Abstract: Solid-state memory having a non-linear current-voltage (I-V) response is provided. By way of example, the solid-state memory can be a selector device. The selector device can be formed in series with a non-volatile memory device via a monolithic fabrication process. Further, the selector device can provide a substantially non-linear I-V response suitable to mitigate leakage current for the non-volatile memory device. In various disclosed embodiments, the series combination of the selector device and the non-volatile memory device can serve as one of a set of memory cells in a 1-transistor, many-resistor resistive memory cell array.

Abstract: A method for facilitating erase or program operations on two-terminal memory devices includes substantially simultaneously initiating erase cycle or program cycle for two-terminal memory devices from a first plurality of two-terminal memory devices, monitoring erase detect or program detect conditions for each of the two-terminal memory devices, and before detecting erase detect or program detect conditions for all of the two-terminal memory devices, the method includes detecting an erase detect or a program detect condition for the first two-terminal memory device from the first plurality of two-terminal memory devices, and initiating an erase cycle or a program for a second two-terminal memory device for a second plurality of two-terminal memory devices, in response to detecting the erase detect or program detect condition for the first two-terminal memory device.

Abstract: Providing for two-terminal memory that mitigates diffusion of external material therein is described herein. In some embodiments, a two-terminal memory cell can comprise an electrode layer. The electrode layer can be at least in part permeable to ionically or chemically reactive material, such as oxygen or the like. The two-terminal memory can further comprise a diffusion mitigation material disposed between the electrode layer and external material. This diffusion mitigation material can be selected to mitigate or prevent diffusion of the undesired element(s) or compound(s), to mitigate or avoid exposure of such element(s) or compound(s) to the electrode layer. Accordingly, degradation of the two-terminal memory as a result of contact with the undesired element(s) or compound(s) can be mitigated by various disclosed embodiments.

Abstract: A two-terminal resistive switching device (TTRSD) such as a non-volatile two-terminal memory device or a volatile two-terminal selector device can be formed according to a manufacturing process. The process can include forming an etch stop layer that is made of aluminum and can include forming a buffer layer below the etch stop layer and/or between the etch stop layer and a top electrode of the TTRSD.

Abstract: A logical NAND memory architecture comprising two-terminal, non-volatile resistive memory is disclosed. By way of example, disclosed logical NAND architectures can comprise non-volatile memory cells having approximately 4 F2 area. This facilitates very high memory densities, even for advanced technology nodes. Further, the disclosed architectures are CMOS compatible, and can be constructed among back-end-of-line (BEOL) metal layers of an integrated chip. In some embodiments, subsets of two-terminal memory cells in a NAND array can be constructed between different pairs of BEOL metal layers. In other embodiments, the two-terminal memory cells can be constructed between a single pair of BEOL metal layers.

Abstract: Providing for a resistive switching memory device is described herein. By way of example, the resistive switching memory device can comprise a bottom electrode, a conductive layer, a resistive switching layer, and a top electrode. Further, two or more layers can be selected to mitigate mechanical stress on the device. In various embodiments, the resistive switching layer and conductive layer can be formed of compatible metal nitride or metal oxide materials having different nitride/oxide concentrations and different electrical resistances. Further, similar materials can mitigate mechanical stress on the resistive switching layer and a conductive filament of the resistive switching memory device.

Abstract: A detection circuit that can detect a two-terminal memory cell changing state. For example, in response to electrical stimuli, a memory cell will change state, e.g., to a defined higher resistance state or a defined lower resistance state. Other, techniques do not detect this state change until after the stimuli is completed and a subsequent sensing operation (e.g., read pulse) is performed. The detection circuit can detect the state change during application of the electrical stimuli that cause the state change and can do so by comparing the magnitudes or values of two particular current parameters.

Abstract: Two-terminal memory devices can be formed in dielectric material that is electrically insulating and operates as a blocking layer to mitigate diffusion of material from a metal layer. A stack of layers of the two-terminal memory device can be covered with a liner layer that can comprise the dielectric material. Thus, in some implementations, the liner layer and the blocking layer can have a similar etch rate.

Abstract: Various embodiments of the present disclosure provide for a memory device having inline processing circuitry. Disclosed memory devices can comprise logic circuits incorporating pattern recognition algorithms, in an embodiment. Comparative analysis functions on sets of data can be implemented with pulldown circuits connected to a common data line. In some embodiments, minimum values, maximum values and the like can be determined among the sets of data in a number of clock cycles comparable to a number of bits in the sets of data.

Abstract: Provided herein is a computing memory architecture. The non-volatile memory architecture can comprise a resistive random access memory array comprising multiple sets of bitlines and multiple wordlines, a first data interface for receiving data from an external device and for outputting data to the external device, and a second data interface for outputting data to the external device. The non-volatile memory architecture can also comprise programmable processing elements connected to respective sets of the multiple sets of bitlines of the resistive random access memory array, and connected to the data interface. The programmable processing elements are configured to receive stored data from the resistive random access memory array via the respective sets of bitlines or to receive external data from the external device via the data interface, and execute a logical or mathematical algorithm on the external data or the stored data and generate processed data.

Abstract: Provision of fabrication, construction, and/or assembly of a two-terminal memory device is described herein. The two-terminal memory device can include an active region with a silicon bearing layer, an interface layer, and an active metal layer. The interface layer can be grown on the silicon bearing layer, and the growth of the interface layer can be regulated with N2O plasma.

Abstract: A non-volatile memory device is provided that uses one or more volatile elements. In some embodiments, the non-volatile memory device can include a resistive two-terminal selector that can be in a low resistive state or a high resistive state depending on the voltage being applied. A MOS (“metal-oxide-semiconductor”) transistor in addition to a capacitor or transistor acting as a capacitor can also be included. A first terminal of the capacitor can be connected to a voltage source, and the second terminal of the capacitor can be connected to the selector device. A floating gate of an NMOS transistor can be connected to the other side of the selector device, and a second NMOS transistor can be connected in series with the first NMOS transistor.

Abstract: Providing for a two-terminal memory cell having intrinsic current limiting characteristic is described herein. By way of example, the two-terminal memory cell can comprise a particle donor layer having a moderate resistivity, comprised of unstable or partially unstable metal compounds. The metal compounds can be selected to release metal atoms in response to an external stimulus (e.g., an electric field, a voltage, a current, heat, etc.) into an electrically-resistive switching medium, which is at least in part permeable to drift or diffusion of the metal atoms. The metal atoms form a thin filament through the switching medium, switching the memory cell to a conductive state. The moderate resistivity of the particle donor layer in conjunction with the thin filament can result in an intrinsic resistance to current through the memory cell at voltages above a restriction voltage, protecting the memory cell from excessive current.

Abstract: Cache memory for resistive switching memory modules is provided herein. The cache memory can reside on a separate DIMM from the resistive switching memory, in some embodiments, or can share a common DIMM with the resistive switching memory. Cache management protocols are provided to service read and write policies for managing interaction of data between the cache memory and the resistive switching memory. In various embodiments, memory controllers are optimized for physical characteristics of resistive switching memory, and cache management protocols can be implemented to take advantage of these characteristics.

Abstract: A configuration bit for a switching block routing array comprising a non-volatile memory cell is provided. By way of example, the configuration bit and switching block routing array can be utilized for a field programmable gate array, or other suitable circuit(s), integrated circuit(s), application specific integrated circuit(s), electronic device or the like. The configuration bit can comprise a switch that selectively connects or disconnects a node of the switching block routing array. A non-volatile memory cell connected to the switch can be utilized to activate or deactivate the switch. In one or more embodiments, the non-volatile memory cell can comprise a volatile resistance switching device connected in serial to a gate node of the switch, configured to trap charge at the gate node to activate the switch, or release the charge at the gate node to deactivate the switch.

Abstract: Two-terminal memory devices can be formed in part within a dielectric material that is electrically insulating and operates as a blocking layer to mitigate diffusion of metal particles employed in integrated circuit fabrication. This dielectric material can be protected from other fabrication processes corrosive to the dielectric material (e.g., CMP, HF clean, etc) by a silicon containing liner. Use of the silicon containing liner can enable a minimum thickness of the dielectric material to be preserved and can facilitate step height differences between adjacent material surfaces that form a two-terminal memory device to be on the order of less than about five angstroms. This small step height difference, particularly when underlying a switching layer of the two-terminal memory device, can yield excellent switching characteristics.

Abstract: Various embodiments disclosed herein provide for a neuromorphic logic system, comprising a bitline and a set of wordlines. The neuromorphic logic system also includes a set of resistive switching memory cells, respectively comprising a two-terminal volatile switching device and a two-terminal non-volatile memory device, at each intersection between the bit line and the set of wordlines, wherein the set of resistive switching memory cells are programmed to a set of resistive states and receive a voltage on the bitline above an activation threshold and wherein the magnitude of the voltage applied to the bitline corresponds to a magnitude of a sensory input, resulting in a current that corresponds to the magnitude of the sensor input and the set of resistive states.

Abstract: Providing for improved manufacturing of silver-based electrodes to facilitate formation of a robust metallic filament for a resistive switching device is disclosed herein. By way of example, a silver electrode can be embedded with a non-silver material to reduce surface energy of silver atoms of a silver-based conductive filament, increasing structural strength of the conductive filament within a resistive switching medium. In other embodiments, an electrode formed of a base material can include silver material to provide mobile particles for an adjacent resistive switching material. The silver material can drift or diffuse into the resistive switching material to form a structurally robust conductive filament therein.

Abstract: Two-terminal memory can be formed into a memory array that contains many discrete memory cells in a physical and a logical arrangement. Where each memory cell is isolated from surrounding circuitry by a single transistor, the resulting array is referred to as a 1T1R memory array. In contrast, where a group of memory cells are isolated from surrounding circuitry by a single transistor, the result is a 1TnR memory array. Because memory cells of a group are not isolated among themselves in the 1TnR case, bit disturb effects are theoretically possible when operating on a single memory cell. Read operations are disclosed for two-terminal memory devices configured to mitigate bit disturb effects, despite a lack of isolation transistors among memory cells of an array. Disclosed operations can facilitate reduced bit disturb effects even for high density two-terminal memory cell arrays.

Abstract: A logical NAND memory architecture comprising two-terminal, non-volatile resistive memory is disclosed. By way of example, disclosed logical NAND architectures can comprise non-volatile memory cells having approximately 4F2 area. This facilitates very high memory densities, even for advanced technology nodes. Further, the disclosed architectures are CMOS compatible, and can be constructed among back-end-of-line (BEOL) metal layers of an integrated chip. In some embodiments, subsets of two-terminal memory cells in a NAND array can be constructed between different pairs of BEOL metal layers. In other embodiments, the two-terminal memory cells can be constructed between a single pair of BEOL metal layers.