Abstract: There is disclosed a hybrid arrangement of more than one electron energy conversion mechanism in a detector arranged physically such that the electron image can be acquired from both energy converters in such a manner that selected high-illumination parts of the image can be imaged with an indirectly coupled scintillator detector and the remainder of the image acquired with the high-sensitivity/direct electron portion of the detector without readjustments in the beam position or mechanical positioning of the detector parts. Further, a mechanism to allow dynamically switchable or simultaneous linear and counted signal processing from each pixel of the image so that high-illumination areas can be acquired linearly without the severe dose rate limitation of counting and low-illumination regions can be acquired with counting, the switchover point determined by the dose rate at which signal quality breaks even between linear and counting modes.

Abstract: Methods are disclosed for removal of outlier pixels from a transmission electron microscopy camera image. One exemplary method includes establishing a desired exposure of n electrons per pixel; exposing the camera to a series of sub-frame exposures to produce a series of sub-frame images; calculating an average image signal of all sub-frame exposures in said series; establishing a threshold selected to achieve a desired number of false positives; evaluating each of said sub-frame exposures for pixels further away from said average than said threshold; and replacing pixels in each of said sub-frame images that exceed said threshold with said average to form corrected sub-frame images.

Abstract: Ion beam sample preparation apparatus and methods are described. The apparatus has disposed in a vacuum chamber at least one tilting ion beam irradiating means with intensity control, a rotation stage with rotation control, a sample holder, and an adjustable positioning stage that has two axes of positional adjustment that are operable to move the region of the sample being prepared by the ion beam relative to the ion beam. The apparatus may also include a vacuum-tight optical window for observing the sample and a shutter for protecting the optical window from debris while the sample is prepared in the ion beam. The apparatus may also include an instrument controller responsive to the state of the apparatus and to the condition of the sample and is operable to control the preparation of the sample.

Abstract: Methods are disclosed for removal of outlier pixels from a transmission electron microscopy camera image. One exemplary method includes establishing a desired exposure of n electrons per pixel; exposing the camera to a series of sub-frame exposures to produce a series of sub-frame images; calculating an average image signal of all sub-frame exposures in said series; establishing a threshold selected to achieve a desired number of false positives; evaluating each of said sub-frame exposures for pixels further away from said average than said threshold; and replacing pixels in each of said sub-frame images that exceed said threshold with said average to form corrected sub-frame images.

Abstract: Disclosed are embodiments of an ion beam sample preparation apparatus and methods. The apparatus has disposed in a vacuum chamber at least one tilting ion beam irradiating means with intensity control, a rotation stage with rotation control, a sample holder, and an adjustable positioning stage that has two axes of positional adjustment that are operable to move the region of the sample being prepared by the ion beam relative to the ion beam. The apparatus may also include a vacuum-tight optical window for observing the sample and a shutter for protecting the optical window from debris while the sample is prepared in the ion beam.

Abstract: Disclosed are embodiments of an ion beam sample preparation apparatus and methods for using the embodiments. The apparatus comprises an ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. The shield has datum features which abut complementary datum features on the shield retention stage when the shield is held in the shield retention stage. A retention stage lifting means allows the creation of a loading chamber that is isolated from the main vacuum chamber where sample ion beam milling takes place. A heat sink means is configured to conduct heat away from the sample undergoing sample preparation in the ion beam.

Abstract: Disclosed are embodiments of an ion beam sample preparation apparatus and methods. The apparatus has disposed in a vacuum chamber at least one tilting ion beam irradiating means with intensity control, a rotation stage with rotation control, a sample holder, and an adjustable positioning stage that has two axes of positional adjustment that are operable to move the region of the sample being prepared by the ion beam relative to the ion beam. The apparatus may also include a vacuum-tight optical window for observing the sample and a shutter for protecting the optical window from debris while the sample is prepared in the ion beam.

Abstract: Disclosed are embodiments of an ion beam shield for use in an ion beam sample preparation apparatus and methods for using the embodiments. The apparatus has an ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. The ion beam shield has datum features which abut complementary datum features on the shield retention stage when the shield is held in the shield retention stage. The shield has features which enable the durable adhering of the sample to the shield for processing the sample with the ion beam. The complementary datum features on both shield and shield retention stage enable accurate and repeatable positioning of the sample in the apparatus for sample processing and reprocessing.

Abstract: Disclosed are embodiments of an ion beam sample preparation apparatus and methods for using the embodiments. The apparatus comprises an ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. The shield has datum features which abut complementary datum features on the shield retention stage when the shield is held in the shield retention stage. The shield has features which enable the durable adhering of the sample to the shield for processing the sample with the ion beam. The complementary datum features on both shield and shield retention stage enable accurate and repeatable positioning of the sample in the apparatus for sample processing and reprocessing. Additionally, apparatus kits are disclosed that enable the use of the same shields in the observation of prepared samples.

Abstract: Cathodoluminescence performed in the scanning electron microscope brings the advantage of localized excitation of individual microscopic structures. When luminescent structures are characterized, the intensity, wavelength, polarization and angular emission of the luminescence are all of interest. The invention provides an apparatus for determining the angular distribution of the radiated light, and in particular provides the user with rotational symmetry which is essential for the principle of measurement. This is compatible with additional polarization and spectral bandpass filtering methods used to characterize the luminescence and understand the specimen.

Abstract: Disclosed are embodiments of an ion beam sample preparation apparatus and methods. The methods operate on a sample disposed in a vacuum chamber and include steps of directing an intensity-controllable, tilt-angle controllable ion beam at a sample holder coupled to a rotation stage. The methods further include illuminating and capturing one or more images of the sample, extracting useful features from one or more images and thereafter adjusting the sample preparation steps. Further methods are disclosed for capturing sequences of images, programmatically rotating images, and displaying sequences of images with similar rotation angles. Further methods include extracting useful features from sequences of images that may change with respect to time as ion beam preparation continues.

Abstract: Disclosed are embodiments of an ion beam shield for use in an ion beam sample preparation apparatus and methods for using the embodiments. The apparatus comprises an ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. The ion beam shield has datum features which abut complementary datum features on the shield retention stage when the shield is held in the shield retention stage. The shield has features which enable the durable adhering of the sample to the shield for processing the sample with the ion beam. The complementary datum features on both shield and shield retention stage enable accurate and repeatable positioning of the sample in the apparatus for sample processing and reprocessing.

Abstract: Disclosed are embodiments of an ion beam sample preparation apparatus and methods for using the embodiments. The apparatus comprises a tilting ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. The shield has datum features which abut complementary datum features on the shield retention stage when the shield is held in the shield retention stage. The tilting ion beam irradiating means may direct ions at the sample from more than one tilt angle. A rotating shield retention stage is also disclosed which works in concert with the tilting ion beam irradiating means.

Abstract: A method for correcting an image made from a system having a plurality of settings wherein the system has optical artifacts which vary according to the settings. The method includes acquiring one reference image of a substantially uniform subject with the system at a first setting. Acquiring a second reference image of the uniform subject with the system at a second setting. Storing both reference images and correcting a subject image acquired by the system by using either the first reference image or the second reference image, depending on the setting at which the subject image was acquired. The method is capable of acquiring and storing multiple reference images and storing them with assignment to multiple settings.

Abstract: Methods are disclosed for correcting vertical line streaks in an interline or full-frame CCD. The method includes the step of subtracting an overscan row from each row of a previous image or from each row of a next image, such that each row of the final image contains the same readout smear effect and such that readout overscan rows contain the same smear information as each row of the final image. The method is also described for use with frame transfer CCDs.

Abstract: Disclosed are embodiments of an ion beam sample preparation apparatus and methods for using the embodiments. The apparatus comprises a tilting ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. The shield has datum features which abut complementary datum features on the shield retention stage when the shield is held in the shield retention stage. The tilting ion beam irradiating means may direct ions at the sample from more than one tilt angle. A rotating shield retention stage is also disclosed which works in concert with the tilting ion beam irradiating means.

Abstract: Disclosed are embodiments of an ion beam sample preparation apparatus and methods for using the embodiments. The apparatus comprises an ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. The shield has datum features which abut complementary datum features on the shield retention stage when the shield is held in the shield retention stage. A retention stage lifting means allows the creation of a loading chamber that is isolated from the main vacuum chamber where sample ion beam milling takes place. A heat sink means is configured to conduct heat away from the sample undergoing sample preparation in the ion beam.

Abstract: A microtome for in situ residence within a chamber of a scanning electron microscope (SEM) and a SEM including the microtome is disclosed. The microtome includes a specimen holder for holding a specimen thereon at high voltage to produce a retardation field thereat and a movable knife. The SEM includes a backscatter electron detector disposed adjacent to specimen holder. The knife arranged is to be carried into engagement with the specimen on the specimen holder to slice a portion of the specimen away to expose a new face of the specimen without interfering with the high voltage on the specimen, and is mounted so that after having engaged the specimen to expose a new face of the specimen it is withdrawn to a retracted position whereupon it does not interfere with the retardation field.

Abstract: A side entry TEM holder incorporates a miniature tilted off axis elliptical mirror to collect cathodoluminescence from the specimen and couple it efficiently into a tilted fiber optic integrated into the holder. The design is compatible with the cryogenic operation of the holder. TEM specimens are partially transparent to the electron beam, and so light can be emitted above and below the specimen. The same principle of off-axis mirror and tilted fiber can be utilized to collect light from above and below the specimen yet fit into the very confined space required by insertion through the goniometer and for operation between narrow gap pole pieces. With a dual system, the emission of light from above the specimen can be compared to that from below thereby enhancing the versatility of the analytical technique.

Abstract: A system is disclosed for obtaining layered cathodoluminescence images of a sample wherein the light collecting equipment is highly efficient and wherein the microtoming or Focused Ion Beam equipment does not interfere with the efficiency of the light collecting equipment and wherein the position of the sample with respect to the light collecting equipment is not disturbed in the microtoming or ion beam milling process. Embodiments are disclosed allowing simultaneous collection of cathodoluminescence images and collection of other electron based imaging signals such as backscattered and secondary electrons.