Abstract: A reticle pod with drain structure comprises an outer container and an inner container, wherein an upper cover of inner container is disposed with a plurality of retainers, and a plurality of supporters disposed on the outer container are used to press the retainers for fastening and stabilizing the reticle in the inner container and thus ensuring safety and stability of the reticle in the reticle pod. Collision risks of the reticle in the reticle pod due to vacillation of reticle pod during transportation can be reduced. Cost of reticles also can be greatly decreased. Further, a plurality of drain holes is disposed on a lower cover of the outer container for draining the remained water in the outer container. It will be done without disassembling the lower cover of outer container for reducing the contamination opportunity in the pod and preventing from wasting of labor and time for disassembling.

Abstract: A photomask cleaning device includes a stage, a fluid dispenser, a scrubbing unit, a cover and a fixing unit. The fluid dispenser includes a direct dispensing unit disposed correspondingly to the scrubbing unit, and an oblique dispensing unit obliquely spraying water onto a photomask. Majority of the particles can be removed with the combined application of the oblique dispensing unit and the scrubbing unit.

Abstract: The present invention discloses a pod which includes a lower cover member, an upper cover member and a guiding locking piece. The guiding locking piece deployed on one side of the upper cover member of pod, the overall structure of which is formed by a flat base linking to a first slope that links to a second slope, two openings deployed on two side areas of the overall structure, and an upper locking piece and a lower locking piece deployed in each of two openings. When the mask is placed into the lower cover member of pod and is covered by the upper cover member, the mask is pushed to certain position and supported and locked by the upper locking piece and the lower locking piece.

Abstract: A mask box having a buckling structure includes a base, a cover and a plurality of buckling elements. The base is configured to support a mask and has a plurality of troughs. The cover covers the base and has a plurality of pivotal portions. The buckling elements are positioned to correspond to the troughs. Each buckling element includes an engaging block and an elastic arm connected to the pivotal portion. The engaging block moves away from the periphery of the cover when the engaging block is subjected to an external force. The engaging block is buckled into the trough via an elastic restoring force of the at least one elastic arm when the external force is removed. By this arrangement, the assembly of the buckling elements is simplified and its product cost is reduced. Further, the present invention conforms to the requirements for environmental protection.

Abstract: The present invention provides an anti-electrostatic cassette, which mainly comprises at least an electrostatic discharge (ESD) device connected electrically to the carrying frames, which are disposed in the substrate cassette and carry the substrates, and to the handles, which are disposed on the outer sides of the substrate cassette, for forming the conductive path. By means of the contact between the equipment and the two handles of the substrate cassette, the residual static charges on the substrates are conducted to the ground for reducing the residual static charges on the substrates. Consequently, the ESD phenomena in the substrates due to friction can be avoided and hence preventing the damages in the substrates caused by static charges.

Abstract: The present invention provides a chuck structure for substrate cleansing equipment, which comprises a base and at least a pair of clipping members. The pair of clipping members is disposed on both corresponding sides of the base, respectively. Each clipping member has a plurality of holes on a surface thereof. When the pair of clipping members moves towards the base, it clips a substrate such as a photomask, a wafer, or other semiconductor substrate. The surfaces of the clipping members having the plurality of holes are against the substrate for reducing the contact area between the clipping members and the substrate. Thereby, the static charges generated on the substrate by the friction between the clipping members and the substrate can be avoided, which can reduce the damages on the substrate due to electrostatic discharge effectively.

Abstract: The present invention relates to a reticle pod having gas guiding apparatus. The gas guiding apparatus communicates with at least an inlet of the reticle pod and comprises a first outlet corresponding to a first gas flowing space of the reticle pod and a second outlet corresponding to a second gas flowing space. When the inlet supplies a high-purity gas to the gas guiding apparatus, the high-purity gas will flows through the gas guiding apparatus, and flow to the first and second gas flowing spaces via the first and second outlets, respectively to distribute uniformly in the first and second gas flowing spaces. In addition, the cleaning efficiency on the reticle is improved; the contact between the reticle and air can be avoided for protecting the reticle. Thereby, the usage of the high-purity gas is reduced, and the filling efficiency of the high-purity gas is enhanced.

Abstract: A Front Opening Unified Pod (FOUP) has a pair of latch structures, and the latch structures install in a door of the FOUP. The latch structures use a circular rotary turntable to drive a pair of sliding devices, let the latch structures can lock or unlock more stabilized, and use sliding rollers respectively disposed on the sliding devices to prevent the generation of dusts.

Abstract: A substrate container having a limit structure includes a box, at least one limit structure and a door. The limit structure is disposed on a side wall of the box and has a plurality of limit grooves. Each limit groove has a first inclined surface and a second inclined surface. The angle of inclination of the second inclined plane relative to a horizontal plane corresponds to a coefficient of friction between materials of the substrate and the limit structure to lower the friction between the substrate and the second inclined plane of the limit groove, so that the substrate can ascend along the second inclined plane to get into the limit groove for the door to be closed smoothly. Through the limit structure to position the substrate, the present invention can prevent the substrate from shaking in the substrate container.

Abstract: A FOUP (front opening unified pod) is disposed with a plurality of supporting pieces, the positions of which are calibrated to be symmetrical for the supporting pieces to horizontally support wafers in the pod, and with an OHT pad (overhead hoist transport pad), a major function of which is to evenly distribute the weight of the FOUP and the wafers so that the transportation of the FOUP and the wafers by the OHT head can be further stabilized and more weight can be loaded to meet the demands of the process.

Abstract: The present invention provides a limit member having a protection cover. The limit member is disposed in a substrate container and holds against the edge of at least one substrate received in the substrate container. The limit member has at least one limit portion and at least one protection cover. The protection cover is disposed on the limit portion. When the limit portion holds against the edge of the substrate, the substrate is against the protection cover on the limit portion, not being direct contact with the limit portion. This prevents the substrate from rubbing against the limit member to bring contamination particles, and further prevents the passivation layer of the substrate from being broken to pieces by the limit member to bring more contamination particles.

Abstract: The invention proposes a device for cleaning photomask comprising a wiping member wrapped on the surface of a central axle and unceasingly washed by cleaning fluid. When the photomask contacts the central axle, the washed wiping member can clean the photomask by rotation of the central axle in light of direction of the photomask's moving. After being wiped clean, the photomask will not be stained with dust or dirt.

Abstract: A package structure used to load substrate storage containers for convenience of transportation is revealed. The package structure includes a package box and at least one buffer pad. The buffer pad is disposed in the package box and used for loading a substrate storage container. The density of the buffer pad is smaller than 70 kg/m3. The buffer pad not only separates the package box from the substrate storage container but also absorbs vibration from outside of the package box so as to prevent the vibration from being transmitted to the substrate storage container completely. The amount of vibration that has an impact on the substrate storage container is reduced.

Abstract: A gas charging check valve uses a first elastic element and a second elastic element, which respectively provide elastic force on a top valve and a bottom valve. The top valve and the bottom valve correspond to each other as a set. When the gas charging device is moved to apply an external force on a movement control portion of the gas charging check valve, the second elastic element removes the elastic force applied on the bottom valve to reduce the required gas inject force for a valve formed by the top valve and the bottom valve so that the gas can enter the valve more easily.

Abstract: The present invention relates to a front opening unified pod (FOUP) having three inlets and one outlet. Thereby, the mixing region for the moisture, oxygen, and the filled gas can be increased and the removing efficiency of the moisture and oxygen in the FOUP is enhanced, improving the purging efficiency of the FOUP and shortening the time required for filling gas. In addition, the humidity in the FOUP can be reduced effectively so that the internal environment of the FOUP can reach rapidly the condition suitable for semiconductor fabrication. Hence, the subsequent semiconductor processes can be performed and the preparation time for the processes can be shortened.

Abstract: The wafer box conveyer includes a chassis, a transverse moving mechanism, a longitudinal moving mechanism, a loading mechanism and a shock reduction mechanism. The chassis includes a frame and a plurality of wheels mounted under the frame. The transverse moving mechanism is movably connected to the frame. The longitudinal moving mechanism is movably connected to the transverse moving mechanism. A moving direction of the longitudinal moving mechanism is perpendicular to that of the transverse moving mechanism. The loading mechanism includes at least one tray for a wafer box. The shock reduction mechanism is disposed between the at least one tray and the frame for absorbing a load of the tray.

Abstract: A method for providing peripheral technical support is revealed. A search of a peripheral technical problem is performed by a first server or a second server so that a peripheral supplier provides a firm a peripheral technology solution the firm required. Moreover, an external technology solution obtained by the second server is stored in the first server so as to expand the first server. While providing the solution for the problem of the external technique, the peripheral supplier also provides the firm a peripheral technical report or a peripheral technical model. Thus a better technical support is offered, allowing the firm to solve the peripheral technical problem the firm encountered.

Abstract: A reticle pod for storing reticles, into the gas channel of partition of which gas is filled through a gas inlet, wherein strong gas flow is formed around the pellicle film and the pellicle film expands outward in accordance with the Bernoulli's principle; when no gas is filled in through the gas inlet, the pellicle film contracts inward. Therefore, by turning on and shutting off the gas inlet valve, the pellicle film will be set in a breathing motion for the gas inside the pellicle film to be exchanged.

Abstract: A container for storing semiconductor devices is revealed. The container includes a receiving body and a cover. The receiving body is disposed with at least one fastener and at least one driver therein. The fastener includes a rolling element that is in contact with the driver. When the driver is rotated, it drives the fastener to move in the receiving body. At least one fixing part of the fastener is moved toward at least one fastening part of the cover. The cover is fixed on the receiving body by the fixing part locked in the fastening part. Moreover, friction between the fastener and the driver is minimized by the rolling element which reduces contact area between the fastener and the driver so as to prevent production of contaminants in the container and protect semiconductor devices stored in the container from being polluted. Thus the container is of high cleanness.