Abstract: An object of the invention is to provide a charged particle beam device capable of specifying an irradiation position of light on a sample when there is no mechanism for forming an image of backscattered electrons. The charged particle beam device according to the invention determines whether an irradiation position of a primary charged particle beam and an irradiation position of light match based on a difference between a first observation image acquired when the sample is irradiated with only the primary charged particle beam and a second observation image acquired when sample is irradiated with the light in addition to the primary charged particle beam. It is determined whether the irradiation position of the primary charged particle beam and the irradiation position of the light match using the first observation image and a measurement result by a light amount measuring device.

Abstract: A charged particle beam apparatus acquires an image that is not affected by movement of a stage at a high speed. The apparatus includes: a charged particle source for irradiating a sample with a charged particle beam; a stage on which the sample is placed; a measurement unit for measuring a movement amount of the stage; a deflector; a deflector offset control unit, which is a feedback control unit for adjusting a deflection amount of the deflector according to the movement amount of the stage; a plurality of detectors for detecting secondary charged particles emitted from the sample by irradiation of the charged particle beam; a composition ratio calculation unit that calculates composition ratios of signals output from the detectors based on the deflection amount adjusted by the feedback control unit; and an image generation unit for generating a composite image by compositing the signals using the composition ratio.

Abstract: The preset invention aims to provide a method of presenting a learning condition which enables an improvement in the accuracy of image analysis. An information processing apparatus for machine learning is provided which includes a true/false information generating unit which generates true/false information of an image analysis result, a reliability determining unit which determines reliability related to analysis in image analysis processing, and a learning condition output unit which presents a learning condition, based on the true/false information and the reliability.

Abstract: According to an embodiment of the present invention, a plasma processing apparatus includes: a processing chamber in which plasma processing is performed to a sample; a radio frequency power source that supplies radio frequency power for generating plasma in the processing chamber; and a data processing apparatus that performs processing to light emission data of the plasma. The data processing apparatus performs the processing to the light emission by using an adaptive double exponential smoothing method for varying a smoothing parameter based on an error between input data and a predicted value of smoothed data. A response coefficient of the smoothing parameter is derived by a probability density function including the error as a parameter.

Abstract: Provided is an automatic analyzer that improves workability when carrying in and out a flow cell. A flow cell that allows a reaction liquid including a specimen and a reagent to pass, a photodetector for detecting light emitted by the reaction liquid, and a housing for housing the flow cell and the photodetector are included, in which the housing includes a lid that opens and closes when the flow cell is carried in and out of the housing, the lid is connected to the housing via a hinge, and a fixing member for fixing the lid in a closed state is provided on the lid or the housing.

Abstract: A computing machine includes: a storage unit that stores learning data; a learning unit that executes learning processing for generating a classifier by using the learning data; and a generation unit that generates the learning data, and the generation unit calculates a feature amount vector handled by the classifier by using the learning data stored in the storage unit, analyzes the distribution ox the learning data in a feature amount space on the basis of the feature amount vector to specify a boundary where the classification result of the classifier changes in the feature amount space, and generates new learning data by using the learning data existing in the vicinity of the boundary.

Abstract: The disclosure relates to a dimension measurement apparatus that reduces time required for dimension measurement and eliminates errors caused by an operator. Therefore, the dimension measurement apparatus uses a first image recognition model that extracts a boundary line between a processed structure and a background over the entire cross-sectional image and/or a boundary line of an interface between different kinds of materials, and a second image recognition that output information for dividing the boundary line extending over the entire cross-sectional image obtained from the first image recognition model for each unit pattern constituting a repetitive pattern, obtains coordinates of a plurality of feature points defined in advance for each unit pattern, and measures a dimension defined as a distance between two predetermined points of the plurality of feature points.

Abstract: There is provided a vacuum processing apparatus in which at least one of the processing units includes a lower member and an upper member mounted on the lower member to be attachable and detachable that configure the vacuum container, a turning shaft member which is attached to an outer circumferential part of the base plate between the work space and the vacuum container, and has a turning shaft that moves from above the base plate when the turning shaft is connected to the lower member and the lower member turns around the connected part, and a maintenance member including an arm which is disposed above the turning shaft member and turns in a horizontal direction as the upper member is suspended, and in which the lower member is configured to be fixable at the position at a predetermined angle within a range of an angle at which the lower member is capable of turning around the shaft, and to be vertically movable as the arm of the maintenance member fixes the position above a center portion of the lower mem

Abstract: In a mass spectrometer, due to impurities accumulated inside a frame, a withstand voltage may decrease, and electric discharge may occur in an ion source, thereby making it impossible to perform normal measurement. Since a result of abnormality measurement due to the electric discharge cannot be distinguished from measurement abnormality caused by clogging of a tube between a pretreatment unit and a needle, there is a problem in that time is required to identify abnormal portions, and a maintenance property is lowered. As a unit for solving the problem, a return current detection unit connected in series between the frame and an ion source power supply that applies a voltage to the needle and a return current detection unit connected in series between the frame and a counter electrode power supply that applies a voltage to a counter electrode are provided.

Abstract: A method of setting a parameter of a charged particle beam device, for shortening the time required to adjust an ABCC parameter. An inverse conversion processing unit generates a simulator input signal corresponding to an electron emitted from a sample. A simulation detector uses an arithmetic model that simulates a detector and executes arithmetic processing on the simulator input signal in a state in which characteristic information is reflected in an arithmetic parameter. A simulated image conversion unit executes arithmetic processing corresponding to an image conversion unit and converts a signal from the simulation detector into a simulated image. An ABCC search unit searches for an ABCC parameter with respect to the simulation detector so that an evaluation value obtained from the simulated image becomes a specified reference value, and outputs the ABCC parameter as a search result to an ABCC control unit of the actual machine.

Abstract: A pattern inspection system inspects an image of an inspection target pattern of an electronic device using an identifier constituted by machine learning, based on the image of the inspection target pattern of the electronic device and data used to manufacture the inspection target pattern. The system includes a storage unit which stores a plurality of pattern images of the electronic device and pattern data used to manufacture a pattern of the electronic device, and an image selection unit which selects a learning pattern image used in the machine learning from the plurality of pattern images, based on the pattern data and the pattern image stored in the storage unit.

Abstract: A sample dispensing mechanism configured to dispense a sample and a reagent to the reaction vessel at a first dispensing position and the reaction cell positioned at a second dispensing position; a second reagent vessel disposed on a track of the sample dispensing mechanism; and a control unit configured to control the sample dispensing mechanism, in which the control unit is configured to, based on information on presence or absence of incubation of an analysis item, control the sample dispensing mechanism to dispense a sample and a reagent to the reaction vessel positioned at the first dispensing position in a case where the incubation is not required by the analysis item, and control the sample dispensing mechanism to dispense a sample to the reaction cell positioned at the second dispensing position in a case where the incubation is required by the analysis item.

Abstract: Provided is a test apparatus in which a test for bacterial identification or antimicrobial susceptibility can be promptly determined. A division state of bacteria is monitored by performing microscopic observation of shapes and the number of the bacteria in each of wells in a culture plate for bacterial identification culture or an antimicrobial susceptibility test, and it is determined whether or not the bacteria grow in a stage shifted from an induction phase to a logarithmic phase, with reference to an image obtained through microscopic observation. In addition, determination performed based on turbidity in the related art may be combined with determination performed based on microscopic observation in which change and the like in the shapes of the bacteria are monitored. Accordingly, it is possible to realize a highly accurate test result.

Abstract: Provided is an electrolyte analysis apparatus capable of diluting and preparing a reagent with higher accuracy with a simpler device configuration, comprising a first flow path configured to send a high-concentration reagent from a high-concentration reagent bottle, a second flow path configured to send a reagent diluent from a reagent diluent bottle that stores the reagent diluent for diluting the high-concentration reagent, a junction unit configured to join the first flow path and the second flow path, a third flow path configured to send a mixed liquid, a dilution tank configured to store the prepared reagent, a prepared reagent discharge nozzle configured to discharge the prepared reagent, a liquid sending mechanism configured to send the reagent and the reagent diluent to the junction unit at a predetermined ratio so that the prepared reagent has a predetermined concentration, and an analysis unit configured to perform analysis with the prepared reagent.

Abstract: Provided is an antibacterial agent-containing dried plate having no cracks on an observation surface (a part of the plate corresponding to an observation visual field of a microscope). According to the present embodiment, an antibacterial agent-introduced plate obtained by introducing an antibacterial agent and performing vacuum drying has a recess at an edge of a well, and a microscopic observation portion, which has a surface substantially parallel to a well bottom surface, near the center of the well. The recess is provided between the microscopic observation portion and a side wall of the well, and is lower in height than the microscopic observation portion. Further, at least the bottom surface of the well and the microscopic observation portion are made of a material having a light-transmitting property in order for optical measurement (FIG. 1).

Abstract: A charged particle beam apparatus using a light guide that improves light utilization efficiency includes a detector including a scintillator for emitting light when a charged particle is incident, a light receiving element, and a light guide for guiding the light from the scintillator to the light receiving element. The light guide includes: an incident surface that faces a light emitting surface of the scintillator and to which the light emitted by the scintillator is incident; an emitting surface that is configured to emit light; and a reflecting surface that is inclined with respect to the incident surface so that the light from the incident surface is reflected toward the emitting surface. The emitting surface is smaller than the incident surface. A slope surface is provided between the incident surface and the emitting surface, faces the reflecting surface, and is inclined with respect to the incident surface.

Abstract: A method, an apparatus, and a program for more appropriately determining a condition for appropriately recognizing a semiconductor pattern are provided. A method for determining a condition related to a captured image of a charged particle beam apparatus including: acquiring, by a processor, a plurality of captured images, each of the captured images being an image generated by irradiating a pattern formed on a wafer with a charged particle beam, and detecting electrons emitted from the pattern, each of the captured images being an image captured according to one or more imaging conditions, the method further including: acquiring teaching information for each of the captured images; acquiring, by the processor, one or more feature determination conditions; calculating, by the processor, a feature for each of the captured images based on each of the feature determination conditions, at least one of the imaging condition and the feature determination condition being plural.

Abstract: The present disclosure is related to an analytical system comprising a liquid chromatographic (LC) system comprising a plurality of fluidic streams alternately connectable to a common detector via a stream-selection valve connected to the detector via a valve-to-detector conduit. The analytical system further comprises a wash pump fluidically connected to the stream-selection valve and configured to connect to the valve-to-detector conduit between two consecutive fluidic streams in order to wash liquid from a previous fluidic stream out of the valve-to-detector conduit before liquid from a subsequent fluidic stream enters the valve-to-detector conduit. An analytical method comprising switching between the fluidic streams and washing in between is also disclosed.

Abstract: To provide a wavelength selection method or a plasma processing method to achieve accurate detection of residual thickness or etching amount, there is provided a plasma processing method, in which a processing object wafer is disposed within a processing chamber in the inside of a vacuum container, and plasma is generated by supplying a processing gas into the processing chamber and used to process a processing-object film layer beforehand formed on a surface of the wafer, and at least two wavelengths are selected from among wavelengths with large mutual information in emission of a plurality of wavelengths of plasma generated during processing of the processing-object film layer, and a temporal change in the emission of at least the two wavelengths is detected, and an endpoint of the processing of the film layer is determined based on a result of the detection.