Abstract: The present invention relates a novel aqueous composition comprising polymeric thermal acid generator and a process of coating the novel composition onto photoresist pattern, thereby forming a layer of the polymeric thermal acid generator over the photoresist pattern. The polymeric thermal acid generator comprises a polymer having at least one repeating unit of structure 2; where R1 to R5 are independently chosen from the group consisting of H and C1-C6 alkyl; R6 is chosen from the group consisting of unsubstituted aryl, substituted aryl, alkyl (C1-C8) and fluoroalkyl (C1-C8) and W is a C2-C6 alkylene spacer.
Type:
Application
Filed:
May 17, 2013
Publication date:
November 20, 2014
Applicant:
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Abstract: This invention relates generally to silicon based photoresist compositions that can be used in forming low k dielectric constant materials suitable for use in electronic devices, methods of their use and the electronic devices made therefrom.
Type:
Grant
Filed:
February 9, 2012
Date of Patent:
October 28, 2014
Assignee:
AZ Electronic Materials (Luxembourg) S.A.R.L.
Inventors:
Ruzhi Zhang, Jihoon Kim, Bharatkumar K. Patel, Elizabeth Wolfer
Abstract: The present invention relates to novel antireflective coating compositions and their use in image processing. The compositions self-segregate to form hydrophobic surfaces of the novel antireflective coating compositions, the composition being situated between a reflective substrate and a photoresist coating. Such compositions are particularly useful in the fabrication of semiconductor devices by photolithographic techniques. The present invention also related to self-segregating polymers useful in image processing and processes of their use.
Type:
Application
Filed:
March 28, 2013
Publication date:
October 2, 2014
Applicant:
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Inventors:
Huirong YAO, JoonYeon CHO, Zachary BOGUSZ, Salem K. MULLEN, Guanyang LIN, Mark O. NEISSER
Abstract: Disclosed herein is a photosensitive composition comprising a heterocyclic thiol compound or tautomeric form thereof and its method of use on a substrate, which may include a chalcophile substrate.
Type:
Grant
Filed:
December 4, 2012
Date of Patent:
September 23, 2014
Assignee:
AZ Electronic Materials (Luxembourg) S.A.R.L.
Abstract: The present invention relates to a novel polymeric composition comprising a novel polymer having two or more repeat units and a terminus having the structure (1): wherein R1 represents a C1-C20 substituted or unsubstituted alkyl group, w is a number from 1-8, X is oxygen (O) or nitrogen (N), and Rd is a reactive group. The invention also relates to a process for forming a pattern using the novel polymeric composition. The invention further relates to a process of making the novel polymer.
Type:
Grant
Filed:
June 8, 2012
Date of Patent:
September 16, 2014
Assignee:
AZ Electronic Materials (Luxembourg) S.A.R.L.
Inventors:
Hengpeng Wu, Orest Polishchuk, Yi Cao, SungEun Hong, Jian Yin, Guanyang Lin, Margareta Paunescu, Mark Neisser
Abstract: The present invention relates to novel neutral layer compositions and methods for using the neutral layer compositions for aligning microdomains of directed self-assembling block copolymers (BCP). The compositions and processes are useful for fabrication of electronic devices.
Type:
Application
Filed:
February 14, 2014
Publication date:
July 10, 2014
Applicant:
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Inventors:
Hengpeng WU, Yi CAO, SungEun HONG, Jian YIN, Margareta PAUNESCU, Mark O. NEISSER, Guanyang LIN
Abstract: The present disclosure relates to soluble, multi-ligand-substituted metal compounds with improved stability as well as compositions made from them and methods of their use.
Type:
Application
Filed:
December 7, 2012
Publication date:
June 12, 2014
Applicant:
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Inventors:
Huirong YAO, M. Dalil RAHMAN, Salem K. MULLEN, JoonYeon CHO, Clement ANYADIEGWU, Munirathna PADMANABAN
Abstract: The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer.
Type:
Application
Filed:
February 7, 2014
Publication date:
June 5, 2014
Applicant:
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Inventors:
Jian YIN, Hengpeng WU, Muthiah THIYAGARAJAN, SungEun HONG, Mark NEISSER, Yi CAO
Abstract: Disclosed herein is a photosensitive composition comprising a heterocyclic thiol compound or tautomeric form thereof and its method of use on a substrate, which may include a chalcophile substrate.
Type:
Application
Filed:
December 4, 2012
Publication date:
June 5, 2014
Applicant:
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Abstract: The present invention relates to novel neutral layer compositions and methods for using the compositions. The neutral layer composition comprises at least one random copolymer having at least one unit of structure (1), at least one unit of structure (2) and at least one unit of structure (3) where R1 is selected from the group consisting of a C1-C8 alkyl, C1-C8 fluoroalkyl moiety, C1-C8 partially fluorinated alkyl, C4-C8 cycloalkyl, C4-C8 cyclofluoroalkyl, C4-C8 partially fluorinated cycloalkyl, and a C2-C8 hydroxyalkyl; R2, R3 and R5 are independently selected from a group consisting of H, C1-C4 alkyl, CF3 and F; R4 is selected from the group consisting of H, C1-C8 alkyl, C1-C8 partially fluorinated alkyl and C1-C8 fluoroalkyl, n ranges from 1 to 5, R6 is selected from the group consisting of H, F, C1-C8 alkyl and a C1-C8 fluoroalkyl and m ranges from 1 to 3.
Type:
Grant
Filed:
September 23, 2011
Date of Patent:
April 8, 2014
Assignee:
AZ Electronic Materials (Luxembourg) S.A.R.L.
Inventors:
Hengpeng Wu, Yi Cao, SungEun Hong, Jian Yin, Margareta Paunescu, Mark O. Neisser, Guanyang Lin
Abstract: The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer.
Type:
Grant
Filed:
March 9, 2012
Date of Patent:
April 1, 2014
Assignee:
AZ Electronic Materials (Luxembourg) S.A.R.L.
Inventors:
Jian Yin, Hengpeng Wu, Muthiah Thiyagarajan, SungEun Hong, Mark Neisser, Yi Cao
Abstract: The present invention provides a cross-linking agent capable of preventing formation of scum from a bottom anti-reflective coating, and also provides a composition for forming a bottom anti-reflection coating containing the agent. The cross-linking agent is a nitrogen-containing aromatic compound having at least one vinyloxy group or N-methoxymethylamide group, and the composition contains the cross-linking agent. The cross-linking agent of the formula (1) can be produced by reaction of a nitrogen-containing aromatic compound, a halogen compound having a vinyloxy group or N-methoxymethylamide group and a basic compound.
Type:
Application
Filed:
September 26, 2012
Publication date:
March 27, 2014
Applicant:
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Inventors:
Shigemasa NAKASUGI, Shinji MIYAZAKI, Munirathna PADMANABAN, Alberto D. DIOSES
Abstract: The invention relates to an antireflective coating composition comprising a crosslinkable polymer, where the crosslinkable polymer comprises at least one unit of fused aromatic moiety, at least one unit with a phenylene moiety in the backbone of the polymer, and at least one hydroxybiphenyl unit, furthermore where the polymer comprises a crosslinking moiety of structure (4), where R3, R?3 and R??3 are independently hydrogen or a C1-C4alkyl. The invention further relates to a process for forming an image using the composition.
Type:
Application
Filed:
August 1, 2012
Publication date:
February 6, 2014
Applicant:
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Inventors:
M. Dalil RAHMAN, Clement ANYADIEGWU, Douglas MCKENZIE, JoonYeon CHO
Abstract: The present invention relates to a novel antireflective coating composition comprising a polymer obtained from a reaction product of at least one amino compound chosen from the group consisting of a polymer with repeat unit of structure (1), structure (2) and mixtures thereof reacted with a hydroxy compound chosen from the group consisting of structure (3), structure (4) and mixtures thereof, and, a thermal acid generator. The invention also relates to a process for using the novel composition in lithography.
Type:
Application
Filed:
June 19, 2012
Publication date:
December 19, 2013
Applicant:
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Inventors:
Huirong YAO, Guanyang LIN, JoonYeon CHO
Abstract: The invention relates to a novel positive working photosensitive composition having: at least one photoacid generator; at least one novolak polymer; at least one polymer, having a polymer backbone, said polymer comprising a structure of the following formula: wherein R1-R5 are, independently, —H or —CH3, A is a linear or branched C1-C10 alkylene group, B is a C1-C12 alkyl or alicyclic group, D is a linking group that may be a chemical bond, a carboxylate group, wherein the carbonyl carbon is bonded to the polymer backbone, or a —COOCH2— group, wherein the carbonyl carbon is bonded to the polymer backbone, Ar is a substituted or unsubstituted aromatic group or heteroaromatic group, E is a linear or branched C2-C10 alkylene group, G is an acid cleavable group. The invention further relates to a process for using the novel composition for forming an image.
Type:
Application
Filed:
June 15, 2012
Publication date:
December 19, 2013
Applicant:
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Inventors:
Weihong LIU, PingHung LU, Chunwei CHEN, Stephen MEYER, Medhat TOUKHY, SookMee LAI
Abstract: Disclosed are compositions for negative-working thick film photophotoresists based on acrylic co-polymers. Also included are methods of using the compositions.
Type:
Application
Filed:
June 15, 2012
Publication date:
December 19, 2013
Applicant:
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Inventors:
Chunwei CHEN, PingHung LU, Weihong LIU, Medhat TOUKHY, SangChul KIM, SookMee LAI
Abstract: The present invention relates to a novel polymeric composition comprising a novel polymer having two or more repeat units and a terminus having the structure (1): wherein R1 represents a C1-C20 substituted or unsubstituted alkyl group, w is a number from 1-8, X is oxygen (O) or nitrogen (N), and Rd is a reactive group. The invention also relates to a process for forming a pattern using the novel polymeric composition. The invention further relates to a process of making the novel polymer.
Type:
Application
Filed:
June 8, 2012
Publication date:
December 12, 2013
Applicant:
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Inventors:
Hengpeng WU, Orest POLISHCHUK, Yi CAO, SungEun HONG, Jian YIN, Guanyang LIN, Margareta PAUNESCU, Mark NEISSER
Abstract: [Problem] To provide a method capable of forming an insulating film suffering less from both shrinkage and stress. [Means for solving] A method for forming a silicon dioxide film, comprising the steps of: coating a substrate with a polysilazane composition to form a coat, and then heating the formed coat in a hydrogen peroxide atmosphere at 50 to 200° C. This method enables to form isolation structures such as various insulating films.
Type:
Application
Filed:
February 16, 2012
Publication date:
November 28, 2013
Applicant:
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.L.
Abstract: The invention relates polysilazane-containing coatings for increasing the light permeability of sun-facing covers of solar cells. The coating for surfaces contains at least one polysilazane of formula (1) —(SiRR?R?—NR??1)n- (1), wherein R?, R?, R?? are the same or different or represent an optionally substituted alkyl, aryl, vinyl or (trialkoxysilyl)alkyl group, n being an integer and n being chosen in such a manner that the perhydropolysilazane has a number average molecular weight of 150 to 150,000 g/mol, a solvent and a catalyst. The cured coating has a thickness of at least 0.50-10 micrometer, preferably 0.2 to 5 micrometer, especially preferred 0.5 to 1.5 micrometer. It is especially suitable as transmission-promoting coating for use in sun-facing covers of solar cells.
Type:
Grant
Filed:
April 17, 2009
Date of Patent:
October 22, 2013
Assignee:
AZ Electronic Materials (Luxembourg) S.a.r.l.
Inventors:
Klaus Rode, Hartmut Wiezer, Sandra Stojanovic, Hubert Liebe, Lars Blankenburg