Patents Assigned to Electronic Materials LLC
  • Patent number: 12228859
    Abstract: Methods of forming an electronic device, comprise: (a) providing a semiconductor substrate comprising one or more layers to be patterned; (b) forming a photoresist layer over the one or more layers to be patterned, wherein the photoresist layer is formed from a composition that comprises: a matrix polymer comprising a unit having an acid labile group; a photoacid generator; and an organic solvent; (c) coating a photoresist overcoat composition over the photoresist layer, wherein the overcoat composition comprises: a matrix polymer; an additive polymer; a basic quencher; and an organic solvent; wherein the additive polymer has a lower surface energy than a surface energy of the matrix polymer, and wherein the additive polymer is present in the overcoat composition in an amount of from 1 to 20 wt % based on total solids of the overcoat composition; (d) exposing the photoresist layer to activating radiation; (e) heating the substrate in a post-exposure bake process; and (f) developing the exposed film with an or
    Type: Grant
    Filed: December 19, 2018
    Date of Patent: February 18, 2025
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Choong-Bong Lee, Stefan J. Caporale, Jason A. DeSisto, Jong Keun Park, Cong Liu, Cheng-Bai Xu, Cecily Andes
  • Patent number: 12140866
    Abstract: Photoacid generators comprising a moiety of formula (1): wherein: Ar1 is a substituted or unsubstituted aryl group; R1 is an alkyl or aryl group, each of which may be substituted or unsubstituted, wherein Ar1 and R1 are optionally connected together by a single bond or a divalent linking group to form a ring; Y is a single bond or a divalent group; and * is the point of attachment of the moiety to another atom of the photoacid generator. The photoacid generator compounds find particular use in photoresist compositions that can be used to form lithographic patterns for the formation of electronic devices.
    Type: Grant
    Filed: November 10, 2021
    Date of Patent: November 12, 2024
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Emad Aqad
  • Patent number: 12099300
    Abstract: Compounds having three or more alkynyl moieties substituted with an aromatic moiety having one or more of certain substituents are useful in forming underlayers useful in semiconductor manufacturing processes.
    Type: Grant
    Filed: October 10, 2019
    Date of Patent: September 24, 2024
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Sheng Liu, James F. Cameron, Shintaro Yamada, Iou-Sheng Ke, Keren Zhang, Daniel Greene, Paul J. LaBeaume, Li Cui, Suzanne M. Coley
  • Patent number: 11940731
    Abstract: Photoresist topcoat compositions comprise: a matrix polymer and a surface active polymer, wherein the surface active polymer comprises polymerized units of the following general formula (I): wherein: R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group, or a C1-C4 haloalkyl group; R2 independently represents a hydrogen atom or an optionally substituted alkyl group, wherein at least one R2 is not a hydrogen atom, wherein the R2 groups taken together optionally form a cyclic structure, and wherein the total number of carbon atoms for the R2 groups taken together is from 2 to 20; R3 represents an optionally substituted C1-C4 alkylene group, wherein an R2 group optionally forms a cyclic structure with R3; and R4 independently represents C1-C4 fluoroalkyl groups; wherein the total polymerized units of general formula (I) are present in the surface active polymer in an amount of 95 wt % or more based on total polymerized units of the surface active polymer; and wherein the surface active polymer i
    Type: Grant
    Filed: June 24, 2019
    Date of Patent: March 26, 2024
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Irvinder Kaur, Cong Liu, Doris Kang, Chunyi Wu
  • Patent number: 11940732
    Abstract: Coating compositions comprise: a curable compound comprising: a core chosen from a C6 carbocyclic aromatic ring, a C2-5 heterocyclic aromatic ring, a C9-30 fused carbocyclic aromatic ring system, a C4-30 fused heterocyclic aromatic ring system, C1-20 aliphatic, and C3-20 cycloaliphatic, and three or more substituents of formula (1) wherein at least two substituents of formula (1) are attached to the aromatic core; provided that no substituents of formula (1) are in an ortho position to each other on the same aromatic ring of the core; a polymer; and one or more solvents, wherein the total solvent content is from 50 to 99 wt % based on the coating composition.
    Type: Grant
    Filed: April 15, 2021
    Date of Patent: March 26, 2024
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Sheng Liu, James F. Cameron, Shintaro Yamada, Iou-Sheng Ke, Keren Zhang, Suzanne M. Coley, Li Cui, Paul J. LaBeaume, Deyan Wang
  • Patent number: 11920023
    Abstract: There is provided a dielectric composite material comprising (a) 20-50 weight % total solids of at least one thermosetting resin and other resin components; and (b) 50-70 weight % total solids of at least one inorganic particulate filler; where the at least one inorganic particulate filler is surface modified with one or more acrylic-based silane coupling agents.
    Type: Grant
    Filed: April 28, 2022
    Date of Patent: March 5, 2024
    Assignee: Rohm and Haas Electronic Materials LLC.
    Inventors: Colin Hayes, Colin Calabrese, Christine Hatter
  • Patent number: 11906493
    Abstract: Gas sensors are provided. The gas sensors comprise: a substrate; a plurality of electrodes on the substrate; and a polymeric sensing layer on the substrate for adsorbing a gas-phase analyte. The adsorption of the analyte is effective to change a property of the gas sensor that results in a change in an output signal from the gas sensor. The polymeric sensing layer comprises a polymer chosen from substituted or unsubstituted polyarylenes comprising the reaction product of monomers comprising a first monomer comprising an aromatic acetylene group and a second monomer comprising two or more cyclopentadienone groups, or a cured product of the reaction product. The gas sensors and methods of using such sensors find particular applicability in the sensing of gas-phase organic analytes.
    Type: Grant
    Filed: June 23, 2020
    Date of Patent: February 20, 2024
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Catherine Mulzer, Christopher D. Gilmore, Hee Jae Yoon, Jaclyn Murphy, Brian Litchfield
  • Patent number: 11781016
    Abstract: A UV curable silicone composition has exceptional curability by ultraviolet irradiation.
    Type: Grant
    Filed: February 12, 2021
    Date of Patent: October 10, 2023
    Assignees: DuPont Toray Specialty Materials Kabushiki Kaisha, Rohm and Haas Electronic Materials LLC, Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Shunya Takeuchi, Anna Ya Ching Feng, Yutaka Oka, Jung Hye Chae
  • Patent number: 11732374
    Abstract: Reaction products of amines and polymers containing saturated heterocyclic moieties may be used as levelers in metal electroplating baths. The reaction products may plate metal with good surface properties and good physical reliability.
    Type: Grant
    Filed: January 17, 2020
    Date of Patent: August 22, 2023
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Lingli Duan, Chen Chen, Tong Sun, Zukhra I. Niazimbetova, Maria Anna Rzeznik
  • Patent number: 11733609
    Abstract: Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising a condensate and/or hydrolyzate of a polymer comprising as polymerized units one or more first unsaturated monomers having a condensable silicon-containing moiety, wherein the condensable silicon-containing moiety is pendent to the polymer backbone, and one or more condensable silicon monomers are provided.
    Type: Grant
    Filed: July 8, 2021
    Date of Patent: August 22, 2023
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Charlotte A. Cutler, Li Cui, Shintaro Yamada, Paul J. LaBeaume, Suzanne M. Coley, James F. Cameron, Daniel Greene
  • Patent number: 11670741
    Abstract: Disclosed is a method of making an optoelectronic device that incorporates a crosslinked resin-linear polyorganosiloxane.
    Type: Grant
    Filed: July 13, 2018
    Date of Patent: June 6, 2023
    Assignees: Rohm and Haas Electronic Materials LLC, DuPont Toray Specialty Materials Kabushiki Kaisha, DDP Specialty Electronic Materials US 9, LLC
    Inventors: Masaaki Amako, Anna Ya Ching Feng, Fumito Nishida
  • Patent number: 11506979
    Abstract: Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising a condensate and/or hydrolyzate of a polymer comprising as polymerized units one or more first unsaturated monomers having a condensable silicon-containing moiety, wherein the condensable silicon-containing moiety is pendent to the polymer backbone, and one or more condensable silicon monomers are provided.
    Type: Grant
    Filed: December 7, 2017
    Date of Patent: November 22, 2022
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Li Cui, Paul J. LaBeaume, Charlotte A. Cutler, Suzanne M. Coley, Shintaro Yamada, James F. Cameron, William Williams
  • Patent number: 11367835
    Abstract: The present invention provides a quantum dot light emitting diode comprising i) an emitting layer of at least one semiconductor nanoparticle made from semiconductor materials selected from the group consisting of Group II-VI compounds, Group II-V compounds, Group III-VI compounds, Group III-V compounds, Group IV-VI compounds, Group I-III-VI compounds, Group II-IV-VI compounds, Group II-IV-V compounds, or any combination thereof; and ii) a polymer for hole injection or hole transport layer, comprising one or more triaryl aminium radical cations having the structure (S1).
    Type: Grant
    Filed: June 26, 2017
    Date of Patent: June 21, 2022
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
    Inventors: Anatoliy N. Sokolov, Brian Goodfellow, Robert David Grigg, Liam P. Spencer, John W. Kramer, David D. Devore, Sukrit Mukhopadhyay, Peter Trefonas, III
  • Patent number: 11360387
    Abstract: Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising one or more condensed polymers having an organic polymer chain having pendently-bound moieties having an acidic proton and a pKa in water from ?5 to 13 and having pendently-bound siloxane moieties are provided.
    Type: Grant
    Filed: June 29, 2018
    Date of Patent: June 14, 2022
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Li Cui, Paul J. LaBeaume, James F. Cameron, Charlotte A. Cutler, Shintaro Yamada, Suzanne M. Coley, Iou-Sheng Ke
  • Patent number: 11121190
    Abstract: Provided is an optoelectronic device comprising an optoelectronic element and circuitry connected to the optoelectronic element, wherein the optoelectronic element comprises plural quantum dots or plural nanorods, and wherein the circuitry is configured to be capable of switching the optoelectronic element between a configuration in which the circuitry provides an effective forward bias voltage that causes the optoelectronic element to emit light and a configuration in which the circuitry provides an effective reverse bias voltage that causes the optoelectronic element to be capable of generating a photocurrent when light to which the optoelectronic element is sensitive strikes the optoelectronic element.
    Type: Grant
    Filed: March 23, 2017
    Date of Patent: September 14, 2021
    Assignees: Dow Global Technologies LLC, Rohm and Haas Company, The Board of Trustees of the University of Illinois, Rohm and Haas Electronic Materials LLC
    Inventors: Peter Trefonas, III, Kishori Deshpande, Trevor Ewers, Edward Greer, Jaebum Joo, Bong Hoon Kim, Nuri Oh, Jong Keun Park, Moonsub Shim, Jieqian Zhang
  • Patent number: 11114617
    Abstract: Provided is a composition comprising a compound having structure (I) wherein each of A1, A2, A3, A4, A5, A6, A7, and A8 is independently CR12 or N; wherein one to four of A1, A2, A3, A4, A5, A6, A7, and A8 are N; wherein J1 is C or Si; wherein J2 is C(R13)n, O, (C(R13)n)2, S, NR13, or Se; wherein n is 1 or 2; wherein each of R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, R12, and R13 is independently H, deuterium, or an organic group. Also provided is a method of making the composition, a method of making an organic light-emitting diode using the composition, and an organic light-emitting diode made by that method.
    Type: Grant
    Filed: August 11, 2017
    Date of Patent: September 7, 2021
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Laura Havens, Sukrit Mukhopadhyay, David S. Laitar, David D. Devore, Aaron A. Rachford, Erich J. Molitor
  • Patent number: 11106137
    Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that comprise one or more base reactive groups and (i) one or more polar groups distinct from the base reactive groups, and/or (ii) at least one of the base reactive groups is a non-perfluorinated base reactive group. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
    Type: Grant
    Filed: November 15, 2011
    Date of Patent: August 31, 2021
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Deyan Wang, Cong Liu, Mingqi Li, Joon Seok Oh, Cheng-Bai Xu, Doris H. Kang, Clark H. Cummins, Matthias S. Ober
  • Patent number: 11084914
    Abstract: Display substrates having a hard coat layer on a colorless polyimide substrate are formed from hard coat compositions having certain organic solvents that do not substantially impact the optical and mechanical properties of the colorless polyimide substrate.
    Type: Grant
    Filed: December 4, 2018
    Date of Patent: August 10, 2021
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Michael Mulzer, Jieqian Zhang, Joseph Kao
  • Patent number: 11042093
    Abstract: A method of manufacturing a semiconductor device comprising: providing a semiconductor device substrate having a relief image on a surface of the substrate, the relief image having a plurality of gaps to be filled; applying a coating composition to the relief image to provide a coating layer, wherein the coating composition comprises (i) a polyarylene oligomer comprising as polymerized units one or more first monomers having two or more cyclopentadienone moieties and one or more second monomers having an aromatic moiety and two or more alkynyl moieties; wherein the polyarylene oligomer has a Mw of 1000 to 6000 Da, a PDI of 1 to 2, and a molar ratio of total first monomers to total second monomers of 1:>1; and (ii) one or more organic solvents; curing the coating layer to form a polyarylene film; patterning the polyarylene film; and transferring the pattern to the semiconductor device substrate.
    Type: Grant
    Filed: October 23, 2018
    Date of Patent: June 22, 2021
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James F. Cameron, Keren Zhang, Li Cui, Daniel Greene, Shintaro Yamada
  • Patent number: 11003074
    Abstract: A pattern formation method, comprising: (a) providing a semiconductor substrate; (b) forming a photoresist pattern over the semiconductor substrate, wherein the photoresist pattern is formed from a photoresist composition comprising: a first polymer comprising acid labile groups; and a photoacid generator; (c) coating a pattern overcoat composition over the photoresist pattern, wherein the pattern overcoat composition comprises a second polymer and an organic solvent, wherein the organic solvent comprises one or more ester solvents, wherein the ester solvent is of the formula R1—C(O)O—R2, wherein R1 is a C3-C6 alkyl group and R2 is a C5-C10 alkyl group; (d) baking the coated photoresist pattern; and (e) rinsing the coated photoresist pattern with a rinsing agent to remove the second polymer. The methods find particular applicability in the manufacture of semiconductor devices.
    Type: Grant
    Filed: April 24, 2018
    Date of Patent: May 11, 2021
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Xisen Hou, Cong Liu, Irvinder Kaur