Abstract: A catadioptric projection objective includes a plurality of optical elements arranged to image an off-axis object field arranged in an object surface onto an off-axis image field arranged in an image surface of the projection objective. The optical elements form: a first, refractive objective part that can generate a first intermediate image from radiation coming from the object surface and including a first pupil surface; a second objective part including at least one concave mirror that can image the first intermediate image into a second intermediate image and including a second pupil surface optically conjugated to the first pupil surface; and a third objective part that can image the second intermediate image onto the image surface and including a third pupil surface optically conjugated to the first and second pupil surface.

Abstract: To enable contactless laser microdissection in a closed container (10, 11), for example in the form of a Petri dish, it is proposed according to the invention to use a holding device which comprises a receiving portion (4) for arrangement in the container (10, 11) and a holding portion (1) for arrangement externally of the container (10, 11). The receiving portion (4) serves to receive at least one receiving means (9), which serves in turn to receive or collect at least one biological specimen obtained by laser microdissection from biological material (15) located in the container (10, 11). The holding portion (1) is coupled to the receiving portion (4) in contactless manner, for example by means of magnetic coupling, in such a way that, by moving the holding portion (1), the receiving portion (4), together with the receiving means (9) held thereby, may be positioned in the closed container (10, 11) precisely over the biological specimen in each case to be received.

Abstract: Disclosed are charged particle systems that include a tip, at least one gas inlet configured to supply gas particles to the tip, and a element having a curved surface positioned to adsorb un-ionized gas particles, and to direct desorbing gas particles to propagate toward the tip. The charged particle systems can include a field shunt connected to the tip, and configured to adjust an electric field at an apex of the tip.

Abstract: A stage drive for moving a microscope stage designed as a mechanical stage including a first drive element linked to a first output element, and a second drive element, which is linked to a second output element. Through first and second transmission means, the first output element is linked to a first stage element and the second output element is linked to a second stage element of the mechanical stage supported by the first stage element. The stage elements are supported so as to be displaceable relative to a fixed base element in orthogonal directions X, Y in a plane extending normal to the optical axis of the microscope beam path. The at least one stage drive includes at least one drive element and at least one output element and is arranged in the base element so as to be displaceable in X direction and/or Y direction within an adjustment range and lockable.

Abstract: The disclosure relates to a method for improving optical properties of an optical system. The optical system has a plurality of optical elements for imaging a pattern onto a substrate that is arranged in an image plane of the optical system. The method includes detecting at least one time-dependent, at least partially reversible aberration of the optical system that is caused by heating of at least one of the optical elements. The method also includes at least partially correcting the aberration by replacing at least one optical element from the plurality of optical elements with at least one optical compensation element. The disclosure also relates to such an optical system with improved imaging properties.

Abstract: Charged particle beams with different charged particle currents are disclosed. In some embodiments, a method includes exposing a sample to a first ion beam having a first ion current at the sample, and exposing the sample to a second ion beam having a second ion current at the sample, where the first ion current is at least two times greater than the second ion current. In certain embodiments, a method includes creating a first ion beam at a first pressure, exposing a sample to the first ion beam, creating a second ion beam at a second pressure, and exposing the sample to the second ion beam, where the first pressure is at least two times greater than the second pressure.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.

Abstract: Process for observing at least one sample region with a light raster microscope by a relative movement between the illumination light and sample via a first scanner along at least one scanning axis essentially perpendicular to the illumination axis wherein several illuminated sample points lie on a line and are detected simultaneously with a spatially resolving detector. At an angle to the plane of the relative movement, a second scanner is moved and an image acquisition takes place by coupling the movement of the first and second scanners and a three-dimensional sampling movement being done by the illumination of the sample. The second scanner is coupled to the movement of the first scanner such that straight and/or curved lines and/or plane and/or curved surfaces are scanned which are extended along at least one scanning direction of the first scanner as well as along the scanning direction of the second scanner.

Abstract: An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.

Abstract: A surgical microscope (1) includes a viewing unit (3) for viewing an object (5) and an image projection module (7) for inputting image data (9) into the viewing unit (3). The image projection module (7, 107, 207, 307) includes a plano-convex lens and a plano-concave lens. The image projection module (7, 107, 207, 307) includes an image display unit (11, 111, 211, 311).

Abstract: The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors.

Abstract: The invention relates to a feeler (1) having a shaft (2) and a coupling body (3) fixing the latter for coupling to a coordinate measuring device. It is provided here that the shaft is fixed in the receiving body by means of injection moulding.

Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.

Abstract: A machining apparatus includes at least one tool holder (1) and at least one cutting tool (2) that are detachably interconnected. At least one first marking (7a) is provided on the tool holder (1) and at least one further marking (7b) is provided on the cutting tool (2). When connecting the tool holder (1) to the cutting tool (2), they can be aligned with each other with the aid of the markings (7a, 7b). The machining apparatus is preferably used for machining spectacle lenses, especially progressive lenses.

Abstract: A method for scanning a work piece surface uses a coordinate measurement device. A probe element is brought into contact with the surface and the probe element is moved along the surface. The coordinate measurement device has a plurality of degrees of freedom, which are independent of one another, in the possible movements of the probe element with respect to the work piece. Maximum speeds which describe the maximum of a movement speed component of the probe element based on the respective degree of freedom are defined for the degrees of freedom. An estimated path on which the probe element is intended to move during scanning is predefined. The actual scanning path can differ from the estimated scanning path. A maximum scanning speed at which the estimated scanning path can be traveled with a constant speed of the probe element is determined.

Abstract: The disclosure relates to a method for manufacturing an object with miniaturized structures. The method involves processing the object by supplying reaction gas during concurrent directing an electron beam onto a location to be processed, to deposit material or ablate material; and inspecting the object by scanning the surface of the object with an electron beam and leading generated backscattered electrons and secondary electrons to an energy selector, reflecting the secondary electrons from the energy selector, detecting the backscattered electrons passing the energy selector and generating an electron microscopic image of the scanned region in dependence on the detected backscattered electrons; and examining the generated electron microscopic image and deciding whether further depositing or ablating of material should be carried out. The disclosure also relates to an electron microscope and a processing system which are adapted for performing the method.

Abstract: The disclosure relates to an illumination system of a microlithographic projection exposure apparatus. The illumination system can include a depolariser which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarisation of polarised light impinging on the depolariser. The illumination system can also include a microlens array which is arranged upstream of the light mixing system in the light propagation direction. The microlens array can include a plurality of microlenses arranged with a periodicity. The depolariser can be configured so that a contribution afforded by interaction of the depolariser with the periodicity of the microlens array to a residual polarisation distribution occurring in a pupil plane arranged downstream of the microlens array in the light propagation direction has a maximum degree of polarisation of not more than 5%.

Abstract: The invention relates to an arrangement for at least partially compensating a torque caused by gravitational forces acting on a mass body (2), which is rotatably supported on an axis of rotation (3). The arrangement includes a gas pressure spring (5) for providing a linear force. This linear force is transformed into a torque by means of a converter unit (7). The mass body (2) and the converter unit (7) can be coupled to each other in a way which allows for adjusting the amplitude and the phase of a compensating torque.

Abstract: The invention is directed to an objective, particularly for telescope-type stereomicroscopes. The objective comprises two lens groups, a first lens group and a second lens group. The first lens group, which faces the object plane, has a positive refractive power and comprises a plurality of lenses of which at least two form a cemented component. The second lens group, which is on the image side, has a negative refractive power and comprises a collecting cemented component and a diverging lens. The objective is characterized in that the following conditions B1 and B2 are met: where DAP represents the diameter of the exit pupil of the objective and ?1 represents the maximum field angle.