Patents Assigned to ASML Netherlands
  • Patent number: 11031209
    Abstract: Systems and methods of observing a sample in a multi-beam apparatus are disclosed. A multi-beam apparatus may comprise an array of deflectors configured to steer individual beamlets of multiple beamlets, each deflector of the array of deflectors having a corresponding driver configured to receive a signal for steering a corresponding individual beamlet. The apparatus may further include a controller having circuitry to acquire profile data of a sample and to control each deflector by providing the signal to the corresponding driver based on the acquired profile data, and a steering circuitry comprising the corresponding driver configured to generate a driving signal, a corresponding compensator configured to receive the driving signal and a set of driving signals from other adjacent drivers associated with adjacent deflectors and to generate a compensation signal to compensate a corresponding deflector based on the driving signal and the set of driving signals.
    Type: Grant
    Filed: December 27, 2019
    Date of Patent: June 8, 2021
    Assignee: ASML Netherlands B.V.
    Inventor: Jan-Gerard Cornelis Van Der Toorn
  • Patent number: 11029612
    Abstract: The invention relates to a bearing device arranged to support in a vertical direction a first part of an apparatus with respect to a second part of the apparatus, comprising a magnetic gravity compensator.
    Type: Grant
    Filed: February 15, 2018
    Date of Patent: June 8, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Maarten Hartger Kimman, Hans Butler, Olof Martinus Josephus Fischer, Christiaan Alexander Hoogendam, Theodorus Mattheus Joannus Maria Huizinga, Johannes Marinus Maria Rovers, Eric Pierre-Yves Vennat, Maurice Willem Jozef Etienne Wijckmans
  • Patent number: 11029595
    Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
    Type: Grant
    Filed: December 9, 2019
    Date of Patent: June 8, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Derk Servatius Gertruda Brouns, Dennis De Graaf, Robertus Cornelis Martinus De Kruif, Paul Janssen, Matthias Kruizinga, Arnoud Willem Notenboom, Daniel Andrew Smith, Beatrijs Louise Marie-Joseph Katrien Verbrugge, James Norman Wiley
  • Patent number: 11029614
    Abstract: A method of determining topographical variation across a substrate on which one or more patterns have been applied. The method includes obtaining measured topography data representing a topographical variation across a substrate on which one or more patterns have been applied by a lithographic process; and combining the measured topography data with knowledge relating to intra-die topology to obtain derived topography data having a resolution greater than the resolution of the measured topography data. Also disclosed is a corresponding level sensor apparatus and lithographic apparatus having such a level sensor apparatus, and a more general method of determining variation of a physical parameter from first measurement data of variation of the physical parameter across the substrate and intra-die measurement data of higher resolution than the first measurement data and combining these.
    Type: Grant
    Filed: June 22, 2017
    Date of Patent: June 8, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Wim Tjibbo Tel, Frank Staals, Martin Jules Marie-Emile De Nivelle, Tanbir Hasan
  • Patent number: 11029607
    Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.
    Type: Grant
    Filed: August 28, 2017
    Date of Patent: June 8, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Pepijn Van Den Eijnden, Cornelius Maria Rops, Theodorus Wilhelmus Polet, Floor Lodewijk Keukens, Gheorghe Tanasa, Rogier Hendrikus Magdalena Cortie, Koen Cuypers, Harold Sebastiaan Buddenberg, Giovanni Luca Gattobigio, Evert Van Vliet, Nicolaas Ten Kate, Mark Johannes Hermanus Frencken, Jantien Laura Van Erve, Marcel Maria Cornelius Franciscus Teunissen
  • Patent number: 11029594
    Abstract: A method including obtaining a selected component of optical aberration of or for a lithography apparatus, under a processing condition; computing an approximate of a cost function, based on the selected component; and producing an adjustment of the lithography apparatus or a patterning process that uses the lithography apparatus, based on the approximate of the cost function.
    Type: Grant
    Filed: August 30, 2017
    Date of Patent: June 8, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Steven George Hansen, Kateryna Stanislavovna Lyakhova, Paulus Jacobus Maria Van Adrichem
  • Patent number: 11029609
    Abstract: A method including: simulating an image or characteristics thereof, using characteristics of a design layout and of a patterning process, determining deviations between the image or characteristics thereof and the design layout or characteristics thereof; aligning a metrology image obtained from a patterned substrate and the design layout based on the deviations, wherein the patterned substrate includes a pattern produced from the design layout using the patterning process; and determining a parameter of a patterned substrate from the metrology image aligned with the design layout.
    Type: Grant
    Filed: December 6, 2017
    Date of Patent: June 8, 2021
    Assignee: ASML Netherlands B.V.
    Inventor: Te-Sheng Wang
  • Patent number: 11029605
    Abstract: A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method including: obtaining a first source of the lithographic apparatus; classifying the first source into a class among a plurality of possible classes, based on one or more numerical characteristics of the first source, using a machine learning model, by a computer; determining whether the class is among one or more predetermined classes; only when the class is among the one or more predetermined classes, adjusting one or more source design variables to obtain a second source.
    Type: Grant
    Filed: July 31, 2019
    Date of Patent: June 8, 2021
    Assignee: ASML Netherlands B.V.
    Inventor: Xiaofeng Liu
  • Publication number: 20210165335
    Abstract: Methods and apparatuses for determining in-plane distortion (IPD) across a substrate having a plurality of patterned regions. A method includes obtaining intra-region data indicative of a local stress distribution across one of the plurality of patterned regions; determining, based on the intra-region data, inter-region data indicative of a global stress distribution across the substrate; and determining, based on the inter-region data, the IPD across the substrate.
    Type: Application
    Filed: July 3, 2019
    Publication date: June 3, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Leon Paul VAN DIJK, Richard Johannes Franciscus VAN HAREN, Subodh SINGH, IIya MALAKHOVSKY, Ronald Henricus Johannes OTTEN, Amandev SINGH
  • Publication number: 20210165334
    Abstract: A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.
    Type: Application
    Filed: November 22, 2018
    Publication date: June 3, 2021
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Thomas POIESZ, Coen Hubertus Matheus BALTIS, Abraham Alexander SOETHOUDT, Mehmet Ali AKBAS, Dennis VAN DEN BERG, Wouter VANESCH, Marcel Maria Cornelius Franciscus TEUNISSEN
  • Publication number: 20210165332
    Abstract: A method involving: obtaining a process model of a patterning process that includes or accounts for an average optical aberration of optical systems of a plurality of apparatuses for use with a patterning process; and applying the process model to determine an adjustment to a parameter of the patterning process to account for the average optical aberration.
    Type: Application
    Filed: December 17, 2018
    Publication date: June 3, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Paulus Jacobus Maria VAN ADRICHEM, Ahmad Wasiem Ibrahim EL-SAID, Christoph Rene Konrad Cebulla HENNERKES, Johannes Christiaan Maria JASPER
  • Publication number: 20210165399
    Abstract: A method for configuring a semiconductor manufacturing process, the method including: obtaining a first value of a first parameter based on measurements associated with a first operation of a process step in the semiconductor manufacturing process and a first sampling scheme; using a recurrent neural network to determine a predicted value of the first parameter based on the first value; and using the predicted value of the first parameter in configuring a subsequent operation of the process step in the semiconductor manufacturing process.
    Type: Application
    Filed: February 11, 2021
    Publication date: June 3, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Sarathi ROY, Edo Maria HULSEBOS, Roy WERKMAN, Junru RUAN
  • Publication number: 20210165336
    Abstract: A system comprises a reflective optical element with a reflective surface that is configured to reflect a radiation beam. The reflective optical element also has a body. The system includes a thermal conditioning mechanism operative to thermally induce a deformation of the body under control of a controller. By means of controllably deforming the body, the shape of the reflective surface can be adjusted in a controlled manner.
    Type: Application
    Filed: April 10, 2019
    Publication date: June 3, 2021
    Applicant: ASML Netherlands B.V.
    Inventors: Ramon Mark HOFSTRA, Andrey Sergeevich TYCHKOV, Francois Charles Dominique DENEUVILLE, Gerardus Hubertus Petrus Maria SWINKELS, Petrus Adrianu Theodorus Maria RUIJS
  • Publication number: 20210163338
    Abstract: A device for connecting a fiber preform including a plurality of elongate holes extending substantially parallel to a longitudinal axis of the fiber preform to a pressure supply system, the device including a first surface to be connected to an end face of the fiber preform where the plurality of elongate holes end, a second surface including at least two ports configured to be in fluid connection with the pressure supply system, and a channel system within the device connecting the plurality of elongate holes at the first surface to the at least two ports, wherein a density of the at least two ports at the second surface is smaller than a density of the plurality of corresponding elongate holes at the first surface.
    Type: Application
    Filed: November 12, 2020
    Publication date: June 3, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Sebastian Thomas Bauerschmidt, Mingli Niu
  • Patent number: 11022901
    Abstract: A positioning device configured to position an object, the positioning device including: an object table configured to hold the object; an electromagnetic motor configured to displace the object table, the electromagnetic motor including: a coil assembly mounted to the object table, a superconductor assembly configured to co-operate with the coil assembly to generate a driving force on the object table, and a cryogenic enclosure configured to enclose the superconductor assembly and maintain the superconductor assembly in a superconductive state; a support for supporting the electromagnetic motor; and an electromagnetic support configured to suspend the cryogenic enclosure relative to the support, thereby maintaining a gap between the cryogenic enclosure and the support.
    Type: Grant
    Filed: September 24, 2018
    Date of Patent: June 1, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Hessel Bart Koolmees, Johannes Petrus Martinus Bernardus Vermeulen
  • Patent number: 11022902
    Abstract: The invention relates to a sensor comprising: a radiation source to emit radiation having a coherence length towards a sensor target; and a polarizing beam splitter to split radiation diffracted by the sensor target into radiation with a first polarization state and radiation with a second polarization state, wherein the first polarization state is orthogonal to the second polarization state, and wherein the sensor is configured such that after passing the polarizing beam splitter radiation with the first polarization state has an optical path difference relative to radiation with the second polarization state that is larger than the coherence length.
    Type: Grant
    Filed: May 14, 2018
    Date of Patent: June 1, 2021
    Assignee: ASML Netherlands B.V
    Inventors: Arie Jeffrey Den Boef, Patricius Aloysius Jacobus Tinnemans, Haico Victor Kok, William Peter Van Drent, Sebastianus Adrianus Goorden
  • Patent number: 11022896
    Abstract: Corrections are calculated for use in controlling a lithographic apparatus. Using a metrology apparatus a performance parameter is measured at sampling locations across one or more substrates to which a lithographic process has previously been applied. A process model is fitted to the measured performance parameter, and an up-sampled estimate is provided for process-induced effects across the substrate. Corrections are calculated for use in controlling the lithographic apparatus, using an actuation model and based at least in part on the fitted process model. For locations where measurement data is available, this is added to the estimate to replace the process model values. Thus, calculation of actuation corrections is based on a modified estimate which is a combination of values estimated by the process model and partly on real measurement data.
    Type: Grant
    Filed: February 22, 2017
    Date of Patent: June 1, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Emil Peter Schmitt-Weaver, Amir Bin Ismail, Kaustuve Bhattacharyya, Paul Derwin
  • Patent number: 11022892
    Abstract: An inspection apparatus (140) measures asymmetry or other property of target structures (T) formed by a lithographic process on a substrate. For a given set of illumination conditions, accuracy of said measurement is influenced strongly by process variations across the substrate and/or between substrates. The apparatus is arranged to collect radiation scattered by a plurality of structures under two or more variants of said illumination conditions (p1?, p1, p1+; ?1?, ?1, ?1+). A processing system (PU) is arranged to derive the measurement of said property using radiation collected under a different selection or combination of said variants for different ones of said structures. The variants may be for example in wavelength, or in angular distribution, or in any characteristic of the illumination conditions. Selection and/or combination of variants is made with reference to a signal quality (302, Q, A) observed in the different variants.
    Type: Grant
    Filed: October 30, 2019
    Date of Patent: June 1, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Patrick Warnaar, Simon Philip Spencer Hastings, Alberto Da Costa Assafrao, Lukasz Jerzy Macht
  • Patent number: 11022897
    Abstract: Methods of determining information about a patterning process. In a method, measurement data from a metrology process applied to each of a plurality of metrology targets on a substrate is obtained. The measurement data for each metrology target includes at least a first contribution and a second contribution. The first contribution is from a parameter of interest of a patterning process used to form the metrology target. The second contribution is from an error in the metrology process. The method further includes using the obtained measurement data from all of the plurality of metrology targets to obtain information about an error in the metrology process, and using the obtained information about the error in the metrology process to extract a value of the parameter of interest for each metrology target.
    Type: Grant
    Filed: November 19, 2018
    Date of Patent: June 1, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Joannes Jitse Venselaar, Anagnostis Tsiatmas, Samee Ur Rehman, Paul Christiaan Hinnen, Jean-Pierre Agnes Henricus Marie Vaessen, Nicolas Mauricio Weiss, Gonzalo Roberto Sanguinetti, Thomai Zacharopoulou, Martijn Maria Zaal
  • Patent number: 11022895
    Abstract: A method comprising determining aberrations caused by each lithographic apparatus of a set of lithographic apparatuses, calculating adjustments of the lithographic apparatuses which minimize differences between the aberrations caused by each of the lithographic apparatuses, and applying the adjustments to the lithographic apparatuses, providing better matching between the aberrations of patterns projected by the lithographic apparatuses.
    Type: Grant
    Filed: August 14, 2018
    Date of Patent: June 1, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Pierluigi Frisco, Giovanni Imponente, James Robert Downes