Abstract: A terminal communication apparatus has a terminal communication control portion rendering an immediate communication control portion sequentially transmitting serial data to another terminal communication apparatus bitwise when receiving a packet as bitwise serial data and a normal communication control portion performing processing on the packet after accumulating the serial data until the serial data reaches a packet length when receiving the bitwise serial data switchable, performing processing with the immediate communication control portion in a case of receiving a time adjustment packet containing time adjustment data posting a timing of synchronization in the other terminal communication apparatus and performing processing with the normal communication control portion in a case of receiving a packet other than the time adjustment packet. Thus, synchronization of control object devices can be enabled without previously investigating communication delay times.

Abstract: The terahertz wave measuring device includes a pulsed laser light generation unit 1, a seed light generation unit 2, a terahertz wave generator 5 that generates terahertz waves, a terahertz wave detector 8 on which the terahertz waves that are generated from the terahertz wave generator and that have interacted with a measurement object 7 and the pump light are incident and that generates terahertz wave detection light 9, an interference optical system 11 that multiplexes the terahertz wave detection light and reference light 14 of the same wavelength as the terahertz wave detection light to generate a plurality of interfering light beams 12, a plurality of light detectors 13 that detect the interfering light beams, and a signal processing unit 16 that outputs an intensity signal and/or a phase signal of the terahertz waves by performing arithmetic operations on the outputs of the plurality of light detectors.

Abstract: A flow cell for electrochemical measurement which introduces a sample solution, applies a voltage between a working electrode and a counter electrode to analyze the sample solution electrochemically, discharges the sample solution, and performs the electrochemical measurement continuously. The flow cell includes a unit which measures a value of a current flowing between electrodes at the time of applying a voltage, a unit which records the measured current value, a unit which compares the recorded current value with a current value set separately as a determination standard, and a unit which determines whether the current value measured at a cycle of a determination target and the recorded current value is normal by the comparison.

Abstract: In a plasma processing method and apparatus for processing a film to be processed contained in a film structure preliminarily formed on an upper surface of a wafer mounted in a processing chamber, by using plasma, a residual film thickness at an arbitrary time is calculated using a result of comparing detective differential waveform pattern data with actual differential waveform pattern data. The detective differential waveform pattern data is produced by using two basic differential waveform pattern data which respectively use, as parameters, residual thicknesses of the films to be processed in film structures having underlying films with different thicknesses and the wavelengths of the interference light. The detective waveform pattern data being preliminarily prepared prior to processing of the wafer. Determination is made as to whether or not an object of the processing has been reached by using the residual film thickness.

Abstract: For a novice user to easily recognize a difference between imaging results caused by a difference between observation conditions, a computer has an operation screen display observation target setting buttons for changing an observation condition for a specimen including a combination of parameter setting values of a charged particle beam apparatus. The processing unit has the operation screen display a radar chart including a characteristic, indicated by three or more incompatible items, of an observation condition for each of the observation target setting buttons. The radar chart indicates at least items of high resolution, emphasis on surface structure and emphasis on material difference.

Abstract: An object of the present invention is to provide a charged particle beam device which can realize improved contrast of an elongated pattern in a specific direction, such as a groove-like pattern. In order to achieve the above-described object, the present invention proposes a charged particle beam device including a detector for detecting a charged particle obtained based on a charged particle beam discharged to a sample. The charged particle beam device includes a charged particle passage restricting member that has at least one of an arcuate groove and a groove having a longitudinal direction in a plurality of directions, and a deflector that deflects the charged particle discharged toward the groove from the sample. The charged particle discharged from the sample is deflected to a designated position of the groove.

Abstract: An electrolyte concentration measuring apparatus is provided with: a plurality of ion selective electrodes and one reference electrode; a sample introduction unit that introduces a sample solution to the plurality of ion selective electrodes and the reference electrode; a potential measuring unit that measures a voltage between the plurality of ion selective electrodes and the reference electrode; and a resistance measuring unit that measures a direct-current resistance of the plurality of ion selective electrodes.

Abstract: A cartridge for dispensing a fluid is presented. The cartridge comprises a reservoir chamber for receiving the fluid. The reservoir chamber has a fluid outlet. The cartridge further comprises a controllable dispenser component for dispensing a dispensing volume of the fluid from the reservoir chamber. The dispenser component is connected to the fluid outlet of the reservoir. The cartridge further comprises a single compressible fluid pump with a single elastic pumping element and a conduit extending from the fluid pump towards the fluid outlet. The fluid pump discharges a mixing volume of the fluid from the conduit into the reservoir chamber upon compression of the elastic pumping element. The mixing volume depends on the degree of compression of the elastic pumping element. The fluid pump sucks in the mixing volume from the reservoir into the conduit upon decompression of the elastic pumping element.

Abstract: A display unit displays, on a single screen, a first display area configured from a first area corresponding to the position on a reagent disc at which a reagent container is disposed and a second display area configured from a second area corresponding to the position on a reagent loader at which a reagent container is disposed. A control unit changes the display state of the first area on the basis of whether a reagent container is placed at a position on the reagent disk corresponding to the first area and reagent information for the reagent accommodated in the placed reagent container and changes the display state of the second area on the basis of whether a reagent container is placed at a position on the reagent loader corresponding to the second area and reagent-container-conveyance-state information for the placed reagent container.

Abstract: This composite charged particle beam device comprises a first charged particle beam column (6), a second charged particle beam column (1) which is equipped with a deceleration system, and is equipped with a detector (3) inside the column, a test piece stage (10) on which a test piece (9) is placed, and an electric field correction electrode (13) which is provided around the tip of the first charged particle beam column, wherein the electric field correction electrode is an electrode that corrects the electric field distribution formed in the vicinity of the test piece, and the electric field correction electrode is positioned between the test piece and the first charged particle beam column, and on the opposite side from the second charged particle beam column with respect to the optical axis of the first charged particle beam column.

Abstract: The scanning electron microscope includes: an electron source; a first deflector for deflecting a primary electron beam emitted from the electron source; a second deflector for focusing the primary electron beam deflected by the first deflector and deflecting a second electron from a sample, which is generated the focused primary electron beam, to the outside of the optical axis; a voltage applying unit for applying a negative voltage to the sample to decelerate the primary electron beam; a spectrometer for dispersing the secondary electron; a detector for detecting the secondary electron passing through the spectrometer; an electrostatic lens provided between the second deflector and the spectrometer; and a voltage control unit that controls the voltage applied to the electrostatic lens based on the negative voltage applied to the sample. The electrostatic lens allows the deflecting action to be overlapped with the converging action.

Abstract: A plasma apparatus of processing a wafer disposed in a processing chamber using plasma includes one window, another window, a light receiving unit, a light source, and an optical branching unit which is disposed between the light source and the other window, branches light emitted by the light source to an optical path toward the processing chamber and an optical path in other direction, and reflects light in the processing chamber from the other window, and a detection unit which detects the light having been emitted from the plasma and received by the light receiving unit using one branched light and other branched and reflected light. The apparatus processes the wafer according to a condition for the processing which is adjusted based on a result of the detection.

Abstract: An ion milling device of the present invention is provided with a tilt stage (8) which is disposed in a vacuum chamber (15) and has a tilt axis parallel to a first axis orthogonal to an ion beam, a drive mechanism (9, 51) which has a rotation axis and a tilt axis parallel to a second axis orthogonal to the first axis and rotates or tilts a sample (3), and a switching unit which enables switching between a state in which the ion beam is applied while the sample is rotated or swung while the tilt stage is tilted, and a state in which the ion beams is applied while the tilt stage is brought into an untilted state and the sample is swung. Consequently, the ion milling device capable of performing cross-section processing and flat processing of the sample in the same vacuum chamber is implemented.

Abstract: Provided is a charged particle beam device that is small, high performance, and easy to transport. A charged particle beam device (100) is provided with a detachable body unit (15) and an auxiliary unit (14), the body unit (15) housing a functional unit related to charged particle beams, and the auxiliary unit (14) housing a power source unit (9).

Abstract: For scanning electron beams and measuring overlay misalignment between an upper layer pattern and a lower layer pattern with high precision, electron beams are scanned over a region including a first pattern and a second pattern of a sample, the sample having the lower layer pattern (the first pattern) and the upper layer pattern (the second pattern) formed in a step after a step of forming the first pattern. The electron beams are scanned such that scan directions and scan sequences of the electron beams become axial symmetrical or point-symmetrical in a plurality of pattern position measurement regions defined within the scan region for the electron beams, thereby reducing measurement errors resulting from the asymmetry of electric charge.

Abstract: When taking in outside air with a fan to control the temperature inside a covered portion where a specimen is installed, the internal temperature may change depending on an environment temperature to cause a difference in temperature control. The wind generated by the fan may blow against a reaction container depending on its loading position and it may influence the temperature control over individual specimens and lead to problems with temperature accuracy, temperature rise speed, and temperature drop speed. A reaction container avoiding these problems has a covered portion which performs temperature control on the reaction container and in which a cover and a fin cover have a heat insulating structure. A heat source is provided for controlling an internal temperature of an internal covered space. The internal temperature is kept constant and the influence of the environment temperature over the temperature control of the reaction container is minimized.

Abstract: In a charged particle beam device including an objective lens that focuses a charged particle beam; a first deflector that deflects the charged particle beam to emit the charged particle beam to a sample from a direction different from an ideal optical axis of the objective lens; and a second deflector that deflects a charged particle emitted from the sample, a charged particle focusing lens to focus the charged particle emitted from the sample is disposed between the sample and the second deflector and strengths of the objective lens and the charged particle focusing lens are controlled, according to deflection conditions of the first deflector.

Abstract: The invention provides a plasma processing apparatus and a dry etching method for etching a multilayered film structure having steps with high accuracy. The plasma processing apparatus comprises a vacuum reactor, a lower electrode placed within a processing chamber of the vacuum reactor and having a wafer to be etched mounted on the upper surface thereof, bias supplying units and for supplying high frequency power for forming a bias potential to the lower electrode, a gas supply means for feeding reactive gas into the processing chamber, an electric field supplying means through for supplying a magnetic field for generating plasma in the processing chamber, and a control unit for controlling the distribution of ion energy in the plasma being incident on the wafer via the high frequency power.

Abstract: A scanning electron microscope of the present invention performs scanning by changing a scanning line density in accordance with a sample when an image of a scanned region is formed by scanning a two-dimensional region on the sample with an electron beam or is provided with a GUI having sample information input means which inputs information relating to the sample and display means which displays a recommended scanning conditioHn according to the input and performs scanning with a scanning line density according to the sample by selecting the recommended scanning condition. As a result, in observation using a scanning electron microscope, a suitable scanning device which can improve contrast of a profile of a two-dimensional pattern and suppress shading by suppressing the influence of charging caused by primary charged particle radiation and by improving a detection rate of secondary electrons and a scanning method are provided.

Abstract: In an automated analyzing apparatus, problems arise when a reagent container is carried in during analysis, since it is necessary to stop all accesses of mechanisms etc. to a location of the apparatus where the reagent container is placed and, in a situation in which measurements have been already started, it is impossible to carry the reagent container after waiting about several minutes. To address the problems, when a remaining amount of a reagent corresponding to a predetermined item becomes equal to or less than a first threshold value, a pause cycle of reagent suction is generated in which the reagent dispensing mechanism does not suction the reagent from inside of a reagent container of a reagent disc at regular intervals, and a reagent container containing the same kind of reagent in the reagent disc by the reagent container carrying mechanism is automatically carried in the pause cycle.