Abstract: A reduction objective, a projection exposure apparatus with a reduction objective, and a method of use thereof are disclosed. The reduction objective has a first set of multilayer mirrors in centered arrangement with respect to a first optical axis, a second set of multilayer mirrors in centered arrangement with respect to a second optical axis, and an additional mirror disposed at grazing incidence, such that said additional mirror defines an angle between the first optical axis and said second optical axis. The reduction objective has an imaging reduction scale of approximately 4× for use in soft X-ray, i.e., EUV and UV, annular field projection applications, such as lithography.

Abstract: The invention relates to a particle-optical apparatus for particle-optical mask projection. According to the invention, an energy filter is used, by which particles which are inelastically scattered in a mask plane are separated from particles which are elastically scattered in the mask plane. Particles from a selected energy range are used for the particle-optical imaging of the mask in the final image plane. The energy filter is an imaging energy filter, the mask plane being coincident with the input image plane of the energy filter or being imaged in it. The output image plane of the energy filter is imaged, reduced in scale, by a following imaging system on a wafer arranged in the projection plane. Beam deflection systems are provided in addition, by which the particle beam is deflectable in the mask plane and onto out-of-axis regions, so that different regions of the mask plane can be imaged in the image plane at successive times.

Abstract: The invention concerns an illumination system, particularly for microlithography with wavelengths ≦193 nm, comprising a light source, a first optical component, a second optical component, an image plane and an exit pupil. The first optical component transforms the light source into a plurality of secondary light sources being imaged by the second optical component in said exit pupil. The first optical component comprises a first optical element having a plurality of first raster elements, which are imaged into said image plane producing a plurality of images being superimposed at least partially on a field in said image plane. The first raster elements deflect incoming ray bundles with first deflection angles, wherein at least two of the first deflection angles are different. The first raster elements are preferably rectangular, wherein the field is a segment of an annulus.

Abstract: In an apparatus for the image-supported treatment of a work object with a work object data unit and a display unit for the display of work object data from the work object data unit, the display unit makes possible a simultaneous visual sensing, with freedom of head movement, of the instantaneous work object and of the work object data from the work object data unit.

Abstract: A confocal microscope has a motorized scanning table for moving the sample perpendicularly to the optical axis of the microscope. The object is illuminated simultaneously at many places by means of a light source array. The light reflected or scattered at the object is detected by means of a diaphragm array, which is conjugate to the object and to the light source array. A sensor array is provided as a detector and makes a displacement of charges possible between individual positions in the scanning direction. The sensor is a so-called TDI sensor. The displacement of the charges is synchronized with the motion of the object corresponding to the motion of the image points in the plane of the sensor array. The image data can thereby be recorded during the motion of the object, so that even large object fields can be sensed in a short time with high lateral resolution.

Abstract: A catadioptric projection objective comprises an object plane, a physical beam splitter, a concave mirror, an image plane, a first objective part, a second objective part, and a third objective part. The first objective part is located between the object plane and the physical beam splitter. The second objective part is located between the physical beam splitter and the concave mirror, and includes at least two divergent lenses. The third objective part is located between the physical beam splitter and the image plane.

Abstract: A scanner for optical coherence tomography for linear scanning of an object with electromagnetic radiation, in which the scanning direction runs transversely of the direction of propagation of the electromagnetic radiation, includes a deflecting element rotatable around a rotation axis that deflects the electromagnetic radiation, incident along a direction of incidence, toward the object and, by its rotation, effects the linear scanning of the object. A beam forming optics is arranged on the object side of the rotatable deflecting element and concentrates electromagnetic radiation coming from the deflecting element. The rotation axis of the rotary deflecting element is parallel to the direction of incidence of the electromagnetic radiation.

Abstract: In a seal arrangement for a load-carrying bearing which is supported on a guide path provided on a carrying body and which is arranged so as to be movable along the length of the guide path, especially for coordinate measuring devices, the bearing is connected with a bearing cover. The bearing cover spans the carrying body at least on one side thereof and has a side portion which is bent toward its side, each side portion projecting into a labyrinth recess which is arranged on the associated side of the carrying body over the entire length of the guide path to form a labyrinth seal.

Abstract: A coordinate measuring instrument or machining equipment has a component that is mounted at its one end, movably on two guides, by a component foot. In order to be able to compensate rotation errors of the component, the component foot is arranged such that the component is turned in a plane that is orthogonal to the direction of motion of the component foot when the distance between the guides is changed.

Abstract: The invention concerns an illumination system for wavelengths (193 nm, particularly for EUV lithography with at least one light source, which has an illumination A in one surface; at least one device for producing secondary light sources; at least one mirror or lens device, comprising at least one mirror or one lens, which is (are) divided into raster elements; one or more optical elements, which are arranged between the mirror or lens device that comprises at least one mirror or one lens, which is (are) divided into raster elements, and the reticle plane, wherein the optical elements image the secondary light sources in the exit pupil of the illumination system.

Abstract: An apparatus records the depth profiles in a specimen with a reference beam and with a device for spatially superposing the measuring beam reflected from the specimen with the reference beam. The reference beam is coherent to the measuring beam in respect to a reference point of time. An evaluation unit having a detector is assigned to this device. The reference beam (9) and the measuring beam (7) for an areal irradiation of a sensor surface (29) are arranged at a spacing (35) from each other. The sensor surface (29) is assigned to the detector (25) and the surface irradiation overlaps at least in a subregion (27).

Abstract: An assembly is provided with a mount (1)and an optical element (7). The optical element (7) is connected via elastic connecting elements directly or via one or more intermediate elements to the mount (1). The connecting elements have at least one membrane-like joining element (4), which is connected in the outer region to the mount (1) or to the intermediate element and in the inner region is connected via a rigid, moment-transferring connection (12) to the optical element (7).

Abstract: An assembly includes a part made of transparent material, in particular, quartz glass or calcium fluoride, and a metal part soldered. The following layer structure is present in the region of a solder joint: a transparent material of the transparent material part, an adhesion layer, a diffusion barrier layer, a first oxidation protection layer, a second oxidation protection layer, a solder layer, as required, a wetting auxiliary layer, and a metal of the metal part, respectively with transitions between the layers, in particular, in the typical manner for soldering, and possibly with diffusion of the two oxidation protection layers into the solder.

Abstract: An optical arrangement is disclosed wherein an entering beam is converted into an exiting beam having a total cross section of light which is linearly polarized essentially in the radial direction by rotation. For this purpose, rasters of half-wave plates (41, 42, 4i), a combination of birefringent quarter-wave plate 420 and a circular plate 430 is suggested in combination with a conical polarizer 21′. This arrangement is preferably utilized in the illumination portion of a microlithographic projection exposure system. It is important that the arrangement be mounted behind all asymmetric or polarizing component elements 103a.

Abstract: The invention is directed to a viewing arrangement (1) having a viewing optic (3) for viewing an object (5) along a viewing beam path. The viewing arrangement (1) also has an illuminating apparatus (9) for illuminating the object (5) along an illuminating beam path running segment-wise transversely to the viewing beam path. A beam-shaping illuminating element (15) is mounted in the segment of the illuminating beam path running transversely to the viewing beam path. The illuminating element (15) is asymmetrical relative to the illuminating beam path.

Abstract: The invention relates to a changeover system for optical components such as filters, reflectors, polarizers and lens systems in optical equipment, particularly microscopes, a so-called reflector revolving nosepiece. The elements carrying the optical components, the so-called reflector blocks, are held by spring force against precision stops on the revolving nosepiece. For this purpose, the reflector blocks have lateral flanges that are respectively held against precision stop surfaces on the revolving nosepiece, by two respective leaf springs. The direction of the spring forces is mutually inclined, so that an outer edge of the flange is pressed into the interior edge formed on the revolver by two mutually perpendicular surfaces. The invention makes possible a rapid and simple fitting and changeover of reflector blocks without the use of tools.

Abstract: The invention regards to a microlithography projection objective for short wavelengths, preferably ≦193 nm, with an entrance pupil and an exit pupil for the imaging of an object field in an image field, which represents a segment of a ring field, wherein the segment has an axis of symmetry and an extension perpendicular to the axis of symmetry, and the extension is at least 20, and preferably 25 mm.

Abstract: An optical system, in particular a projection exposure device for microlithography, with a slit-shaped image field or illumination which is not rotationally symmetrical, has an optical element, in particular, a lens or a mirror which is arranged in a mount (2), and actuators (3) which engage on the optical element (1) at least approximately perpendicularly to the optical axis. The actuators (3) bring about forces and or moments, which are not rotationally symmetrical and which deviate from the radial, on the optical element (1), for the production of bendings which take place substantially without thickness changes.

Abstract: The invention is directed to an optoelectronic mixer for demodulating a high-frequency light signal amplitude modulated at a signal frequency (fsig) The optoelectronic mixer includes a light sensor for receiving and converting the light signal into free charge carriers. The light sensor has at least two individually drivable sensor electrodes and a reference frequency generator supplies an alternating-current voltage at a reference frequency (fref). The reference frequency generator is connected to the sensor electrodes to alternately conduct the charge carriers to the one or the other of the sensor electrodes at the reference frequency (fref).

Abstract: A measuring device for the measurement of workplaces has a base frame with a workpiece receiver to receive a workpiece to be measured, and at least one measuring unit for the measurement of the workpiece. In order to utilize the measuring device as flexibly as possible, and permit the measurement of different workplaces in as simple a manner as possible, the measuring unit can be brought into at least two different positions.