Patents Assigned to Horiba Stec, Co., Ltd.
  • Publication number: 20230228677
    Abstract: Provided are a gas cell into which a gas is introduced, a temperature control block configured to control a temperature of the gas cell, and a pressure sensor configured to measure a pressure inside the gas cell. The pressure sensor is built into the temperature control block and/or the gas cell.
    Type: Application
    Filed: January 10, 2023
    Publication date: July 20, 2023
    Applicant: HORIBA STEC, Co., Ltd.
    Inventors: Motonobu TAKAHASHI, Sotaro KISHIDA, Akira KUWAHARA, Takeshi AKAMATSU, Yuhei SAKAGUCHI, Masakazu MINAMI
  • Patent number: 11698649
    Abstract: Provided is a concentration control module that improve responsiveness of concentration control of a vaporization system, and is used in a vaporization system. The concentration control module includes a concentration measuring part configured to measure a concentration of a source gas; a valve provided in a lead-out pipe configured to lead out the source gas from the tank; a pressure target value calculating part configured to calculate a pressure target value inside the tank by using a concentration target value of the source gas, and a concentration measured value of the concentration measuring part; a delay filter configured to generate a pressure control value by applying a predetermined time delay to the pressure target value obtained by the pressure target value calculating part; and a valve control part configured to feedback-control the valve by using a deviation between the pressure control value obtained by the delay filter, and a pressure inside the tank.
    Type: Grant
    Filed: August 23, 2021
    Date of Patent: July 11, 2023
    Assignee: HORIBA STEC, CO., LTD.
    Inventor: Toru Shimizu
  • Patent number: 11686603
    Abstract: A pressure type flowmeter includes a fluid resistance element provided in a flow path through which fluid flows, and in which a resistance flow path communicating with the flow path is formed, an upstream-side pressure sensor that detects upstream-side pressure of the fluid resistance element, and a downstream-side pressure sensor that detects downstream-side pressure of the fluid resistance element, in which the fluid resistance element is sandwiched and fixed by a pair of sandwiching components sealing components having a sheet-like shape are provided between the fluid resistance element and the sandwiching components and protrusions that partially press the sealing components are formed on at least one of the fluid resistance element and the sandwiching components.
    Type: Grant
    Filed: September 9, 2021
    Date of Patent: June 27, 2023
    Assignee: HORIBA STEC, Co., Ltd.
    Inventors: Hiroshi Horiguchi, Tadahiro Yasuda, Kentaro Nagai
  • Patent number: 11680646
    Abstract: To avoid formation of surface sag formed when an internal flow path of a valve element is processed and to ensure a maximum flow rate in a fluid control valve where a seating surface of the valve element is formed of a resin layer, in a fluid control valve that includes a valve seat, and a valve element including resin layers provided in concave grooves formed on a facing surface facing the valve seat, the valve element further includes internal flow paths whose inflow ports are opened in a back surface facing away from the facing surface and whose outflow ports are opened in portions around the concave grooves on the facing surface, and counterbored portions are formed on sides of the inflow ports of the internal flow paths.
    Type: Grant
    Filed: January 14, 2022
    Date of Patent: June 20, 2023
    Assignee: HORIBA STEC, Co., Ltd.
    Inventor: Kazuya Shakudo
  • Patent number: 11644852
    Abstract: A system that controls the flow rates of a plurality of split channels provided parallel to each other to a certain flow split ratio includes: a flow split ratio calculation unit that, in order to be able to diagnose whether a system abnormality that affects the flow split ratio is occurring, calculates a ratio of output values of flow rate sensors obtained by allowing, while fluid control valves of different split channels are closed, fluids to flow in these split channels as an actual flow split ratio; a reference flow split ratio storage unit that stores a reference flow split ratio serving as a reference for the actual flow split ratio; and an abnormality diagnosis unit that compares the actual flow split ratio and the reference flow split ratio, and diagnoses a system abnormality.
    Type: Grant
    Filed: May 11, 2021
    Date of Patent: May 9, 2023
    Assignee: HORIBA STEC, Co., Ltd.
    Inventors: Yusuke Kanamaru, Kotaro Takijiri, Kazuya Shakudo
  • Patent number: 11644354
    Abstract: In order to provide a correction device that enables the accuracy of the linearity between sensor output values and flow rate values in a flow rate sensor, there are provided a sensitivity correction function storage unit that stores a sensitivity correction function in which at least a portion of sensitivity correction values are set to different values in accordance with the sensor output values output from a flow rate sensor in an initial state in which the sensitivity coefficient is set to an initial value, a sensitivity setting unit that sets the sensitivity coefficient based on the initial values and on the sensitivity correction function, and then adjusts the sensitivity of the flow rate sensor, and a coefficient calculation unit that calculates a post-correction flow rate characteristic function based on function correction values that are decided in accordance with the flow rate values output post sensitivity correction.
    Type: Grant
    Filed: June 29, 2020
    Date of Patent: May 9, 2023
    Assignee: HORIBA STEC, Co., Ltd.
    Inventor: Hiroyuki Okano
  • Patent number: 11644357
    Abstract: A flow rate diagnosis apparatus includes: a main line in which a tank having a volume is provided; a branch line that branches from the main line on an upstream side of the tank; a first open close valve provided in the branch line; a second open close valve provided in the main line; a dead volume defined from the diagnosis object as an upstream end and the first open close valve and the second open close valve as downstream ends; and a second pressure control mechanism that controls a fluid flowing through the main line such that the pressure of the fluid in the dead volume is maintained at a second setting pressure during an inflow mode during which the fluid is caused to flow into the tank by closing of the first open close valve and opening of the second open close valve after a preparation mode.
    Type: Grant
    Filed: March 9, 2021
    Date of Patent: May 9, 2023
    Assignee: HORIBA STEC, Co., Ltd.
    Inventors: Osamu Horinouchi, Koji Imamura, Masaki Kobayashi
  • Patent number: 11631596
    Abstract: In order to provide a concentration control apparatus that, without adding any new sensors or the like, makes it possible to accurately estimate a quantity of source consumed inside a vaporization tank, and to perform highly accurate concentration control in accordance with the remaining quantity of source, there is provided a concentration control apparatus that, in a vaporizer that is equipped with at least a vaporization tank containing a liquid or solid source, a carrier gas supply path that supplies a carrier gas to the vaporization tank, and a source gas extraction path along which flows a source gas which is created by vaporizing the source and is then extracted from the vaporization tank, controls a concentration of the source gas and includes a concentration monitor that is provided on the source gas extraction path, and outputs output signals in accordance with a concentration of the source gas.
    Type: Grant
    Filed: March 3, 2020
    Date of Patent: April 18, 2023
    Assignee: HORIBA STEC, CO., LTD.
    Inventors: Toru Shimizu, Masakazu Minami
  • Patent number: 11609146
    Abstract: In order to accurately judge whether or not there is a seat leakage in the first valve and the second valve in a short period of time, a fluid control apparatus comprises a fluid resistor arranged in a flow channel, a first valve arranged upstream of the fluid resistor, a first pressure sensor that measures a pressure in a first volume between the first valve and the fluid resistor in the flow channel, a second valve arranged downstream of the fluid resistor, a second pressure sensor that measures a pressure in a second volume between the fluid resistor and the second valve, a valve controller that controls the first or second valve, and a seat leakage judging part that judges whether or not there is a seat leakage in the valve valves based on the pressure sensors in a state where the valves are fully closed.
    Type: Grant
    Filed: March 11, 2020
    Date of Patent: March 21, 2023
    Assignee: HORIBA STEC, Co., Ltd.
    Inventors: Sota Matsumoto, Kentaro Nagai, Yuko Imasato
  • Patent number: 11608910
    Abstract: In order to provide a piezo valve in which it is possible to accurately predict the remaining lifespan of a piezo actuator, there are provided a valve seat, a valve body that is able to move between a fully closed position in contact with the valve seat and a fully open position, a piezo actuator that drives the valve body, a drive circuit that receives an input signal, and outputs to the piezo actuator a corresponding drive voltage, and a leakage current detector that, when the drive circuit outputs a voltage equal to or greater than a maximum rated voltage that drives the valve body to the fully closed/open position, detects leakage current from the piezo actuator. When the leakage current is detected or in a state immediately prior to detection, a fluid is flowing between the valve seat and the valve body.
    Type: Grant
    Filed: October 23, 2020
    Date of Patent: March 21, 2023
    Assignee: HORIBA STEC, Co., Ltd.
    Inventor: Jeffrey Ransdell
  • Patent number: 11567476
    Abstract: A gas delivery apparatus is provided, comprising a system controller configured to collect valve position information and sensor information from at least a plurality of the sensors and valves, store the valve position information and sensor information into the monitored gas delivery process data, and execute the discriminative classifier including a first artificial intelligence (AI) model configured to extract features in a first input image of the monitored gas delivery process; a second AI model configured to extract features in a second input image of a golden gas delivery process; and a contrastive loss function configured to calculate a similarity between the first input image and the second input image based on outputs of the first AI model and the second AI model, and output a repeatability confidence value based on a similarity index between the first input image and the second input image.
    Type: Grant
    Filed: August 31, 2020
    Date of Patent: January 31, 2023
    Assignee: HORIBA STEC, Co., Ltd.
    Inventor: Edward Cocciadiferro
  • Patent number: 11537150
    Abstract: A fluid control apparatus includes a block elongated in a longitudinal direction and having a predetermined width, an internal flow channel formed inside the block so as to extend in the longitudinal direction, a first control valve mounted on the block, a second control valve mounted on the block at a position downstream of the first control valve. In the fluid control apparatus, the internal flow channel has a first outflow channel connected to a first outlet of the first control valve through which a fluid flows out thereof and also has a second inflow channel connected to a second inlet of the second control valve through which the fluid flows thereinto. In addition, the first outflow channel and the second inflow channel are disposed so as to overlap each other at one point as viewed in the width direction through the block.
    Type: Grant
    Filed: March 24, 2021
    Date of Patent: December 27, 2022
    Assignee: HORIBA STEC, Co., Ltd.
    Inventor: Kazuya Shakudo
  • Patent number: 11531359
    Abstract: Provided is a fluid control apparatus capable of setting, to a value as close as possible to an opening start voltage, an initial applied voltage applied when controlling a control valve so that a measured amount becomes a set amount from a fully closed state and capable of preventing occurrence of large overshoot while increasing a response speed. A valve controller inputs a voltage command for setting an initial driving voltage to be applied to a control valve to a voltage generation circuit in a case where the control valve is changed from a fully closed state to a predetermined opening degree, and includes a drive history storage unit that stores therein drive history information of the control valve. The controller is configured to change a value of the initial driving voltage in accordance with the drive history information.
    Type: Grant
    Filed: November 11, 2021
    Date of Patent: December 20, 2022
    Assignee: HORIBA STEC, Co., Ltd.
    Inventor: Kazuya Shakudo
  • Patent number: 11519070
    Abstract: In order to inhibit overshoot in the concentration of a source gas immediately after a gas supply period starts, there is provided a vaporization device that is equipped with a vaporization tank that holds a liquid or a solid source, a carrier gas supply path that supplies carrier gas to the vaporization tank, a source gas extraction path along which flows a source gas which is obtained by vaporizing the source and which is extracted from the vaporization tank, a concentration monitor that is provided on the source gas extraction path, and a concentration control mechanism that is provided with a fluid controller which controls a concentration of the source gas extracted from the source gas extraction path. This vaporization device alternates between supplying the source gas and stopping the supply of the source gas.
    Type: Grant
    Filed: January 31, 2020
    Date of Patent: December 6, 2022
    Assignee: HORIBA STEC, CO., LTD.
    Inventors: Toru Shimizu, Masakazu Minami
  • Patent number: 11519805
    Abstract: In a vacuum gauge that controls a temperature of a sensor section to a high temperature, a circuit board can be sufficiently cooled without applying air to the vacuum gauge from outside. The vacuum gauge includes a sensor section that communicates with a measurement space via a connection port and outputs an output signal according to a pressure in the measurement space, a heater provided around the sensor section to heat the sensor section, a circuit board arranged on a side opposite to the connection port with respect to the sensor section, a first inner case that accommodates the sensor section and the heater, a second inner case that accommodates the circuit board, and an outer case that surrounds the first inner case and the second inner case and forms a flow path, through which outside air flows, together with the first inner case and the second inner case.
    Type: Grant
    Filed: February 18, 2021
    Date of Patent: December 6, 2022
    Assignee: HORIBA STEC, CO., LTD.
    Inventors: Junya Nakai, Sotaro Kishida
  • Patent number: 11513060
    Abstract: In order to provide an absorption analyzer capable of directly measuring an analysis target gas flowing into or produced in a vessel such as a chamber and preventing a measurement error due to moisture condensation, the absorption analyzer is adapted to include: a light emission module that is attached covering a first opening of the vessel into which the analysis target gas flows or in which the analysis target gas is produced and emits light into the vessel; and a light detection module that detects the light emitted from the light emission module and passing through the vessel. In addition, the light emission module is adapted to include: a base flange that is attached around the first opening on an outer surface of the vessel; a window material whose outer surface is tilted at a predetermined angle; a seal member; and a pressing body.
    Type: Grant
    Filed: November 20, 2019
    Date of Patent: November 29, 2022
    Assignee: HORIBA STEC, CO., LTD.
    Inventors: Miyako Hada, Daisuke Hayashi
  • Patent number: 11493443
    Abstract: In order to make it possible to conduct a zero calibration even though an interference gas exists in a measurement area of a detector, a light absorbance analysis apparatus includes a detector that detects an intensity of light that transmits a gas, a total pressure sensor that measures a total pressure of the gas, an absorbance calculating part that calculates an absorbance based on an output value of the detector and a previously set zero reference value, a partial pressure—absorbance relation storing part that stores a partial pressure—absorbance relational data that indicates a relationship between a partial pressure of an interference gas that exists in a measurement area of the detector and an absorbance calculated by the absorbance calculating part, and a partial pressure calculating part that calculates an interference gas partial pressure as a partial pressure of the interference gas.
    Type: Grant
    Filed: April 15, 2020
    Date of Patent: November 8, 2022
    Assignee: HORIBA STEC, CO., LTD.
    Inventors: Toru Shimizu, Yuhei Sakaguchi, Masakazu Minami
  • Publication number: 20220307977
    Abstract: In order to provide an absorbance analysis apparatus for DCR gas that can measure a concentration of a DCR gas by separating absorbance of the DCR gas alone even in a mixed gas consisting of the DCR gas and CO gas whose absorption spectrum overlaps each other, the absorbance analysis apparatus for DCR gas comprises a DCR filter 31 that is configured to transmit a light in a first wavenumber domain including an absorbance peak of the DCR gas, a CO filter 32 that is configured to transmit a light in a second wavenumber domain that is different from the first wavenumber domain, and a DCR gas volume calculator 4 that is configured to calculate volume of the DCR gas based on a first absorbance measured by the light transmitted through the DCR filter 31 and a second absorbance measured by the light transmitted through the CO filter 32.
    Type: Application
    Filed: March 15, 2022
    Publication date: September 29, 2022
    Applicants: Tokyo Electron Limited, HORIBA STEC, Co., Ltd.
    Inventors: Yuichi FURUYA, Masayuki TANAKA, Yuhei SAKAGUCHI, Masakazu MINAMI, Toru SHIMIZU
  • Patent number: 11454993
    Abstract: A flow rate control apparatus calculates a resistance flow rate, which is a flow rate of a fluid flowing through the fluid resistor, based on a first pressure measured by a first pressure sensor and a second pressure measured by a second pressure sensor, converts the resistance flow rate to a first valve flow rate, which is the flow rate of the fluid passing through a first valve, based on the first pressure, converts the resistance flow rate to a second valve flow rate, which is the flow rate of the fluid passing through a second valve, based on the second pressure, controls the first valve so that the deviation between a first set flow rate and the first valve flow rate becomes small, and controls the second valve so that the deviation between a second set flow rate and the second valve flow rate becomes small.
    Type: Grant
    Filed: August 3, 2021
    Date of Patent: September 27, 2022
    Assignee: HORIBA STEC, Co., Ltd.
    Inventor: Kazuya Tokunaga
  • Patent number: 11448535
    Abstract: In order to accurately calculate an estimated flow rate by a dynamic constant volume method, a flow rate calculation system including a tank into which fluid flows, an inflow line through which the fluid flows into the tank, and a pressure sensor that detects the pressure inside the tank is adapted to include: a pressure change data storage part that stores pressure change data indicating a temporal change in the pressure detected by the pressure sensor during an inflow period; a flow rate calculation part that calculates the estimated flow rate during the inflow period based on a pressure change rate; and a flow rate correction part that, on the basis of first pressure detected by the pressure sensor after a predetermined time has elapsed after the inflow period and second pressure included in the pressure change data and higher than the first pressure, corrects the estimated flow rate.
    Type: Grant
    Filed: February 25, 2020
    Date of Patent: September 20, 2022
    Assignee: HORIBA STEC, Co., Ltd.
    Inventors: Masanori Terasaka, Koji Imamura, Osamu Horinouchi, Yasuhiro Isobe