Patents Assigned to Dongjin Semichem Co., Ltd.
  • Patent number: 10570311
    Abstract: The present invention relates to a laminate including a coating layer, which includes an Si—O group-containing material and an intermediate interface layer, and to a method for producing the same, and more specifically, to a laminate which includes an intermediate interface layer, which is a mixture of materials constituting a substrate and materials constituting a coating layer, between the substrate and the coating layer, which includes an Si—O group-containing material, and thus can significantly improve bending capabilities, transparency, and adhesion between the substrate and the coating layer, and further enhances scratch resistance, water repellent properties, anti-fouling properties, fingerprint resistance, thermal stability, gloss properties, and surface hardness by a silsesquioxane coating, and a method for producing the laminate.
    Type: Grant
    Filed: August 25, 2016
    Date of Patent: February 25, 2020
    Assignee: DONGJIN SEMICHEM CO., LTD.
    Inventors: Young Min Yoon, Ho Jong Kim, Sung Hyun Lee, Sung Gun Shin
  • Patent number: 10539874
    Abstract: Provided is a composition for forming an organic anti-reflective coating layer used in a negative tone development, which not only enhance an adhesion to a photoresist while having a high refractive index and a high etch rate but also improve a pattern profile of undercut etc. The composition an isocyanurate compound containing at least one moiety which is represented by Formula 2; a polymer represented by Formula 3 and an organic solvent for dissolving the above-mentioned components.
    Type: Grant
    Filed: May 31, 2017
    Date of Patent: January 21, 2020
    Assignee: DONGJIN SEMICHEM CO., LTD.
    Inventors: Hyo Jung Roh, Ji Hyun Kim, Seung Jin Kim, Hyun Jin Kim
  • Patent number: 10410758
    Abstract: The present invention relates to a method for patterning a metal nanowire-based transparent conductive film through surface treatment and, more particularly, to a method wherein the refractive index is adjusted by adding an optical functional layer prior to a patterning process, the surface of a metal nanowire transparent conductive film is oxidized using a surface treatment agent composition or a salt compound is generated, thereby changing the color and insulating the surface, and a film having excellent visibility is patterned.
    Type: Grant
    Filed: December 29, 2014
    Date of Patent: September 10, 2019
    Assignee: DONGJIN SEMICHEM CO., LTD.
    Inventors: Byong Wook Lee, Sung Hyun Lee, Kyung Eun Kim, Myeong Jin Kim, Dong Min Seo, Seong Bae Kim
  • Publication number: 20190245003
    Abstract: A protective film composition includes a polymer having the following formula: each of a, b, and c is a mole fraction; a+b+c=1; 0.05?a/(a+b+c)?0.3; 0.1?b/(a+b+c)?0.6; 0.1?c/(a+b+c)?0.6; each of R1, R2, and R3 is a hydrogen atom or a methyl group; R4 is a hydrogen atom, a butyrolactonyl group, or a substituted or unsubstituted C3 to C30 alicyclic hydrocarbon group; and R5 is a substituted or unsubstituted C6 to C30 linear or cyclic hydrocarbon group. A method of manufacturing a semiconductor package includes forming a sawing protective film on a semiconductor structure by using the protective film composition and sawing the sawing protective film and the semiconductor structure from the sawing protective film.
    Type: Application
    Filed: December 21, 2018
    Publication date: August 8, 2019
    Applicant: DONGJIN SEMICHEM CO., LTD.
    Inventors: Myoung-chul Eum, Hye-kyoung Lee, Chang-kun Kang, Jae-hyun Kim, Kyeong-il Oh, Seung-keun Oh, Chi-hwan Lee
  • Patent number: 10332650
    Abstract: The present invention relates to a carbon-metal composite and a method for preparing carbon-metal composite, and more particularly to a method for preparing carbon-metal composite, which: is capable of reducing graphene oxide; which is capable of decreasing the steps and the time for hybridization of graphene which is obtained from the reduction, graphene or carbon nanotube, with metal; which is done under mild condition and; also which is capable of lowering resistivity of the carbon-metal composite. The method for preparing the carbon-metal composite comprises the steps of: reacting a composition containing a carbon compound selected from a group consisting of graphene, graphene oxide and carbon nanotube, a metallic precursor, a reducing agent and a solvent; and removing solvent partially or wholly from the composition reaction-completed.
    Type: Grant
    Filed: June 24, 2016
    Date of Patent: June 25, 2019
    Assignee: DONGJIN SEMICHEM CO., LTD.
    Inventors: Seon Yeong Gong, Soo Yeon Lee, Hyeonseong Choe, Chongchan Lee
  • Patent number: 10280336
    Abstract: The present invention relates to a coating method for preventing warpage of a substrate, and more specifically, to a coating method for preventing substrate warpage comprising forming two or more coating layers by coating the surface of a substrate with coating compositions having different densities, wherein at least one layer of the two or more coating layers is coated and cured with a coating composition containing a silsesquioxane composite polymer represented by a specific chemical formula, thereby not only preventing substrate warpage but also providing high surface hardness, excellent transparency, scratch resistance, water repellent characteristics, anti-fouling characteristics, anti-fingerprint property, thermal stability and gloss characteristics to the surface of the substrate.
    Type: Grant
    Filed: March 31, 2015
    Date of Patent: May 7, 2019
    Assignee: DONGJIN SEMICHEM CO., LTD.
    Inventors: Kyu Soon Shin, Hee Jung Jung, Seung Sock Choi
  • Publication number: 20180374655
    Abstract: A monolithic-type module of a perovskite solar cell includes: a plurality of unit cells including a substrate, a first electrode layer formed on the substrate and having conductivity, a perovskite optical absorption layer formed on the upper surface of the first electrode layer, and made of a porous metal oxide to which an optical absorber having a perovskite structure is attached, and a hole transport layer formed on the upper surface of the perovskite optical absorption layer; and a second electrode layer formed on the hole transport layer and formed of a conductive material, wherein an interconnection partition electrode of a predetermined height is formed between individual unit cells such that the plurality of unit cells are connected in series by interconnection wiring for electrically connecting the second electrode layer of each unit cell with the first electrode layer of a neighboring unit cell by the interconnection partition electrode.
    Type: Application
    Filed: December 13, 2016
    Publication date: December 27, 2018
    Applicants: Dongjin Semichem Co., Ltd., Dongjin Semichem Co., Ltd.
    Inventor: Young Sam Jin
  • Publication number: 20180331365
    Abstract: Provided herein are high performance direct deposit electrodes that do not require the use of a binder, as well as processes of manufacturing the same by an electrospray process.
    Type: Application
    Filed: November 10, 2016
    Publication date: November 15, 2018
    Applicants: Cornell University, Dongjin Semichem Co., Ltd.
    Inventors: Yong Lak JOO, Ling FEI, Sunchan PARK, Seon Yeong GONG
  • Patent number: 10113079
    Abstract: The present invention relates to a conductive composition, and more particularly, to a conductive copper ink or paste composition for forming fine pattern which comprises a metal precursor and copper powder to increase the density of metal pattern formed during sintering and improve surface roughness, thereby being capable of achieving excellent electrical conductivity, adhesion strength to a substrate, and printability.
    Type: Grant
    Filed: May 21, 2015
    Date of Patent: October 30, 2018
    Assignee: DONGJIN SEMICHEM CO., LTD.
    Inventors: Seung Hyuk Lee, Ju Kyung Han, Young Mo Kim, Hyun Seok Yoo, Kyung Eun Kim
  • Patent number: 10043678
    Abstract: The present invention relates to a slurry composition for reducing scratches generated when polishing the metal film in a manufacturing process of a semiconductor integrated circuit, by lowering frictional force so that a temperature of the composition which may rise during the polishing is lowered, the thermal stability of the slurry is improved and the size increase of particles in the slurry is suppressed, and a method for reducing scratches using the same. The method comprises the steps of applying a slurry composition for polishing a metal film to a substrate on which the metal film is formed, the slurry composition containing an organic solvent including a nitrogen atom and a glycol-based organic solvent; and making a polishing pad to be contacted to the substrate and moving the polishing pad with respect to the substrate, thereby removing at least part of the metal film from the substrate.
    Type: Grant
    Filed: October 21, 2014
    Date of Patent: August 7, 2018
    Assignee: DONGJIN SEMICHEM CO., LTD.
    Inventors: Chang Yong Park, Jong Dai Park, Jong Chul Shin, Jae Hyun Kim, Goo Hwa Lee, Min Sung Park
  • Patent number: 10011739
    Abstract: The present invention relates to a coating composition comprising a bis-type silane compound, and particularly relates to a coating composition which has high storage stability and can form a highly transparent and high-strength coating film, a preparation method thereof and a coating film formed using the same.
    Type: Grant
    Filed: April 1, 2014
    Date of Patent: July 3, 2018
    Assignee: DONGJIN SEMICHEM CO., LTD.
    Inventors: Seung-Sock Choi, Jae-Won Yoo, Doo-Shik Kim, Dong-Jin Nam, Kyung-Min Park, Seong-Yeon Oh
  • Patent number: 9976082
    Abstract: The present invention provides a liquid crystal composition having easily adjustable rotational viscosity while maintaining stability at low temperature, a clearing point and dielectric anisotropy (positive value) in an optimal condition according to an exemplary embodiment of the present invention, including: at least one liquid crystal compound selected from the group consisting of liquid crystal compounds represented by the following Chemical Formula 1, as a first component; at least one liquid crystal compound selected from the group consisting of liquid crystal compounds represented by the following Chemical Formula 2, as a second component; and at least one liquid crystal compound selected from the group consisting of liquid crystal compounds represented by the following Chemical Formula 3, as a third component.
    Type: Grant
    Filed: December 15, 2016
    Date of Patent: May 22, 2018
    Assignee: Dongjin Semichem Co., Ltd.
    Inventors: Bo Ra Hong, Sun-Hee Lee, Mi Kyoung Lee, Bong Hee Kim, Young Kuk Kim
  • Patent number: 9783735
    Abstract: A liquid crystal display device comprises a first substrate, a second substrate which faces the first substrate, an electrode part which is provided on at least one of the first substrate and the second substrate, and a liquid crystal layer which comprises a liquid crystal composition and is provided between the first substrate and the second substrate. The liquid crystal composition includes a liquid crystal compound of Formula 1. wherein R1, R2, A11, A12, A13, A21, A22, Z11, Z12, Z13, Z21, Z22, a, b, c, d, and e are as described herein.
    Type: Grant
    Filed: March 3, 2016
    Date of Patent: October 10, 2017
    Assignees: SAMSUNG DISPLAY CO., LTD., DONGJIN SEMICHEM CO., LTD.
    Inventors: Si Heun Kim, Beom Soo Shin, Keun Chan Oh, Bong Hee Kim, Young Ho Seo
  • Patent number: 9651867
    Abstract: Disclosed are a compound and composition for forming a lower film, which are used in a process for forming a resist pattern by means of the directed self-assembly of a block copolymer (BCP). Also disclosed is a method for forming a lower film using same. The compound for forming a lower film of a resist pattern according to the present invention has the structure of formula 1 of claim 1.
    Type: Grant
    Filed: September 12, 2013
    Date of Patent: May 16, 2017
    Assignee: DONGJIN SEMICHEM CO., LTD.
    Inventors: Su-Young Han, Jung-Youl Lee, Jae-Woo Lee, Jae-Hyun Kim
  • Patent number: 9593241
    Abstract: The present invention relates to a resin composition for encapsulating an optical device and more particularly, the resin composition for encapsulating optical device of the invention comprising a polyhedral oligomeric silsesquioxane (POSS) of which the compatibility with resins is enhanced by its cross-linking ability and an organic polysilazane compound has excellent mechanical properties, and enhanced adhesive strengths to a base material and barrier properties against moisture or oxygen by having excellent solubility with siloxane resins and significantly improved outgassing phenomenon, thus being able to be applied to encapsulation process for various optical devices, especially the encapsulation process of thick films.
    Type: Grant
    Filed: February 24, 2014
    Date of Patent: March 14, 2017
    Assignee: DONGJIN SEMICHEM CO., LTD.
    Inventors: Han Bok Joo, Sun Sik Song, Hyeok Yong Kwon, Eun Ju Park, Jae Hyun Kim, Young Je Kwark, Hee Chun Eun, Hee Eun Im
  • Patent number: 9469763
    Abstract: The present invention relates to a photo-curable organic-inorganic hybrid composition, more particularly to a photo-curable organic-inorganic hybrid resin composition having superior physical properties such as UV resistance, chemical resistance, light transmittance, adhesive property, insulating property, heat resistance, flatness and water resistance and in particular, having excellent heat resistance and adhesive property enabling the composition to endure a thermal deformation caused by a processing temperature change during post-process after a film is cured. Thus, the composition of the invention is suitable for use as an insulating material and an encapsulating material for a protective film of optical devices including display devices and semiconductors.
    Type: Grant
    Filed: January 23, 2014
    Date of Patent: October 18, 2016
    Assignee: DONGJIN SEMICHEM CO., LTD.
    Inventors: Jae-Won Yoo, Dong-Jin Nam, Doo-shick Kim, Kyung-Min Park
  • Patent number: 9460826
    Abstract: The present invention relates to a conductive composition for forming a back electrode of a liquid crystal device, and a formation method of a back electrode using the same. The conductive composition enables the supply of a back electrode having excellent coating uniformity, low surface resistance, high transmittance and surface hardness, and particularly excellent reliability of 500 hours.
    Type: Grant
    Filed: December 3, 2012
    Date of Patent: October 4, 2016
    Assignee: Dongjin Semichem Co., Ltd.
    Inventors: Ja Hun Byeon, Dong Min Kim, Won-Young Lee, Eun Jeagal, Seung-Ki Kim, Woo Sung Hong, Jung Yul Lee, You-Young Kim
  • Patent number: 9423692
    Abstract: Provided are a composition for forming a resist protection film for lithography and a method for forming a pattern of a semiconductor device using the same. The composition comprises a repeat unit having a fluorine-containing functional group on a side chain thereof and contains a polymer having a weight average molecular weight of 2,000-100,000 and a solvent. The solvent containing 10-100 parts by weight of a material has a Hildebrand solubility parameter of 12.5-22.0, based on 100 parts by weight of the total weight thereof.
    Type: Grant
    Filed: September 11, 2015
    Date of Patent: August 23, 2016
    Assignee: Dongjin Semichem Co., Ltd.
    Inventors: Man Ho Han, Jong Kyoung Park, Hyun Jin Kim, Jae Hyun Kim
  • Patent number: 9416296
    Abstract: An under-layer composition of resist having superior thermal stability, etching resistance, gap-filling property and void-preventing property, and a method for forming pattern using the same are disclosed. The under-layer composition of resist comprises: an aromatic ring containing polymer having the repeating unit of the following Formula 1; a compound of the following Formula 4; and an organic solvent. in Formula 1, R1 is a monocyclic or polycyclic aromatic hydrocarbon group having 5 to 20 carbon atoms, R2 and R3 is independently a monocyclic or polycyclic aromatic hydrocarbon group having 4 to 14 carbon atoms, a is an integer of 1 to 3, and b is an integer of 0 to 2. in Formula 4, n is an integer of 1 to 250.
    Type: Grant
    Filed: March 24, 2014
    Date of Patent: August 16, 2016
    Assignee: DONGJIN SEMICHEM CO., LTD.
    Inventors: Jung-Youl Lee, Young Bae Lim, Jong-Won Kim, Jae Woo Lee, Jae Hyun Kim
  • Publication number: 20160053132
    Abstract: An under-layer composition of resist having superior thermal stability, etching resistance, gap-filling property and void-preventing property, and a method for forming pattern using the same are disclosed. The under-layer composition of resist comprises: an aromatic ring containing polymer having the repeating unit of the following Formula 1; a compound of the following Formula 4; and an organic solvent. in Formula 1, R1 is a monocyclic or polycyclic aromatic hydrocarbon group having 5 to 20 carbon atoms, R2 and R3 is independently a monocyclic or polycyclic aromatic hydrocarbon group having 4 to 14 carbon atoms, a is an integer of 1 to 3, and b is an integer of 0 to 2. in Formula 4, n is an integer of 1 to 250.
    Type: Application
    Filed: March 24, 2014
    Publication date: February 25, 2016
    Applicant: DONGJIN SEMICHEM CO., LTD.
    Inventors: Jung-Youl LEE, Young Bae LIM, Jong-Won KIM, Jae Woo LEE, Jae Hyun KIM