Abstract: A time-to-amplitude component having an integrated designed configured to measure a time difference between a start signal and a stop signal includes a first time-to-amplitude converter having a delay chain, a resistor network, a capacitor configured to be chargeable via the resistor network, and a respective driver. The component further includes a control device and a stabilizing device including a control circuit for generating a regulated control voltage. The first time-to-amplitude converter is configured so that the delay elements of the first time-to-amplitude converter are configured to be controlled by the regulated control voltage, a run signal is transmitted through the delay chain, and the capacitor is continuously charged via the resistor network, and the resistor network is electrically separated from the delay chain via the respective drivers so as to terminate a charging of the capacitor, and the analog voltage signal is measurable at an output of the capacitor.
Abstract: A method of spectrometric photon dosimetry for integrally and nuclide-specifically determining a gamma dose rate for X-ray and gamma radiation. The method includes measuring a spectrum in at least one energy group or at least one interval group. The pulse height distribution is with a spectrometer and a pulse height analyzer. The number of channels of the spectrometer is such that a map of the pulse height distribution at a requisite resolution over an energy can be made. The measured pulse height distribution is converted into a photon spectrum using a deconvolution procedure that uses response functions having the same energy resolution as the pulse height distribution. The dose spectrum is calculated using dose conversion factors that are energy-dependent and related to the mean energy of a respective corresponding energy interval. The integral dose or dose rate is determined by summing the dose spectrum.
Abstract: A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.
Type:
Grant
Filed:
July 1, 2008
Date of Patent:
June 7, 2011
Assignee:
GSI Group Corporation
Inventors:
James J. Cordingley, Jonathan S. Ehrman, David M. Filgas, Shepard D. Johnson, Joohan Lee, Donald V. Smart, Donald J. Svetkoff
Abstract: A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.
Type:
Grant
Filed:
December 20, 2006
Date of Patent:
June 7, 2011
Assignee:
GSI Group Corporation
Inventors:
James J. Cordingley, Jonathan S. Ehrmann, David M. Filgas, Shepard D. Johnson, Joohan Lee, Donald V. Smart, Donald J. Svetkoff
Abstract: A magnetic-field generating device includes at least one magnetic-field generator configured to generate a magnetic field so as to provide at least one magnetic gap for receiving objects upon which the magnetic field acts. At least one magnetic-field measuring device is disposed within a measuring-device receiving region outside of the magnetic gap. The at least one magnetic-field measuring device is configured to provide at least one measurement signal useable as an input signal for controlling the at least one magnetic-field generator.
Abstract: A method and system for high-speed, precise micromachining an array of devices are disclosed wherein improved process throughput and accuracy, such as resistor trimming accuracy, are provided. Beam scanning and deflection are both used to distribute beam spots to elements of an array of elements for selective processing. The deflection can be performed with a solid state deflector.
Type:
Application
Filed:
January 11, 2011
Publication date:
May 12, 2011
Applicant:
GSI GROUP CORPORATION
Inventors:
Bruce L. Couch, Jonathan S. Ehrmann, Yun Fee Chu, Joseph V. Lento, Shepard D. Johnson
Abstract: A data storage disc carrier (1) for carrying discs (10). The carrier includes an axial clamping mechanism which incorporates a three legged resilient clamping member (7) that can flees between release and clamping positions to allow easy loading a gripping of discs (10). The clamping member is articulatingly mounted on a tail (4) that is gripped to provide clamping.
Abstract: Laser-based methods and systems for removing one or more target link structures of a circuit fabricated on a substrate includes generating a pulsed laser output at a predetermined wavelength less than an absorption edge of the substrate are provided. The laser output includes at least one pulse having a pulse duration in the range of about 10 picoseconds to less than 1 nanosecond, the pulse duration being within a thermal laser processing range. The method also includes delivering and focusing the laser output onto the target link structure. The focused laser output has sufficient power density at a location within the target link structure to reduce the reflectivity of the target link structure and efficiently couple the focused laser output into the target link structure to remove the target link structure without damaging the substrate.
Type:
Application
Filed:
November 19, 2010
Publication date:
March 17, 2011
Applicant:
GSI GROUP CORPORATION
Inventors:
Bo Gu, Donald V. Smart, James J. Cordingley, Joohan Lee, Donald J. Svetkoff, Shepard D. Johnson, Jonathan S. Ehrmann
Abstract: A reflective metrological scale has a metal tape substrate and a scale pattern of elongated side-by-side marks surrounded by reflective surface areas of the substrate. Each mark has a furrowed cross section and may have a depth in the range of 0.5 to 2 microns. The central region of each mark may be rippled and darkened to provide an enhanced optical reflection ratio with respect to surrounding surface areas. A manufacturing method includes the repeated steps of (1) creating a scale mark by irradiating the substrate surface at a mark location with overlapped pulses from a laser, each pulse having an energy density of less than about 1 joule per cm2, and (2) changing the relative position of the laser and the substrate by a displacement amount defining a next mark location on the substrate at which a next mark of the scale is to be created.
Type:
Grant
Filed:
October 11, 2006
Date of Patent:
March 8, 2011
Assignee:
GSI Group Corporation
Inventors:
Kurt Pelsue, Stuart A. Dodson, II, Bradley L. Hunter, Donald V. Smart, Pierre-Yves Mabboux, Jonathan S. Ehrmann
Abstract: A phantom device for in-vitro validation of radiation procedures under motion influence in consideration of an effective biological dose includes a phantom having a first biological detector with a first biological sample. The first biological sample includes a plurality of culturing and irradiation elements. Each of the culturing and irradiation elements are provided with a respective biological sub-sample so that the first biological detector is configured as a spatially resolving biological detector. A first motion device is configured to move the first biological detector so as to simulate a motion of a target volume.
Abstract: A method and system for high-speed, precise micromachining an array of devices are disclosed wherein improved process throughput and accuracy, such as resistor trimming accuracy, are provided. Beam scanning and deflection are both used to distribute beam spots to elements of an array of elements for selective processing. The deflection can be performed with a solid state deflector.
Type:
Grant
Filed:
December 22, 2009
Date of Patent:
January 18, 2011
Assignee:
GSI Group Corporation
Inventors:
Bruce L. Couch, Jonathan S. Erhmann, Yun Fee Chu, Joseph V. Lento, Shepard D. Johnson
Abstract: A method of generating a data set defining a plurality of target points in a target volume in a body at which a particle beam is to be directed in a continuous or discontinuous process includes directing a particle beam to each of the target points so as to provide a spatial dose distribution in an area around the respective target point. The target points include a first target point having z-spacing, measured in a direction of the particle beam in a homogenous body equivalent to the body, from an adjacent second target point at a higher or lower particle energy. The method also includes defining the target points in the data set by at least one of the z-spacing and the spatial dose distribution in dependence upon a particle energy of the respective target point.
Abstract: A method of determining an actual, especially an actual effective, radiation dose distribution of a moving target volume includes detecting first and further positions of volume elements of the target volume in a first and at least one further motional state of the moving target volume, determining transformation parameters by transformation of the first positions into the further positions, irradiating the moving target volume in accordance with an irradiation plan which comprises a plurality of raster points to be irradiated, wherein during the irradiation of a raster point it is detected which of the motional states is occupied by the moving target volume, assigning raster points to subirradiation plans and determining the actual effective dose for each of the plurality of volume elements, in each case from contributions from the raster points of the subirradiation plans using the transformation parameters.
Type:
Application
Filed:
September 25, 2008
Publication date:
December 2, 2010
Applicants:
GSI Helmholtzzentrum fuer Schwerionenforschung GmbH, Siemens AG
Inventors:
Christoph Bert, Gerhard Kraft, Eike Rietzel, Alexander Gemmel
Abstract: A fibre laser system is disclosed comprising an optical fibre, a part of which is doped with a rare earth to form an optical gain medium; at least one laser diode; means for applying pump radiation from the laser diode to the optical gain medium and for generating a laser beam and delivery fibre means for delivering a laser beam to a workpiece, wherein the fibre laser is provided with at least one means for protecting one or more components from damage caused by errant radiation. Several different means of protection are disclosed.
Abstract: Laser-based methods and systems for removing one or more target link structures of a circuit fabricated on a substrate includes generating a pulsed laser output at a predetermined wavelength less than an absorption edge of the substrate are provided. The laser output includes at least one pulse having a pulse duration in the range of about 10 picoseconds to less than 1 nanosecond, the pulse duration being within a thermal laser processing range. The method also includes delivering and focusing the laser output onto the target link structure. The focused laser output has sufficient power density at a location within the target link structure to reduce the reflectivity of the target link structure and efficiently couple the focused laser output into the target link structure to remove the target link structure without damaging the substrate.
Type:
Grant
Filed:
January 31, 2007
Date of Patent:
November 23, 2010
Assignee:
GSI Group Corporation
Inventors:
Bo Gu, Donald V. Smart, James J. Cordingley, Joohan Lee, Donald J. Svetkoff, Shepard D. Johnson, Jonathan S. Ehrmann
Abstract: A position transducer system is disclosed for a limited rotation motor that includes an illumination source that directs illumination toward an illumination reflector that rotates with a rotor of the limited rotation motor, and a plurality of detector areas adjacent the illumination source for receiving modulated reflected illumination from the illumination reflector.
Type:
Grant
Filed:
June 4, 2007
Date of Patent:
October 26, 2010
Assignee:
GSI Group Corporation
Inventors:
Kurt Sidor, Adam Pinard, Kristopher Pruyn
Abstract: The invention relates to a multi-layered radiation protection wall for shielding against gamma and/or particle radiation of a reaction site of an accelerator facility, wherein the radiation protection wall comprises a sandwich-like structure with at least a first and a second layer arrangement, wherein the first layer arrangement has at least a primary shielding layer and the second layer arrangement has at least a secondary shielding layer. Thereby, at least one of the first and the second layer arrangements is sub-divided into a plurality of wall segments, whereby a selective disposal is made possible. Thus an increased cost efficiency is achieved and the environmental impact is lowered.
Abstract: A laser processing system is disclosed for providing a relatively small velocity of a laser beam at target location while at least one scanner scans at a relatively larger velocity. The system includes a laser source, a first scanning unit, a beam expander, a second scanning unit and focusing optics. The laser source is for providing a pulsed laser output having at least one beam with a beam dimension. The first scanning unit is for scanning the laser output in a first direction along a first axis at the target location. The beam expander is for receiving the laser output and for modifying a beam diameter of the laser output and providing a modified laser output. The second scanning unit is for scanning the modified laser output from the beam expander in a second direction along the first axis at the target location.
Type:
Grant
Filed:
July 26, 2007
Date of Patent:
October 19, 2010
Assignee:
GSI Group Corporation
Inventors:
Adam I. Pinard, Kurt Pelsue, Felix Stukalin
Abstract: A system and method for inspecting machine readable marks on one side of a wafer without requiring transmission of radiant energy from another side of the wafer and through the wafer. The wafer has articles which may include die, chip scale packages, circuit patterns and the like. The marking occurs in a wafer marking system and within a designated region relative to an article position. The articles have a pattern on a first side. The method includes the steps of imaging a first side of the wafer, imaging a second side of the wafer, establishing correspondence between a portion of first side image and a portion of a second side image, and superimposing image data from the first and second sides to determine at least the position of a mark relative to an article.
Type:
Grant
Filed:
November 30, 2007
Date of Patent:
November 16, 2010
Assignee:
GSI Group Corporation
Inventors:
Christian Nemets, Michael Woelki, Amit V. Engineer