Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template
A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.
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The present application is a continuation of U.S. patent application Ser. No. 12/838,852 filed Jul. 19, 2010, now abandoned, which is a continuation of U.S. patent application Ser. No. 11/744,698 filed May 4, 2007, now abandoned, which claims priority to U.S. provisional application No. 60/799,496 filed on May 11, 2006. Each of the aforementioned patent applications is incorporated herein by reference.
BACKGROUND INFORMATIONNano-fabrication involves the fabrication of very small structures, e.g., having features on the order of nanometers or smaller. One area in which nano-fabrication has had a sizeable impact is in the processing of integrated circuits. As the semiconductor processing industry continues to strive for larger production yields while increasing the circuits per unit area formed on a substrate, nano-fabrication becomes increasingly important. Nano-fabrication provides greater process control while allowing increased reduction of the minimum feature dimension of the structures formed. Other areas of development in which nano-fabrication has been employed include biotechnology, optical technology, mechanical systems and the like.
An exemplary nano-fabrication technique is commonly referred to as imprint lithography. Exemplary imprint lithography processes are described in detail in numerous publications, such as U.S. patent publication no. 2004/0065976 filed as U.S. patent application Ser. No. 10/264,960, entitled “Method and a Mold to Arrange Features on a Substrate to Replicate Features having Minimal Dimensional Variability”; U.S. patent publication no. 2004/0065252 filed as U.S. patent application Ser. No. 10/264,926, entitled “Method of Forming a Layer on a Substrate to Facilitate Fabrication of Metrology Standards”; and U.S. Pat. No. 6,936,194, entitled “Functional Patterning Material for Imprint Lithography Processes,” all of which are assigned to the assignee of the present invention and are incorporated herein by reference.
The imprint lithography technique disclosed in each of the aforementioned U.S. patent publications and U.S. patent includes formation of a relief pattern in a polymerizable layer and transferring a pattern corresponding to the relief pattern into an underlying substrate. The substrate may be positioned upon a stage to obtain a desired position to facilitate patterning thereof. To that end, a mold is employed spaced-apart from the substrate with a formable liquid present between the mold and the substrate. The liquid is solidified to form a patterned layer that has a pattern recorded therein that is conforming to a shape of the surface of the mold in contact with the liquid. The mold is then separated from the patterned layer such that the mold and the substrate are spaced-apart. The substrate and the patterned layer are then subjected to processes to transfer, into the substrate, a relief image that corresponds to the pattern in the patterned layer.
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Template 20 may further comprises a first region 38 and a second region 40, with second region 40 surrounding first region 38 and second region 40 having a perimeter 41. In an embodiment, the first region is a hollowed out portion of the template 20. First region 38 may be in superimposition with recess 32. To that end, template 20 may have a varying thickness with respect to first and second regions 38 and 40. More specifically, a portion of first surface 25 in superimposition with first region 38 may be spaced-apart from second side 24 a first distance d1 defining a first thickness t1 and a portion of first surface 25 in superimposition with second region 40 may be spaced-apart from second side 24 a second distance d2, defining a second thickness t2. Distance d2 may be greater than distance d1 and thickness t2 may be greater than thickness t1. In an example, distance d2 may have a magnitude of approximately 0.25 inches and distance d1 may have a magnitude of approximately 700 microns. In a further example, distance d1 may have a magnitude in a range of 1 micron to 0.25 inches.
Mesa 26 may be referred to as a mold 26. Mesa 26 may also be referred to as a nanoimprint mold 26. In a further embodiment, template 20 may be substantially absent of mold 26. Template 20 and/or mold 26 may be formed from such materials including, but not limited to, fused-silica, quartz, silicon, organic polymers, siloxane polymers, borosilicate glass, fluorocarbon polymers, metal, and hardened sapphire. As shown, patterning surface 28 comprises features defined by a plurality of spaced-apart recesses 42 and protrusions 44. However, in a further embodiment, patterning surface 28 may be substantially smooth and/or planar. Patterning surface 28 may define an original pattern that forms the basis of a pattern to be formed on substrate 12. Further, mold 26 may be in superimposition with a portion of first region 38, however, in a further embodiment, mold 26 may be in superimposition with an entirety of first region 38.
Referring to
Formed in template chuck 46 are throughways 27 and 29, however, template chuck 46 may comprise any number of throughways. Throughway 27 places first recess 17 in fluid communication with side surface 15, however, in a further embodiment, it should be understood that throughway 27 may place first recess 17 in fluid communication with any surface of template chuck 46. Throughway 29 places second recess 19 in fluid communication with second side 13, however, in a further embodiment, it should be understood that throughway 29 may place second recess 19 in fluid communication with any surface of template chuck 46. Furthermore, what is desired is that throughways 27 and 29 facilitate placing first and second recess 17 and 19, respectively, in fluid communication with a pressure control system, such as a pump system 31.
Pump system 31 may include one or more pumps to control the pressure proximate to first and second recess 17 and 19. To that end, when template 20 is coupled to template chuck 46, template 20 rests against first 21 and second 23 support regions, covering first 17 and second 19 recesses. First region 38 of template 20 may be in superimposition with second recess 19, defining a first chamber 33 and second region 40 template 20 may be in superimposition with first recess 17, defining a second chamber 35. Pump system 31 operates to control a pressure in first and second chambers 33 and 35. Further, template chuck 46 may be coupled to an imprint head 48 to facilitate movement of patterning device 18.
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As shown, actuation system 78 comprises sixteen actuators 80 coupled to a perimeter 41 of patterning device 18, with each side of patterning device 18 having four actuators 80 coupled thereto. However, patterning device 18 may have any number of actuators 80 coupled thereto and may have differing number of actuators 80 coupled to each side of patterning device 18. Patterning device 18 may have any configuration and number of actuators 80 positioned thereon. In a further embodiment, actuators 80 may be coupled to boundary surface 36 of recess 32, as shown in
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The embodiments of the present invention described above are exemplary. Many changes and modifications may be made to the disclosure recited above, while remaining within the scope of the invention. Therefore, the scope of the invention should not be limited by the above description, but instead should be determined with reference to the appended claims along with their full scope of equivalents.
Claims
1. A nanoimprint lithography system comprising:
- a template having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the template having a first region and a second region having a perimeter, with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance, the template further having a mold disposed on the first side in superimposition with a portion of the first region and wherein the mold comprises a plurality of protrusions and recessions and the recess is in superimposition with the plurality of protrusions and recessions, and the first region further adapted to bow away from the second side of the template upon application of pressure, wherein a volume occupied by the recess on the second side is greater than a volume occupied by the mold on the first side; and
- a pressure control system in fluid communication with the recess configured to apply pressure to the template to bow the first region of the template away from the second side of the template, and to bow out farther a center sub-portion of the mold as compared to other portions of the mold.
2. The system as recited in claim 1 further comprising a template chuck coupled to the template, the template chuck covering the recess to define a chamber in superimposition with the first region.
3. The system of claim 1 further comprising a plurality of actuators coupled to the perimeter of the template to apply a force to the template.
4. The system as recited in claim 3, wherein the forces of the actuators may vary dimensions of the template.
5. The system as recited in claim 1, wherein the recess has a geometric shape selected from a group of geometric shapes consisting of square, rectangular, circular, and elliptical.
6. The system as recited in claim 1, wherein the recess comprises a nadir surface spaced-apart from the first side and the template comprises a boundary surface defined between the nadir surface and the second side, and further comprising additional actuators coupled to the boundary surface.
7. A nanoimprint lithography template comprising:
- a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region, wherein the first region is adapted to bow away from the second side of the body upon application of pressure; and
- a mold disposed on the first side of the body in superimposition with a portion of the recess, wherein the mold comprises a plurality of protrusions and recessions or has a patterning surface that is substantially smooth and/or planar, the recess is opposite to the mold, and a center sub-portion of the mold is adapted to bow out farther as compared to other portions of the mold, wherein a volume occupied by the recess on the second side is greater than a volume occupied by the mold on the first side.
8. The nanoimprint lithography template as recited in claim 7, wherein the body has a single piece construction.
9. The nanoimprint lithography template as recited in claim 8, wherein a surface of the first region on the second side is flat.
10. The nanoimprint lithography template as recited in claim 7, wherein the body has a rectangular shape, and said recess has a circular or elliptical shape.
11. The nanoimprint lithography template as recited in claim 7, wherein the mold is an only mold of the template.
12. The nanoimprint lithography template as recited in claim 7, wherein the mold comprises a material including fused-silica, quartz, silicon, organic polymers, siloxane polymers, borosilicate glass, fluorocarbon polymers, metal, or hardened sapphire.
13. The nanoimprint lithography template as recited in claim 7, wherein the first region has a first thickness, t1, and the second region has a second thickness, t2, and wherein t2 is greater than t1.
14. A nanoimprint lithography template comprising:
- a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance, wherein the body is adapted to selectively deform upon application of pressure; and
- a mold disposed on the first side of the body in superimposition with a portion of the first region,
- wherein: the mold comprises a plurality of protrusions and recessions, the recess is opposite to the plurality of the protrusions and recessions, the body has a single piece construction, a surface of the first region on the second side is flat, the template is adapted to cause droplets over a substrate to spread and to produce a contiguous liquid sheet, wherein an edge of the continuous liquid sheet defines a liquid-gas interface that functions to push a gas from a center of the mold toward edges of the mold, and a volume occupied by the recess on the second side is greater than a volume occupied by the mold on the first side.
15. The nanoimprint lithography template as recited in claim 14, wherein the recess is a circular recess.
16. The nanoimprint lithography template as recited in claim 14, wherein the body has a rectangular shape, and said recess has a circular or elliptical shape.
17. The nanoimprint lithography template as recited in claim 14, wherein the mold is an only mold of the template.
18. The nanoimprint lithography template as recited in claim 14, wherein the mold comprises a material including fused-silica, quartz, silicon, organic polymers, siloxane polymers, borosilicate glass, fluorocarbon polymers, metal, or hardened sapphire.
19. The nanoimprint lithography template as recited in claim 6, wherein a diameter of the nadir surface of the recess is greater than a diameter of the mold.
20. The nanoimprint lithography template as recited in claim 7, wherein the template comprises a first region and a second region, wherein the first region is in superimposition with the recess and the mold.
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Type: Grant
Filed: Oct 14, 2015
Date of Patent: Jul 2, 2019
Assignees: Molecular Imprints, Inc. (Austin, TX), Canon Nanotechnologies, Inc. (Austin, TX)
Inventors: Douglas J. Resnick (Leander, TX), Mario Johannes Meissl (Austin, TX), Byung-Jin Choi (Austin, TX), Sidlgata V. Sreenivasan (Austin, TX)
Primary Examiner: Krisanne M Jastrzab
Application Number: 14/882,971
International Classification: G03F 7/00 (20060101); B82Y 10/00 (20110101); B82Y 40/00 (20110101); H01L 21/67 (20060101);