, and/or a combination selected from the foregoing.Type: GrantFiled: June 13, 2019Date of Patent: June 1, 2021Assignee: ASML Netherlands B.V.Inventors: Duan-Fu Stephen Hsu, Kurt E. Wampler
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Publication number: 20210157248Abstract: Disclosed is a metrology sensor apparatus comprising: an illumination system operable to illuminate a metrology mark in on a substrate with illumination radiation; an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark; and a wavelength dependent spatial filter for spatially filtering the scattered radiation, the wavelength dependent spatial filter having a spatial profile dependent on the wavelength of the scattered radiation. The wavelength dependent spatial filter may comprise a dichroic filter operable to substantially transmit scattered radiation within a first wavelength range and substantially block scattered radiation within a second wavelength range and at least one second filter operable to substantially block scattered radiation at least within the first wavelength range and the second wavelength range.Type: ApplicationFiled: April 13, 2018Publication date: May 27, 2021Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Sebastianus Adrianus GOORDEN, Johannes Antonius Gerardus AKKERMANS, Simon Reinald HUISMAN, Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY
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Publication number: 20210157247Abstract: A method of maintaining a set of fingerprints representing variation of one or more process parameters across wafers subjected to a device manufacturing method, the method including: receiving measurement data of one or more parameters measured on wafers; updating the set of fingerprints based on an expected evolution of the one or more process parameters; and evaluation of the updated set of fingerprints based on decomposition of the received measurement data in terms of the updated set of fingerprints. Each fingerprint may have a stored likelihood of occurrence, and the decomposition may involve: estimating, based the received measurement data, likelihoods of occurrence of the set of fingerprints in the received measurement data; and updating the stored likelihoods of occurrence based on the estimated likelihoods.Type: ApplicationFiled: April 9, 2018Publication date: May 27, 2021Applicant: ASML NETHERLANDS B.VInventors: Alexander YPMA, Vahid BASTANI, Dag SONNTAG, Jelle NIJE, Hakki Ergün CEKLI, Georgios TSIROGIANNIS, Robert Jan VAN WIJK
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Publication number: 20210157245Abstract: A method includes illuminating a mirror array with light having light amplitudes forming a first greyscale pattern, the mirror array including a number of mirrors and at least two of the mirrors are illuminated with a same amplitude of the light. The method also includes imaging the light with the light amplitudes onto a substrate to create a second greyscale pattern, different than the first greyscale pattern, at the substrate.Type: ApplicationFiled: July 3, 2019Publication date: May 27, 2021Applicant: ASML NETHERLANDS B.V.Inventor: Pieter Willem Herman DE JAGER
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Patent number: 11016397Abstract: A method and a computer program product that relates to lithographic apparatuses and, processes, and more particularly to a method and computer program to inspect substrates produced by the lithographic apparatuses and processes. The method and/or computer program product includes determining contributions from independent sources from results measured from a lithography process or a substrate processed by the lithography process, wherein the results are measured using a plurality of different substrate measurement recipes.Type: GrantFiled: November 22, 2016Date of Patent: May 25, 2021Assignee: ASML Netherlands B.V.Inventors: Scott Anderson Middlebrooks, Omer Abubaker Omer Adam, Adrianus Cornelis Matheus Koopman, Henricus Johannes Lambertus Megens, Arie Jeffrey Den Boef
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Patent number: 11016395Abstract: A method including: obtaining a thin-mask transmission function of a patterning device and a M3D model for a lithographic process, wherein the thin-mask transmission function represents a continuous transmission mask and the M3D model at least represents a portion of M3D attributable to multiple edges of structures on the patterning device; determining a M3D mask transmission function of the patterning device by using the thin-mask transmission function and the M3D model; and determining an aerial image produced by the patterning device and the lithographic process, by using the M3D mask transmission function.Type: GrantFiled: December 6, 2017Date of Patent: May 25, 2021Assignee: ASML Netherlands B.V.Inventors: Yu Cao, Yen-Wen Lu, Peng Liu, Rafael C. Howell, Roshni Biswas
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Patent number: 11016399Abstract: A method of predicting the dominant failure mode and/or the failure rate of a plurality of features formed on a substrate, and an associated inspection apparatus. The method may include determining a placement metric for each feature, the placement metric including a measure of whether the feature is in an expected position, and comparing a distribution of the placement metric to a reference (e.g., Gaussian) distribution. The placement metric may include a boundary metric for a plurality of boundary points on a boundary defining each feature, the boundary metric including a measure of whether a boundary point is in an expected position. The dominant failure mode and/or the failure rate of the plurality of features is predicted from the comparison.Type: GrantFiled: December 10, 2018Date of Patent: May 25, 2021Assignee: ASML Netherlands B.V.Inventors: Marleen Kooiman, Sander Frederik Wuister
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Patent number: 11016402Abstract: An apparatus for removing particles from a clamp, the apparatus being arrangeable in proximity of the clamp and comprising an insulating portion, a supporting portion, at least a part or all of the insulating portion being arranged on the supporting portion, wherein the supporting portion is configured such that when a voltage is applied to the supporting portion of the apparatus and/or to an electrode of the clamp, the supporting portion acts as an electrode to allow an electric field to be generated between the apparatus and the clamp for removal of the particles from the clamp.Type: GrantFiled: November 27, 2019Date of Patent: May 25, 2021Assignee: ASML Netherlands B.V.Inventors: Jeroen Van Duivenbode, Petrus Jacobus Maria Van Gils, Petrus Johannes Van Den Oever, Coen Hubertus Matheus Baltis
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Patent number: 11016401Abstract: A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.Type: GrantFiled: May 1, 2018Date of Patent: May 25, 2021Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Matthew Lipson, Christopher John Mason, Damoon Sohrabibabaheidary, Jimmy Matheus Wilhelmus Van De Winkel, Bert Dirk Scholten
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Patent number: 11016394Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.Type: GrantFiled: June 15, 2020Date of Patent: May 25, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Michel Riepen
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Publication number: 20210150116Abstract: A method for determining an etch profile is described. The method includes determining a masking layer profile. Loading information can be determined. The loading information indicates dependence of an etch rate for the masking layer profile on a quantity and pattern of material being etched. Flux information can be determined. The flux information indicates dependence of the etch rate on an intensity and a spread angle of radiation incident on the masking layer profile. Re-deposition information can be determined. The re-deposition information indicates dependence of the etch rate on an amount of material removed from the masking layer profile that is re-deposited back on the masking layer profile. An output etch profile for the layer of the wafer is determined based on the loading information, the flux information, and/or the re-deposition information.Type: ApplicationFiled: January 25, 2021Publication date: May 20, 2021Applicant: ASML Netherlands B.V.Inventors: Chi-Hsiang Fan, Feng Chen, Wangshi Zhao, Youping Zhang
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Publication number: 20210149316Abstract: A method for determining substrate deformation includes obtaining first measurement data associated with mark positions, from measurements of a plurality of substrates; obtaining second measurement data associated with mark positions, from measurements of the plurality of substrates; determining a mapping between the first measurement data and the second measurement data; and decomposing the mapping, by calculating an eigenvalue decomposition for the mapping, to separately determine a first deformation (e.g. mark deformation) that scales differently from a second deformation (e.g. substrate deformation) in the mapping between the data. The steps of determining a mapping and decomposing the mapping may be performed together using non-linear optimization.Type: ApplicationFiled: May 28, 2018Publication date: May 20, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Edo Maria HULSEBOS, Patricius Aloysius Jacobus TINNEMANS, Franciscus Godefridus Casper BIJNEN
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Publication number: 20210150115Abstract: A method including obtaining verified values of a characteristic of a plurality of patterns on a substrate produced by a device manufacturing process; obtaining computed values of the characteristic using a non-probabilistic model; obtaining values of a residue of the non-probabilistic model based on the verified values and the computed values; and obtaining an attribute of a distribution of the residue based on the values of the residue. Also disclosed herein are methods of computing a probability of defects on a substrate produced by the device manufacturing process, and of obtaining an attribute of a distribution of the residue of a non-probabilistic model.Type: ApplicationFiled: June 20, 2018Publication date: May 20, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Lin Lee CHEONG, Bruno LA FONTAINE, Marc Jurian KEA, Yasri YUDHISTIRA, Maxime Philippe Frederic GENIN
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Patent number: 11009343Abstract: Disclosed is a method and associated apparatus for measuring a characteristic of interest relating to a structure on a substrate. The method comprises calculating a value for the characteristic of interest directly from the effect of the characteristic of interest on at least the phase of illuminating radiation when scattered by the structure, subsequent to illuminating said structure with said illuminating radiation.Type: GrantFiled: February 15, 2019Date of Patent: May 18, 2021Assignee: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus Tinnemans, Vasco Tomas Tenner, Arie Jeffrey Den Boef, Hugo Augustinus Joseph Cramer, Patrick Warnaar, Grzegorz Grzela, Martin Jacobus Johan Jak
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Patent number: 11009345Abstract: Disclosed is a method of, and associated metrology apparatus for, determining a characteristic of a target on a substrate. The method comprises obtaining a plurality of intensity asymmetry measurements, each intensity asymmetry measurement relating to a target formed on the substrate and determining a sensitivity coefficient corresponding to each target, from the plurality of intensity asymmetry measurements. Using these sensitivity coefficients a representative sensitivity coefficient is determined for said plurality of targets or a subset greater than one thereof. The characteristic of the target can then be determined using the representative sensitivity coefficient.Type: GrantFiled: May 21, 2019Date of Patent: May 18, 2021Assignee: ASML Netherlands B.V.Inventors: Alberto Da Costa Assafrao, Mohammadreza Hajiahmadi
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Patent number: 11009800Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.Type: GrantFiled: January 26, 2017Date of Patent: May 18, 2021Assignee: ASML Netherlands B.V.Inventors: Han-Kwang Nienhuys, Güneş Nakiboğlu, Rita Marguerite Albin Lambertine Petit, Hermen Folken Pen, Remco Yuri Van De Moesdijk, Frank Johannes Jacobus Van Boxtel, Borgert Kruizinga
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Patent number: 11009803Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.Type: GrantFiled: September 30, 2019Date of Patent: May 18, 2021Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Matthias Kruizinga, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Erik Willem Bogaart, Derk Servatius Gertruda Brouns, Marc Bruijn, Richard Joseph Bruls, Jeroen Dekkers, Paul Janssen, Mohammad Reza Kamali, Ronald Harm Gunther Kramer, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Matthew Lipson, Erik Roelof Loopstra, Joseph H. Lyons, Stephen Roux, Gerrit Van Den Bosch, Sander Van Den Heijkant, Sandra Van Der Graaf, Frits Van Der Meulen, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge
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Publication number: 20210141312Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.Type: ApplicationFiled: January 18, 2021Publication date: May 13, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Günes NAKIBOGLU, Coen Hubertus Matheus BALTIS, Siegfried Alexander TROMP, Yuri Johannes Gabriël VAN DE VIJVER, Bert Dirk SCHOLTEN, Daan Daniel Johannes Antonius VAN SOMMERE, Mark Johannes Hermanus FRENCKEN