Abstract: A semiconductor container molded from a plastic material containing silver that absorb sulfide to prevent crystal formation on masks/wafers carried in the enclosed storage space inside the semiconductor container during a photolithographic process under the radiation of a deep-ultraviolet light source. In an alternate form of the invention, the inside wall of the semiconductor container is coated with a layer of silver to absorb sulfide. In another alternate form of the present invention, blocks of silver are fixedly provided inside the semiconductor container to absorb sulfide in the enclosed storage space.

Abstract: An apparatus suitable for holding a photomask comprises a photomask holder having a plurality of through holes and a plurality of protrusions detachably connected to the photmask holder via the through holes. The photomask is positioned on supporting ridges of the protrusions so that the friction between the protrusions and the photomask is prevented, and the generation of particulates can be effectively reduced.

Abstract: A photomask positioning apparatus comprises a positioning device having a base, one end of which comprises a bended fixed portion connected to a bottom of the containing space and the other of which is away from the fixed portion comprises a bended positioning portion such that a photomask can be positioned between the positioning portion set at the two sides of the containing space.

Abstract: The present invention relates to an apparatus of holder of photomask for holding the photomask, which is placed in the transfer box and to be exposed by projecting light during process of manufacturing semiconductor, and more particularly to one being able to prevent the photomask from friction with the protrusions therein in consequence of not creating any dust particle. The holder is made of material of PEEK or VESPEL, which is abrasion resisting and high hardness. On the side of the protrusion is shaped in inclination toward center with the top in long cambered surface as supporting ridge. And, at distal end of the supporting ridge, a pedestal is given to jointly integrate with the holder so that the photomask can be placed thereon. Thus, by means of the supporting ridge with the long cambered surface of the protrusion to uphold photo mask, the contacting area of friction is reduced.

Abstract: A method of manufacturing aluminum frames for photomask protective films comprises the step of: providing a square-shaped hollow or solid strut aluminum material, fastening the bottom end of the aluminum material to a base of a machine tool, using a milling cutter to fabricate and form a hollow trough for a selected depth in the aluminum material from the top surface thereof, and using a cutting tool to cut off the aluminum material at the periphery of the hollow trough to form individual aluminum frames for the photomask protective films. The method of the invention uses fewer chucks and screw bolts during machining, and can reduce chuck setup time and simplify machining processes.

Abstract: A method of manufacturing aluminum frames for photomask protective films comprises the step of: providing a square-shaped hollow or solid strut aluminum material, fastening the bottom end of the aluminum material to a base of a machine tool, using a milling cutter to fabricate and form a hollow trough for a selected depth in the aluminum material from the top surface thereof, and using a cutting tool to cut off the aluminum material at the periphery of the hollow trough to form individual aluminum frames for the photomask protective films. The method of the invention uses fewer chucks and screw bolts during machining, and can reduce chuck setup time and simplify machining processes.