Abstract: Provided are certain liquid silicon precursors useful for the deposition of silicon-containing films, such as films comprising silicon, silicon nitride, silicon oxynitride, silicon dioxide, silicon carbide, carbon-doped silicon nitride, or carbon-doped silicon oxynitride. Also provided are methods for forming such films utilizing vapor deposition techniques.
Type:
Grant
Filed:
March 26, 2021
Date of Patent:
August 27, 2024
Assignee:
ENTEGRIS, INC.
Inventors:
SangJin Lee, DaHye Kim, Sungsil Cho, Seobong Chang, Jae Eon Park, Bryan C. Hendrix, Thomas H. Baum, SooJin Lee
Abstract: Provided are certain activated carbonaceous materials which have been treated with dilute mineral acids to modify their surface chemistry and morphology. The modified activated carbonaceous materials of the disclosure are useful in removing certain contaminants from gaseous streams. In one embodiment, the contaminants are compounds containing silicon and oxygen moieties, such as alkyl silanols and alkyl siloxanes. The modified activated carbonaceous materials can be incorporated into filters and filter systems.
Type:
Grant
Filed:
November 10, 2021
Date of Patent:
August 27, 2024
Assignee:
ENTEGRIS, INC.
Inventors:
Reena Srivastava, Baoquan Xie, Frank V. Belanger, Rocky D. Gipson
Abstract: Provided are compositions and methods for selectively etching hard mask layers and/or photoresist etch residues relative to low-k dielectric layers that are present. More specifically, the present invention relates to a composition and process for selectively etching titanium nitride and/or photoresist etch residues relative to low-k dielectric layers. Other materials that may be present on the microelectronic device should not be substantially removed or corroded by said compositions.
Abstract: A gas sampling trap includes a first stage and a second stage. The first stage includes a metal salt that reacts with sulfurous species to produce acidic gas. The second stage configured to receive the acidic gas produced in the first stage. An adsorbent substrate in the second stage adsorbs the acidic gas. A method of sampling a gas includes directing gas onto a metal stage within a first stage to produce acidic gas, directing the acidic gas into the second stage, and adsorbing the acidic gas in the second stage with an adsorbent substrate. A method of detecting a concentration of sulfurous species in a gas includes sampling the gas with a sampling trap, desorbing adsorbed acidic gas from an adsorbent substrate of the sampling trap with a solvent, and testing the solvent with ion chromatography.
Abstract: This disclosure provides operative components that mitigate electrostatic charge in fluid circuits. Illustrative embodiments include diaphragm valves that provide fluid control and allow static charge to dissipate when these diaphragm valves are grounded.
Abstract: Gaskets for wafer containers include a seal body and a retention projection. The retention projection includes a retention segment extending from the seal body, a compression relief segment extending from the retention segment, and a bead disposed at an end of the compression relief segment. The compression relief segment has a cross-sectional width less than a cross-sectional width of the retention segment. The bead has a shape including portion having a width greater than a cross-sectional width of the gland at a corresponding depth in the gland. The gasket can be provided in a wafer container or a door of the wafer container.
Type:
Grant
Filed:
June 13, 2022
Date of Patent:
August 20, 2024
Assignee:
ENTEGRIS, INC.
Inventors:
Aaron Vestal, Matthew A. Fuller, Christopher Strickhouser
Abstract: The disclosure is directed to removal of metal contaminants from fluids, as well as ligand-modified filter materials useful for carrying out such methods. The filters and methods of this disclosure are particularly effective for removal of metals from liquid compositions comprising amines. Such liquid compositions with significantly reduced amounts of metals can be used in a microelectronic manufacturing process, such as liquids for removing photoresist or liquids used in etching. The ligand-modified filters, such as ligand-modified porous membranes, can be configured for use in a microelectronic manufacturing system, which can be utilized in the system as a point of use metal-removal feature for liquids entering the system.
Type:
Grant
Filed:
September 29, 2021
Date of Patent:
August 13, 2024
Assignee:
ENTEGRIS, INC.
Inventors:
James Hamzik, Justin Brewster, Siddarth Sampath, Jad Ali Jaber, Aabid A. Mir
Abstract: A reticle pod includes an outer pod, an inner pod cover and an inner base plate. A reticle is supported on the base and is contained within the environment created by the inner pod cover and the inner pod base. The inner pod cover can include a plurality of reticle retainers configured to contact a side wall of the reticle and limit movement of the reticle in a horizontal direction.
Type:
Grant
Filed:
February 8, 2023
Date of Patent:
August 13, 2024
Assignee:
ENTEGRIS, INC.
Inventors:
Russ V. Raschke, Shawn D. Eggum, Barry Lee Gregerson
Abstract: Spacers for filtration membranes that are formed from perforated films. The spacer include unperforated regions, which can serve as integrated lamination strips, advantageously omitting the need for separate lamination steps required with woven and nonwoven spacer fabrics while also providing a spacer with a uniform thickness.
Abstract: Vaporizer vessels include one or more reagent support panels, serving as dividers of interior space of the vessel, in a vertical orientation such as when filling the vaporizer vessels, and when rotated into a horizontal orientation, the panels support the vaporizable solid materials placed in one or more chambers formed by the panels and interior walls of the vessels and enable transfer of heat to those solid materials. The chambers are such that any or all chambers filled with the vaporizable solid materials provide a void space to allow the solid materials to vaporize and for gas to move through the vaporizer vessels when heated, to allow effective vaporization of the solid materials and further allow the vapor resulting from the solid materials to move to an outlet of the vessels where it can be provided as part of a process.
Abstract: Provided is a method for forming a silicon oxycarbonitride film (SiOCN) with varying proportions of each element, using a disilane precursor under vapor deposition conditions, wherein the percent carbon incorporation into the SiOCN film may be varied between about 5 to about 60%, by utilizing co-reactants chosen from oxygen, ammonia, and nitrous oxide gas. The carbon-enriched SiOCN films thus formed may be converted to pure silicon dioxide films after an etch stop protocol by treatment with O2 plasma.
Type:
Grant
Filed:
June 30, 2022
Date of Patent:
July 16, 2024
Assignee:
ENTEGRIS, INC.
Inventors:
Sungsil Cho, Seobong Chang, Jae Eon Park, Bryan C. Hendrix, Thomas H. Baum
Abstract: Described are yttrium fluoride compositions, including deposited films, e.g., coatings, that contain yttrium fluoride; methods of preparing yttrium fluoride compositions and deposited film coatings that contain yttrium fluoride; as well as substrates that have a deposited film coating that contains yttrium fluoride at a surface and methods and equipment that include the substrates.
Type:
Grant
Filed:
April 14, 2021
Date of Patent:
July 9, 2024
Assignee:
ENTEGRIS, INC.
Inventors:
Carlo Waldfried, Stephen Longo, Parul Tyagi
Abstract: A pressure regulator device for use within a pressure-regulated fluid storage and dispensing vessel primarily in low flow, low delivery pressure applications. Regulator stiction challenges have been solved with an improved poppet assembly using different poppet element configurations as well as an improved bellows structure in the pressure-sensing assembly that provides more flexibility during contraction and expansion of the diaphragm elements.
Abstract: Coatings applicable to a variety of substrate articles, structures, materials, and equipment are described. In various applications, the substrate includes metal surface susceptible to formation of oxide, nitride, fluoride, or chloride of such metal thereon, wherein the metal surface is configured to be contacted in use with gas, solid, or liquid that is reactive therewith to form a reaction product that deleterious to the substrate article, structure material, or equipment. The metal surface is coated with a protective coating preventing reaction of the coated surface with the reactive gas, and/or otherwise improving the electrical, chemical, thermal, or structural properties of the substrate article or equipment. Various methods of coating the metal surface are described, and for selecting the coating material that is utilized.
Type:
Grant
Filed:
September 6, 2018
Date of Patent:
June 25, 2024
Assignee:
ENTEGRIS, INC.
Inventors:
Bryan C. Hendrix, David W. Peters, Weimin Li, Carlo Waldfried, Richard A. Cooke, Nilesh Gunda, I-Kuan Lin
Abstract: Disclosed herein is a filter having a housing having first and second end surfaces and interior and exterior surfaces, a membrane disposed within the tubular housing, a first end cap sealed to the first end surface of the tubular housing and the first end surface of the membrane; a second end cap sealed to the second end surface of the tubular housing and the second end surface of the membrane; and a fluid channel formed in the interior surface of the housing in a helical pattern. The helical pattern has a helical pitch in an axial direction of the housing of less than or equal to about 60 mm.
Type:
Grant
Filed:
October 21, 2020
Date of Patent:
June 25, 2024
Assignee:
ENTEGRIS, INC.
Inventors:
Barry L. Gregerson, Christopher P. Barck
Abstract: The invention relates to compositions and methods for the selective wet etching of a surface of a microelectronic device that contains both silicon nitride (SiN) and polysilicon. An etching composition as described comprises phosphoric acid, certain polysilicon corrosion inhibitors, along with certain silanes. The combination of the two components was found to greatly improve the selectivity of the silicon nitride etching composition in the presence of polysilicon.
Type:
Grant
Filed:
May 20, 2022
Date of Patent:
June 18, 2024
Assignee:
ENTEGRIS, INC.
Inventors:
Steven M. Bilodeau, Claudia Yevenes, Juhee Yeo
Abstract: Reticle pods include inner pods where motion limiting features restrict translational motion of the cover and the baseplate relative to one another. The motion limiting features are in addition to gross alignment features included in the inner pod. The motion limiting features resist the translational motion before the gross alignment features would resist the motion. Motion limiting features can include elastic bodies providing friction against contact surfaces, or pins received on elastic contact surfaces or in diaphragms or motion limiting cups.
Abstract: Described are liquid filter apparatuses that include a housing, an interior within the housing, a cartridge assembly (otherwise known as a “filter cartridge”) contained within the housing, and a vent that allows gaseous fluid from an interior of the housing to be released to an exterior of the housing, as well as related methods.