Patents Assigned to Ebara Corporation
  • Patent number: 11027395
    Abstract: A polishing unit 3A includes a state acquisition section 846 and a learning section. The state acquisition section can acquire a state variable including at least one of data on a state of a top ring making up the polishing unit and data on a state of a semiconductor wafer. The learning section has learned a relationship between the state variable and a change in film thickness of the semiconductor wafer using a neural network, the learning section being capable of receiving the state variable from the state acquisition section to predict the change and/or receiving the state variable from the state acquisition section to determine that the change is abnormal.
    Type: Grant
    Filed: September 23, 2019
    Date of Patent: June 8, 2021
    Assignee: Ebara Corporation
    Inventor: Yuta Suzuki
  • Patent number: 11024520
    Abstract: The substrate processing apparatus includes a processing chamber including an outer chamber configured to hold a processing liquid and an inner chamber capable of surrounding the substrate held by the substrate holder; a liquid delivery pipe having one end coupled to a bottom of the inner chamber and other end coupled to the outer chamber; a pump configured to suck the processing liquid from the inner chamber through the liquid delivery pipe and to deliver the processing liquid to the outer chamber through the liquid delivery pipe; and a guide cover having a through-hole in which the substrate holder can be inserted. The guide cover is located below an upper end of the outer chamber and above the inner chamber.
    Type: Grant
    Filed: September 30, 2019
    Date of Patent: June 1, 2021
    Assignee: EBARA CORPORATION
    Inventors: Keiichi Kurashina, Toshio Yokoyama
  • Patent number: 11015261
    Abstract: To provide a substrate holder and a plating apparatus that can easily position a substrate. A substrate holder includes a substrate holding body for holding a substrate, and a first holding member and a second holding member that interpose and hold the substrate holding body therebetween, and the first holding member includes an opening portion through which the plating target surface of the substrate is exposed, and a power supply member configured to be in contact with a plating target surface of the substrate.
    Type: Grant
    Filed: March 7, 2017
    Date of Patent: May 25, 2021
    Assignee: EBARA CORPORATION
    Inventors: Yoshitaka Mukaiyama, Toshio Yokoyama, Junitsu Yamakawa, Takuya Tsushima, Tomonori Hirao, Sho Tamura, Hirotaka Ohashi
  • Publication number: 20210148630
    Abstract: A temperature control system is used for controlling a temperature of a control target to a target temperature that changes with lapse of time. The system includes: a first adjustment apparatus that includes a first tank that stores a first heat transfer medium, adjusts the temperature of the first heat transfer medium to a first set temperature, and supplies the temperature-adjusted first heat transfer medium; a first circulation circuit through which the first heat transfer medium flows from the first adjustment apparatus to a first flow-through path and returns to the first adjustment apparatus; an adjustment section that adjusts an amount of heat supplied from the first flow-through path to the control target; a memory that stores a relation between the lapse of time and the target temperature; and a controller.
    Type: Application
    Filed: November 20, 2020
    Publication date: May 20, 2021
    Applicants: CKD CORPORATION, EBARA CORPORATION, EBARA REFRIGERATION EQUIPMENT & SYSTEMS CO., LTD.
    Inventors: Akihiro Ito, Norio Kokubo, Masayuki Kouketsu, Isahiro Hasegawa, Toshiharu Nakazawa, Keisuke Takanashi, Yukihiro Fukusumi
  • Publication number: 20210148621
    Abstract: A cooling system includes: a first cooling apparatus electrically driven to supply a first heat transfer medium cooled to a first set temperature or lower; a plurality of second cooling apparatuses each of which includes a heat exchanger that exchanges heat between the first heat transfer medium supplied from the first cooling apparatus and a second heat transfer medium, and is electrically driven to supply a third heat transfer medium cooled to a second set temperature or lower, the second set temperature being changed individually with lapse of time; and a processor that obtains second set temperatures of the second cooling apparatuses and sets the first set temperature based on the obtained second set temperatures.
    Type: Application
    Filed: November 20, 2020
    Publication date: May 20, 2021
    Applicants: CKD CORPORATION, EBARA CORPORATION, EBARA REFRIGERATION EQUIPMENT & SYSTEMS CO., LTD.
    Inventors: Akihiro Ito, Norio Kokubo, Masayuki Kouketsu, Isahiro Hasegawa, Toshiharu Nakazawa, Keisuke Takanashi, Yukihiro Fukusumi
  • Patent number: 11007621
    Abstract: Provided is a polishing apparatus and polishing method which can preferably adjust a temperature of a surface of a polishing pad. A polishing apparatus includes: a polishing table configured to be rotatable, and to support the polishing pad; a substrate configured to hold an object to be polished, and to press the object to be polished against the polishing pad; a polishing liquid supplying portion configured to supply a polishing liquid to a polishing surface; a polishing liquid removing portion configured to remove the polishing liquid from the polishing surface; and a temperature adjuster configured to adjust a temperature of the polishing surface. In a rotating direction of the polishing table, the polishing liquid supplying portion, a polishing region where the object to be polished is pressed against the polishing surface by the substrate, the polishing liquid removing portion, and the temperature adjuster are disposed in this order.
    Type: Grant
    Filed: April 10, 2018
    Date of Patent: May 18, 2021
    Assignee: EBARA CORPORATION
    Inventors: Hiroshi Sotozaki, Tadakazu Sone
  • Patent number: 11008668
    Abstract: There is provided an inspection method of a substrate holder for holding a substrate. This inspection method has a step of providing the substrate holder comprising a first member and a second member between which a substrate is held, an electric contact, and a seal member, the first member having a surface region where intrusion of the liquid is prevented by the seal member, the second member having the seal member, a step of holding the second member by a holding portion of a substrate holder opening/closing unit, and detaching the second member from the first member, and a detection step of detecting that the liquid adheres to the surface region of the first member, by a detector located above the first member and the second member.
    Type: Grant
    Filed: April 23, 2019
    Date of Patent: May 18, 2021
    Assignee: EBARA CORPORATION
    Inventor: Masaki Tomita
  • Patent number: 11011342
    Abstract: In a first cross section along an electron ray that passes between an inner curved surface and an outer curved surface of a beam bender, the curvature of the surfaces are fixed, and the center of the curvature of the surfaces are set so as to match each other. In a second cross section perpendicular to the electron ray, the curvature of the surfaces are fixed, and the center of curvature of the surfaces are set so as to match each other. The radius of the curvature of the surface in the second cross section is set to be larger than that of the surface in the first cross section. The radius of curvature of the surface in the second cross section is set to be larger than that of the surface in the first cross section.
    Type: Grant
    Filed: June 10, 2019
    Date of Patent: May 18, 2021
    Assignee: EBARA CORPORATION
    Inventor: Takeshi Murakami
  • Publication number: 20210138281
    Abstract: The present invention relates to a fire fighting system for transporting a nozzle of a fire hose coupled to a drone to a high place. The fire fighting system includes a fire hose (10) having a fire hose (10) having a nozzle (11) for injecting a fire extinguishing liquid; a fire-extinguishing-liquid supply source (2) which is coupled to the fire hose (10), and supplies the fire extinguishing liquid to the fire hose (10); a top drone (1) coupled to the nozzle (11); a wired cable (4) coupled to the top drone (1); and a power supply unit (3) which supplies power or fuel for flying the top drone (1) through the wired cable (4).
    Type: Application
    Filed: April 19, 2019
    Publication date: May 13, 2021
    Applicant: Ebara Corporation
    Inventors: Motohiko NOHMI, Yumiko SEKINO
  • Publication number: 20210140719
    Abstract: A temperature control system is used for controlling a temperature of a control target. The system includes: a first circulation circuit through which a first heat transfer medium circulates; a second circulation circuit that is independent of the first circulation circuit and through which a second heat transfer medium circulates; and a third circulation circuit that is independent of the first circulation circuit and the second circulation circuit and through which a third heat transfer medium circulates. The third heat transfer medium has a usable temperature range wider than usable temperature ranges of the first heat transfer medium and the second heat transfer medium.
    Type: Application
    Filed: November 9, 2020
    Publication date: May 13, 2021
    Applicants: CKD CORPORATION, EBARA CORPORATION, EBARA REFRIGERATION EQUIPMENT & SYSTEMS CO., LTD.
    Inventors: Akihiro Ito, Norio Kokubo, Masayuki Kouketsu, Isahiro Hasegawa, Toshiharu Nakazawa, Keisuke Takanashi, Yukihiro Fukusumi
  • Publication number: 20210140688
    Abstract: A temperature control system is used for controlling a temperature of a control target. The system includes: a first circulation circuit through which a first heat transfer medium circulates; a second circulation circuit that is independent of the first circulation circuit and through which a second heat transfer medium circulates; and a third circulation circuit that is independent of the first circulation circuit and the second circulation circuit and through which a third heat transfer medium circulates. The third heat transfer medium has a usable temperature range wider than usable temperature ranges of the first heat transfer medium and the second heat transfer medium.
    Type: Application
    Filed: November 9, 2020
    Publication date: May 13, 2021
    Applicants: CKD CORPORATION, EBARA CORPORATION, EBARA REFRIGERATION EQUIPMENT & SYSTEMS CO., LTD.
    Inventors: Akihiro Ito, Norio Kokubo, Masayuki Kouketsu, Isahiro Hasegawa, Toshiharu Nakazawa, Keisuke Takanashi, Yukihiro Fukusumi
  • Patent number: 11004701
    Abstract: A break-in apparatus 100 has a supply unit 20 for supplying a cleaning liquid, a substrate support unit 30 for holding a dummy substrate W1 and a cleaning member holding unit 40 for performing a break-in processing on the cleaning member 200 by rotating the cleaning member 200 and bringing the cleaning member 200 into contact with the dummy substrate W1.
    Type: Grant
    Filed: September 14, 2018
    Date of Patent: May 11, 2021
    Assignee: EBARA CORPORATION
    Inventor: Shuichi Suemasa
  • Publication number: 20210129194
    Abstract: Providing a substrate cleaning device and a substrate cleaning method having high detergency. Provided is a substrate cleaning device including: a substrate rotating mechanism that rotates a substrate; and a first nozzle and a second nozzle that eject an ultrasonic cleaning solution toward a predetermined surface of the substrate that is rotated, wherein the first nozzle and the second nozzle are held in one casing.
    Type: Application
    Filed: February 15, 2019
    Publication date: May 6, 2021
    Applicant: Ebara Corporation
    Inventor: Tomoatsu ISHIBASHI
  • Patent number: 10995765
    Abstract: A magnetic levitated pump that does not cause pulsation of a pumped liquid and can suppress the generation of particles, which are liable to be produced by contact of a sliding part, is disclosed. The magnetic levitated pump for magnetically levitating an impeller housed in a pump casing includes a motor configured to rotate the impeller, and an electromagnet configured to magnetically support the impeller. The motor and the electromagnet are arranged so as to face each other across the impeller, and the motor is arranged on the opposite side of a suction port of the pump casing.
    Type: Grant
    Filed: October 30, 2015
    Date of Patent: May 4, 2021
    Assignee: EBARA CORPORATION
    Inventors: Ichiju Sato, Hiroshi Sobukawa, Toshimitsu Barada, Tomonori Ohashi, Satoshi Mori
  • Patent number: 10991615
    Abstract: To detach a substrate from a table without damaging the substrate. According to Embodiment 1, provided is a substrate processing apparatus including a table to hold a substrate, a plurality of lift pins that are arranged at periphery of the table and configured to arrange or separate the substrate on or from the table and to be movable in a direction perpendicular to a surface of the table, a drive mechanism that includes a motor to move the lift pins in the direction perpendicular to the surface of the table, and a control device that is configured to control the drive mechanism. The control device is configured to be capable of moving the lift pins at a first speed and at a second speed different from the first speed.
    Type: Grant
    Filed: August 14, 2018
    Date of Patent: April 27, 2021
    Assignee: EBARA CORPORATION
    Inventors: Haiyang Xu, Koji Maeda, Mitsuhiko Inaba
  • Patent number: 10991602
    Abstract: A substrate washing device includes a substrate holding mechanism 70 that holds a substrate W, a substrate rotating mechanism 72 that rotates the substrate W held by the substrate holding mechanism 70, and a two-fluid nozzle 46 that ejects a two-fluid jet toward a surface of the rotating substrate W. The two-fluid nozzle 46 is formed of a conductive material. Accordingly, the electrification amount of droplets ejected as the two-fluid jet from the two-fluid nozzle 46 can be suppressed.
    Type: Grant
    Filed: May 8, 2017
    Date of Patent: April 27, 2021
    Assignee: EBARA CORPORATION
    Inventors: Koichi Fukaya, Tomoatsu Ishibashi, Hisajiro Nakano
  • Patent number: 10991613
    Abstract: A substrate holding apparatus is provided, which includes a top ring main body to which an elastic film having a surface that can suck a substrate can be attached, a first line communicating with a first area of the plurality of areas, a second line communicating with a second area different from the first area of the plurality of areas, a pressure adjuster that can pressurize the first area by feeding fluid into the first area through the first line and can generate negative pressure in the second area through the second line, and a determiner that performs determination of whether or not the substrate is sucked to the elastic film based on a volume of the fluid fed into the first area or a measurement value corresponding to pressure in the first area.
    Type: Grant
    Filed: August 6, 2019
    Date of Patent: April 27, 2021
    Assignee: EBARA CORPORATION
    Inventors: Osamu Nabeya, Satoru Yamaki, Makoto Fukushima
  • Patent number: 10987776
    Abstract: A method, which can accurately determine in a short time a relationship between a load of a dresser and a pressure of a gas supplied to an air cylinder, is disclosed. The method includes determining a first contact point where a load measurement device is brought into contact with a polishing table, calculating a relational expression composed to a quadratic function showing a relationship between a measured load and a measured pressure, determining a second contact point where the dresser is brought into contact with a polishing surface of a polishing pad, calculating an amount of correction from the pressure of the gas at the first contact point and the pressure of the gas at the second contact point, and correcting the relational expression based on the calculated amount of correction.
    Type: Grant
    Filed: May 25, 2018
    Date of Patent: April 27, 2021
    Assignee: EBARA CORPORATION
    Inventors: Pohan Chen, Tadakazu Sone, Kenichi Suzuki, Hiroshi Sotozaki
  • Patent number: 10991605
    Abstract: A substrate processing device for processing a substrate, comprising an image sensor configured to detect positions of two corners on at least one diagonal of a substrate when the substrate is transferred to a predetermined position; an illuminating device that can be disposed so as to illuminate the two corners of the substrate on an opposite side of the substrate at the predetermined position relative to the image sensor; and a control device configured to determine the position of the substrate on the basis of the positions of the two corners, which are detected by the image sensor, the control device being configured to be capable of changing at least either light quantity or wavelength of output light of the illuminating device.
    Type: Grant
    Filed: December 12, 2018
    Date of Patent: April 27, 2021
    Assignee: EBARA CORPORATION
    Inventors: Junitsu Yamakawa, Takuya Tsushima
  • Patent number: D918161
    Type: Grant
    Filed: June 18, 2018
    Date of Patent: May 4, 2021
    Assignee: EBARA CORPORATION
    Inventors: Shingo Togashi, Makoto Fukushima, Keisuke Namiki, Osamu Nabeya, Satoru Yamaki, Tomoko Owada, Yoshikazu Kato