Patents Assigned to ASML Netherlands
  • Publication number: 20210208507
    Abstract: A method for improving a process model for a patterning process, the method including obtaining a) a measured contour from an image capture device, and b) a simulated contour generated from a simulation of the process model. The method also includes aligning the measured contour with the simulated contour by determining an offset between the measured contour and the simulated contour. The process model is calibrated to reduce a difference, computed based on the determined offset, between the simulated contour and the measured contour.
    Type: Application
    Filed: May 14, 2019
    Publication date: July 8, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jen-Shiang WANG, Qian Zhao, Yunbo GUO, Yen-Wen LU, Mu FENG, Qiang ZHANG
  • Publication number: 20210208512
    Abstract: A method of measuring a parameter of a patterning process, the method including obtaining a measurement of a substrate processed by a patterning process, with a first metrology target measurement recipe; obtaining a measurement of the substrate with a second, different metrology target measurement recipe, wherein measurements using the first and second metrology target measurement recipes have their own distinct sensitivity to a metrology target structural asymmetry of the patterning process; and determining a value of the parameter by a weighted combination of the measurements of the substrate using the first and second metrology target measurement recipes, wherein the weighting reduces or eliminates the effect of the metrology target structural geometric asymmetry on the parameter of the patterning process determined from the measurements using the first and second metrology target measurement recipes.
    Type: Application
    Filed: November 1, 2017
    Publication date: July 8, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Victor Emanuel CALADO, Youping ZHANG, Maurits VAN DER SCHAAR, Richard Johannes Franciscus VAN HAREN, Xing Lan LIU
  • Publication number: 20210208513
    Abstract: A method of determining a patterning process parameter from a metrology target, the method including: obtaining a plurality of values of diffraction radiation from the metrology target, each value of the plurality of values corresponding to a different illumination condition of a plurality of illumination conditions of illumination radiation for the target; and using the combination of values to determine a same value of the patterning process parameter for the target.
    Type: Application
    Filed: March 22, 2021
    Publication date: July 8, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Narjes JAVAHERI, Mohammadreza HAJIAHMADI, Olger Victor ZWIER, Gonzalo Roberto SANGUINETTI
  • Publication number: 20210208510
    Abstract: A method of controlling a computer process for designing or verifying a photolithographic component includes building a source tree including nodes of the process, including dependency relationships among the nodes, defining, for some nodes, at least two different process conditions, expanding the source tree to form an expanded tree, including generating a separate node for each different defined process condition, and duplicating dependent nodes having an input relationship to each generated separate node, determining respective computing hardware requirements for processing the node, selecting computer hardware constraints based on capabilities of the host computing system, determining, based on the requirements and constraints and on dependency relations in the expanded tree, an execution sequence for the computer process, and performing the computer process on the computing system.
    Type: Application
    Filed: November 24, 2017
    Publication date: July 8, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Yen-Wen LU, Xiaorui CHEN, Yang LIN
  • Publication number: 20210210309
    Abstract: A charged particle assessment tool includes: an objective lens configured to project a plurality of charged particle beams onto a sample, the objective lens having a sample-facing surface defining a plurality of beam apertures through which respective ones of the charged particle beams are emitted toward the sample; and a plurality of capture electrodes adjacent respective ones of the beam apertures and configured to capture charged particles emitted from the sample.
    Type: Application
    Filed: December 24, 2020
    Publication date: July 8, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Marco Jan-Jaco WIELAND
  • Publication number: 20210208519
    Abstract: Disclosed is a bandwidth calculation system for determining a desired wavelength bandwidth for a measurement beam in a mark detection system, the bandwidth calculation system comprising a processing unit configured to determine the desired wavelength bandwidth based on mark geometry information, e.g. comprising mark depth information representing a depth of a mark. In an embodiment the desired wavelength bandwidth is based on a period and/or a variance parameter of a mark detection error function. The invention further relates to a mark detection system, a position measurement system and a lithographic apparatus comprising the bandwidth calculation system, as well as a method for determining a desired wavelength bandwidth.
    Type: Application
    Filed: May 2, 2019
    Publication date: July 8, 2021
    Applicant: ASML Netherlands B.V.
    Inventors: Jia WANG, Jacob Fredrik Friso KLINKHAMER, Hua LI
  • Publication number: 20210208500
    Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
    Type: Application
    Filed: March 19, 2021
    Publication date: July 8, 2021
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: David Ferdinand VLES, Erik Achilles ABEGG, Aage BENDIKSEN, Derk Servatius Gertruda BROUNS, Pradeep K. GOVIL, Paul JANSSEN, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Mária PÉTER, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, James Norman WILEY
  • Patent number: 11056311
    Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus for detecting a thin device structure defect is disclosed. An improved charged particle beam inspection apparatus may include a charged particle beam source to direct charged particles to a location of a wafer under inspection over a time sequence. The improved charged particle beam apparatus may further include a controller configured to sample multiple images of the area of the wafer at difference times over the time sequence. The multiple images may be compared to detect a voltage contrast difference or changes to identify a thin device structure defect.
    Type: Grant
    Filed: August 27, 2019
    Date of Patent: July 6, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Chih-Yu Jen, Long Ma, Yongjun Wang, Jun Jiang
  • Patent number: 11054813
    Abstract: In a lithographic process in which a series of substrates are processed in different contexts, object data (such as performance data representing overlay measured on a set of substrates that have been processed previously) is received. Context data represents one or more parameters of the lithographic process that vary between substrates within the set. By principal component analysis or other statistical analysis of the performance data, the set of substrates are partitioned into two or more subsets. The first partitioning of the substrates and the context data are used to identify one or more relevant context parameters, being parameters of the lithographic process that are observed to correlate most strongly with the first partitioning. The lithographic apparatus is controlled for new substrates by reference to the identified relevant context parameters. Embodiments with feedback control and feedforward control are described.
    Type: Grant
    Filed: September 21, 2016
    Date of Patent: July 6, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Alexander Ypma, David Frans Simon Deckers, Franciscus Godefridus Casper Bijnen, Richard Johannes Franciscus Van Haren, Weitian Kou
  • Patent number: 11054750
    Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus having an illuminator and projection optics, the method including: computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, at least some of the design variables being characteristics of the illumination produced by the illuminator and of the design layout, wherein the multi-variable cost function is a function of a three-dimensional resist profile on the substrate, or a three-dimensional radiation field projected from the projection optics, or both; and reconfiguring one or more characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied.
    Type: Grant
    Filed: September 11, 2014
    Date of Patent: July 6, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen Hsu, Rafael C. Howell, Feng-Liang Liu
  • Patent number: 11054665
    Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: July 6, 2021
    Assignees: Cymer, LLC, ASML Netherlands B.V.
    Inventors: Wilhelmus Patrick Elisabeth Maria op 't Root, Thomas Patrick Duffey, Herman Philip Godfried, Frank Everts, Joshua Jon Thornes, Brian Edward King
  • Patent number: 11054754
    Abstract: Focus metrology patterns and methods are disclosed which do not rely on sub-resolution features. Focus can be measured by measuring asymmetry of the printed pattern (T), or complementary pairs of printed patterns (TN/TM). Asymmetry can be measured by scatterometry. Patterns may be printed using EUV radiation or DUV radiation. A first type of focus metrology pattern comprises first features (422) interleaved with second features (424) A minimum dimension (w1) of each first feature is close to a printing resolution. A maximum dimension (w2) of each second feature in the direction of periodicity is at least twice the minimum dimension of the first features. Each first feature is positioned between two adjacent second features such that a spacing (w1?) and its nearest second feature is between one half and twice the minimum dimension of the first features. A second type of focus metrology pattern comprises features (1122, 1124) arranged in pairs.
    Type: Grant
    Filed: May 28, 2018
    Date of Patent: July 6, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Frank Staals, Anton Bernhard Van Oosten, Yasri Yudhistira, Carlo Cornelis Maria Luijten, Bert Verstraeten, Jan-Willem Gemmink
  • Publication number: 20210199885
    Abstract: A system and method for providing a radiation source. In one arrangement, the radiation source includes an optical fiber that is hollow, and has an axial direction, a gas that fills the hollow of the optical fiber, and a plurality of temperature setting devices disposed at respective positions along the axial direction of the optical fiber, wherein the temperature setting devices are configured to control the temperature of the gas to locally control the density of the gas.
    Type: Application
    Filed: March 3, 2021
    Publication date: July 1, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hendrik Sabert, Patrick Sebastian Uebel
  • Patent number: 11048178
    Abstract: A plate to be positioned between a movable stage and a projection system of a lithographic apparatus, the plate having a surface to face the movable stage; an opening through the plate for passage of patterned radiation beam; one or more gas outlets in a side of the opening and in the surface of the plate, wherein the one or more gas outlets are configured to supply gas to a region between the movable stage and the projection system, wherein all of the one or more gas outlets in the surface of the plate are positioned such that, for each of such one or more gas outlets, a line that is both orthogonal to the surface and intersects the gas outlet does not intersect the patterning device at any point during the entire range of movement of the patterning device.
    Type: Grant
    Filed: November 22, 2018
    Date of Patent: June 29, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Federico La Torre, Laurentius Johannes Adrianus Van Bokhoven, José Nilton Fonseca, Jr., Gerben Pieterse, Erik Henricus Egidius Catharina Eummelen, Frank Johannes Jacobus Van Boxtel
  • Patent number: 11049689
    Abstract: Systems and methods for conducting charged particle beam modulation are disclosed. According to certain embodiments, a charged particle beam apparatus generates a plurality of charged particle beams. A modulator may be configured to receive the plurality of charged particle beams and generate a plurality of modulated charged particle beams. A detector may be configured to receive the plurality of modulated charged particle beams.
    Type: Grant
    Filed: September 3, 2019
    Date of Patent: June 29, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Ehud Shaked, Martinus Maassen
  • Patent number: 11048180
    Abstract: A component for use in a patterning device environment including a patterning device, wherein the component is treated to suppress EUV plasma-induced contaminant release and/or atomic hydrogen or other radicals induced defectivity. A conduit array comprising at least one conduit, wherein the at least one conduit has been treated to promote adhesion of a contaminant to the at least one conduit.
    Type: Grant
    Filed: September 16, 2019
    Date of Patent: June 29, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Andrey Nikipelov, Vadim Yevgenyevich Banine, Christian Gerardus Norbertus Hendricus Marie Cloin, Edwin Te Sligte, Marcus Adrianus Van De Kerkhof, Ferdinandus Martinus Jozef Henricus Van De Wetering
  • Patent number: 11050213
    Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
    Type: Grant
    Filed: June 24, 2020
    Date of Patent: June 29, 2021
    Assignees: Cymer, LLC, ASML Netherlands B.V.
    Inventors: Joshua Jon Thornes, Tanuj Aggarwal, Kevin Michael O'Brien, Frank Everts, Herman Philip Godfried, Russell Allen Burdt
  • Patent number: 11048174
    Abstract: A method, and associated apparatus and computer program, to determine corrections for a parameter of interest, such as critical dimension, of a patterning process. The method includes determining an exposure control correction for an exposure control parameter and, optionally, determining a process control correction for a process control parameter, based upon a measurement of the parameter of interest of a structure, and an exposure control relationship and a process control relationship. The exposure control relationship describes the dependence of the parameter of interest on the exposure control parameter and the process control relationship describes the dependence of the parameter of interest on the process control parameter. The exposure control correction and process control correction may be co-optimized to minimize variation of the parameter of interest of subsequent exposed and processed structures relative to a target parameter of interest.
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: June 29, 2021
    Assignees: ASML Netherlands B.V., LAM Research Corporation
    Inventors: Michael Kubis, Marinus Jochemsen, Richard Stephen Wise, Nader Shamma, Girish Anant Dixit, Liesbeth Reijnen, Ekaterina Mikhailovna Viatkina, Melisa Luca, Johannes Catharinus Hubertus Mulkens
  • Publication number: 20210191275
    Abstract: A fluid handling structure configured to confine immersion fluid to a region of a lithographic apparatus, the fluid handling structure having an aperture formed therein for the passage therethrough of a radiation beam through the immersion fluid, the aperture defining an immersion space to be filled with the immersion fluid, and having an inner part and an outer part, wherein the inner part and the outer part are arranged so as to form therebetween a variable space and a connecting space that connects the variable space to the immersion space, wherein the outer part is movable relative to the inner part in a first plane so as to change in shape the variable space but not the connecting space, and wherein the fluid handling structure is configured to contain the immersion fluid in the variable space.
    Type: Application
    Filed: November 22, 2018
    Publication date: June 24, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raphael Nico Johan STEGEN, Giovanni Luca GATTOBIGIO, Theodorus Wilhelmus POLET
  • Publication number: 20210191278
    Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.
    Type: Application
    Filed: March 10, 2021
    Publication date: June 24, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Wim Tjibbo TEL, Bart Peter Bert SEGERS, Everhardus Cornelis MOS, Emil Peter SCHMITT-WEAVER, Yichen ZHANG, Petrus Gerardus VAN RHEE, Xing Lan LIU, Maria KILITZIRAKI, Reiner Maria JUNGBLUT, Hyunwoo YU