Abstract: A laser chamber may include a first discharge electrode, a second discharge electrode, a fan making a laser gas flow through a discharge space between the first and second discharge electrodes, a first insulating member disposed on upstream side and downstream side of the first discharge electrode in the laser gas flow, a first metal damper member disposed on upstream side of the second discharge electrode and a second insulating member disposed on downstream side of the second discharge electrode in the laser gas flow, and a second metal damper member disposed on downstream side of the second insulating member in the laser gas flow. In a boundary portion between the second metal damper member and the second insulating member, a first discharge space side surface of the second metal damper member may be located further toward the opposite side to the discharge space than a second discharge space side surface of the second insulating member.

Abstract: An extreme ultraviolet light generation device includes: a target supply unit including a nozzle through which a target substance in a liquid form is output into a chamber; a piezoelectric element configured to vibrate the nozzle under a droplet connection condition to regularly generate a droplet of the target substance; and a control unit configured to perform search processing of changing a drive condition of the piezoelectric element to search for a drive condition of the piezoelectric element corresponding to the droplet connection condition and configured to set a drive condition of the piezoelectric element used for generation of extreme ultraviolet light based on a result of the search processing. The control unit preliminarily drives the piezoelectric element before performing the search processing and starts the search processing after performing the preliminary drive.

Abstract: An EUV light generating apparatus includes: a chamber device including an inner wall surrounding a space, and a plasma generating region in the space in which plasma is generated from a droplet irradiated with a laser beam; a heat shield including a through-hole and a channel portion, and disposed between the inner wall and the plasma generating region; a gas supply device that supplies gas; a gas introducing cylinder that is provided in the space on a side opposite to the plasma generating region, extends toward the through-hole, and introduces the gas supplied from the gas supply device through the through-hole toward the plasma generating region over the heat shield; and an optical unit optically coupled to the space through an internal space of the gas introducing cylinder and the through-hole. An entire front end surface of the gas introducing cylinder faces the heat shield.

Abstract: An extreme ultraviolet light generation apparatus that generates plasma by irradiating a target substance with a pulse laser beam and generates extreme ultraviolet light from the plasma includes: a droplet detection unit configured to detect a droplet passing through a predetermined position between a target supply unit and a plasma generation region; and a control unit configured to control a laser apparatus configured to output the pulse laser beam. The control unit performs control to determine whether there is a defective droplet based on a droplet detection signal obtained from the droplet detection unit and to stop, when it is determined that there is a defective droplet, irradiation of the defective droplet determined to be defective, a preceding droplet output one droplet before the defective droplet, and a following droplet output one droplet after the defective droplet with the pulse laser beam.

Abstract: A laser apparatus includes: a master oscillator for emitting a laser beam; an amplifier on an optical path of the laser beam; a beam splitter between the master oscillator and the amplifier for separating, from the optical path of the laser beam, at least part of a return beam traveling through the optical path of the laser beam in a direction opposite to a traveling direction of the laser beam; a focusing optical system for focusing the return beam separated from the optical path; and an optical sensor having a light receiving surface for the return beam for detecting information on power of the return beam entering the light receiving surface through the focusing optical system, the light receiving surface being arranged at a position different from a focusing position of the focusing optical system on the optical path of the return beam.

Abstract: An extreme ultraviolet light generation device according to an aspect of the present disclosure includes: a chamber; a mirror configured to condense extreme ultraviolet light radiated from plasma generated by irradiating a target supplied into the chamber with a laser beam; an electromagnet disposed outside the chamber to form a magnetic field between a generation region of the plasma in the chamber and the mirror; a current inversion device configured to invert the direction of current flowing through the electromagnet; and a controller configured to control the current inversion device to invert the direction of the current when a set condition is satisfied.

Abstract: An extreme ultraviolet light generating apparatus for generating extreme ultraviolet light in a chamber according to one aspect of the present disclosure includes a piezoelectric element provided in the chamber; a pressure sensor configured to detect pressure in the chamber; a gas introducing unit configured to introduce gas into the chamber; an exhaust unit configured to exhaust the gas from the chamber; and a control unit configured to control application of a voltage to the piezoelectric element. The control unit is configured to determine whether or not to apply a voltage to the piezoelectric element based on information on the pressure in the chamber obtained by the pressure sensor.

Abstract: An EUV light generating apparatus includes: a chamber device including an inner wall surrounding a space, and a plasma generating region in the space in which plasma is generated from a droplet irradiated with a laser beam; a heat shield including a through-hole and a channel portion, and disposed between the inner wall and the plasma generating region; a gas supply device that supplies gas; a gas introducing cylinder that is provided in the space on a side opposite to the plasma generating region, extends toward the through-hole, and introduces the gas supplied from the gas supply device through the through-hole toward the plasma generating region over the heat shield; and an optical unit optically coupled to the space through an internal space of the gas introducing cylinder and the through-hole. An entire front end surface of the gas introducing cylinder faces the heat shield.

Abstract: An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm2 and equal to or lower than a fluence of the main pulse laser beam.

Abstract: A laser processing apparatus according to the present disclosure includes a placement base on which a processing receiving object is placed, an optical system that guides laser light to the processing receiving object, a gas supply port via which a gas is supplied to a laser light irradiated region of the processing receiving object, a gas recovery port via which the supplied gas is recovered, a mover that moves the irradiated region, and a controller that controls, in accordance with the moving direction of the irradiated region, the direction of the flow of the gas flowing from the gas supply port to the gas recovery port, and the controller changes the direction of the gas flow in response to a change in the moving direction of the irradiated region in such a way that the gas flows in the direction opposite the moving direction of the irradiated region.

Abstract: A target image capturing device according to an aspect of the present disclosure includes a delay circuit configured to receive a timing signal from outside and output a first trigger signal at a timing delayed by a first delay time from the reception of the timing signal; an illumination light source configured to emit light based on the first trigger signal; an image capturing unit including a light amplification unit and disposed to capture an image of a shadow of a target to be observed, which is generated when the target is irradiated with the light emitted from the illumination light source; a processing unit configured to perform image processing including processing of measuring a background luminance from the image captured by the image capturing unit; and a control unit configured to perform control to adjust a gain of the light amplification unit based on the background luminance.

Abstract: A laser apparatus includes an optical element disposed on a laser beam axis, an actuator configured to displace the optical element to displace the laser beam axis, a driving amount monitor configured to monitor a driving amount of the actuator, an optical axis monitor disposed along the laser beam axis and configured to monitor the laser beam axis, and a control unit configured to control the actuator based on a monitoring result of the optical axis monitor and determine abnormality of the optical element based on a monitoring result of the driving amount monitor.

Abstract: A line narrowing module includes a prism that refracts laser light in a first plane, a grating that disperses the laser light in the first plane, first to fourth elements, and a rotation mechanism and narrows the linewidth of the laser light. The second element is supported between the first and fourth elements by the first element. The rotation mechanism rotates the second element relative to the first element around an axis intersecting the first plane. The prism is located between the second and fourth elements and so supported by the second element that the rotation mechanism rotates the prism and the second element. The third element has elasticity and is compressed and located between the prism and the fourth element. The fourth element receives reaction force from the compressed third element. The second element is mechanically independent of the fourth element in the rotational direction of the rotation mechanism.

Abstract: An extreme ultraviolet light generation apparatus may include: a chamber device including an internal space; a target supply unit disposed at the chamber device and configured to supply a droplet of a target substance to the internal space; a target collection unit disposed at the chamber device, communicated with the internal space through an opening provided to an inner wall of the chamber device, and configured to collect the droplet passing through the opening; a detection unit disposed at the chamber device and configured to detect the target substance accumulating in the vicinity of the opening of the inner wall; and a control unit configured to stop the target supply unit depending on a result of the detection by the detection unit.

Abstract: An extreme ultraviolet light generation system according to one aspect of the present disclosure includes: a pulse laser apparatus configured to output a pulse laser beam, the pulse laser beam being supplied to a predetermined region in a chamber in which plasma containing extreme ultraviolet light is to be generated; a sensor configured to detect a beam size of the pulse laser beam; an actuator configured to change the beam size; and a controller. The controller performs, based on a first algorithm, first control that controls the actuator by a first control amount in a beam size minifying direction when the beam size has exceeded a first upper limit threshold in one burst duration, and then performs, based on a second algorithm, second control that controls the actuator by a second control amount smaller than the first control amount so that the beam size becomes closer to a target value.

Abstract: An EUV chamber apparatus includes: a chamber; a target generation unit configured to output a target toward a predetermined region inside the chamber; a gas nozzle through which gas is supplied into the chamber; and a shroud including a first flow path through which a first cooling medium circulates and surrounding at least part of the trajectory of the target inside the chamber.

Abstract: An extreme ultraviolet light generation system includes: a chamber; a target generation unit; a laser system configured to output a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that fluence of the first pre-pulse laser beam is 1.5 J/cm2 to 16 J/cm2 inclusive at a position where a target is irradiated with the first pre-pulse laser beam; and a control unit configured to control the laser system so that a first delay time from a timing of irradiation of the target with the first pre-pulse laser beam to a timing of irradiation with the second pre-pulse laser beam and a second delay time from the timing of irradiation of the target with the second pre-pulse laser beam to a timing of irradiation with the main pulse laser beam have a following relation: the first delay time<the second delay time.

Abstract: An optical pulse stretcher includes a separation optical element configured to separate pulsed laser light incident on a first surface thereof into first transmitted light and first reflected light, a reflective optical system configured to guide the first reflected light to be incident on a second surface of the separation optical element that is the surface opposite the first surface, and a holding member that has a through hole having an opening area smaller than the area of a reflective surface of a reflective optical element provided in the reflective optical system, is disposed on the rear side of the reflective optical element, and is configured to hold the reflective optical element.

Abstract: The laser apparatus includes a master oscillator, an amplifier, a power source, and a controller to control the power source. The controller controls the power source such that an excitation intensity of the amplifier in a burst oscillation period performing the burst oscillation is a first excitation intensity, controls the power source such that, if the predetermined repetition frequency is a first repetition frequency, an excitation intensity of the amplifier in a suspension period suspending the burst oscillation is a second excitation intensity equal to or lower than the first excitation intensity, and controls the power source such that, if the predetermined repetition frequency is a second repetition frequency higher than the first repetition frequency, the excitation intensity of the amplifier in the suspension period is a third excitation intensity lower than the second excitation intensity.

Abstract: A laser gas purifying system to purify laser gas emitted from a laser apparatus and return purified gas to the laser apparatus may include a first pipe configured to pass the laser gas emitted from the laser apparatus, a purifying apparatus connected to the first pipe and configured to purify the laser gas emitted from the laser apparatus, a second pipe connected to the purifying apparatus and configured to return the purified gas purified by the purifying apparatus to the laser apparatus, and an exhausting device provided in at least one of the first pipe, the purifying apparatus, and the second pipe.