Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.

Abstract: The disclosure relates to a connecting arrangement for an optical device, such as in microlithography. The connecting arrangement includes a first body, a second body and a connecting device. The first body contacts the second body in a laminar manner in a contact region. The connecting device is connected to the second body and contacts the first body via at least one contact unit. The connecting device is configured to generate a predefinable contact force in the contact region between the first body and the second body. The contact unit includes a plurality of separate contact elements.

Abstract: A method for producing an image of a layer of an object by a wide field optical element on a resolving detector. The object is illuminated in a focused manner on at least one object plane having at least two binary illuminating patterns. The corresponding images are detected. Light and/or the dark areas of the illuminating patterns completely cover the object when the illuminating pattern is superimposed. A layer image determined from the detected images, includes a partial segment that respectively reproduces a partial area of the object that is arranged inside the light area of one of the used illuminating patterns. Edges are arranged at a distance from the edges of the light area about at least one predefined minimum distance.

Abstract: Projection objectives of micro-lithographic projection exposure apparatuses, as well as related methods and components, are disclosed.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.

Abstract: A projection objective of a microlithographic projection exposure apparatus has a first lens, which is the penul-timate curved optical element on the image side. The first lens has a concave surface on the image side and contains a first intrinsically birefringent crystal, which has a first orientation of the crystal axes. The projection objective furthermore has a second lens, which is the last curved optical element on the image side and has a convex surface on the object side. The second lens contains a second intrinsically birefringent crystal, which has a second orientation of the crystal axes. The latter can be described by rotating the first orientation of the crystal axes about a symmetry axis of the first lens. The first and second orientations of the crystal axes are selected so that an intrinsic birefringence due to the first crystal, together with an intrinsic bire-fringence due to the second crystal, leads in total to at least approximately axisymmetric distribution of the overall birefringence.

Abstract: Method for correcting control of an optical scanner in a laser scanning microscope for imaging of a sample by scanning, the microscope guiding at least one beam path section of an illumination beam path of the microscope over the sample from an illumination device to the sample and/or an imaging beam path of the microscope from the sample to an acquisition device of the microscope in order to obtain an image of the sample, generating control signals corresponding to a predefined target movement using parameters and/or a transfer function of the scanner that are used for control and/or regulation and moving the at least one beam path section in response to the control signals, whereby an image of a reference sample having predefined structures imageable by the microscope is obtained by generating control signals corresponding to a predefined target test movement and moving the at least one beam path section in response to the control signals, thereby obtaining the image.

Abstract: An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements can be arranged in a first plane. The system can further include an optical raster element, which includes a plurality of microlenses and/or diffractive structures. The beam deflection elements), which can be arranged in a first plane, and the optical raster element, which can be arranged in a second plane, can commonly produce a two-dimensional far field intensity distribution. An optical imaging system can optically conjugate the first plane to the second plane.

Abstract: The disclosure relates to a correction light device for the irradiation of optical elements of an optical arrangement, in particular a lens, such a microlithography lens having a correction light, which include at least one correction light source and at least one mirror arrangement that deflects the light from the correction light source in the beam path to the optical element such that at least part of at least one surface of at least one optical element of the optical arrangement are irradiated in a locally and/or temporally variable fashion. The correction light strikes the surface of the optical element at a flat angle such that the obtuse angle between the optical axis of the optical arrangement at the location of the optical element and the correction light beam is less than or equal to 105°.

Abstract: This disclosure generally relates to medical systems and methods. In one aspect of the invention, a method includes determining a fluorescent light intensity at one or more points on each of multiple recorded images, and producing an image based on the determined fluorescent light intensity at the one or more points.

Abstract: The invention relates to a method by which image data from the terrain lying in front of a vehicle (1) in the direction of travel are detected, and from which data steering commands to influence the direction and/or the speed of travel are generated. The invention relates further to an arrangement for steering an agricultural vehicle (1) according to this method. According to the invention, the problem is solved in that prominent objects (3) are selected by means of the image data, the distance between the vehicle (1) and the prominent objects (3) is determined, and the steering commands are generated from the image data which correspond to the objects and from the changes of distance between the vehicle (1) and the objects (3).

Abstract: A device and method for determining the defective vision of an optical system include a controllable optical element. The objective and subjective determination of the correction values are more greatly combined in that a measuring and controlling device forms a control loop with the controllable optical element, and the optical characteristics of the controllable element can be changed manually.

Abstract: The invention relates to an opthalmological measuring instrument, e.g. for determining the corneal curvature, anterior chamber depth, axial length, or the like, comprising measuring systems for determining said variables. The measuring systems are connected to an evaluation unit which verifies whether quality parameters regarding the measurements are satisfied and generates a corresponding signal that indicates to the user that a proper measurement can be taken.

Abstract: Methods and systems for defect repair are disclosed. The methods include: (a) identifying a defect causing an absence of an electrical connection between a first circuit element and a second circuit element, the first and second circuit elements being positioned in or on a substrate and the defect being positioned in the substrate; (b) removing a portion of the substrate to expose the defect, and depositing a conductive material to electrically connect the first and second circuit elements; and (c) verifying that the defect caused the absence of an electrical connection between the first and second circuit elements.

Abstract: A processing system includes a particle beam column for generating a particle beam directed to a first processing location; a laser system for generating a laser beam directed to a second processing location located at a distance from the first processing location; and a protector including an actuator and a plate connected to the actuator. The actuator is configured to move the plate between a first position in which it protects a component of the particle beam column from particles released from the object by the laser beam and a second position in which the component of the particle beam column is not protected from particles released from the object by the laser beam.

Abstract: Ion microscope methods and systems are disclosed. In general, the systems and methods provide high ion beam stability.

Abstract: As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.

Abstract: A microscope objective having at least four lenses or groups of lenses and which can be used to improve image contrast. According to the invention, a phase plate, aligned concentrically to the optical axis, can be integrated into and taken out of the air space between the first lens and the second lens, as viewed from the object side. The defined arrangement of the phase plate and the associated shift of the real pupil into the air space between the first two lenses or groups of lenses, respectively, of the microscope objective allows a microscope objective, initially designed as a bright-field variant, to be redesigned as a phase contrast variant with relative ease.

Abstract: An arrangement for measuring the diffuse reflection of samples and a method for internal recalibration of the measuring head. The spectrometric measuring head with a device for recalibration comprises a housing which is provided with a window and which contains an illumination source, a spectrometer arrangement and at least two standards for internal recalibration. The two standards can be swiveled into the beam path of the measuring head selectively so that the measurement light emitted by the illumination source can be used in its entirety for recalibration. A processor for acquiring and processing measured values and an interface to a bus system are arranged in the housing. Accordingly, relatively time-consuming calibration of the measuring head at the place of use is required only before putting into operation or at longer time intervals. By the internal recalibrations, it is possible to prevent changes in the measured values in long-term operation.