Abstract: A mounting device for an optical element in an assembly has a support member 3 with two or more gear elements 1. The support member 3 is connected, on the one hand, to an external mounting structure 30 and, via base points 2, to the gear elements 1. Via top points, the gear elements 1 are connected to the optical element 5 directly, or are connected to the optical element 5 indirectly via a mount 5′ arranged therebetween. The top points 4 of the gear elements 1 are located in planes of symmetry of the optical element 5 which are defined by the axial axis and a radial axis of the optical element 5. The gear elements 1 are arranged and dimensioned such that in the event of disturbing influences a compensation effect is produced with regard to the deformation of the optical surface of the optical element 5.

Abstract: The invention is directed to an articulating device for a probe head (4) of a coordinate measuring apparatus with the articulating device having at least two rotation joints (14, 15) for angularly aligning the probe head (4). In this articulating device, corrective values are assigned to the device with which the errors caused by the elastic deformation of the articulating device are corrected when making measurements. To improve the measuring results, a mathematical model is used for correcting the deformation and this mathematical model includes at least one mathematical finite element (17, 18).

Abstract: An adjusting optical element mount (1) serves for the position of two components (2a, 2b) in relation to one another, in particular of two carrier elements for optical elements, such as mirrors or lenses, in particular as an axial and/or angle manipulator for lithography lenses. The components (2a, 2b) can be adjusted in relation to one another via the action of force (F, T). Each of the components (2a, 2b) has at least three hinges (4a, 4b, 4c, 4d, 5a, 5b, 5c, 5d). Each of the hinges (4a, 4b, 4c, 4d) of one component (2a) is connected in each case to a corresponding hinge (5a, 5b, 5c, 5d) of the respectively other component (2b) to form a pair of hinges (7a, 7b, 7c, 7d) via a lever element (6a, 6b, 6c, 6d) in each case.

Abstract: A projection exposure device, in particular for micro-lithography, serves to produce an image of an object in an image plane positioned in an object plane. This happens with the aid of a light source emitting projection light and illumination optics positioned in the ray path between the light source and the object plane. In addition projection optics positioned in the ray path between the object plane and the image plane serve to guide the projection light. A filter (7) is positioned in a filter plane which lies in the vicinity of a pupil plane between the light source and the object plane. This has a moveable filter element (22′) which has at least in certain areas (24) for the projection light a transmission factor which is greater than zero and less than 100%.

Abstract: An illumination system for microlithography, has an excimer laser with an emission wavelength, a beam expanding system, a light mixer system and an illumination plane. In the system, an optical element made of a double refracting material is arranged in a light beam cross-section (for example, a Hanle depolarizer) and the thickness of the element varies across the light beam cross-section by a multiple of the emission wavelength. At least one light mixer system is positioned downstream of the optical element. A pseudo-depolarizer having two wedge plates is positioned upstream of the optical element.

Abstract: The invention is directed to a scanning system having one or several deflectable probe tips which are excited to oscillation at or near their resonant frequency. A saturation amplifier (16) is provided for detecting and measuring the phase shift between the excitation signal and the oscillation carried out by the probe tip. The saturation amplifier (16) generates a rectangular signal from the incoming sinusoidally-shaped signal (3e) while exactly maintaining the time-dependent position of the zero crossovers of the signal. The detection system, which is required for each probe tip, thereby acquires a very simple configuration of few commercially available components. Saturation amplified rectangular signals exclusively form the basis for the further evaluation. For this reason, a substantial independence of the signal intensity of the oscillation signal is ensured.

Abstract: A pivot mounting assembly is provided including a pivot arm (5) hinged to a pivot base (3) for mounting a load in a vertically adjustable manner. A first force-providing device (13) is hinged with its first operative end to the pivot arm and is supported with its second (17) operative ends on the pivot base for providing an antitorque moment to at least partially compensate for a torque imparted by the load on the pivot arm. The pivot base is provided with a support surface (27) in which the support location (49) for the second operative end is shiftable. A second force-providing device (36) is provided for generating a shifting force the second operative end of the first force-providing device.

Abstract: The present invention is a process by which optical surfaces of lenses, particularly plastic progressive lenses and molding shells for producing lenses are manufactured directly in a single step according to didicidual data. A blank from which an optical surface or a molding shell is to be manufactured is held at the workpiece carrier of a spindle axis (Z axis) of a shaping machine and is directly turned into its final form by a turning tool which can move relative to the blank (in the X axis), i.e., transversely to the direction of displacement of the tool. During each rotation of the spindle, the turning tool is incrementally adjusted towards or away from the blank depending on the characteristic surface data, which may be predetermined or calculated on-line.

Abstract: An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. A refractive optical element, e.g. a lens (2), is heated by the rotationally non-symmetrical radiated impingement (3) of a light source. At least one electric heating element is coupled to the optical element. Said heating element comprises a resistance heating coating carried by the optical element. In the region of the surface (3) of the optical element acted upon by the radiation of the light source the resistance heating coating is substantially optically transparent. It comprises a plurality of parallel, electrically mutually insulated coating strips (5 to 10). A heating current source (17 to 19) is additionally part of the heating element.

Abstract: An optical system, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. The system comprises a light source (30) as well as at least one optical element, in particular a lens or a mirror. In the region of at least one surface acted upon by the radiation (1) of the light source (30) the optical element is substantially symmetrical in relation to an axis of rotational symmetry (5). The optical element or its housing (6) is rotatably connected to a frame (7) by at least one bearing (8, 9, 10). An actuator (18) sets the optical element (25) or its housing (6) in rotation about the axis of rotational symmetry (5). The actuation cooperates with a control device (23). The latter activates the actuator (18) for rotation of the optical element at least temporarily during the period, when the optical element is exposed to lumination. In such a manner rotationally non-symmetrical image defects are compensated.

Abstract: A projection objective, particularly for microlithography at 248 nm or 193 nm has, after two bulges and two waists, a pronounced lens arrangement that preferably contains a further waist and the system diaphragm (AS). This is markedly set back from the negative lens group containing the second waist, and is surrounded by important correction devices. The highest numerical aperture (0.65-0.80) is attained with the smallest lens diameters and by paying heed to the further qualities required for such a microlithography projection objective.

Abstract: Apparatus for the spatially resolved determination of the refractive power distribution of an optical element, with a light source unit for illuminating the optical element with an extended pencil of rays, includes a first multi hole screen for the production of a first number of beam pencils, a spatially resolving detector, and a computing unit. A controllable manipulator is arranged before or after the first multi hole screen. The first multi hole screen and the manipulator are transmissive only for a second number of beam pencils, the second number being smaller than the first number but greater than unity. The measurement principle of the apparatus corresponds to that of a Hartmann wavefront sensor.

Abstract: A beam splitter (4) arranged in a laser beam (2) and at least two beam-deflecting devices (7) are provided in a system for at least far-reaching compensation of directional and positional fluctuations in the light beam (2) produced by a laser (1), in particular for micro lithographic illuminating devices. The beam splitter (4) guides a partial beam (2a) directly onto an illuminating reference surface (3) of the illuminating device, while a further partial beam (2b) is led back to the beam splitter (4) via a detour (5) in which the at least two beam-deflecting devices (6, 7) are located, and is subsequently likewise fed to the illuminating reference surface (3).

Abstract: The invention is directed to a projection exposure apparatus for the flat panel display manufacture having an objective array and magnifying objectives (O1 to O5).

Abstract: There is provided an illumination system for light having wavelengths ≦193 nm. The system includes (a) a first raster element for receiving a first diverging portion of the light and directing a first beam of the light, (b) a second raster element for receiving a second diverging portion of the light and directing a second beam of the light, where the first raster element is oriented at an angle with respect to the second raster element to cause a center ray of the first beam to intersect with a center ray of the second beam at an image plane, and (c) an optical element for imaging secondary sources of the light in an exit pupil, where the optical element is situated in a path of the light after the first and second raster elements and before the image plane.

Abstract: The invention is directed to an optical unit having elements (6, 7) which are juxtaposed without an air gap therebetween. The two elements (6, 7) are joined by wringing the same to each other. At least one element (7) is of crystalline material and has an amorphous inorganic layer (70) on the side thereof facing toward the other element (6). The invention is also directed to a method of preparing an element made of crystalline material, such as a fluoride, as well as a method for making a thin optical element of the crystalline material.

Abstract: There is provided an illumination system for illuminating a field with an aspect ratio other than 1:1 in an image plane. The illumination system includes (a) a light source, and (b) an optical component for transforming the light source into a secondary light source, where the optical component produces an anamorphotic effect that splits the secondary light source into a tangential secondary light source and a sagital secondary light source. The optical component has a first mirror or a first lens, having a raster element. The raster element has an aspect ratio smaller than the aspect ratio of the field in the image plane, and the raster element is imaged into the image plane.

Abstract: An optical mounting for an optical component includes an inner, preferably multi-part, portion that abuts the optical component and an outer frame, which are connected together by a plurality of spring hinge beams. The spring hinge beams and other portions of the optical mounting are produced galvanoplastically.

Abstract: An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. An optical element (1) is therefore acted upon in a rotationally non-symmetrical manner by the radiation of the light source. A compensating light supply device (11, 14 to 19) is optically coupled via the peripheral surface (13) of the optical element (1) to the latter. It supplies compensating light (16, 12) to the optical element (1) in such a way that the temperature distribution in the optical element (1), which arises as a result of cumulative heating of the optical element (1) with projection light (2) and compensating light (12), is at least partially homogenized. In said manner image defects induced by the projection light are corrected.

Abstract: The invention is concerned with a microlithography projection objective device for short wavelength microlithography, preferably <100 nm, with a first mirror (S1), a second mirror (S2), a third mirror (S3), a fourth mirror (S4) and a fifth mirror (S5). The invention is characterized by the fact that the image-side numerical aperture (NA) is greater than or equal to 0.10 and that the mirror closest to the object to be illuminated, preferably the wafer, is arranged in such a way that the image-side optical free working distance corresponds at least to the used diameter (D) of the mirror closest to the wafer; the image-side optical free working distance is at least the sum of one-third of the used diameter (D) of the mirror closest to the wafer and a length which lies between 20 mm and 30 mm; and/or the image-side optical free working distance is at least 50 mm, preferably 60 mm.