Patents Assigned to Gigaphoton
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Publication number: 20220050382Abstract: A laser processing method of performing laser processing on a transparent material that is transparent to ultraviolet light by using a laser processing system includes: performing relative positioning of a transfer position of a transfer image and the transparent material in an optical axis direction of a pulse laser beam so that the transfer position is set at a position inside the transparent material at a predetermined depth ?Zsf from a surface of the transparent material in the optical axis direction; and irradiating the transparent material with the pulse laser beam having a pulse width of 1 ns to 100 ns inclusive and a beam diameter of 10 ?m to 150 ?m inclusive at the transfer position.Type: ApplicationFiled: October 26, 2021Publication date: February 17, 2022Applicant: Gigaphoton Inc.Inventors: Koji KAKIZAKI, Masakazu KOBAYASHI, Akira SUWA, Osamu WAKABAYASHI
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Publication number: 20220035249Abstract: An extreme ultraviolet light generation system may include a laser system emitting first prepulse laser light, second prepulse laser light, and main pulse laser light in this order; a chamber including at least one window for introducing, into the chamber, the first prepulse laser light, the second prepulse laser light, and the main pulse laser light; a target supply unit supplying a target to a predetermined region in the chamber; and a processor controlling the laser system to irradiate the target with the first prepulse laser light, irradiate the target, having been irradiated with the first prepulse laser light, with the second prepulse laser light having a pulse time width longer than a pulse time width of the main pulse laser light, and irradiate the target, having been irradiated with the second prepulse laser light, with the main pulse laser light temporally separated from the second prepulse laser light.Type: ApplicationFiled: June 3, 2021Publication date: February 3, 2022Applicant: Gigaphoton Inc.Inventors: Takanari KOBAYASHI, Hirokazu HOSODA, Yoshiyuki HONDA
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Patent number: 11239624Abstract: A laser device may include a chamber accommodating a pair of discharge electrodes, a grating provided outside the chamber, first beam-expanding optics provided between the chamber and the grating and configured to expand a beam width of light outputted from the chamber at least in a first direction perpendicular to a direction of discharge between the pair of discharge electrodes, and second beam-expanding optics having a plurality of prisms provided between the chamber and the grating, the second beam-expanding optics being configured to expand a beam width of light outputted from the chamber at least in a second direction parallel to the direction of discharge between the pair of discharge electrodes.Type: GrantFiled: March 23, 2020Date of Patent: February 1, 2022Assignee: Gigaphoton Inc.Inventor: Hirotaka Miyamoto
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Patent number: 11239625Abstract: A laser apparatus includes a controller that selects one of a first gas control and a second gas control based on gas pressure measured by a pressure sensor. The first gas control causes at least one of first laser gas and second laser gas is supplied to a chamber such that the gas pressure in the chamber after the first gas control is higher than the gas pressure in the chamber before the first gas control. The second gas control causes at least the first laser gas is supplied to the chamber and causes a part of the laser gas in the chamber is exhausted such that a difference between the gas pressure in the chamber before the second gas control and the gas pressure in the chamber after the second gas control is smaller than a difference between the gas pressure in the chamber before the first gas control and the gas pressure in the chamber after the first gas control.Type: GrantFiled: October 3, 2018Date of Patent: February 1, 2022Assignee: Gigaphoton Inc.Inventor: Takeshi Asayama
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Patent number: 11226565Abstract: An extreme ultraviolet light generating system includes a chamber; a target supply unit configured to successively output, toward a predetermined region in the chamber, a plurality of droplets including a first droplet and a second droplet of a target substance; a trajectory correcting laser apparatus configured to apply a trajectory correcting laser beam to each of the droplets moving from the target supply unit toward the predetermined region; a drive laser apparatus configured to apply a drive laser beam to each droplet having reached the predetermined region to generate plasma; and a control unit configured to control the trajectory correcting laser apparatus such that intensity of the trajectory correcting laser beam applied to the first droplet is different from intensity of the trajectory correcting laser beam applied to the second droplet.Type: GrantFiled: August 7, 2020Date of Patent: January 18, 2022Assignee: Gigaphoton Inc.Inventor: Tatsuya Yanagida
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Patent number: 11228156Abstract: A laser system according to the present disclosure includes: a laser apparatus configured to emit a laser beam; a transmission optical system disposed on a path between the laser apparatus and a target supplied into an EUV chamber in which EUV light is generated; a reflection optical system configured to reflect, toward the target, the laser beam from the transmission optical system; a first sensor configured to detect the laser beam traveling from the laser apparatus toward the reflection optical system; a second sensor configured to detect return light of the laser beam reflected by the reflection optical system and traveling backward to the laser apparatus; and a control unit configured to determine that the reflection optical system is damaged when no anomaly of the laser beam is detected and a light amount of the return light exceeds a predetermined light amount value.Type: GrantFiled: August 7, 2019Date of Patent: January 18, 2022Assignee: Gigaphoton Inc.Inventors: Yoshifumi Ueno, Yuta Takashima
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Patent number: 11226536Abstract: A wavelength conversion system including: A. a first nonlinear optical crystal to which first pulsed laser light having a first polarization state and a first wavelength and second pulsed laser light having a second polarization state and a second wavelength are inputted and which is configured to output in response to the input the second pulsed laser light and first sum frequency light having the second polarization state and a third wavelength produced by sum frequency mixing of the first wavelength with the second wavelength; and B. a second nonlinear optical crystal to which the first sum frequency light and the second pulsed laser light outputted from the first nonlinear optical crystal are inputted and which is configured to output in response to the input third pulsed laser light having a fourth wavelength.Type: GrantFiled: August 7, 2020Date of Patent: January 18, 2022Assignees: Gigaphoton Inc., The University of TokyoInventors: Chen Qu, Yohei Kobayashi, Zhigang Zhao, Hironori Igarashi
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Patent number: 11229112Abstract: An extreme ultraviolet light generation apparatus may include a target supply unit configured to output a target; an actuator configured to change a trajectory of the target; an illumination device configured to illuminate the target; a first trajectory sensor configured to detect the trajectory in a first direction; a second trajectory sensor configured to detect the trajectory in a second direction; and a processor configured, when the trajectory of the target is detected by the first trajectory sensor but is not detected by the second trajectory sensor, to perform a first search and determine whether or not to repeat the first search based on a signal intensity of the first trajectory sensor, the first search including changing the trajectory of the target into a third direction by controlling the actuator, and then determining whether or not the second trajectory sensor is capable of detecting the trajectory of the target.Type: GrantFiled: April 12, 2021Date of Patent: January 18, 2022Assignee: Gigaphoton Inc.Inventor: Toru Abe
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Publication number: 20220009031Abstract: Provided is a laser annealing apparatus causing laser light to be radiated to processing receiving areas arranged, out of a first direction and a second direction perpendicular to the first direction, along at least the second direction and move a batch radiation area and a workpiece in the first direction, and the laser annealing apparatus includes an energy density measuring apparatus measuring the energy density at, out of first and second ends of the batch radiation area in the second direction, at least the second end, an energy density adjusting apparatus adjusting the energy density at the first end, and a controller controlling the energy density adjusting apparatus. The energy density at the first end when (N+1)-th scanning is performed is so adjusted that the energy density at the first end in an (N+1)-th scan area approaches the energy density at the second end in the N-th scan area.Type: ApplicationFiled: September 28, 2021Publication date: January 13, 2022Applicant: Gigaphoton Inc.Inventors: Satoshi TANAKA, Akiyoshi SUZUKI, Hideo HOSHINO
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Publication number: 20220015218Abstract: A target supply device may include a first containing member configured to contain a target substance; a second containing member configured to contain the target substance flowing from the first containing member; a ring-shaped sealing portion which is formed integrally with one of the first containing member and the second containing member, and is brought into close contact with the other containing member; and a fastening member which fastens the first containing member and the second containing member to each other so that the first containing member communicates with the second containing member through the communication portion, and presses the sealing portion against the other containing member. Here, the sealing portion being plastically deformed by being pressed against the other containing member by the fastening member to seal a gap between the first containing member and the second containing member around the communication portion due to the plastic deformation.Type: ApplicationFiled: May 28, 2021Publication date: January 13, 2022Applicant: Gigaphoton Inc.Inventors: Yutaka SHIRAISHI, Toshihiro NISHISAKA, Tsukasa HORI
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Patent number: 11219116Abstract: An extreme ultraviolet light generation system may include an irradiation position adjustment mechanism adjusting an irradiation position of the laser light; an extreme ultraviolet light sensor measuring energy of extreme ultraviolet light; a return light sensor measuring energy of return light traveling backward on the laser light path; and a processor controlling the irradiation position adjustment mechanism.Type: GrantFiled: May 7, 2021Date of Patent: January 4, 2022Assignee: Gigaphoton Inc.Inventors: Yuta Takashima, Yuichi Nishimura, Takayuki Yabu, Yoshifumi Ueno
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Patent number: 11217962Abstract: A laser system includes: A. a solid-state laser apparatus configured to output a pulse laser beam having light intensity distribution in a Gaussian shape that is rotationally symmetric about an optical path axis; B. an amplifier including a pair of discharge electrodes and configured to amplify the pulse laser beam in a discharge space between the pair of discharge electrodes; and C. a conversion optical system configured to convert the light intensity distribution of the pulse laser beam output from the amplifier into a top hat shape in each of a discharge direction of the pair of discharge electrodes and a direction orthogonal to the discharge direction.Type: GrantFiled: December 9, 2019Date of Patent: January 4, 2022Assignee: Gigaphoton Inc.Inventors: Masaki Arakawa, Osamu Wakabayashi
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Publication number: 20210410262Abstract: An extreme ultraviolet light generation system may include an irradiation position adjustment mechanism adjusting an irradiation position of the laser light; an extreme ultraviolet light sensor measuring energy of extreme ultraviolet light; a return light sensor measuring energy of return light traveling backward on the laser light path; and a processor controlling the irradiation position adjustment mechanism.Type: ApplicationFiled: May 7, 2021Publication date: December 30, 2021Applicant: Gigaphoton Inc.Inventors: Yuta TAKASHIMA, Yuichi NISHIMURA, Takayuki YABU, Yoshifumi UENO
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Publication number: 20210410261Abstract: A target supply device may include a first container configured to contain a solid target substance; a second container including a first connection port connected to the first container, a second connection port connected to a first pressurized gas supply line, and a third connection port connected to a target substance lead-out path; a moving body including a first recessed portion configured to contain the solid target substance supplied from the first container and move the first recessed portion inside the second container to cause an opening of the first recessed portion to be overlapped sequentially with the first to third connection ports; a third container connected to both a second pressurized gas supply line and the target substance lead-out path and configured to melt the solid target substance supplied from the third connection port; and a nozzle configured to output the melted target substance supplied from the third container.Type: ApplicationFiled: May 5, 2021Publication date: December 30, 2021Applicant: Gigaphoton Inc.Inventors: Yutaka SHIRAISHI, Tsukasa HORI
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Publication number: 20210407700Abstract: An extreme ultraviolet light concentrating mirror may include a substrate, a multilayer reflection film provided on the substrate and configured to reflect extreme ultraviolet light, and a protective film provided on the multilayer reflection film. Here, the protective film may include a mixed film in which a network-forming oxide is mixed with an amorphous titanium oxide, or a mixed film in which two or more amorphous titanium oxide layers and two or more network-forming oxide layers are each alternately laminated.Type: ApplicationFiled: April 14, 2021Publication date: December 30, 2021Applicant: Gigaphoton Inc.Inventors: Yoshiyuki Honda, Masayuki Morita
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Patent number: 11211239Abstract: An EUV light generation apparatus includes: a chamber; an EUV light condensing mirror positioned inside the chamber and having a reflective surface that determines a first focal point and a second focal point, the reflective surface and the second focal point being positioned on respective sides of a first surface; at least one magnet configured to generate a magnetic field at and around the first focal point; a first gas supply unit configured to supply first gas to the reflective surface in the chamber and opened near an outer peripheral part of the reflective surface; a second gas supply unit configured to supply second gas into the chamber and opened at a position between the first surface and the second focal point; and a discharge device configured to discharge gas inside the chamber and opened at a position between the first focal point and the at least one magnet.Type: GrantFiled: February 10, 2020Date of Patent: December 28, 2021Assignee: Gigaphoton Inc.Inventors: Atsushi Ueda, Takashi Saito
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Patent number: 11194255Abstract: A laser processing method of performing laser processing on a transparent material that is transparent to ultraviolet light by using a laser processing system includes: performing relative positioning of a transfer position of a transfer image and the transparent material in an optical axis direction of a pulse laser beam so that the transfer position is set at a position inside the transparent material at a predetermined depth ?Zsf from a surface of the transparent material in the optical axis direction; and irradiating the transparent material with the pulse laser beam having a pulse width of 1 ns to 100 ns inclusive and a beam diameter of 10 ?m to 150 ?m inclusive at the transfer position.Type: GrantFiled: March 9, 2020Date of Patent: December 7, 2021Assignee: Gigaphoton Inc.Inventors: Koji Kakizaki, Masakazu Kobayashi, Akira Suwa, Osamu Wakabayashi
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Publication number: 20210367390Abstract: A gas laser apparatus may include a chamber filled with a laser gas; a window provided in the chamber and through which a laser beam passes; an optical path tube connected to the chamber to surround a position of the window in the chamber; a heated gas supply port configured to supply a heated purge gas into a closed space including a space in the optical path tube; and an exhaust port configured to exhaust a gas in the closed space.Type: ApplicationFiled: August 10, 2021Publication date: November 25, 2021Applicant: Gigaphoton Inc.Inventors: Daisuke TEI, Osamu WAKABAYASHI, Makoto TANAKA, Miwa IGARASHI
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Publication number: 20210364928Abstract: A tin trap device for collecting tin in a chamber device which causes tin to be turned into plasma with laser light in an internal space thereof may include a housing provided with a gas inlet port through which exhaust gas in the chamber device flows and a gas exhaust port through which the exhaust gas is exhausted; and a main heater arranged in the housing, configured to have a temperature equal to or higher than the melting point of tin and lower than the boiling point thereof, and having a projection surface projected toward a direction in which the exhaust gas flows in the gas inlet port cover the gas inlet port.Type: ApplicationFiled: August 10, 2021Publication date: November 25, 2021Applicant: Gigaphoton Inc.Inventors: Gota NIIMI, Yoshifumi UENO, Shinji NAGAI
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Publication number: 20210366710Abstract: A method for manufacturing a semiconductor crystalline thin film according to a viewpoint of the present disclosure includes radiating first pulsed laser light having a first pulse duration to an amorphous semiconductor to poly-crystallize the amorphous semiconductor and radiating second pulsed laser light having a second pulse duration shorter than the first pulse duration to an area of a semiconductor crystal having undergone the poly-crystallization to lower the height of ridges of the semiconductor crystal.Type: ApplicationFiled: August 3, 2021Publication date: November 25, 2021Applicants: Gigaphoton Inc., KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATIONInventors: Kaname IMOKAWA, Ryoichi NOHDOMI, Osamu WAKABAYASHI, Hiroshi IKENOUE