Patents Assigned to HITACHI HIGH-TECH CORPORATION
-
Publication number: 20250054270Abstract: Provided is a training data creation assistance device which, for an image on which a plurality of defects in an image are reflected, enables the efficient collection/selection of a training image by specifying a feature amount corresponding to each of the defects in a way that a peripheral area of the defect is also considered and by mapping the specified feature amount to a low dimensional space.Type: ApplicationFiled: December 17, 2021Publication date: February 13, 2025Applicant: Hitachi High-Tech CorporationInventors: Toshinori YAMAUCHI, Yasuhiro YOSHIDA, Masayoshi ISHIKAWA, Takefumi KAKINUMA, Masaki HASEGAWA, Kentaro OHIRA, Yasutaka TOYODA
-
Patent number: 12224157Abstract: A plasma processing apparatus having an improved yield includes a metal base member having a disk shape or a cylindrical shape arranged inside a sample table; a refrigerant flow path arranged multiple times in a concentrical shape around a center of the base member; at least one temperature sensor; and a controller configured to detect a temperature of the base member or the wafer using the temperature sensor. The controller is configured to detect the temperature of the base member or the wafer based on one of a plurality of linear functions indicating a relation between an error and a set temperature of the refrigerant, and the linear functions are different corresponding to regions of a plurality of continuous temperature ranges within an adjustable temperature range of the refrigerant, and the plurality of linear functions include the same coefficient and have a point where the error is 0.Type: GrantFiled: March 25, 2021Date of Patent: February 11, 2025Assignee: Hitachi High-Tech CorporationInventors: Yuki Tanaka, Takamasa Ichino, Shintarou Nakatani, Ryusuke Eijima
-
Patent number: 12222359Abstract: Provided are a sample container gripping device capable of gripping a sample container without allowing foreign matter to be mixed into a sample, a sample conveyance device comprising the sample container gripping device, and a connection device. This sample container gripping device for gripping a sample container accommodating a sample is characterized by comprising a pair of clamps that are kept outside of a conveyance path, which is for conveying a sample carrier upon which the sample container is placed, until the sample carrier is conveyed to a prescribed position and, when the sample carrier is conveyed to the prescribed position, move horizontally toward the conveyance path so as to grip the sample container from the horizontal direction at the prescribed position.Type: GrantFiled: July 29, 2020Date of Patent: February 11, 2025Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Taichiro Yamashita, Shigeki Yamaguchi, Masashi Endo
-
Patent number: 12222690Abstract: To facilitate evaluation of a predicted process shape in process recipe development using machine learning, a process recipe search apparatus that searches for an etching recipe that is a parameter of a plasma processing apparatus set so as to etch a sample into a desired shape displays, on a display device, the predicted process shape of the sample by a candidate etching recipe predicted by using a machine leaning model, by highlighting a difference between the predicted process shape and a target shape.Type: GrantFiled: July 8, 2021Date of Patent: February 11, 2025Assignee: Hitachi High-Tech CorporationInventors: Takashi Dobashi, Hiroyuki Kobayashi, Takeshi Ohmori
-
Patent number: 12222360Abstract: An automatic analyzer includes a flow cell detector, a nozzle that is connected to the flow cell detector by a flow path and aspirates or discharges liquid, a reservoir that is provided with a table and a table driving mechanism that rotates or moves the table up and down, and a cleaning tank that is disposed on the table. A position of the nozzle is fixed, and a cleaning water discharge port discharges cleaning water used for cleaning the nozzle at an angle ? with respect to a plane perpendicular to a central axis of the nozzle. An upper part of a side wall of the cleaning tank is continuous with an upper discharge unit at a side facing a discharge outlet provided in the reservoir and a spatula-shaped part projects outward of the cleaning tank at a side facing the upper discharge unit.Type: GrantFiled: February 26, 2020Date of Patent: February 11, 2025Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Yoshihiro Kabe, Takenori Okusa
-
Patent number: 12222357Abstract: Provided is an automatic analyzer in which a linear movement unit and a rotational movement unit that access to a same location can be arranged in a same plane. The automatic analyzer includes a linear movement unit configured to access to an access point by a linear movement, a rotational movement unit configured to access to the access point by a rotational movement, and a control unit configured to control an operation of the linear movement unit and the rotational movement unit so that the linear movement unit and the rotational movement unit do not interfere with each other.Type: GrantFiled: February 25, 2020Date of Patent: February 11, 2025Assignee: Hitachi High-Tech CorporationInventors: Tsukasa Suenari, Takenori Okusa
-
Patent number: 12224168Abstract: In a mass spectrometer, due to impurities accumulated inside a frame, a withstand voltage may decrease, and electric discharge may occur in an ion source, thereby making it impossible to perform normal measurement. Since a result of abnormality measurement due to the electric discharge cannot be distinguished from measurement abnormality caused by clogging of a tube between a pretreatment unit and a needle, there is a problem in that time is required to identify abnormal portions, and a maintenance property is lowered. As a unit for solving the problem, a return current detection unit connected in series between the frame and an ion source power supply that applies a voltage to the needle and a return current detection unit connected in series between the frame and a counter electrode power supply that applies a voltage to a counter electrode are provided.Type: GrantFiled: December 2, 2020Date of Patent: February 11, 2025Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Takuma Nishimoto, Zihao Ong, Isao Furuya, Hiroshi Touda, Yuichiro Hashimoto, Masuyuki Sugiyama
-
Patent number: 12224158Abstract: A plasma processing apparatus that can inhibit clustering of gas and supply the gas stably, including an integrated gas box configured to adjust the flow rate of gas, and a discharge portion, and the integrated gas box includes gas blocks including a flow path through which the gas flows, a heater configured to heat the flow path, a bypass path provided in the flow path, and a flow controller configured to detect the inflow amount of the gas and output the gas from the flow path to the discharge portion. The heater is configured to perform heating to a predetermined temperature based on the type of the gas. The predetermined temperature is, for example, 65° C. or more. The bypass path includes a flow path causing a change in the pressure of the gas flowing through the flow path.Type: GrantFiled: March 9, 2022Date of Patent: February 11, 2025Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Yoshinori Yoshida, Yutaka Kouzuma, Kazuyuki Hirozane
-
Patent number: 12224155Abstract: Provided is an ion milling apparatus capable of enhancing reproducibility of an ion distribution. The ion milling apparatus includes: an ion source 101; a sample stage 102 on which a sample to be processed by being irradiated with an unfocused ion beam from the ion source 101 is placed; and a measurement member holding unit 106 that holds an ion beam current measurement member 105. A covering material 120 is provided so as to cover at least a surface of the measurement member holding unit 106 and the sample stage 102 facing the ion source 101. A material of the covering material 120 contains, as a main component, an element having an atomic number smaller than that of an element of a material of a structure on which the covering material is provided.Type: GrantFiled: December 24, 2019Date of Patent: February 11, 2025Assignee: Hitachi High-Tech CorporationInventors: Shota Aida, Hisayuki Takasu, Atsushi Kamino, Hitoshi Kamoshida
-
Publication number: 20250044312Abstract: The present invention has a plurality of conveyance lanes disposed in parallel, and also has an information-reading unit for reading a sample identifier of a container present in a reading region set within a conveying unit, the reading region being disposed in at least one location from among the conveyance-direction front-surface side of a holder, the conveyance-direction reverse side of the holder, and above the conveyance lanes. The information-reading unit is configured to read the sample identifier of a container being conveyed through any conveyance lane among the plurality of conveyance lanes using the one information-reading unit. There are thereby provided a specimen conveyance device and a specimen conveyance method by which the accuracy of reading sample information can be improved over that in the past.Type: ApplicationFiled: September 28, 2022Publication date: February 6, 2025Applicant: HITACHI HIGH-TECH CORPORATIONInventors: Takaichi OKUBO, Kuniaki ONIZAWA, Shigeru YANO
-
Patent number: 12215308Abstract: Provided is a charged particle beam apparatus capable of more objectively and highly accurately calculating a feature of a cell from an observation image of a cell and evaluating a cell. The charged particle beam apparatus includes an image acquisition unit 18 that acquires an image of a cell, a contour extraction unit 19 that extracts a contour of the image, a feature calculation unit 20 that calculates a morphological feature of the contour based on the contour and calculates the feature of an internal structure such as a cytoplasm contained in an internal area of the contour, and a determination unit 21 that determines quality and/or functionality of the cell based on the feature, and can objectively and highly accurately evaluate the quality and/or the functionality of the cell included in the captured image.Type: GrantFiled: April 14, 2017Date of Patent: February 4, 2025Assignee: Hitachi High-Tech CorporationInventors: Akira Ikeuchi, Shigeru Kawamata, Hiromi Mise, Akira Sawaguchi
-
Patent number: 12217928Abstract: The electron gun is provided with a first anode electrode and a second anode electrode to generate an acceleration and deceleration electric field. A lens electric field makes it possible to irradiate a sample with an electron beam emitted from a part outside an optical axis of the photoelectric film without being blocked by a differential exhaust diaphragm. A wide range of electron beams off-optical axis can be used even in a high-brightness photocathode that requires high vacuum. As a result, the photoelectric film and the electron gun can be extended in life, can be stabilized, and can be increased in brightness. Further, it is possible to facilitate a control of emitting electron beams from a plurality of positions on the photoelectric film, a timing control of emitting electron beams from a plurality of positions, a condition control of an electron beam in an electron microscope using electron beams.Type: GrantFiled: March 25, 2020Date of Patent: February 4, 2025Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Hideo Morishita, Takashi Ohshima, Tatsuro Ide, Naohiro Kohmu, Toshihide Agemura, Yoichi Ose, Junichi Katane
-
Patent number: 12216134Abstract: In a case where plural measurement items that require different incubation times are simultaneously measured in an automatic analyzer, deterioration of the turnaround time of the measurement is minimized. The automatic analyzer receives a request of a sample, obtains a ratio of a short measurement item among examination items of the received analysis request, and a determines an empty cycle based on the ratio of the short measurement item and the number of schedules. When an empty cycle is necessary, the empty cycle is scheduled in a schedule of a sample that is requested to be measured first, for example, an empty cycle in a short measurement for making an incubator empty. As a result, this position can be used for a measurement of a short measurement item such that the wait time of the start of the measurement can be short.Type: GrantFiled: July 3, 2019Date of Patent: February 4, 2025Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Takaaki Hagiwara, Teruhiro Yamano, Kazunori Yamazawa, Taku Sakazume
-
Patent number: 12217953Abstract: Provided are an ion source and a mass spectrometer that reduce a dead volume of the connecting part of a pipe to a capillary. An ion source has a capillary and a pipe. The capillary has a large-diameter part that forms a capillary upstream-side end face on an upstream side. The large-diameter part has a large-diameter part downstream side face on a downstream side. The pipe has a pipe downstream end face on the downstream side. A capillary retaining unit has a hole through which the capillary downstream-side end face is passable and a face on which the large-diameter part downstream side face is installable. The ion source includes a pipe retaining unit that retains the pipe. The capillary retaining unit and the pipe retaining unit are disposed such that the capillary upstream-side end face contacts the pipe downstream end face to connect the capillary to the pipe.Type: GrantFiled: October 15, 2020Date of Patent: February 4, 2025Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Hideki Hasegawa, Masuyuki Sugiyama, Yuichiro Hashimoto
-
Publication number: 20250035597Abstract: The method for controlling a liquid chromatograph according to the invention is a method for controlling the liquid chromatograph including a liquid delivery pump, a flow path connected to the liquid delivery pump, a flow path switching valve (an auto purge valve, an injection valve, and a stream select valve) provided in the flow path and configured to switch a plurality of connection destinations for the flow path, and a pressure sensor configured to detect at least one of a liquid delivery pressure of the liquid delivery pump, a flow path pressure in the flow path, and a pressure applied to the flow path switching valve. The method includes rotating the flow path switching valve during liquid delivery from the liquid delivery pump, and determining whether a bubble remains in the flow path based on a pressure fluctuation when the pressure lowered by rotating the flow path switching valve increases.Type: ApplicationFiled: November 10, 2022Publication date: January 30, 2025Applicant: HITACHI HIGH-TECH CORPORATIONInventors: Makoto Nogami, Yushi Harada
-
Patent number: 12210003Abstract: A liquid chromatographic apparatus which removes air bubbles during preparatory operation for apparatus startup includes a liquid feeding pump to feed a solvent, an injector to inject a sample into the solvent, a separation column to receive the solvent and the sample through the injector and separate the sample into components, a detector to detect the components supplied from the separation column, a pressure sensor to measure a pressure in a solvent flow channel of the liquid feeding pump, and a controller to control a purge operation for removing air bubbles in the solvent flow channel by the liquid feeding pump, determine whether a pressure change amount in the solvent flow channel measured by the pressure sensor during the purge operation is a specified change amount or larger, and complete the air bubble removal operation when the pressure change amount is the specified change amount or larger.Type: GrantFiled: March 5, 2021Date of Patent: January 28, 2025Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Midori Tobita, Yuichiro Hashimoto, Nobuhiro Tsukada
-
Patent number: 12210338Abstract: As a technology for an observation device and an inspection device, a technology capable of reducing a work effort related to generation of a recipe including alignment information is provided. An observation device 1 includes an observation unit 103 that obtains an image for observing a sample 101 on a stage 102. A computer system 2 of the observation device 1 acquires the image from the observation unit 103, specifies a period of a pattern-formed unit region repeatedly formed on a surface of the sample 101 from the image, and generates a recipe including observation or inspection alignment positions of the sample 101 using the specified period.Type: GrantFiled: November 23, 2021Date of Patent: January 28, 2025Assignee: Hitachi High-Tech CorporationInventors: Kosuke Matsumoto, Satoshi Takada, Hideki Nakayama, Miyuki Fukuda, Kozo Miyake, Yuya Isomae
-
Patent number: 12210025Abstract: An interlock unit for preventing rotation from a closed position of a cover to an open position thereof, includes: a hollow case having a rectangular parallelepiped shape disposed at a position adjacent to an inner side surface of a casing, below an end part opposite to a support shaft at the closed position of the cover; an action member that is provided on an upper surface of the case, supported to be movable between a non-operating position and an operating position, and engaged with a protruding part provided on the cover at the operating position to inhibit the cover from rotating toward the open position; electromagnetic drive means provided below the action member to drive the action member; and drive connecting means for driving the action member by connecting the action member and the electromagnetic drive means and transmitting an operation of the electromagnetic drive means to the action member.Type: GrantFiled: February 13, 2020Date of Patent: January 28, 2025Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Taichiro Yamashita, Tsukasa Suenari, Takenori Okusa
-
Patent number: 12211194Abstract: Provided are a defect inspection apparatus and a defect inspection method that can inspect various types of defects in a synthesized image. The defect inspection apparatus synthesizes a first detection signal from a first detector and a second detection signal from a second detector with a first synthesis ratio to generate a first synthesized image, and synthesizes the first detection signal and the second detection signal with a second synthesis ratio different from the first synthesis ratio to generate a second synthesized image. The defect inspection apparatus generates a first inspection image based on the first synthesized image and generates a second inspection image based on the second synthesized image. The defect inspection apparatus executes a logical operation on the first inspection image and the second inspection image to generate a synthesized inspection image. The defect inspection apparatus executes defect determination on the synthesized inspection image.Type: GrantFiled: April 8, 2022Date of Patent: January 28, 2025Assignee: Hitachi High-Tech CorporationInventors: Yasushi Ebizuka, Hiroyuki Shindo, Ryugo Kagetani
-
Patent number: D1060717Type: GrantFiled: October 12, 2023Date of Patent: February 4, 2025Assignee: Hitachi High-Tech CorporationInventors: Junpei Hokari, Toshiki Yamagata, Masashi Shibahara