Patents Assigned to Hitachi Chemical Co.
  • Publication number: 20130120948
    Abstract: The present invention provides a circuit component that enables satisfactory connection between a substrate and an IC chip and a method of making the same. The circuit component includes an IC chip and a substrate connected to each other using an electrically conductive adhesive containing electrically conductive particles. Bump electrodes and a non-electrode surface are provided on a mounting surface of the IC chip. The non-electrode surface is a portion of the mounting surface other than a portion where the bump electrodes are formed. Electrically conductive particles are placed in a first state between the surfaces of the substrate and the non-electrode surface so as to be in contact with both surfaces. Electrically conductive particles are placed in a second state between the surfaces of both the substrate and the bump electrodes, so as to be more flattened than the first state and dig into the bump electrodes.
    Type: Application
    Filed: October 26, 2012
    Publication date: May 16, 2013
    Applicant: HITACHI CHEMICAL CO., LTD.
    Inventor: Hitachi Chemical Co., Ltd.
  • Patent number: 8439995
    Abstract: A polishing slurry for semiconductor planarization containing cerium oxide particles and water, wherein the content of the cerium oxide particles having a diameter of 3 ?m or more is 500 ppm or less (weight ratio) in a solid, preferably 100 ppm or less and it is more preferable that D99 (99% by volume of the whole particles in polishing slurry) of the cerium oxide particles is 1 ?m or less. The polishing slurry can reduce the generation of scratches, and can polish a surface of the semiconductor substrate in the wiring formation process of semiconductor device precisely at a high speed.
    Type: Grant
    Filed: April 16, 2010
    Date of Patent: May 14, 2013
    Assignee: Hitachi Chemical Co., Ltd.
    Inventor: Kanshi Chinone
  • Publication number: 20130115616
    Abstract: Embodiments of the invention relate generally to methods detecting, quantifying, or purifying nucleic acids by way of agglutination reactions. Several embodiments amplify target nucleic acids while incorporating a label such as 5-methyl-cytosine into amplified product and detecting, quantifying, or purifying the product with latex beads coupled to antibody reactive to the 5-methyl-cytosine labeled nucleic acid. Several embodiments incorporate DNA labels into specifically designed primers in order to detect, quantify, or purify a product after agglutination.
    Type: Application
    Filed: July 13, 2011
    Publication date: May 9, 2013
    Applicants: HITACHI CHEMICAL RESEARCH CENTER, INC., HITACHI CHEMICAL CO., LTD.
    Inventor: Cindy Yamamoto
  • Patent number: 8418818
    Abstract: The present invention is to provide a friction material composition comprising a fibrous material except for asbestos, an inorganic friction regulating agent, an organic friction regulating agent and a binder, wherein active alumina is contained as the inorganic friction regulating agent, and a fluorine series polymer is contained as the organic friction regulating agent, and to provide a friction material using the friction material composition.
    Type: Grant
    Filed: February 5, 2004
    Date of Patent: April 16, 2013
    Assignees: Hitachi Chemical Co., Ltd., Japan Brake Industrial Co., Ltd.
    Inventors: Manabu Ono, Teruyuki Nagayoshi, Mitsuhiro Inoue, Takenori Abe
  • Publication number: 20130089855
    Abstract: Embodiments of the invention relate generally to methods of diagnosing diseases and measuring homeostatic states. In particular, the methods described here are used to characterize RNA from vesicles for expression of disease related markers. Embodiments of the invention also relate generally to the characterization of RNA by using sensitive techniques such as PCR to internally sample organ health using whole blood.
    Type: Application
    Filed: December 10, 2012
    Publication date: April 11, 2013
    Applicants: HITACHI CHEMICAL RESEARCH CENTER, INC., HITACHI CHEMICAL CO., LTD.
    Inventors: HITACHI CHEMICAL CO., LTD., HITACHI CHEMICAL RESEARCH CENTER, INC.
  • Patent number: 8415081
    Abstract: The present invention discloses a photosensitive resin composition which comprises (A) a compound having a molecule with at least one thiirane ring and a total number of a thiirane ring and/or an epoxy ring of at least 2 in the molecule, and (B) a photo acid generator, said composition having a refractive index of at least 1.6, and a method of obtaining a high refractive index periodical structure which comprises subjecting the photosensitive resin composition to photolithography.
    Type: Grant
    Filed: June 17, 2004
    Date of Patent: April 9, 2013
    Assignees: Cornell Research Foundation, Inc., Hitachi Chemical Co., Ltd.
    Inventors: Christopher K. Ober, Yasuharu Murakami
  • Publication number: 20130084577
    Abstract: Embodiments of the invention relate generally to ex vivo methods of quantifying expression of interferon responsive genes and characterizing an individual's potential responsiveness to interferon administration. Certain embodiments relate to methods to monitor the efficacy of ongoing interferon therapy by evaluating expression of interferon responsive genes before and after interferon administration.
    Type: Application
    Filed: May 3, 2011
    Publication date: April 4, 2013
    Applicants: HITACHI CHEMICAL CO., LTD., THE CLEVELAND CLINIC FOUNDATION, HITACHI CHEMICAL RESEARCH CENTER, INC.
    Inventors: Masato Mitsuhashi, Ernest C. Borden
  • Publication number: 20130075142
    Abstract: An adhesive composition for connection between a first circuit member having a first connecting terminal on the main surface and a second circuit member having a second connecting terminal on the main surface, wherein the first circuit member and/or second circuit member are made of a base material containing a thermoplastic resin with a glass transition temperature of no higher than 200° C., the first connecting terminal and/or second connecting terminal are made of ITO and/or IZO, and the adhesive composition includes a phosphate group-containing compound, the free phosphate concentration of the cured adhesive composition being no greater than 100 ppm by mass.
    Type: Application
    Filed: March 24, 2011
    Publication date: March 28, 2013
    Applicant: HITACHI CHEMICAL CO., LTD.
    Inventors: Hiroyuki Izawa, Shigeki Katogi
  • Publication number: 20130048921
    Abstract: A conductive material used for connecting electrodes of a solar battery cell and wiring members, the conductive material comprising a resin binder; and a conductive particle dispersed in the resin binder, wherein the conductive particle comprises a phosphorous-containing copper alloy having a phosphorus content of 0.01% by mass or more and 8% by mass or less.
    Type: Application
    Filed: July 23, 2012
    Publication date: February 28, 2013
    Applicant: HITACHI CHEMICAL CO., LTD.
    Inventors: Yasuo Tsuruoka, Takeshi Nojiri, Shuuichirou Adachi, Takahiro Fukutomi, Waka Inoue, Kenzou Takemura, Michio Uruno
  • Patent number: 8362199
    Abstract: Interlayer insulating films 5,7 (insulating films) provided in a memory capacitor cell 8 are formed between a gate electrode 3 and a counter electrode 8C formed on a silicon wafer 1. The interlayer insulating films 5,7 comprise a borazine-based resin, having a specific dielectric constant of no greater than 2.6, a Young's modulus of 5 GPa or greater and a leak current of no greater than 1×10?8 A/cm2.
    Type: Grant
    Filed: June 1, 2009
    Date of Patent: January 29, 2013
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Hiroshi Matsutani, Makoto Kaji, Koichi Abe, Yuko Uchimaru
  • Publication number: 20130014446
    Abstract: A cerium salt wherein, when 20 g of the cerium salt is dissolved in a mixed liquid of 12.5 g of 6N nitric acid and 12.5 g of a 30% hydrogen peroxide aqueous solution, a concentration of an insoluble component present in the solution is 5 ppm or less by mass ratio to the cerium salt before dissolution and cerium oxide produced by processing the cerium salt at high temperatures. Scratch on a surface to be polished can be reduced when a cerium based polishing slurry containing the cerium oxide particles is used, since an amount of impurities in cerium oxide particles and cerium salt particles, raw material thereof, is reduced for high purification.
    Type: Application
    Filed: September 24, 2012
    Publication date: January 17, 2013
    Applicant: HITACHI CHEMICAL CO., LTD.
    Inventor: HITACHI CHEMICAL CO., LTD.
  • Publication number: 20130010849
    Abstract: A wireless transmission system includes a wireless HDMI transmitter and a wireless HDMI receiver. The wireless HDMI transmitter includes a carrier oscillator provided for each channel of an HDMI transmission path to output a carrier signal in a millimeter band, an OOK modulator provided for each carrier oscillator to perform on-off keying modulation on a carrier signal outputted by its corresponding carrier oscillator, and an input circuit provided for each channel of the HDMI transmission path to input a digital signal outputted by a source device to the OOK modulator. Radio signals have different planes of polarization from their adjacent channels.
    Type: Application
    Filed: March 17, 2011
    Publication date: January 10, 2013
    Applicants: Silicon Library Inc., Hiroshima University, Hitachi Chemical Co., Ltd.
    Inventors: Junzoh Shimizu, Minoru Fujishima, Masahiko Ohta, Toshio Takada
  • Publication number: 20120322944
    Abstract: The present invention is directed to polymeric materials including a copolymer of at least a first and second monomer that have desirable electrical and optical properties, such as a low band gap and near infrared (NIR) absorption, respectively. More specifically, the present invention is directed to polymeric materials with charge neutrality that display increased solubility in aqueous media while retaining their electrical and optical properties. The polymeric materials in accordance with the present invention can be modified with any desired functional group to tailor the polymer materials for a specific application. Also described are methods of making the polymeric materials in accordance with the present invention.
    Type: Application
    Filed: March 28, 2011
    Publication date: December 20, 2012
    Applicants: HITACHI CHEMICAL RESEARCH CENTER, INC., HITACHI CHEMICAL CO., LTD.
    Inventor: Cuihua Xue
  • Patent number: 8334129
    Abstract: Problem to be Solved: To provide a new microorganism capable of producing a polyhydroxyalkanoate (PHA), a PHA synthase gene, an expression cassette including the gene, a vector including the expression cassette, a transformant transformed by the vector, a polypeptide having PHA synthase activity, a method for producing a PHA synthase and a method for producing a PHA. Solution: The new microorganism is capable of producing a polyhydroxyalkanoate comprising a 16S rRNA gene whose polynucleotide sequence shows 99% or more homology to a polynucleotide sequence represented by SEQ ID No: 1, having an optimum temperature of an activity temperature range for the growth and PHA production of the microorganism of at least 45° C. and being capable of growing at a pH range from 6 to 10.
    Type: Grant
    Filed: July 9, 2009
    Date of Patent: December 18, 2012
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Yasuharu Satou, Kenji Tajima, Masanobu Munekata, Tokuo Matsushima
  • Patent number: 8328893
    Abstract: The present invention provides a method of producing oxide particles, comprising a step of mixing a metal carbonate with an acid to give a mixture, a step of heating the mixture to give a metal oxide and a step of pulverizing the metal oxide, and slurry wherein metal oxide particles obtained by the above method of producing are dispersed in an aqueous medium, a polishing slurry, and a method of polishing a substrate. Particularly, the present invention provides a polishing slurry containing cerium oxide particles obtained by using cerium carbonate as the metal carbonate material and oxalic acid as the acid. The present invention provides a method of producing oxide particles, wherein coarse particle- and abrasion powder-free fine particles can be rapidly obtained. The present invention also provides a polishing slurry using the oxide particles, which can maintain a suitable polishing rate, can reduce generation of scratches, and can accurately polish the surface of a semiconductor.
    Type: Grant
    Filed: April 20, 2007
    Date of Patent: December 11, 2012
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Takafumi Sakurada, Daisuke Hosaka, Kanshi Chinone
  • Patent number: 8323604
    Abstract: A cerium salt wherein, when 20 g of the cerium salt is dissolved in a mixed liquid of 12.5 g of 6N nitric acid and 12.5 g of a 30% hydrogen peroxide aqueous solution, a concentration of an insoluble component present in the solution is 5 ppm or less by mass ratio to the cerium salt before dissolution and cerium oxide produced by processing the cerium salt at high temperatures. Scratch on a surface to be polished can be reduced when a cerium based polishing slurry containing the cerium oxide particles is used, since an amount of impurities in cerium oxide particles and cerium salt particles, raw material thereof, is reduced for high purification.
    Type: Grant
    Filed: September 20, 2010
    Date of Patent: December 4, 2012
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Kanshi Chinone, Seiji Miyaoka
  • Publication number: 20120295818
    Abstract: A culturing method includes culturing a sample having one or more species of target pathogens of a detection assay and competing microorganisms under oxygen-poor condition in a growth medium. The growth medium can be a non-selective medium. The oxygen-poor condition is effective to prevent competing microorganisms from suppressing growth of the target pathogens. This method can be used in combination with a sample preparation method for large volume particulate samples using highly porous filter material and porous spherical filter aid.
    Type: Application
    Filed: January 24, 2011
    Publication date: November 22, 2012
    Applicants: HITACHI CHEMICAL RESEARCH CENTER, INC., HITACHI CHEMICAL CO., LTD.
    Inventor: Taku Murakami
  • Publication number: 20120282623
    Abstract: Methods for selectively detecting a live pathogen in a sample containing live and dead pathogens, without detecting the dead pathogen are disclosed. Such methods may include: (i) immobilizing at least a portion of the live and dead pathogens on a solid support with a physical barrier; (ii) incubating the solid support in a growth medium, where the live pathogen can multiply and the multiplied pathogen move from the solid support to a supernatant of the growth medium; and (iii) detecting the multiplied pathogen in the supernatant by a pathogen assay.
    Type: Application
    Filed: January 24, 2011
    Publication date: November 8, 2012
    Applicants: Hitachi Chemical Research Center, Inc., Hitachi Chemical Co., Ltd.
    Inventors: Taku Murakami, Toshit Sen
  • Publication number: 20120273974
    Abstract: The adhesive composition of the invention comprises a radical generator, a thermoplastic resin and a urethane (meth)acrylate having two or more radical-polymerizing groups in the molecule and a weight-average molecular weight of 3000-30,000.
    Type: Application
    Filed: June 12, 2012
    Publication date: November 1, 2012
    Applicant: HITACHI CHEMICAL CO., LTD.
    Inventors: Shigeki Katogi, Hiroyuki Izawa, Houko Sutou, Masami Yusa, Tohru Fujinawa
  • Patent number: 8293847
    Abstract: An object of the present invention is to provide a film-like adhesive capable of achieving a superior combination of processability and reflow resistance. A film-like adhesive of the present invention is used for bonding a semiconductor element to an adherend, and includes an adhesive layer comprising at least one resin selected from the group consisting of polyurethaneimide resins, polyurethaneamideimide resins and polyurethaneimide-polyurethaneamideimide resins.
    Type: Grant
    Filed: August 4, 2006
    Date of Patent: October 23, 2012
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Takashi Masuko, Minoru Sugiura, Shigeki Katogi, Masami Yusa