Patents Assigned to HITACHI HIGH-TECH SCIENCE CORPORATION
  • Patent number: 11366013
    Abstract: A method of obtaining a quantum efficiency distribution in a predetermined sample surface, including: irradiating a reference material with excitation light belonging to a first wavelength range; obtaining the reference material's image, which includes a first channel for the first wavelength range and a second channel for a second wavelength range, the first and the second channel's irradiation luminance value in each pixel; irradiating the predetermined sample surface with the excitation light; obtaining the first and the second channel's measurement luminance value in each pixel of the image of the predetermined surface; calculating an absorption luminance value from a difference between the first channel's irradiation luminance value and measurement luminance value; calculating a fluorescence luminance value from difference between the second channel's irradiation luminance value and measurement luminance value; calculating quantum efficiency of each pixel based on the values; and obtaining quantum effici
    Type: Grant
    Filed: September 1, 2020
    Date of Patent: June 21, 2022
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Jun Horigome, Hiroki Okawa, Takahiro Tamashima, Imari Sato, Yinqiang Zheng
  • Patent number: 11361936
    Abstract: To accomplish fast automated micro-sampling, provided is a charged particle beam apparatus, which is configured to automatically fabricate a sample piece from a sample, the charged particle beam apparatus including: a charged particle beam irradiation optical system configured to radiate a charged particle beam; a sample stage configured to move the sample that is placed on the sample stage; a sample piece transportation unit configured to hold and convey the sample piece separated and extracted from the sample; a holder fixing base configured to hold a sample piece holder to which the sample piece is transported; and a computer configured to perform position control with respect to a second target, based on a machine learning model in which first information including a first image of a first target is learned, and on second information including a second image, which is obtained by irradiation with the charged particle beam.
    Type: Grant
    Filed: September 24, 2020
    Date of Patent: June 14, 2022
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Ayana Muraki, Atsushi Uemoto, Tatsuya Asahata
  • Patent number: 11340176
    Abstract: The X-ray inspection apparatus includes an X-ray source, a sample moving mechanism, an X-ray detector equipped with a line sensor with pixels detecting X-ray radiation passing through a sample, an image storage unit for storing X-ray radiation intensities, an intensity correction unit for correcting the X-ray radiation intensities stored in the image storage unit, and a defect detector for detecting a defect in the sample. The intensity correction unit sets an intensity of X-rays detected from the inspection initiation region after starting inspection of the sample or an intensity of X-rays preliminarily detected from the sample before starting the inspection as a reference radiation intensity, and corrects an intensity of X-rays detected from the subsequent inspection region based on a correction coefficient obtained from comparison between the intensity of X-rays detected from the subsequent inspection region and the reference radiation intensity.
    Type: Grant
    Filed: August 21, 2020
    Date of Patent: May 24, 2022
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventor: Akihiro Takeda
  • Patent number: 11335534
    Abstract: The particle beam irradiation apparatus includes: an irradiation unit configured to radiate a particle beam; a first detection unit configured to detect first particles; a second detection unit configured to detect second particles; an image forming unit configured to form an observation image based on a first signal obtained by the detection of the first particles, which is performed by the first detection unit, and to form an observation image based on a second signal obtained by the detection of the second particles, which is performed by the second detection unit; and a control unit configured to calculate a brightness of a first region in the formed first observation image and perform a brightness adjustment of the first detection unit based on a first target brightness as a first brightness adjustment when the brightness of the first region is different from the first target brightness.
    Type: Grant
    Filed: September 21, 2020
    Date of Patent: May 17, 2022
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Takuma Aso, Xin Man, Makoto Sato, Tatsuya Asahata
  • Patent number: 11282672
    Abstract: Disclosed are a charged particle beam apparatus and a sample processing observation method, the method including: a sample piece formation process in which a sample is irradiated with a focused ion beam such that a sample piece is cut out from the sample; a cross-section processing process in which the sample piece support holds the sample piece and a cross section thereof is irradiated with the ion beam to process the cross section; a sample piece approach movement process in which the sample piece support holds the sample piece and the sample piece is moved to a position that is closer to an electron beam column than an intersection point of beam optical axes of the ion beam and an electron beam is; and a SEM image acquisition process in which the cross section is irradiated with the electron beam to acquire the SEM image of the cross section.
    Type: Grant
    Filed: September 17, 2019
    Date of Patent: March 22, 2022
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Hidekazu Suzuki, Tatsuya Asahata
  • Patent number: 11276555
    Abstract: The charged particle beam apparatus includes: a charged particle source configured to generate charged particles; a plurality of scanning electrodes configured to generate electric fields for deflecting charged particles that are emitted by applying an acceleration voltage to the charged particle source, and applying an extraction voltage to an extraction electrode configured to extract the charged particles; an electrostatic lens, which is provided between the plurality of scanning electrodes and a sample table, and is configured to focus a charged particle beam deflected by the plurality of scanning electrodes; and a processing unit configured to obtain a measurement condition, and set each of scanning voltages to be applied to the plurality of scanning electrodes based on the obtained measurement condition.
    Type: Grant
    Filed: October 16, 2020
    Date of Patent: March 15, 2022
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Yasuhiko Sugiyama, Koji Nagahara
  • Patent number: 11257655
    Abstract: The focused ion beam apparatus includes: an ion source configured to generate ions; a first electrostatic lens configured to accelerate and focus the ions to form an ion beam; a beam booster electrode configured to accelerate the ion beam to a higher level; one or a plurality of electrodes, which are placed in the beam booster electrode, and are configured to electrostatically deflect the ion beam; a second electrostatic lens, which is provided between the one or plurality of electrodes and a sample table, and is configured to focus the ion beam applied with a voltage; and a processing unit configured to obtain a measurement condition, and set at least one of voltages to be applied to the one or plurality of electrodes or a voltage to be applied to each of the first electrostatic lens and the second electrostatic lens, based on the obtained measurement condition.
    Type: Grant
    Filed: October 16, 2020
    Date of Patent: February 22, 2022
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Yasuhiko Sugiyama, Naoko Hirose
  • Patent number: 11239046
    Abstract: To stabilize automated MS, provided is a charged particle beam apparatus, which is configured to automatically fabricate a sample piece from a sample, the charged particle beam apparatus including: a charged particle beam irradiation optical system configured to radiate a charged particle beam; a sample stage configured to move the sample that is placed on the sample stage; a sample piece transportation unit configured to hold and convey the sample piece separated and extracted from the sample; a holder fixing base configured to hold a sample piece holder to which the sample piece is transported; and a computer configured to perform control of a position with respect to a target, based on: a result of second determination about the position, which is executed depending on a result of first determination about the position; and information including an image that is obtained by irradiation with the charged particle beam.
    Type: Grant
    Filed: September 24, 2020
    Date of Patent: February 1, 2022
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Ayana Muraki, Atsushi Uemoto, Tatsuya Asahata
  • Patent number: 11215591
    Abstract: A chromatographic data system processing apparatus performs data processing based on plot data measured by a chromatograph. The chromatographic data system processing apparatus includes a virtual curve calculation portion which obtains a virtual curve based on the measured plot data, a tentative feature point acquisition portion which obtains a tentative feature point based on the obtained virtual curve, and an actual plot data feature point extraction portion which extracts an actual plot data feature point corresponding to the tentative feature point from the measured plot data.
    Type: Grant
    Filed: March 25, 2019
    Date of Patent: January 4, 2022
    Assignee: Hitachi High-Tech Science Corporation
    Inventors: Masahito Ito, Masato Fukuda
  • Patent number: 11199480
    Abstract: A thin-sample-piece fabricating device is provided with a focused-ion-beam irradiation optical system, a stage, a stage driving mechanism, and a computer. The focused-ion-beam irradiation optical system performs irradiation with a focused ion beam (FIB). The stage holds a sample piece (Q). The stage driving mechanism drives the stage. The computer sets a thin-piece forming region serving as a treatment region, as well as a peripheral section surrounding the entire periphery of the thin-piece forming region, on the sample piece (Q). The computer causes irradiation with the focused ion beam (FIB) from a direction crossing the irradiated face of the sample piece (Q) so as to perform etching treatment such that the thickness of the thin-piece forming region becomes less than the thickness of the peripheral section.
    Type: Grant
    Filed: February 28, 2019
    Date of Patent: December 14, 2021
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventor: Ikuko Nakatani
  • Patent number: 11177113
    Abstract: Automated processing is provided. A charged particle beam apparatus includes: an image identity degree determination unit determining whether an identity degree is equal to or greater than a predetermined value, the identity degree indicating a degree of identity between a processing cross-section image that is an SEM image obtained through observation of a cross section of the sample by a scanning electron microscope, and a criterion image that is the processing cross-section image previously registered; and a post-determination processing unit performing a predetermined processing operation according to a result of the determination by the image identity degree determination unit.
    Type: Grant
    Filed: March 17, 2020
    Date of Patent: November 16, 2021
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Ayana Muraki, Tatsuya Asahata, Atsushi Uemoto
  • Patent number: 11143541
    Abstract: A sample container of a thermal analyzer that performs thermogravimetry or calorimetry includes a bottomed cylindrical body portion and a cover portion abutting against an opening of the body portion and covering at least a part of the opening. The cover portion includes a first cover portion abutting against an edge portion of the opening and having a second opening in a part of the first cover portion, and a second cover portion separated from the first cover portion in an axial direction of the body portion so as to cover at least a part of the second opening.
    Type: Grant
    Filed: March 24, 2017
    Date of Patent: October 12, 2021
    Assignee: Hitachi High-Tech Science Corporation
    Inventors: Kentaro Yamada, Yasuyuki Takagi
  • Patent number: 11133149
    Abstract: A focused ion beam apparatus (100) includes: a focused ion beam lens column (20); a sample table (51); a sample stage (50); a memory (6M) configured to store in advance three-dimensional data on the sample table and an irradiation axis of the focused ion beam, the three-dimensional data being associated with stage coordinates of the sample stage; a display (7); and a display controller (6A) configured to cause the display to display a virtual positional relationship between the sample table (51v) and the irradiation axis (20Av) of the focused ion beam, which is exhibited when the sample stage is operated to move the sample table to a predetermined position, based on the three-dimensional data on the sample table and the irradiation axis of the focused ion beam.
    Type: Grant
    Filed: September 22, 2020
    Date of Patent: September 28, 2021
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Toshihiro Mochizuki, Haruyuki Ishii, Atsushi Uemoto
  • Patent number: 11114276
    Abstract: An apparatus for processing and observing a cross-section includes: a sample bed holding a sample; a focused ion beam column radiating a focused ion beam to the sample; an electron beam column radiating an electron beam to the sample, perpendicularly to the focused ion beam; an electron detector detecting secondary electrons or reflection electrons generated from the sample; a irradiation position controller controlling irradiation positions of the focused ion beam and the electron beam based on target irradiation position information showing target irradiation positions of beams on the sample; a process controller controlling a cross-section-exposing process that exposes a cross-section of the sample by radiating the focused ion beam to the sample and a cross-section image-obtaining process that obtains a cross-section image of the cross-section by radiating the electron beam to the cross-section; and an image quality corrector correcting image quality of the cross-section image obtained.
    Type: Grant
    Filed: March 6, 2019
    Date of Patent: September 7, 2021
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Xin Man, Tatsuya Asahata, Makoto Sato
  • Publication number: 20210262949
    Abstract: A method of inspecting a membrane-electrode assembly includes obtaining an X-ray transmission image by applying X-rays to the membrane-electrode assembly, and determining whether a foreign matter having a size equal to or larger than a predetermined value is included in the membrane-electrode assembly, according to a brightness reduction amount in each pixel of the X-ray transmission image obtained, while referring to a correlative relationship between the size of the foreign matter measured in a planar direction of the membrane-electrode assembly, and the brightness reduction amount in the X-ray transmission image.
    Type: Application
    Filed: February 24, 2021
    Publication date: August 26, 2021
    Applicants: TOYOTA JIDOSHA KABUSHIKI KAISHA, HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Shinya TAKESHITA, Toshiyuki TAKAHARA, Masaki TATSUMI
  • Patent number: 11094503
    Abstract: Provided are a thin film sample creation method and a charged particle beam apparatus capable of preventing a thin film sample piece from being damaged. The method includes a process of processing a sample by irradiating a surface of the sample with a focused ion beam (FIB) from a second direction that crosses a normal line to the surface of the sample to create a thin film sample piece and a connection portion positioned at and connected to one side of the thin film sample piece, a process of rotating the sample around the normal line, a process of connecting the thin film sample piece to a needle for holding the thin film sample piece, and a process of separating the thin film sample piece from the sample by irradiating the connection portion with a focused ion beam from a third direction that crosses the normal line.
    Type: Grant
    Filed: February 13, 2020
    Date of Patent: August 17, 2021
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Masato Suzuki, Ikuko Nakatani, Satoshi Tomimatsu, Makoto Sato
  • Patent number: 11081312
    Abstract: A method of manufacturing an emitter is disclosed. The method enables a crystal structure of the tip of the front end of the emitter to return to its original state with high reproducibility by rearranging atoms in a treatment, and enables a long lasting emitter to be attained by suppressing extraction voltage rise after the treatment. As a method of manufacturing an emitter having a sharpened needle-shape, the method includes: performing an electropolishing process for the front end of an emitter material having conductivity to taper toward the front end; and performing an etching to make the number of atoms constituting the tip of the front end be a predetermined number or less by further sharpening the front end through an electric field-induced gas etching having constantly applied voltage, while observing the crystal structure of the front end, by a field ion microscope, in a sharp portion having the front end at its apex.
    Type: Grant
    Filed: February 7, 2020
    Date of Patent: August 3, 2021
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Tomokazu Kozakai, Yoshimi Kawanami, Hiroyuki Mutoh, Yoko Nakajima, Hironori Moritani, Shinichi Matsubara
  • Patent number: 11073453
    Abstract: An automatic sample preparation apparatus that automatically prepares a sample piece from a sample includes: a focused ion beam irradiation optical system configured to irradiate a focused ion beam; an electron beam irradiation optical system configured to irradiate an electron beam from a direction different from a direction of the focused ion beam; a sample piece transfer device configured to hold and transfer the sample piece separated and extracted from the sample; a detector configured to detect secondary charged particles emitted from an irradiation object by irradiating the irradiation object with the focused ion beam and/or the electron beam; and a computer configured to recognize a position of the sample piece transfer device by image-recognition using an image data of the focused ion beam and the electron beam generated by irradiating the sample piece transfer device with the focused ion beam and the electron beam, and drive the transfer device.
    Type: Grant
    Filed: July 22, 2020
    Date of Patent: July 27, 2021
    Assignee: Hitachi High-Tech Science Corporation
    Inventors: Atsushi Uemoto, Tatsuya Asahata, Makoto Sato, Yo Yamamoto
  • Patent number: 11022570
    Abstract: An X-ray transmission inspection apparatus includes an X-ray source for irradiating a sample with X-rays, a two-dimensional sensor for detecting transmission X-rays passing through the sample, a sample moving mechanism for moving the sample, a calculation unit for processing an image of the transmission X-rays detected by the two-dimensional sensor, and a display unit for displaying a cross-sectional image. When V1 is a speed at which the sample moves, F is a frame rate of the two-dimensional sensor, A is a sample pitch of the two-dimensional sensor, and LS is a distance between the X-ray source and the two-dimensional sensor, the calculation unit creates a cross-sectional image taken at a distance L from the X-ray source by adding the images of the pixels positioned at an interval of [(LS×V2)/(L×F×A)] in a direction in which the sample moves.
    Type: Grant
    Filed: July 29, 2019
    Date of Patent: June 1, 2021
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventor: Yoshiki Matoba
  • Patent number: 11017982
    Abstract: Disclosed is a composite charged particle beam apparatus including: an ion supply unit supplying an ion beam; an acceleration voltage application unit applying an acceleration voltage to the ion beam supplied by the ion supply unit to accelerate the ion beam; a first focusing unit focusing the ion beam; a beam booster voltage application unit applying a beam booster voltage to the ion beam; a second focusing unit focusing the ion beam to irradiate a sample; an electron beam emission unit emitting an electron beam to irradiate the sample; and a controller setting a value of the beam booster voltage that the beam booster voltage application unit applies to the ion beam, based on a value of the acceleration voltage applied to the ion beam by the acceleration voltage application unit and of a set value predetermined according to a focal distance of the focused ion beam.
    Type: Grant
    Filed: February 7, 2020
    Date of Patent: May 25, 2021
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Yasuhiko Sugiyama, Naoko Hirose, Hiroshi Oba