Patents Assigned to Beneq Oy
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Patent number: 10961620Abstract: The invention relates to a method for fabricating a plasma etch-resistant film (1) on a surface of a substrate (2), wherein the method comprises the step of forming a film comprising an intermediate layer (4) of rare earth metal oxide, rare earth metal carbonate, or rare earth metal oxycarbonate, or anymixture thereof on a first layer (3) of rare earth metal oxide, wherein the rare earth metal is the same in the first layer and in the intermediate layer. The invention further relates to a plasma etch-resistant film and to the use thereof.Type: GrantFiled: March 3, 2017Date of Patent: March 30, 2021Assignee: BENEQ OYInventors: Pekka J. Soininen, Vasil Vorsa, Mohammad Ameen
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Publication number: 20200381488Abstract: A thin film display element (100) has at least one emissive area (103) in the display region (101) and a layer structure (104) comprising: a first patterned conductor layer (110) comprising a first display electrode (111) in the display region; a second patterned conductor layer (120) comprising a second display electrode (121) in the display region; and an emissive layer (130) between the first and the second conductor layers configured to emit light in the at least one emissive area. The patterned conductor layers further comprise a first touch electrode (141) and a second touch electrode (142) in the display region, the first and the second touch electrodes forming a touch sensor (140) for capacitive touch or proximity sensing.Type: ApplicationFiled: February 21, 2019Publication date: December 3, 2020Applicant: Beneq OyInventors: Janne LESONEN, Olli PEKONEN
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Patent number: 10590536Abstract: The present invention relates to an apparatus, method, a reaction chamber and a use of a reaction chamber for processing a surface of a substrate by subjecting the surface of a substrate to successive surface reactions of at least a first precursor and a second precursor. The apparatus comprises a vacuum chamber; a detachable reaction chamber arranged to be installed inside the vacuum chamber, and inside which the substrate is positioned during processing and a precursor system for supplying the at least first and second precursors into the action chamber and for discharging the at least first and second precursors from the reaction chamber. According to the present invention the reaction chamber is provided as a gastight vessel.Type: GrantFiled: November 27, 2018Date of Patent: March 17, 2020Assignee: BENEQ OYInventors: Mikko Soderlund, Pekka Soininen, Jarmo Maula
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Patent number: 10576445Abstract: An apparatus and method for processing particulate matter by exposing the particulate matter to successive surface reactions of at least a first and a second gaseous precursor according to the principles of atomic layer deposition. The apparatus includes a vacuum chamber, a reaction chamber for particulate matter, wherein the reaction chamber is provided inside the vacuum chamber, a vibration mechanism for vibrating particulate matter inside the reaction chamber; and a precursor system arranged to supply the at least first and second gaseous precursors through the reaction chamber for subjecting the particulate matter to the at least first and second gaseous precursors. The method includes the steps of supplying the at least first and second gaseous precursors through the reaction chamber for subjecting the particulate matter to the at least first and second gaseous precursors, and vibrating particulate matter inside the reaction chamber.Type: GrantFiled: June 22, 2017Date of Patent: March 3, 2020Assignee: BENEQ OYInventors: Markus Bosund, Risto Peltonen
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Publication number: 20200035777Abstract: A transparent thin film display element (100) with a display region(101), and a transition region (105) having a first edge (106) bordering the display region and a second edge (107) opposite to the first edge, the transparent display element having a layer stack (103) comprises:a first conductor layer (110); a second conductor layer (120); andan emissive layer (130) superposed between the first and the second conductor layers and configured to emit light upon electrical current flowing through the emissive layer between the first and the second conductor layers. At least one layer (120) of a group comprising the first and the second conductor layers and the emissive layer has, in the transition region (105), a first coverage at the first edge (106), a second coverage lower than the first coverage at the second edge (107), and an intermediate coverage lying between the first and the second coverage.Type: ApplicationFiled: March 22, 2018Publication date: January 30, 2020Applicant: BENEQ OYInventors: Pertti MALVARANTA, Asta OLLILA, Jukka LAMMI, Kari HARKONEN, Mikko SAIKKONEN
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Patent number: 10513776Abstract: A method for subjecting a surface of a substrate to successive surface reactions of precursors according to the principles of atomic layer deposition includes subjecting the surface of the substrate to the first precursor in a first precursor zone and subjecting the surface of the substrate to the second precursor in a second precursor zone, changing the first precursor in the first precursor zone to a subsequent precursor which is different than the first and second precursors, subjecting the surface of the substrate to the subsequent precursor in the first precursor zone, and subjecting the surface of the substrate to the second precursor in the second precursor zone.Type: GrantFiled: June 30, 2017Date of Patent: December 24, 2019Assignee: BENEQ OYInventor: Leif Keto
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Patent number: 10385450Abstract: A method and an apparatus for coating a substrate by subjecting a surface of the substrate to successive surface reactions of a first precursor and a second precursor in a reaction chamber. The method includes the steps of arranging the substrate to the substrate support in the reaction zone; supplying a predetermined amount of the first precursor to the reaction chamber for providing a flow of the first precursor to the reaction zone; supplying the second precursor for providing a flow of the second precursor through the reaction zone and discharging the second precursor from the reaction chamber, the second precursor being inactive to react with the first precursor; generating plasma discharge to the reaction zone for forming active precursor radicals from the second precursor supplied into the reaction zone, the active precursor radicals being active to react with the first precursor.Type: GrantFiled: June 30, 2017Date of Patent: August 20, 2019Assignee: BENEQ OYInventors: Mikko Söderlund, Pekka Soininen, Paavo Timonen
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Publication number: 20190223268Abstract: A method for manufacturing an inorganic thin film electroluminescent display element comprises forming a layer structure, said forming the layer structure comprising forming a first dielectric layer (11); forming a luminescent layer (12), comprising manganese doped zinc sulfide ZnS:Mn, on the first dielectric layer, and forming a second dielectric layer (13) on the luminescent layer. Each of the first and the second dielectric layers are formed so as to comprise nanolaminate with alternating aluminum oxide Al2O3 and zirconium oxide ZrO2 sub-layers.Type: ApplicationFiled: August 30, 2017Publication date: July 18, 2019Applicant: Beneq OyInventors: Heli SEPPÄNEN, Tommy TURKULAINEN, Kari HÄRKÖNEN
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Publication number: 20190186011Abstract: A method and an apparatus for coating a substrate by subjecting a surface of the substrate to successive surface reactions of a first precursor and a second precursor in a reaction chamber. The method includes the steps of arranging the substrate to the substrate support in the reaction zone; supplying a predetermined amount of the first precursor to the reaction chamber for providing a flow of the first precursor to the reaction zone; supplying the second precursor for providing a flow of the second precursor through the reaction zone and discharging the second precursor from the reaction chamber, the second precursor being inactive to react with the first precursor; generating plasma discharge to the reaction zone for forming active precursor radicals from the second precursor supplied into the reaction zone, the active precursor radicals being active to react with the first precursor.Type: ApplicationFiled: June 30, 2017Publication date: June 20, 2019Applicant: BENEQ OYInventors: Mikko Soderlund, Pekka Soininen, Paavo Timonen
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Publication number: 20190184363Abstract: An apparatus and method for processing particulate matter by exposing the particulate matter to successive surface reactions of at least a first and a second gaseous precursor according to the principles of atomic layer deposition. The apparatus includes a vacuum chamber, a reaction chamber for particulate matter, wherein the reaction chamber is provided inside the vacuum chamber, a vibration mechanism for vibrating particulate matter inside the reaction chamber; and a precursor system arranged to supply the at least first and second gaseous precursors through the reaction chamber for subjecting the particulate matter to the at least first and second gaseous precursors. The method includes the steps of supplying the at least first and second gaseous precursors through the reaction chamber for subjecting the particulate matter to the at least first and second gaseous precursors, and vibrating particulate matter inside the reaction chamber.Type: ApplicationFiled: June 22, 2017Publication date: June 20, 2019Applicant: BENEQ OYInventors: Markus Bosund, Risto Peltonen
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Patent number: 10280508Abstract: A nozzle head, apparatus and method for providing a coating on a surface of a substrate by subjecting the surface of the substrate to successive surface reactions of at least two precursors according to principles of atomic layer deposition. The nozzle head comprises an output face provided with at least two different precursor zones, the at least two different precursor zones being arranged to provide different coating layers on the surface of the substrate.Type: GrantFiled: December 21, 2015Date of Patent: May 7, 2019Assignee: BENEQ OYInventors: Pekka Soininen, Olli Pekonen
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Patent number: 10273579Abstract: An apparatus for processing two or more substrates in a batch process by subjecting at least part of the surface of the substrates to alternating surface reactions of at least a first and a second precursor. The apparatus includes: multiple substrate holders for supporting the substrates, and a reaction chamber that includes a reaction space for depositing material on the surface of the substrates during a processing phase. The substrate holders are installed or arranged to be installed inside the reaction chamber for processing of the substrates inside the reaction chamber during the processing phase. During a loading phase in which the substrates are loaded to the substrate holders by a loading device, at least some of the substrate holders are arranged to be movable relative to each other.Type: GrantFiled: February 28, 2014Date of Patent: April 30, 2019Assignee: Beneq OyInventor: Leif Keto
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Patent number: 10214813Abstract: The invention relates to an apparatus and to a method for providing an ALD coating to a surface of a substrate. The apparatus includes at least one ALD coating unit for coating the surface of the substrate, a first reel for unwinding the substrate to be coated, a second reel for rewinding the coated substrate, one or more primary support structures provided on the same side of the substrate as the surface to be coated or the coated surface for forming a substrate transport path from the first reel through the at least one primary support structure to the second reel, and an interleave web in connection with each of the one or more primary support structures.Type: GrantFiled: August 30, 2016Date of Patent: February 26, 2019Assignee: BENEQ OYInventor: Leif Keto
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Patent number: 10167551Abstract: The present invention relates to an apparatus, method, a reaction chamber and a use of a reaction chamber for processing a surface of a substrate by subjecting the surface of a substrate to successive surface reactions of at least a first precursor and a second precursor. The apparatus includes a vacuum chamber; a detachable reaction chamber arranged to be installed inside the vacuum chamber, and inside which the substrate is positioned during processing and a precursor system for supplying the at least first and second precursors into the action chamber and for discharging the at least first and second precursors from the reaction chamber. According to the present invention the reaction chamber is provided as a gastight vessel.Type: GrantFiled: January 24, 2012Date of Patent: January 1, 2019Assignee: BENEQ OYInventors: Mikko Soderlund, Pekka Soininen, Jarmo Maula
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Patent number: 10111300Abstract: An improved transparent thin film electroluminescent display including a substrate, an active layer capable of emitting a wavelength range of visible light, a viewing side surface and a narrowband reflector reflecting part of the light of the active layer back towards the viewing side surface is disclosed. Said narrowband reflector and viewing side surface are arranged on opposite sides of the active layer. A method for manufacturing an improved transparent thin film electroluminescent display including a narrowband reflector is also disclosed.Type: GrantFiled: March 4, 2016Date of Patent: October 23, 2018Assignee: BENEQ OYInventor: Kari Härkönen
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Publication number: 20180258536Abstract: The invention relates to an apparatus for processing a surface of a substrate by atomic layer deposition and to a method for operating the apparatus. The apparatus includes a deposition chamber and one or more lead-through connections provided between one or more side chambers and the deposition chamber. The one or more lead through connections includes one or more lead-through chambers and a secondary pressure device operatively connected to the one or more lead-through chambers.Type: ApplicationFiled: August 30, 2016Publication date: September 13, 2018Applicant: BENEQ OYInventors: Leif Keto, Pekka Soininen, Mikko Söderlund
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Patent number: 10023957Abstract: The present invention relates to an apparatus and method for processing a surface of a substrate by subjecting the surface to successive surface reactions of a first and second precursor. The apparatus includes a nozzle head having two or more precursor nozzles and a moving mechanism for moving the nozzle head in non-linear oscillating movement in a first and second movement direction between a first extreme position and a second extreme position via a center position. The moving mechanism includes first driving means for accelerating the nozzle head in the first moving direction and decelerating the nozzle head in the second moving direction and second driving means for accelerating the nozzle head in the second moving direction and decelerating the nozzle head in the first moving direction.Type: GrantFiled: July 8, 2013Date of Patent: July 17, 2018Assignee: BENEQ OYInventors: Mika Jauhiainen, Pekka Soininen
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Patent number: 9987642Abstract: The present invention relates to an apparatus and method for producing aerosol. The apparatus comprising a first atomizer for producing a first aerosol jet and a second atomizer for producing a second aerosol jet, each atomizer comprising an atomizing head in which the liquid is atomized into an atomized aerosol jet. Said atomizers further comprise a focusing part arranged to restrain the atomized aerosol jet for providing a punctual aerosol jet, said focusing part extending directly from the atomizing head. The first and second atomizer form an atomizer pair such that the atomizers are aligned towards each other for colliding the aerosol jets to each other.Type: GrantFiled: September 9, 2014Date of Patent: June 5, 2018Assignee: BENEQ OYInventors: Ville Alitalo, Kai Asikkala, Simo Tammela, Sauli Virtanen
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Patent number: 9909212Abstract: Disclosed is an apparatus for processing a surface of a substrate by subjecting the surface of a substrate to successive surface reactions of at least a first precursor and a second precursor. The apparatus includes at least one nozzle head having two or more two or more precursor zones for subjecting the surface of the substrate to at least the first and second precursors and a moving mechanism for moving the nozzle head in oscillating movement between a first end position and a second end position. The moving mechanism is arranged to store at least part of the kinetic energy of the nozzle head released in oscillating movement of the nozzle head.Type: GrantFiled: August 22, 2011Date of Patent: March 6, 2018Assignee: BENEQ OYInventors: Tapani Alasaarela, Pekka Soininen
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Patent number: 9892814Abstract: A method for forming an electrically conductive oxide film (1) on a substrate (2), the method comprising the steps of, bringing the substrate (2) into a reaction space, forming a preliminary deposit on a deposition surface of the substrate (2) and treating the deposition surface with a chemical. The step of forming the preliminary deposit on the deposition surface of the substrate (2) comprises forming a preliminary deposit of transition metal oxide on the deposition surface and subsequently purging the reaction space. The step of treating the deposition surface with a chemical comprises treating the deposition surface with an organometallic chemical and subsequently purging the reaction space, to form oxide comprising oxygen, first metal and transition metal. The steps of forming the preliminary deposit and treating the deposition surface being alternately repeated such that a film (1) of electrically conductive oxide is formed on the substrate (2).Type: GrantFiled: February 10, 2016Date of Patent: February 13, 2018Assignee: Beneq OyInventor: Jarmo Maula