Patents Assigned to Canon Nanotechnologies, Inc.
  • Patent number: 10578964
    Abstract: Systems and methods for partial field imprinting are provided such that imprint templates are asymmetrically modulated to allow initial contact with a partial field on a substrate at a location spaced apart from the template center.
    Type: Grant
    Filed: December 31, 2014
    Date of Patent: March 3, 2020
    Assignee: Canon Nanotechnologies, Inc.
    Inventors: Mahadevan Ganapathisubramanian, Matthew M. Kincaid, Byung-Jin Choi, Sidlgata V. Sreenivasan
  • Patent number: 10168615
    Abstract: Provided is an imprint apparatus that applies a resin to several locations on a substrate, brings the resin and a mold into contact, and transfers a contoured pattern formed in the mold to the resin, comprising: a controller that sets a principal axis direction according to the contoured pattern and determines the application positions of the resin based on the principal axis direction that has been set such that the distances between resin drops that have been applied so as to be separated in the principal axis direction is larger than the distances between resin drops that have been applied so as to be separated in a direction that is perpendicular to the principal axis direction; and a dispenser that applies the resin based on the application position that has been determined.
    Type: Grant
    Filed: June 20, 2014
    Date of Patent: January 1, 2019
    Assignees: CANON KABUSHIKI KAISHA, CANON NANOTECHNOLOGIES, INC., KABUSHIKI KAISHA TOSHIBA
    Inventors: Keiji Yamashita, Yutaka Watanabe, Takuya Kono, Masayuki Hatano, Ikuo Yoneda
  • Patent number: 10124529
    Abstract: Imprint lithography templates having leading and trailing edge borders are provided that achieve zero-gap imprinting between adjacent fields with full-feature height features provided in the pattern exclusion zones (PEZ) located between such fields. The leading edge borders include dummy features, e.g., elongated features directionally oriented parallel to the mesa edge, while the trailing edge border includes a recess extending to the mesa edges. When used in a step-and-repeat process, the trailing edge border overlaps edge portions of an adjacent imprinted field that were previously patterned by the leading edge border of the template, producing full-feature height features in the pattern exclusion zones between such fields, and avoiding gaps or open areas between such fields that otherwise lead to non-uniformity of downstream processes such as etch processes and CMP.
    Type: Grant
    Filed: December 10, 2014
    Date of Patent: November 13, 2018
    Assignee: Canon Nanotechnologies, Inc.
    Inventors: Gaddi S. Haase, Kosta S. Selinidis, Zhengmao Ye
  • Patent number: 9778578
    Abstract: Imprint lithography template chucks and related systems and methods are provided that substantially maintain structural support functions while significantly enhancing imprint quality functions. The chucks incorporate dynamic vacuum seals to substantially reduce template contact during alignment and distortion correction while still providing good structural support upon separation.
    Type: Grant
    Filed: November 7, 2014
    Date of Patent: October 3, 2017
    Assignee: Canon Nanotechnologies, Inc.
    Inventors: Mario Johannes Meissl, Anshuman Cherala, Byung-Jin Choi, Seth J. Bamesberger
  • Patent number: 9778562
    Abstract: An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.
    Type: Grant
    Filed: November 21, 2008
    Date of Patent: October 3, 2017
    Assignee: Canon Nanotechnologies, Inc.
    Inventors: Frank Y. Xu, Weijun Liu, Edward Brian Fletcher, Sidlgata V. Sreenivasan, Byung Jin Choi, Niyaz Khusnatdinov, Anshuman Cherala, Kosta S. Selinidis
  • Patent number: 9770850
    Abstract: Provided is an imprint apparatus that imprints a pattern formed on a mold onto a substrate. The imprint apparatus includes a substrate holder that holds the substrate and can move in a direction along the surface of the substrate; a gas supply unit for supplying a gas into a space between a pattern part of the mold and the substrate; and a wall part that is disposed so as to enclose the space that is supplied with gas, wherein at a position opposed to the substrate and the mold, the wall part faces the substrate holder or the substrate with a gap therebetween.
    Type: Grant
    Filed: April 16, 2014
    Date of Patent: September 26, 2017
    Assignees: CANON KABUSHIKI KAISHA, CANON NANOTECHNOLOGIES, INC., MOLECULAR IMPRINTS, INC.
    Inventors: Makoto Mizuno, Tsuyoshi Arai, Yukio Takabayashi, Steven C. Shackleton, Byung-Jin Choi
  • Patent number: 9651862
    Abstract: Imprint lithography methods that incorporate depositing droplets of polymerizable material in patterns that improve fill time performance when employing directionally-oriented imprint templates. The patterns are based on grid arrays formed of repeating sets of rows of droplets oriented along fast and slow axes, with droplets of each row offset along the slow axis relative to droplets in adjacent rows.
    Type: Grant
    Filed: July 11, 2014
    Date of Patent: May 16, 2017
    Assignee: Canon Nanotechnologies, Inc.
    Inventors: Edward Brian Fletcher, Gerard M. Schmid, Se-Hyuk Im, Niyaz Khusnatdinov, Yeshwanth Srinivasan, Weijun Liu, Frank Y. Xu
  • Patent number: 9616614
    Abstract: Methods and systems are provided for patterning polymerizable material dispensed on flexible substrates or flat substrates using imprint lithography techniques. Template replication methods and systems are also presented where patterns from a master are transferred to flexible substrates to form flexible film templates. Such flexible film templates are then used to pattern large area flat substrates. Contact between the imprint template and substrate can be initiated and propagated by relative translation between the template and the substrate.
    Type: Grant
    Filed: February 21, 2013
    Date of Patent: April 11, 2017
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Byung-Jin Choi, Se Hyun Ahn, Mahadevan GanapathiSubramanian, Michael N. Miller, Sidlgata V. Sreenivasan
  • Patent number: 9529274
    Abstract: In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.
    Type: Grant
    Filed: December 15, 2014
    Date of Patent: December 27, 2016
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Mahadevan GanapathiSubramanian, Mario Johannes Meissl, Avinash Panga, Byung-Jin Choi
  • Patent number: 9514950
    Abstract: Methods of increasing etch selectivity in imprint lithography are described which employ material deposition techniques that impart a unique morphology to the multi-layer material stacks, thereby enhancing etch process window and improving etch selectivity. For example, etch selectivity of 50:1 or more between patterned resist layer and deposited metals, metalloids, or non-organic oxides can be achieved, which greatly preserves the pattern feature height prior to the etch process that transfers the pattern into the substrate, allowing for sub-20 nm pattern transfer at high fidelity.
    Type: Grant
    Filed: December 30, 2014
    Date of Patent: December 6, 2016
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Zhengmao Ye, Dwayne L. LaBrake
  • Patent number: 9452574
    Abstract: Described are methods of forming large area templates useful for patterning large area optical devices including e.g. wire grid polarizers (WGPs). Such methods provide for seamless patterning of such large area devices.
    Type: Grant
    Filed: December 19, 2012
    Date of Patent: September 27, 2016
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Douglas J. Resnick, Michael N. Miller, Frank Y. Xu
  • Patent number: 9323143
    Abstract: A nano-imprint lithography process includes forming a multiplicity of hydroxyl groups on a surface of a substantially inorganic nano-imprint lithography template, heating the template, and reacting a pre-selected percentage of the hydroxyl groups on the surface of the template with a mono-functional, non-fluorinated compound to form a monolayer coating on the surface of the nano-imprint lithography template. The coated template may be contacted with a polymerizable composition disposed on a nano-imprint lithography substrate, and the polymerizable composition solidified to form a patterned layer. The coated template is separated from the patterned layer.
    Type: Grant
    Filed: February 3, 2009
    Date of Patent: April 26, 2016
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Frank Y. Xu, Weijun Liu
  • Patent number: 9227361
    Abstract: Nano imprint lithography templates for purging of fluid during nano imprint lithography processes are described. The templates may include an inner channel and an outer channel. The inner channel constructed to provide fluid communication with a process gas supply to a region between the template and a substrate during the nano imprint lithography process. The outer channel constructed to evacuate fluid and/or confine fluid between the active area of template and the substrate.
    Type: Grant
    Filed: September 13, 2013
    Date of Patent: January 5, 2016
    Assignee: Canon Nanotechnologies, Inc.
    Inventors: Byung-Jin Choi, Yeong-Jun Choi, Kosta S. Selinidis, Steven C. Shackleton
  • Patent number: 9170485
    Abstract: Methods and systems are provided for fabricating polymer-based imprint lithography templates having thin metallic or oxide coated patterning surfaces. Such templates show enhanced fluid spreading and filling (even in absence of purging gases), good release properties, and longevity of use. Methods and systems for fabricating oxide coated versions, in particular, can be performed under atmospheric pressure conditions, allowing for lower cost processing and enhanced throughput.
    Type: Grant
    Filed: March 17, 2014
    Date of Patent: October 27, 2015
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Se Hyun Ahn, Byung-Jin Choi, Frank Y. Xu
  • Patent number: 9164375
    Abstract: A template chuck includes multiple zones to provide 1) an imprint bend optimized to provide high curvature and provide contact at middle radius of substrate and/or, 2) separation bend zone with an increased free span zone and high crack angle.
    Type: Grant
    Filed: June 17, 2010
    Date of Patent: October 20, 2015
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Mahadevan Ganapathisubramanian, Byung-Jin Choi
  • Patent number: 9122148
    Abstract: Systems and methods for providing multiple replicas from a master template are described. Replicas may be formed having a mesa. In one embodiment, a dummy fill region may be included on master template and/or replicas.
    Type: Grant
    Filed: October 28, 2009
    Date of Patent: September 1, 2015
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Michael N. Miller, Cynthia B. Brooks, Laura Anne Brown, Gerard M. Schmid
  • Patent number: 9090014
    Abstract: Systems for controlling velocity of a contact line and height profile between a template and a substrate during imprinting of polymerizable material are described.
    Type: Grant
    Filed: January 26, 2015
    Date of Patent: July 28, 2015
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Xiaoming Lu, Philip D. Schumaker
  • Patent number: 9063409
    Abstract: Porous nano-imprint lithography templates may include pores, channels, or porous layers arranged to allow evacuation of gas trapped between a nano-imprint lithography template and substrate. The pores or channels may be formed by etch or other processes. Gaskets may be formed on an nano-imprint lithography template to restrict flow of polymerizable material during nano-imprint lithography processes.
    Type: Grant
    Filed: June 5, 2013
    Date of Patent: June 23, 2015
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Niyaz Khusnatdinov, Weijun Liu, Frank Y. Xu, Edward Brian Fletcher, Fen Wan
  • Publication number: 20150158240
    Abstract: Imprint lithography templates having leading and trailing edge borders are provided that achieve zero-gap imprinting between adjacent fields with full-feature height features provided in the pattern exclusion zones (PEZ) located between such fields. The leading edge borders include dummy features, e.g., elongated features directionally oriented parallel to the mesa edge, while the trailing edge border includes a recess extending to the mesa edges. When used in a step-and-repeat process, the trailing edge border overlaps edge portions of an adjacent imprinted field that were previously patterned by the leading edge border of the template, producing full-feature height features in the pattern exclusion zones between such fields, and avoiding gaps or open areas between such fields that otherwise lead to non-uniformity of downstream processes such as etch processes and CMP.
    Type: Application
    Filed: December 10, 2014
    Publication date: June 11, 2015
    Applicant: Canon Nanotechnologies, Inc.
    Inventors: Gaddi S. Haase, Kosta S. Selinidis, Zhengmao Ye
  • Patent number: RE47483
    Abstract: A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.
    Type: Grant
    Filed: October 14, 2015
    Date of Patent: July 2, 2019
    Assignees: Molecular Imprints, Inc., Canon Nanotechnologies, Inc.
    Inventors: Douglas J. Resnick, Mario Johannes Meissl, Byung-Jin Choi, Sidlgata V. Sreenivasan