Abstract: A reagent container transfer mechanism transfers a reagent container selected from among reagent containers stored in a second reagent container storage section to a first reagent container storage section. A controller controls the reagent container transfer mechanism to transfer a reagent container from a second reagent container storage section to the first reagent container storage section on the basis of a predetermined priority condition. The predetermined priority condition is one of a reagent provided with an effective calibration curve result, a number of remaining tests, and an expiration date of a reagent.

Abstract: A sample transfer device has sample container transfer mechanisms which are arranged between a conveyance path for conveying a sample container holder to one of plural analysis devices. A sample container housing a sample is mounted in the sample container holder. The sample container transfer mechanisms transfer the sample container between the sample container holder and a sample container rack, which is used for mounting the sample container in the analysis device and for conveyance. The sample transfer device determines whether or not an analysis device is in a state suitable for receiving the sample container, and if the analysis device is determined not to be in a state suitable for receiving, controls the sample container transfer mechanism to convey the sample container to the other analysis device via the conveyance path. In this way, it is possible to suppress delays in analysis processing and decreases in throughput.

Abstract: A plasma processing apparatus including a processing chamber, a radio frequency power source, a monitoring unit, and a calculation unit is provided. In the processing chamber, etching target film is etched by using plasma. The radio frequency power source supplies radio frequency electric power. The monitoring unit monitors light emission of the plasma. The calculation unit estimates an etching amount of plasma etching of the etching target film based on an emission intensity and a correlation between the etching amount of the etching target film and the emission intensity, the emission intensity being obtained when removing, by using the plasma, a deposition film deposited as a result of the plasma etching.

Abstract: To realize a sample lifting and lowering device capable of easily responding to increase of a diameter of a sample with light weight and high rigidity as well as with less directional dependence of rigidity as the sample lifting lowering device arranged above a horizontal movement mechanism.

Abstract: The invention is directed to a charged particle beam apparatus that enables temperature maintenance in a cooling unit provided inside a vacuum application apparatus using a refrigerant. The charged particle beam apparatus includes a cooling tank that contains a refrigerant for cooling a cooling unit, a cooling pipe that supplies the refrigerant from the cooling tank to the cooling unit, and a unit that leads the refrigerant to liquefy when the refrigerant is biased to a solid.

Abstract: An automatic analyzing apparatus capable of obtaining an analysis result of a specimen high in urgency in a shorter time is provided. When a first rack 50 is present in a sampling line 103 and an analysis request for a second rack higher in the degree of urgency for analysis than the first rack 50 is detected, a control unit unloads the first rack 50 onto a transport line 100 through a return line 102, allows the first rack 50 to stand by at a rack standby position 120 on a transport line 101 between a loading line 101 and the return line 102 under control, and loads the second rack from the transport line 101 onto the sampling line 103 through the loading line 101 and transports the second rack to the dispensing position 111 under control while allowing the first rack 50 to stand by.

Abstract: The present invention is a data processing apparatus including a data input/output device for receiving data, a storage for storing the data received by the data input/output device, a data processing program storage for storing a data processing program that includes the steps of calculating, using a double exponential smoothing method, a first predicted value that is a predicted value of smoothed data and a second predicted value that is a predicted value of the gradient of the smoothed data, and calculating, using a double exponential smoothing method in which the second predicted value is set as input data, a third predicted value that is a predicted value of smoothed data and a fourth predicted value that is a predicted value of the gradient of the smoothed data, and a data calculation processing apparatus for performing the data processing under the data processing program.

Abstract: A device which automatically performs a step in which expanded and cultured cells are diluted to a desired cell concentration and re-inoculated using a cell-concentration adjustment device having an inlet for taking in a cell suspension; an outlet for discharging a diluted cell suspension; and a flow path which is provided between the inlet and the outlet and is capable of holding a cell suspension, the flow path being provided with: a liquid delivery pump for causing a cell suspension inside to flow; a cell-concentration measurement instrument for collecting data related to a cell concentration per unit amount of the cell suspension; and a dilution-liquid container for holding a dilution liquid which is supplied to the flow path to dilute the cell suspension.

Abstract: A vacuum processing apparatus includes a processing chamber inside a vacuum vessel, a plasma forming chamber above, a dielectric plate member having multiple through-holes for introducing particles of plasma to the processing chamber between the processing chamber and the plasma forming chamber above a sample stage upper surface in the processing chamber, heating lamp arranged around an outer periphery of the plate member to irradiate an electromagnetic wave to the wafer to heat, and a ring-shaped window member for transmitting the electromagnetic wave from the lamp. The apparatus performs, from the through-holes to the wafer, supplying particles of plasma formed in the plasma forming chamber to form a reaction product, extinguishing the plasma and heating the wafer to desorb the product, and supplying particles, formed in the plasma forming chamber, of the plasma of cleaning gas to the plasma forming chamber, the processing chamber, and the window member.

Abstract: A sample observation device of the invention includes: a charged particle optical column for irradiating a sample with charged particle beams at a first acceleration voltage, the sample having a target part to be observed which is a concave part; an image acquisition part for acquiring an image including the target part to be observed on the basis of signals obtained by irradiation with the charged particle beams; a memory part for memorizing in advance, at each of a plurality of acceleration voltages, information indicating a relationship between a brightness ratio of a concave part to a periphery part of the concave part in a standard sample and a value indicating a structure of the concave part in the standard sample; and an operation part for obtaining a brightness ratio of the concave part to a periphery part of the concave part in the image.

Abstract: A mass spectrometer device comprising an ion mobility separation device and a mass spectrometer that are coupled together. In order to achieve high efficiency, high throughput, and high sensitivity, the mass spectrometer is provided with: a first flow passageway 24 through which ions from an ion source 1 are introduced into the mass spectrometer 11 by passing through an ion mobility separation unit 2; a second flow passageway 21 through which the ions from the ion source are introduced into the mass spectrometer without passing through the ion mobility separation unit; and a switch means, such as shield units 4, 5, for switching between the first flow passageway 24 and the second flow passageway 21.

Abstract: There is disclosed a plasma processing apparatus for processing a wafer put on a sample stage disposed in a processing chamber within a vacuum vessel by the use of a plasma generated in the processing chamber after mounting the wafer on the sample stage. The apparatus has heaters in areas of the interior of the sample stage which are divided radially and circumferentially. At least those of the heaters which are arranged in the areas located in the radially outer position include circumferentially arranged heater portions that are connected in series. The amounts of heat generated by these circumferentially arranged heater portions are adjusted.

Abstract: By slowing down the passing velocity of a DNA molecule in a nanopore, the accuracy of the reading of a nucleotide sequence of DNA is improved. A small temperature difference is introduced between a DNA molecule having an asymmetric and periodic structure and a nanopore membrane that carries the DNA molecule, whereby the DNA molecule that passes through a nanopore can move in one direction and the passing velocity of the DNA molecule in the nanopore can be controlled and reduced. In this manner, the accuracy of the analysis of a nucleotide sequence can be improved. Furthermore, it becomes possible to dissociate double-stranded DNA into single-stranded DNA molecules by the action of temperature and subject the single-stranded DNA molecules to a measurement selectively. Furthermore, it also becomes possible to select the polarity of a DNA molecule and subject the DNA molecule to a measurement.

Abstract: In a device for performing observation with a charged particle microscope at an atmospheric pressure using a diaphragm, while there was a demand that a distance between the diaphragm and a sample be reduced as much as possible, there was a problem that a limit for how close the diaphragm and the sample can be brought to each other was unknown in the past. In the present invention, a height adjustment member is used, and the position of a diaphragm in a charged particle beam device with respect to the height adjustment member is defined as the specific point of an optical device, so that the positional relationship between the height adjustment member and the diaphragm in the optical device is reproduced, and the height of a sample table with a Z-axis driving mechanism is adjusted so as to locate the surface of the sample at the position of the specific point of the optical device.

Abstract: Provided is a charged particle beam device including a charged particle optical column that irradiates a specimen with a primary charged particle beam, and a specimen base rotating unit that is capable of rotating the specimen base in a state of an angle formed by a surface of the specimen base and an optical axis of the primary charged particle beam being inclined to a non-perpendicular angle, in which the specimen base is configured to include a detecting element that detects a charged particle scattered or transmitted inside the specimen, and transmitted charged particle images of the specimen corresponding to each angle is acquired by irradiating the specimen in a state of the specimen base rotating unit being rotated at a plurality of different angles.

Abstract: A scanning electron microscope according to the present invention includes: an electron source that produces an electron beam; a trajectory dispersion unit that disperses the trajectory of an electron beam of electrons with a different energy value; a selection slit plate having a selection slit that selects the energy range of the dispersed electron beam; and a transmittance monitoring unit that monitors the transmittance of an electron beam, which is being transmitted through the selection slit. Accordingly, there can be provided a scanning electron microscope equipped with an energy filter that implements a stable reduction in energy distribution.

Abstract: A charged particle beam device includes: a first charged particle source that generates first charged particles and irradiates a sample with the generated first charged particles; a phase plate that changes phases of the first charged particles in accordance with charged states of portions through which the first charged particles are transmitted; and a phase plate control system that controls the charging of the phase plate.