Abstract: Provided are a defect inspection apparatus and a defect inspection method that can inspect various types of defects in a synthesized image. The defect inspection apparatus synthesizes a first detection signal from a first detector and a second detection signal from a second detector with a first synthesis ratio to generate a first synthesized image, and synthesizes the first detection signal and the second detection signal with a second synthesis ratio different from the first synthesis ratio to generate a second synthesized image. The defect inspection apparatus generates a first inspection image based on the first synthesized image and generates a second inspection image based on the second synthesized image. The defect inspection apparatus executes a logical operation on the first inspection image and the second inspection image to generate a synthesized inspection image. The defect inspection apparatus executes defect determination on the synthesized inspection image.

Abstract: Provided is a charged particle beam device capable of detecting signal charged particles in a wide range of elevation angles from a large elevation angle to a small elevation angle and distinguishing detection signals between backscattered charged particles and secondary charged particles regardless of distribution of the signal charged particles. The charged particle beam device according to the disclosure includes a first detector that detects the secondary charged particles or the backscattered charged particles and a second detector that detects tertiary charged particles generated from the first detector, and generates an observation image of a sample using a signal value obtained by subtracting at least a part of a second detection signal output by the second detector from a first detection signal output by the first detector, or subtracting at least a part of the first detection signal from the second detection signal.

Abstract: As a technology for an observation device and an inspection device, a technology capable of reducing a work effort related to generation of a recipe including alignment information is provided. An observation device 1 includes an observation unit 103 that obtains an image for observing a sample 101 on a stage 102. A computer system 2 of the observation device 1 acquires the image from the observation unit 103, specifies a period of a pattern-formed unit region repeatedly formed on a surface of the sample 101 from the image, and generates a recipe including observation or inspection alignment positions of the sample 101 using the specified period.

Abstract: A charged particle beam device suppresses sample deformation caused by placing a sample on a suctioning surface of an electrostatic chuck mechanism, the sample having a temperature different from the suctioning surface. The charged particle beam device includes the electrostatic chuck mechanism; a stage which moves a sample, which is to be irradiated with a charged particle beam, relative to an irradiation position of the charged particle beam; an insulating body which is disposed on the stage and constitutes a dielectric layer of the electrostatic chuck; a first support member which supports the insulating body on the stage; a ring-shaped electrode which encloses the surroundings of the sample and is installed on the insulating body in a contactless manner, and to which a predetermined voltage is applied; and a second support member which supports the ring-shaped electrode.

Abstract: A plasma processing apparatus for finely adjusting conductance of exhaust gas and controlling pressure in a processing chamber with high accuracy, including a processing chamber; a base plate formed with an exhaust opening; an exhaust portion lid disposed in the processing chamber so as to face the exhaust opening; an exhaust device configured to exhaust a gas in the processing chamber via the exhaust opening; and an actuator configured to drive the exhaust portion lid. An axis of the exhaust opening coincides with a central axis of the processing chamber. The exhaust portion lid includes a circular plate portion and a protruding portion protruding from the circular plate portion toward the exhaust opening. The exhaust portion lid is driven by the actuator to be movable to various positions with respect to the exhaust opening and the base plate.

Abstract: In order to perform quantitative analysis on an object in an image, it is important to accurately identify the object, but when plural objects are in contact with each other, it is potential that a target portion cannot be accurately identified. An image is segmented into a foreground region and a background region, the foreground region being a region in which an object for which quantitative information is to be calculated is shown, and the background region being a region other than the foreground region. With respect to a first object and a second object in contact with each other in the image, a contact point between the first object and the second object is detected based on a region segmentation result output by a segmentation unit.

Abstract: An object of the invention is to provide a temperature control device that prevents occurrence of dew condensation on an upper surface of a cover portion. For this purpose, the invention provides a temperature control device including: a thermally conductive portion; a cooling part configured to cool the thermally conductive portion; and a cover portion having an opening through which a container is inserted and removed while covering an upper side of the thermally conductive portion, in which an air layer is formed between the thermally conductive portion and the cover portion. When such a temperature control device is used for a genetic testing device, the dew condensation is unlikely to occur on an upper surface of the cover portion of the temperature control device, and contamination of a sample due to splashing of dew condensation water is prevented. Therefore, it is possible to maintain high testing accuracy.

Abstract: Since the measurement start timings for a plurality of specimens in different test fields deviate from one another, the measurement results are not coordinated, leading to a delay in reporting. When determining an order for measuring a newly recognized specimen using an automated analysis device capable of performing measurements in a plurality of test fields, the measurement order for specimens waiting to be measured is changed to minimize the time difference between measurement result output timings for a plurality of specimens for the same patient, with reference to specimen information such as urgent test information, a measurement completion time, and an earliest measurement completion time for other specimens, relating to the patient's other specimens having the same patient number in the specimen information.

Abstract: The invention provides a charged particle beam device capable of reducing a positional shift between secondary beams generated in a beam separator. The charged particle beam device includes a charged particle beam source configured to irradiate a sample with a plurality of primary beams, a plurality of detectors configured to detect secondary beams emitted from the sample in correspondence to the primary beams, and a beam separator configured to deflect the secondary beams in a direction different from that of the primary beams. The charged particle beam device further includes a deflector provided between the beam separator and the detector to correct a positional shift between the secondary beams generated in the beam separator.

Abstract: The system includes a bed on which an irradiation target is mounted, an irradiation device that irradiates the irradiation target with a particle beam, and a magnetic resonance imaging apparatus that captures an image of an irradiation object and includes a magnet that generates a static magnetic field in an image capturing space in which the irradiation target is disposed, and a yoke disposed outside the image capturing space and through which a magnetic flux of the generated magnetic field passes. The irradiation device 21 is disposed on a back surface side of the yoke when viewed from the image capturing space, and irradiates the irradiation target with the particle beam from a through-hole or gap provided in the yoke. A direction in which the particle beam enters the image capturing space intersects with a direction of a static magnetic field applied to the image capturing space by the magnet.

Abstract: A charged particle beam microscope image processing system includes: a charged particle beam optical system configured to irradiate a sample with a charged particle beam, and output a detection signal of charged particles from the sample; and a control and image processing system configured to control the charged particle beam optical system, generate an image of the sample from the detection signal, store the generated image in a storage, and perform analysis processing on the image. The control and image processing system determines a performance of processing the image on the basis of an operation state of the control and image processing system, on the basis of the processing performance, determines a processing performance corresponding to a speed of storing the image into the storage, and generates the image and stores the image into the storage according to the determined processing performance.

Abstract: In an automatic analyzer, detection sensitivity in flow rate measurement in a cleaning system having a low pressure and a low flow rate is improved. The present disclosure proposes a control method for an automatic analyzer including a liquid feed pump that feeds, through a flow path, a cleaning liquid to a cleaning mechanism of a dispensing nozzle, and a control unit that controls an operation of the liquid feed pump. The control method includes: operating, by the control unit, the liquid feed pump to feed the cleaning liquid to a low-pressure flow path having a low pressure and a low flow rate, the low-pressure flow path constituting at least a part of the flow path; and operating, by the control unit, a flow rate estimation mechanism provided in the low-pressure flow path to obtain a flow rate estimation value in the low-pressure flow path.

Abstract: The present invention proposes a technique for enabling the execution of measurement processing without referring to a design drawing for which it is difficult to adjust or obtain parameters for image processing that requires knowhow. This measurement system according to the present disclosure refers to a learning model generated on the basis of teaching data, which is generated from a sample image of a semiconductor, and the sample image, generates a region-segmented image from an input image (measurement subject) of a semiconductor having a predetermined structure, and uses the region-segmented image to perform image measurement. Here, the teaching data is an image in which labels, which include a structure of the semiconductor in the sample image, are assigned to each pixel of the image, and the learning model includes parameters for deducing teaching data from the sample image (see indicator 1).

Abstract: Provided is an electrophoresis device that, by electrophoresis, feeds a sample into capillaries and optically detects the sample, the electrophoresis device being provided with capillaries, a capillary head provided at the distal end of the capillaries, a phoretic medium-filled container used for electrophoresis and filled with a phoretic medium, a guide member that covers the side surface of the phoretic medium-filled container, a seal member that seals from below the phoretic medium filled in the phoretic medium-filled container, and a plunger that presses the seal member.

Abstract: This far-infrared spectroscopy device comprises a holding mechanism that is capable of holding a sample in humid air, a detector for detecting light obtained by emitting far infrared light onto the sample, and a signal processing unit for calculating an absorption spectrum of the sample from a signal from the detector. The signal processing unit comprises a threshold processing unit that subjects the signal from the detector to threshold processing and removes the part of the signal influenced by the absorption by the water vapor in the humid air, a signal interpolation unit that carries out interpolation on the signal that has been subjected to the removal by the threshold processing unit, and an absorbance calculation unit for calculating an absorbance from the signal that has been subjected to the interpolation by the signal interpolation unit.

Abstract: Provided is an automatic analysis device, a cooling box, and a cooling method for a reagent in the automatic analysis device capable of suppressing dew condensation on the outside of the reagent cooling box without increasing an outer diameter of the cooling box and without affecting a reagent temperature. The automatic analysis device 100 is a device that is configured to measure physical properties of reaction liquid in which a sample and a reagent are dispensed respectively and reacted in a reaction container 30, and includes a reagent cooling box 24 that is configured to store a reagent container 106 housing the reagent, and a heating unit that is disposed on an outer peripheral part of the reagent cooling box 24 to heat the outer peripheral part.

Abstract: A method of setting a parameter of a charged particle beam device, for shortening the time required to adjust an ABCC parameter. An inverse conversion processing unit generates a simulator input signal corresponding to an electron emitted from a sample. A simulation detector uses an arithmetic model that simulates a detector and executes arithmetic processing on the simulator input signal in a state in which characteristic information is reflected in an arithmetic parameter. A simulated image conversion unit executes arithmetic processing corresponding to an image conversion unit and converts a signal from the simulation detector into a simulated image. An ABCC search unit searches for an ABCC parameter with respect to the simulation detector so that an evaluation value obtained from the simulated image becomes a specified reference value, and outputs the ABCC parameter as a search result to an ABCC control unit of the actual machine.

Abstract: A semiconductor inspection device 1 having a first measurement mode and a second measurement mode includes: an electron optical system configured to irradiate a sample with an electron beam; an optical system configured to irradiate the sample with light; an electron detector configured to detect a signal electron; a photodetector 29 configured to detect signal light; a control unit 11 configured to control the electron optical system and the optical system such that an electron beam and light are emitted under a first irradiation condition in the first measurement mode, and to control the electron optical system and the optical system such that an electron beam and light are emitted under a second irradiation condition in the second measurement mode; and a computer configured to process a detection signal from the electron detector or the photodetector.

Abstract: A defect inspection apparatus includes a first objective lens having an optical axis is perpendicular to a wafer mounting surface of the stage, a second objective lens having an optical axis forms a predetermined acute angle with respect to the wafer mounting surface of the stage, and a dichroic mirror which reflects light having a first wavelength and transmits or reflects light having a second wavelength. Emitted light of a first optical path 111 from a first light source which is reflected from or transmitted through the dichroic mirror and first emitted light and second emitted light polarized and separated from a second light source which are transmitted through or reflected from the dichroic mirror are incident on the first objective lens, and emitted light of a second optical path from the first light source is incident on the second objective lens.

Abstract: A sample holder HL capable of efficiently applying a pressure to an observation surface of a sample SAM is provided. The sample holder HL includes a fixed electrode 4b, a movable electrode 5, and a pressure applying member 6 attached to the movable electrode 5 and having a function to move the movable electrode 5 in a horizontal direction. When the sample SAM is held between a side surface of the fixed electrode 4b and a side surface of the movable electrode 5, an upper surface of the sample SAM is located within a range of a width of the pressure applying member 6 at a position where the pressure applying member 6 is in contact with the movable electrode 5 in the Z direction.