Patents Assigned to Carl Zeiss
  • PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
    Publication number: 20100079739
    Abstract: A projection objective for applications in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for microstructured components, and a component manufactured using such a manufacturing method are disclosed.
    Type: Application
    Filed: November 24, 2009
    Publication date: April 1, 2010
    Applicant: CARL ZEISS SMT AG
    Inventors: Aksel Goehnermeier, Daniel Kraehmer, Vladimir Kamenov, Michael Totzeck
  • OPTICAL MEASUREMENT APPARATUS FOR A PROJECTION EXPOSURE SYSTEM
    Publication number: 20100079738
    Abstract: An optical measurement apparatus (50) for a projection exposure system (10) for microlithography includes an optical sensor (52) that measures a given property of exposure radiation (16) within the projection exposure system (10) and a data interface (66; 166) that transmits at least one value for the measured property in the form of measurement data (60) to a data receiver (72). The data receiver (72) is separated from the measurement apparatus (50) at least during the measuring operation, and is disposed outside of the measurement apparatus (50). The optical measurement apparatus has the outer form of a reticle.
    Type: Application
    Filed: September 29, 2009
    Publication date: April 1, 2010
    Applicant: Carl Zeiss SMT AG
    Inventors: Johannes Eisenmenger, Thomas Stammler, Richard Ell
  • METHOD FOR MEASURING A SPECTRUM OF A NARROWBAND LIGHT SOURCE, AND SPECTROMETER ARRANGEMENT
    Publication number: 20100079765
    Abstract: A spectrometer arrangement for measuring a spectrum of a light beam emitted by a narrowband light source, such as a bandwidth-narrowed laser, includes at least one etalon, a beam splitter for splitting the light beam into a first partial beam and a second partial beam, one or more optical directing elements for directing the first partial beam n times and the second partial beam (n+k) times through the at least one etalon, wherein n and k are integers ?1. The spectrometer arrangement further has at least one light-sensitive detector and an evaluation device for evaluating the spectra—recorded by the at least one detector—of the first partial beam that has passed through the at least one etalon n times and of the second partial beam that has passed through the at least one etalon (n+k) times in order to determine the light spectrum corrected for the apparatus function of the at least one etalon.
    Type: Application
    Filed: September 14, 2009
    Publication date: April 1, 2010
    Applicant: CARL ZEISS LASER OPTICS GMBH
    Inventors: Johannes Kraus, Alois Herkommer, Bernhard Weigl, Michel Le Maire, Holger Muenz
  • ELECTRON BEAM SOURCE AND METHOD OF MANUFACTURING THE SAME
    Publication number: 20100078557
    Abstract: A tip of an electron beam source includes a core carrying a coating. The coating is formed from a material having a greater electrical conductivity than a material forming the surface of the core.
    Type: Application
    Filed: September 30, 2009
    Publication date: April 1, 2010
    Applicants: CARL ZEISS NTS GMBH, NANOTOOLS GMBH
    Inventors: Volker Drexel, Ulrich Mantz, Bernd Irmer, Christian Penzkofer
  • Method and system for indirect determination of local irradiance in an optical system
    Patent number: 7686505
    Abstract: The invention concerns a method for the indirect determination of local irradiance in an optical system; wherein the optical system comprises optical elements between which an illuminated beam path is formed and a measurement object which absorbs the radiation in the beam path at least partially is positioned in a partial region of the beam path selected for the locally-resolved determination of the irradiance and the temperature distribution of at least one part of the measurement object is determined by means of a temperature detector.
    Type: Grant
    Filed: January 31, 2006
    Date of Patent: March 30, 2010
    Assignee: Carl Zeiss SMT AG
    Inventors: Frank Meltzer, Axel Scholz
  • Microscopy system and microscopy method for plural observers
    Patent number: 7688503
    Abstract: A microscopy system allows to superimpose a light optically generated microscopic image of an object with an electronically generated image. The electronically generated image is composed of two input images, one of which is independent of optical settings of an ocular tube, such as a rotational position and a magnification thereof, and the other input image is dependent of the optical setting.
    Type: Grant
    Filed: September 22, 2003
    Date of Patent: March 30, 2010
    Assignee: Carl Zeiss Stiftung
    Inventors: Karlheinz Hermann, Frank Rudolph, Martin Schneider, Joachim Steffen, Michael Wirth
  • Method to be used in fluorescence microscopy
    Patent number: 7688442
    Abstract: A method using fluorescence microscopy for image evaluation using a laser scanning microscope in which an at least partially spectrally resolved detection of the fluorescence spectrum occurs. Reference spectra are used for spectral demixing. Temporally and/or spectrally variable dyes and/or dye combinations are employed for recording of the reference spectra. Finally, the recorded reference spectra are inspected for image evaluation.
    Type: Grant
    Filed: June 9, 2004
    Date of Patent: March 30, 2010
    Assignee: Carl Zeiss Microimaging GmbH
    Inventors: Ralf Wolleschensky, Bernhard Zimmermann, Richard Ankerhold
  • Method for probing a workpiece using a coordinate measuring machine and coordinate measuring machines
    Patent number: 7685726
    Abstract: In probing by scanning a workpiece (71) to be measured using a coordinate measuring machine a stylus tip is moved before the scanning along a scanning path (73) along an initialization path (83) or/and after the scanning path (73) along a finalization path (85). A length (Lv, Ln) of the initialization path, respectively finalization path, is chosen in dependence of parameters of a concrete measuring task, in particular in dependence of a pre-determined scanning speed, a stiffness of the stylus or a mass of the stylus.
    Type: Grant
    Filed: July 3, 2006
    Date of Patent: March 30, 2010
    Assignee: Carl Zeiss Industrielle Messtechnik GmbH
    Inventors: Andreas Fuchs, Hermann Deeg, Heinz Peter
  • Optical scanning microscope
    Patent number: 7688504
    Abstract: Microscope, in particular an optical scanning microscope with illumination of a specimen via a beam splitter, which is arranged in an objective pupil and includes at least a reflecting first portion and at least a transmitting second portion, whereby the reflecting portion serves to couple in the illumination light and the transmitting portion serves to pass the detection light in the detection direction or the transmitting portion serves to couple in the illumination light and the reflecting portion serves to couple out the detection light, with a first scanning arrangement. Means are provided in the detection light path for the overlay of at least one further scanning arrangement for illumination and detection.
    Type: Grant
    Filed: January 23, 2009
    Date of Patent: March 30, 2010
    Assignee: Carl Zeiss Microimaging GmbH
    Inventor: Ralf Wolleschensky
  • METHOD AND SYSTEM FOR REMOVING CONTAMINANTS FROM A SURFACE
    Publication number: 20100071720
    Abstract: Inside a vacuum chamber 200 a cleaning unit 204 provides atomic hydrogen or atomic deuterium for cleaning a surface 202 at a pressure of less than 10?4 Torr or of more than 10?3 Torr. The surface 202 is heated by the heating unit 203 to a temperature of at least 50° C. This allows achieving cleaning rates of more than 60 ?/h. Preferably, the surface 202 is the surface of a multilayer mirror 201 as used in an EUV lithography apparatus.
    Type: Application
    Filed: September 19, 2008
    Publication date: March 25, 2010
    Applicant: Carl Zeiss SMT AG
    Inventors: Dirk Heinrich Ehm, Stefan Schmidt, Dieter Kraus, Stefan Wiesner, Stefan Koehler, Almut Czap, Hin Yiu Anthony Chung
  • OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    Publication number: 20100073655
    Abstract: An optical system of a microlithographic projection exposure apparatus contains a module, which can be fitted in the optical system and removed from it as a unit. The module contains a cavity which can be completely filled with a liquid and hermetically sealed, and a concavely curved optical surface which bounds the cavity at the top during operation of the projection exposure apparatus. This makes it possible to fill the module outside the optical system. The module can be tilted there so that no air bubble, which prevents complete filling, can form below the concavely curved optical surface.
    Type: Application
    Filed: December 1, 2009
    Publication date: March 25, 2010
    Applicant: CARL ZEISS SMT AG
    Inventors: Aurelian Dodoc, Albrecht Ehrmann, Sascha Bleidistel
  • Diaphragm changing device
    Patent number: 7684125
    Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
    Type: Grant
    Filed: December 18, 2003
    Date of Patent: March 23, 2010
    Assignee: Carl Zeiss SMT AG
    Inventors: Hermann Bieg, Thomas Bischoff, Uy-Liem Nguyen, Stefan Xalter, Marcus Will, Yim-Bum Patrick Kwan, Michael Muehlbeyer
  • Method and a device for positioning an element in an optical system
    Patent number: 7684131
    Abstract: The disclosure generally relates to methods, devices, systems and components configured to position an element in a lens assembly, such as a lens assembly for microlithography, in which the element to be positioned is moved from an actual position to a target position via at least one actuator, and in which at least the positioning movement of the actuator is superimposed with an oscillating movement.
    Type: Grant
    Filed: September 26, 2007
    Date of Patent: March 23, 2010
    Assignee: Carl Zeiss SMT AG
    Inventor: Karl-Eugen Aubele
  • Catoptric objectives and systems using catoptric objectives
    Patent number: 7682031
    Abstract: In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.
    Type: Grant
    Filed: December 22, 2005
    Date of Patent: March 23, 2010
    Assignee: Carl Zeiss SMT AG
    Inventors: Hans-Jurgen Mann, David Shafer, Wilhelm Ulrich
  • Lithographic apparatus and device manufacturing method
    Patent number: 7684013
    Abstract: A lithographic apparatus includes an illumination unit including a radiation source configured to generate a radiation bundle, an illumination optics with a numerical aperture NA0 and an aperture system; a projection lens having a first numerical aperture NAOB1; a support arranged between the illumination unit and the projection lens and configured to support a patterning device; a substrate support configured to support a substrate on which structures on the patterning device are imaged, wherein the first numerical aperture NAOB1 of the projection lens is smaller than the numerical aperture NA0 of the illumination unit.
    Type: Grant
    Filed: May 18, 2006
    Date of Patent: March 23, 2010
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Steven George Hansen, Donis George Flagello, Wolfgang Singer, Bernd Peter Geh, Vladan Blahnik
  • IMAGING DEVICE WITH EXCHANGEABLE DIAPHRAGMS AND METHOD THEREFOR
    Publication number: 20100066990
    Abstract: The disclosure concerns a method for exchangeable introduction and/or exchange of diaphragms in an imaging device, such as an EUV projection exposure system for microlithography or a corresponding imaging device with a housing and at least one diaphragm, which is accommodated exchangeably in the housing and at least one transfer device with at least one receptacle, on or at which the diaphragm can be detachably arranged in order that it may be moved in or out of the objective space. At least one receptacle of the transfer device, on or at which the diaphragm can be detachably arranged, is an element of the diaphragm mount for positioning the diaphragm in the housing.
    Type: Application
    Filed: August 28, 2009
    Publication date: March 18, 2010
    Applicant: CARL ZEISS SMT AG
    Inventors: Hermann Bieg, Yim-Bun Patrick Kwan, Uy-Liem Nguyen
  • OPTICAL ELEMENT FOR RADIATION IN THE EUV AND/OR SOFT X-RAY REGION AND AN OPTICAL SYSTEM WITH AT LEAST ONE OPTICAL ELEMENT
    Publication number: 20100067653
    Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
    Type: Application
    Filed: November 24, 2009
    Publication date: March 18, 2010
    Applicant: Carl Zeiss SMT AG
    Inventors: Marco Wedowski, Markus Weiss, Stephan Mûllender, Johann Trenkler, Hartmut Enkisch, Gisela Sipos, H.A. van Mierlo, Michiel David Nijkerk, Fokko Pieter Wieringa, Nadyeh Shariloo
  • CONNECTING ARRANGEMENT FOR AN OPTICAL DEVICE
    Publication number: 20100065252
    Abstract: The disclosure relates to a connecting arrangement for an optical device, such as in microlithography. The connecting arrangement includes a first body, a second body and a connecting device. The first body contacts the second body in a laminar manner in a contact region. The connecting device is connected to the second body and contacts the first body via at least one contact unit. The connecting device is configured to generate a predefinable contact force in the contact region between the first body and the second body. The contact unit includes a plurality of separate contact elements.
    Type: Application
    Filed: September 17, 2009
    Publication date: March 18, 2010
    Applicant: CARL ZEISS SMT AG
    Inventors: Heiko Methe, Willi Heintel, Sascha Licht
  • METHOD AND DEVICE FOR PRODUCING AN IMAGE OF A THIN LAYER OF AN OBJECT
    Publication number: 20100066823
    Abstract: A method for producing an image of a layer of an object by a wide field optical element on a resolving detector. The object is illuminated in a focused manner on at least one object plane having at least two binary illuminating patterns. The corresponding images are detected. Light and/or the dark areas of the illuminating patterns completely cover the object when the illuminating pattern is superimposed. A layer image determined from the detected images, includes a partial segment that respectively reproduces a partial area of the object that is arranged inside the light area of one of the used illuminating patterns. Edges are arranged at a distance from the edges of the light area about at least one predefined minimum distance.
    Type: Application
    Filed: June 27, 2007
    Publication date: March 18, 2010
    Applicant: CARL ZEISS MEDITEC AG
    Inventors: Peter Westphal, Daniel Bublitz
  • Projection objective of a microlithographic projection exposure apparatus
    Patent number: 7679831
    Abstract: Projection objectives of micro-lithographic projection exposure apparatuses, as well as related methods and components, are disclosed.
    Type: Grant
    Filed: August 15, 2007
    Date of Patent: March 16, 2010
    Assignee: Carl Zeiss SMT AG
    Inventors: Daniel Kraehmer, Johannes Ruoff