Abstract: A controller is provided for selectively and independently control each of a plurality of therapeutic radiation sources arranged along an array. The controller is operable to selectively generate therapeutic radiation at selected time intervals and at selected intensities. The controller includes intensity control circuitry for controlling the intensity of the therapeutic radiation generated by each therapeutic radiation source. The controller also includes duration control circuitry for controlling the duration of the therapeutic radiation generated by each therapeutic radiation source. The controller may also include a mechanical introducer for inserting the array into a treatment region, and for withdrawing the array from the treatment region.

Abstract: A minaturized tharapeutic radiation source includes a optically driven thermionic cathode having an electron-emissive surface, and a non-planar, x-ray emissive target. A fiber optic cable directs a beam of optical radiation, having a power level sufficient to heat at least a portion of the electron-emissive surface to an electron emitting temperature, from a laser source onto the cathode. An electron beam emitted from said cathode strikes the target, positioned in the electron beam path. The target includes a thin film of x-ray emissive material, adapted to emit therapeutic radiation in response to incident accelerated electrons from the electron beam, and a support structure made of x-ray transmissive material. The target has a non-planar configuration, such as a conical shape or a hemispherical shape, designed to produce a more uniform and intense radiation pattern around the target.

Abstract: An objective for a movie camera for digital cinematography comprises a cylindrical main barrel with a bayonet or K mount, an inner tube, fixed optical elements, adjustable optical sliding elements and drive rings with scales for adjusting the optical sliding elements that are mounted rotatably in the axial direction on the main barrel. The objective also comprises an iris diaphragm with a diaphragm ring rotating on the main barrel, an internal focusing system and a back focus correction device. The inner tube is mounted on the main barrel in a fashion displaceable along the optical axis for the purpose of back focus correction by means of the back focus correction device. The fixed optical elements, the iris diaphragm and sliding holders for holding the adjustable optical sliding elements are inserted into the inner tube.

Abstract: This disclosure relates to a spectacle lens family and methods of manufacturing the same, which in one embodiment has a multifocal property such that along a line between a far-vision reference point and a near-vision reference point spaced apart therefrom a mean spherical power changes continuously from a first value at the far-vision reference point to a second value at the near-vision reference point, wherein the spectacle lenses of the spectacle lens family each exhibit the same difference between the first value and the second value and nominal dioptric powers which are different from one another, wherein the shape of a first lens surface of the spectacle lenses is formed of a sphere and/or a torus to obtain the respective nominal dioptric power, wherein the spectacle lenses of the spectacle lens family have a basic shape of a second lens surface of the spectacle lens in common which provides the multifocal property, and wherein the shape of the second lens surface of each spectacle lens of the spectacle

Abstract: The invention relates to a method for detecting measurement data on coordinate measuring and digitalizing machines. When the measuring times of the coordinate measuring machine and the sensor are determined by an electric signal (trigger), the equality thereof can be guaranteed and the influence of signal propagation delays can be excluded. The nth sensor information always corresponds to the nth machine information. Allocation is made easier when each value detected at a measuring time obtains an identifier. In one embodiment, surface points of a free forming surface can be detected during movement of the sensor on the coordinate measuring machine and by means of a measuring sensor. The measuring times are determined by an electric signal that is produced by the sensor and is transmitted to the coordinate measuring machine. The signal triggers distance measuring of the sensor as well as the output of the current machine position.

Abstract: A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a second substantially refractive optical group more image forward than the first optical group having a number of lenses. The second optical group has a negative overall magnifying power for providing image reduction. The first optical group provides compensative aberrative correction for the second optical group. The objective forms an image with a numerical aperture of at least substantially 0.65, and preferably greater than 0.70 or still more preferably greater than 0.75.

Abstract: An optical system made up of lens arrays and normal lenses is particularly suitable for use as a massive parallel reader (approximately 102 channels) for microtiter plates and the like in absorption, fluorescence and luminescence.

Abstract: An illumination system having a rod integrator and an objective for imaging an object field onto an image field, which has an entry surface, an exit surface, and reflecting side surfaces. A lens-free interspace with an axial size of at least 30 mm is in the objective. A plane within this interspace is optically conjugate to the plane of the entry surface. All rays starting from a central field within the entry surface that are not reflected at the side surfaces have smaller ray heights in the lens-free interspace in relation to the optical axis than all the rays starting from the central field that are reflected at the side surfaces; the ratio of the field width to the width of the entry surface is at most 0.7. The ratio of the field height to the height of the entry surface is at most 0.7.

Abstract: In the production of optical elements, not only flat substrates but also spherical or aspherical substrates are used. The costs of such a substrate can exceed the coating costs by a multiple. Particularly in development work, cost savings may be achieved if a substrate can be used repeatedly. To recover a substrate, it is proposed to provide an interlayer between the substrate and the functional layers, which comprises at least one layer of chromium and one layer of scandium. By immersing the optical element into a hydrochloric acid solution, this interlayer is dissolved, so that the functional layer is also removed from the substrate and the substrate is ready for reuse.

Abstract: A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.

Abstract: Multilayer systems, such as those used as mirrors in the extreme ultraviolet wavelength range, suffer contamination or oxidation during storage in air and in long-time operation, i.e. when exposed to EUV radiation in a vacuum environment with certain partial pressures of water or oxygen, which causes a serious reduction in reflectivity. The multilayer system according to the invention will have a long life with constantly high reflectivity. The multilayer systems according to the invention have protective layers made from ruthenium, aluminium oxide, silicon carbide, molybdenum carbide, carbon, titanium nitride or titanium dioxide. The multilayer systems according to the invention are produced by direct, ion-beam-supported growth of the protective layer or, except in the case of ruthenium, by mixing aluminium or titanium with oxygen or nitrogen at atomic level, with ion-beam support, to product an outermost protective layer with ion-beam support.

Abstract: A coordinate measuring apparatus includes a bending-resistant measuring table configured as a ribbed hollow body.

Abstract: A beam deflector 1 for a beam of light 9 comprises: a first plate of electro-optical material disposed between a pair of electrode arrangements and a pair of plano-parallel mirrors, the refractive index of the electro-optical material being variable by the application of electric voltages, wherein a first mirror of the pair facing towards the incident light has a lower reflectivity than the second mirror, the first or second mirrors comprising a plurality of dielectric layers having refractive indices different from each other. Further, a switching system comprises: a plurality of terminals (53) for optical signals and beam deflectors (1) allocated to each other in pairs, each beam deflector being controllable such that it deflects the light beam (9) directed thereto into a selectable direction in order for the beam to enter at least one selected terminal end (55).

Abstract: A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a second substantially refractive optical group more image forward than the first optical group having a number of lenses. The second optical group has a negative overall magnifying power for providing image reduction. The first optical group provides compensative aberrative correction for the second optical group. The objective forms an image with a numerical aperture of at least substantially 0.65, and preferably greater than 0.70 or still more preferably greater than 0.75.

Abstract: A projection exposure device (1), in particular for micro-lithography, serves to produce an image of an object (2) in an image plane (11) positioned in an object plane (10). For this reason the projection exposure device (1) has a radiation source (4) emitting projection radiation (5). Illumination optics (6) are positioned between the radiation source (4) and the object plane (10) and projection optics (8) are positioned between the object plane (10) and the image plane (11). A detection device (30) is provided to measure the illumination angle distribution of the projection radiation (5) in a field plane (10). This communicates via at least one control device (34, 18) with at least one manipulator (20, 45, 47). The latter serves to move at least one optical component (7, 41) within the projection ray path (5, 9). The illumination angle distribution changes as a result of the controlled movement of the optical component (7, 41).

Abstract: An aspheric reduction objective has a catadioptric partial objective (L1), an intermediate image (IMI) and a refractive partial objective (L2). The catadioptric partial objective has an assembly centered to the optical axis and this assembly includes two mutually facing concave mirrors (M1, M2). The cutouts in the mirrors (B1, B2) lead to an aperture obscuration which can be held to be very small by utilizing lenses close to the mirrors and having a high negative refractive power and aspheric lens surfaces (27, 33). The position of the entry and exit pupils can be corrected with aspherical lens surfaces (12, 48, 53) in the field lens groups. The number of spherical lenses in the refractive partial objective can be reduced with aspherical lens surfaces (66, 78) arranged symmetrically to the diaphragm plane. Neighboring aspheric lens surfaces (172, 173) form additional correction possibilities.

Abstract: A bearing arrangement has fluid pressure bearings which permit an especially stiff support and is therefore especially well suited for high precision machines such as coordinate measuring apparatus. The bearing arrangement includes at least two fluid pressure bearings (12, 13, 14, 15, 16, 17) having a membrane formed as a support end. The membrane is concavely deformed by the bearing pressure. The bearing arrangement also includes a rigidly configured bearing base body which is supported on the two fluid pressure bearings. The rigid support is achieved in that at least one of the fluid pressure bearings includes a bearing housing (12a, 12b; 13a, 13b; 14a, 14b) which is configured as one piece and in that the bearing base body (6) is operatively connected directly to the bearing housing (12a, 12b; 13a, 13b; 14a, 14b). The bearing housing includes at least the membrane.

Abstract: The invention is directed to a method for determining the weight of a probe of a coordinate measuring machine wherein the probe is connected to a probe head (1) of the machine. The machine includes a control unit and the weight of the probe (3) is preferably statically determined without active control of the movement of the probe. Signals from the probe (3) and/or the probe head (1) are supplied to the control unit (51).