Abstract: A reticle POD, comprising a top cover, a bottom cover, and a plurality of supporting components deployed in the four corners of the bottom cover, the supporting component comprising: a base body perpendicularly assembled, on two sides of which being disposed with mounting blocks; a pair of elastic elements respectively placed on the base body; a pair of leading elements connecting respectively to the horizontal extension of the elastic elements and then extending lengthwise to form a tip, a first bevel and a second bevel being formed on the side of the tip located on the inner side of the base body; a supporting base plate, the first and the second ends of which being connected to the second bevel of the leading element and a supporting pillar being disposed on the third end of the supporting base plate.

Abstract: A wafer container includes a container body, formed by a pair of side walls, a top surface, and a bottom surface, on one sidewall of which is formed with an opening and on the other sidewall opposite to the opening is formed with a back wall, a supporting module being disposed on each of said sidewall for supporting a plurality of wafers; and a door joining with opening of the container body with its inner surface for protecting the plurality of wafers within the container body, the characteristic in that: a purgeable supporting module is respectively disposed between each side wall of the container body and the back wall, a long slot is further disposed on the side of purgeable supporting module facing the opening, and an air inlet is further disposed on one end of the purgeable supporting module for being connected to an gas valve, wherein the purgeable supporting module is formed by a plurality of supporting ribs vertically arranged at intervals.

Abstract: The present invention relates a sealing apparatus with interlocking air inflation device for wafer carrier and a sealing method thereof, wherein the sealing apparatus is disposed between a wafer container and a cover of a wafer carrier, used for sealing the cover and the wafer container when the cover is closed to the wafer container. The sealing apparatus comprises: at least one latch set, at least one interlocked cam, an air inflation sealing member, and at least one air intake/outtake valve, wherein the interlocked cam is adopted for connecting an interlocking device having an air inflation member, and the interlocking device can be used to drive the interlocked cam for making the latch set bolt the cover and the wafer container, and inflate the air inflation sealing member through the air inflation member thereof and the air intake/outtake valve in order to inflate and expand the air inflation sealing member.

Abstract: A container having a top cover and a bottom cover is provided, which includes a canopy disposed on the bottom cover to form therewith a space to accommodate an article. A plurality of locators is disposed on a surface of the bottom cover so that when the bottom cover is tightly combined with the top cover, the locators are clipped between the bottom cover and the top cover to orient the canopy in a fixed position.

Abstract: A wafer container including a container body having an opening formed on one sidewall and a door joining with the opening, the characteristic of the wafer container in that: A latch component disposed in a platform of the door comprising an oval cam with an arrester disposed at its center, one surface of the oval cam being disposed with at least a groove, a pair of moving bars respectively having an engaging portion that is engaged in the groove for the pair of moving bars to be engaged with the oval cam, a guiding element disposed at the center of the oval cam, and a long narrow spring framingly disposed on the guiding element, wherein the arrester is used to control the rotation of the oval cam for the moving bars to go to and fro between the pair of socket holes and the pair of latch holes.

Abstract: A wafer container includes a container body, a door, and a purging valve, wherein the purging valve is disposed in the through hole of the container body. The purging valve includes a fixed sleeve body, a purging head, an elastic component, and a valve lid. The fixed sleeve body comprises a base, and a lower opening is formed at the center of the base for the purging head to be disposed therein. The purging head comprises a bottom portion and a hollow sleeve portion protruding upward from the bottom portion, wherein the hollow sleeve portion is surroundingly disposed with elastic component and with vent disposed on its circumference wall. The valve lid is disposed on top of the hollow sleeve portion so that the purging head can move from the first position to the second position inside the fixed sleeve body when being propped up by an upward force.

Abstract: This invention is related to a carrier of reticle pod. The carrier of reticle pod comprises an upper cover and a lower cover, and the upper cover is configured to be coupled to the lower cover to form an interior space for accommodation. The lower cover includes several pairs of guide tracks disposed on two opposite lateral sides of inner surface of the lower cover. Clapboards are set into the lower cover via the guide tracks to separate the space for accommodation into a plurality of spaces for accommodation for storing reticle pod. Fixing elements including a clipping portion and a resisting portion are disposed on the top surface of the inner surface of upper cover. When the upper cover closes the lower cover, each fixing element of the upper cover is configured to be coupled to each reticle pod stored in the carrier.

Abstract: The present invention relates to a photomask case structure, and more particularly to a photomask case able to firmly fix position of a photomask, which includes an upper cover, a lower cover, supporters and position fixing pieces. Accordingly, when a photomask is retained within the photomask case, then elastic holding portions of the position fixing pieces are used to elastically hold one side of the photomask, beveled edges of the position fixing pieces are used to hold another side of the photomask, and finally press portions of the elastic holding portions are used to elastically press down on the surface of the photomask, thereby firmly retaining the photomask within the photomask case, and preventing impact damage to the photomask from occurring.

Abstract: The wafer container includes a container body, which is disposed with a plurality of slots for receiving a plurality of wafers therein and an opening is formed by one sidewall of which for importing and exporting the plurality of wafers, and a door includes an outer surface and an inner surface, which is joined with the opening of the container body via the inner surface for protecting the plurality of wafers within the container body. A latch component is disposed in a platform of the inner surface of the door, which includes an oval cam, a pair of moving bars contacting two ends of the oval cam, at least a pair of roller disposed in the platform and each of roller fixed in a slide groove of each moving bar, and a locating spring being an integral part of each moving bar for controlling the turning of the oval cam to drive the each moving bar.

Abstract: A gas filling apparatus used to fill a photomask box with gas such as nitrogen or other inert gas. The gas filling apparatus of the present invention has a gas filling chamber provided with a plurality of first pillared elements, a plurality of second pillared elements, at least one gas inlet, at least one gas outlet, and a plurality of clamping elements; wherein the first pillared elements are used to couple with the recesses on a cover member of the photomask box, the second pillared elements are used to prop against the peripheral of a cover member of the photomask box, and the clamping elements respectively prop against two opposite sides of the cover member of photomask box, whereby the gas inlets and the gas outlets are respectively coupled with the through holes formed on the lower cover member of the photomask box and the gas can be filled into and exhausted from the photomask box.

Abstract: The present invention provides a gas filling apparatus and gas filling port thereof. The gas filling apparatus is connected with the air feed apparatus which is introduced the gas into the first inlet port of the semiconductor device or reticle storage apparatus. The gas filling apparatus includes a supporting base which is provided to hold the storage apparatus thereon, and at least one second inlet port which is disposed on the first inlet port of the storage apparatus so as to the gas is flowed into the storage apparatus through the second inlet port. The second inlet port includes a first base, a second base, a first elastic element, a fixing element, and a switch device. Both of the first base and second base have through holes, and opposite to each other. The first elastic element is used to maintain the airtight and is disposed on the second base and opposite to the first inlet port of the storage apparatus used to maintain the airtight.

Abstract: The present invention discloses a sealing apparatus of a wafer carrier and a sealing method, and the wafer carrier is comprised of a wafer container and a cover, and includes a latch unit for integrally latch the wafer container and the cover. The wafer container has an open distal portion disposed on a surface of wafer container, and the sealing apparatus is installed between the open distal portion and the cover. The sealing apparatus includes an air intake/outtake valve and an air inflation sealing unit coupled to the air intake/outtake valve, and the air intake/outtake valve performs an air inflation to expand the air inflation sealing unit, and the wafer container and the cover are elastically latched after the inflation and the expansion of the air inflation sealing unit to achieve the sealing effect.

Abstract: The present invention provides an equipment for measuring the vertical distance or pitch between a plurality of thin substrates inside a container body, including an optical component to transmit a light beam to a thin substrate in the container body and receive light beam reflected from the thin substrate, a scanning device to drive the optical component to move along vertical direction of the thin substrates for measuring the vertical distance or pitch between the plurality of thin substrates in the container body, and a rotation base to carry and rotate the container body to a plurality of angles for the plurality of thin substrates inside the container body to be measured from different angular positions.

Abstract: A photo mask retainer, mounted inside a photo mask delivery box for holding a photo mask, in which the photo mask retainer includes a base, a U-turn extending from the top of the rear side of the base and curving toward the top side of the base, a bearing portion formed on the free end of the U-turn for pressing on the vertical peripheral sidewall of the photo mask, a retaining end portion formed on the free end of the U-turn for pressing on the top surface of the photo mask, and a clamp extending from the front side of the base for fastening to a respective locating block on the wall surface of the photo mask delivery box

Abstract: A wafer holding device for a wafer pod is disclosed. The disclosed wafer holding device includes a support frame mounted on one side of the housing of the wafer pod, an actuating frame, two rotating arms and two wafer retainers. When the housing and the base of a wafer pod are assembled, the actuating frame moves and forces the wafer retainers to rotate in a direction perpendicular to the edge surface of the wafers.

Abstract: A photomask cleaner includes a clamp assembly using clamping plates with an elastic buffer device for clamping a photomask to be cleaned positively, a displacement mechanism for moving the clamp assembly among workstations subject to a predetermined track, a cleaning unit installed in one workstation for cleaning the photomask carried by the clamp assembly, and an air dryer installed in one workstation for drying the well-cleaned photomask carried.

Abstract: A gas filling system includes a work platform installed in a pod storage cabinet and defining an accommodation chamber for holding a photomask pod, a pod detaching mechanism disposed in one side of the work platform and controllable to unlock the locking members of the photomask pod for allowing removal of a cover member of the photomask pod from its support tray, and a displacement mechanism mounted in a second side of the work platform and controllable to separate the support tray and the cover member of the photomask pod for allowing filling of an inert gas into the accommodation chamber.

Abstract: A photomask positioning apparatus comprises a positioning device having a base, one end of which comprises a bended fixed portion connected to a bottom of the containing space and the other of which is away from the fixed portion comprises a bended positioning portion such that a photomask can be positioned between the positioning portion set at the two sides of the containing space.

Abstract: An airtight semiconductor transferring container is disclosed to included a container base, an elastically deformable packing member covered on the top surface of the container base, and a top cover closed on the container base, the top cover having an outer cover body, and an elastically deformable inner lining shell fitted into the outer cover body, the elastically deformable inner lining shell having a downwardly protruding peripheral flange, which is pressed on the border area of the elastically deformable packing member to keep the inside space of the airtight semiconductor transferring container in an airtight status after closing of the top cover on the container base.

Abstract: A pellicle frame for pellicle for use with a photomask in a wafer lithographic processing process is disclosed to have the frame body made of a material containing silver that absorbs sulfide released from other materials of the pellicle, preventing formation of crystals on the mask pattern of the photomask after exposure. In an alternate form, the pellicle frame is made of aluminum alloy, ceramics, or stainless steel, and then coated with a layer of silver and a black coating of polymer, for example, Teflon, PEEK (Polyaryletherketone) or PFA (Perfluoroalkoxy).