Patents Assigned to IMEC vzw
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Patent number: 12687493Abstract: Example embodiments relate to alignment-tolerant photonic sensing systems. An example sensing system includes an illumination module for delivery of a light beam. The sensing system also includes a cartridge that includes a photonic sensor chip having a length axis and a width axis. The photonic sensor chip includes a plurality of grating couplers in a first areal portion of the photonic sensor chip. The photonic sensor chip also includes a plurality of sensing sites. Additionally, the photonic sensor chip includes waveguides connecting each grating coupler to a respective sensing site or group of sensing sites of the plurality of sensing sites. Further, the sensing system includes a cartridge holder for releasably receiving and locking the cartridge into a sensing position. The photonic sensor chip is aligned relative to the illumination module up to permitted alignment tolerances when the cartridge is locked into the sensing position.Type: GrantFiled: November 21, 2023Date of Patent: July 21, 2026Assignee: Imec vzwInventors: Roelof Jansen, Jeonghwan Song
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Patent number: 12687516Abstract: An electric field gradient focusing device is provided that includes: (i) a fluidic channel having an inlet and an outlet for a fluid, (ii) a first actuator configured to induce a fluid flow in the fluidic channel from the inlet to the outlet via AC electroosmosis, and (iii) a second actuator configured to generate a DC electric field gradient along at least part of the fluidic channel.Type: GrantFiled: December 20, 2022Date of Patent: July 21, 2026Assignee: Imec VZWInventors: Willem Van Roy, Chengxun Liu, Tinne De Moor
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Patent number: 12690261Abstract: Integrated circuit chips and method for making integrated circuit chips are provided. The method includes providing a semiconductor substrate, forming a device layer including a forksheet device on the substrate and providing the substrate with a substrate part of a dielectric wall of the forksheet device, a first shallow trench isolation and a second shallow trench isolation. The method also includes contacting a source or drain contact and extending into the substrate between the first shallow trench isolation and the dielectric wall, then removing the substrate material so as to expose an end of the dielectric wall, the first surface, and the second surface, then obtaining a first spacer and a second spacer, so as to obtain a trench, wherein the end of the dielectric wall is exposed to the trench, then depositing an electrically insulating material in the trench so as to form an extension.Type: GrantFiled: December 5, 2023Date of Patent: July 21, 2026Assignee: Imec vzwInventors: Boon Teik Chan, Gaspard Hiblot, Gioele Mirabelli
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Patent number: 12689037Abstract: A coated cathode, a device including the coated cathode and methods for preparation thereof is provided. The coated cathode includes: an active material (10) for supplying and storing Li+ ions, an electrically conductive additive (12), and a coating (11), different from the active material (10), that coats surfaces of the active material (10), wherein the coating (11) comprises amorphous halogen-doped titanium oxide, and wherein the coating (11) has a thickness ranging from 1 to 20 nm.Type: GrantFiled: January 31, 2022Date of Patent: July 21, 2026Assignees: Imec vzw, Katholieke Universiteit LeuvenInventors: Louis De Taeye, Philippe Vereecken
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Patent number: 12684795Abstract: A method for forming a FET device is provided.Type: GrantFiled: December 2, 2022Date of Patent: July 14, 2026Assignee: Imec vzwInventors: Boon Teik Chan, Naoto Horiguchi, Julien Ryckaert
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Patent number: 12669645Abstract: An integrated photonics arrayed waveguide multiplexing/demultiplexing device is disclosed. The device includes an array of waveguides having an incident light waveguide section including a phase correcting region, a transmitted light waveguide section, a tunable reflector, wherein each pair of consecutive waveguides in the array includes a coupler. The coupler configured to combine light from the transmitted light waveguide sections, determine therefrom an optical phase difference between the two consecutive waveguides, and wherein the couplers are further configured to determine therefrom a change in optical path length required for each of two consecutive waveguides to reach a predetermined optical phase difference, and wherein each phase correcting region is configured to apply the change to correct the optical path length of the respective waveguide.Type: GrantFiled: December 21, 2023Date of Patent: June 30, 2026Assignee: Imec vzwInventor: Bruno Figeys
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Patent number: 12671431Abstract: A sampling circuit for sampling an analog input signal including: a capacitive means, a reset switch, and a sampling switch; the reset switch and the sampling switch being connected to a signal generator circuit configured to provide periodic reset and sampling control signals to the respective switches for controlling their operation. The respective periodic reset and sampling control signals have equal duty factors and signal periods, and a phase delay with respect to one another being less than the signals' duty factor, thereby forming an overlap period during which the reset switch and the sampling switch remain closed.Type: GrantFiled: July 15, 2022Date of Patent: June 30, 2026Assignees: UNIVERSITEIT GENT, IMEC VZWInventors: Shengpu Niu, Joris Lambrecht, Michiel Verplaetse, Yin Xin
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Patent number: 12663656Abstract: Embodiments of the present disclosure provide an imaging device for holographic imaging of a sample, the imaging device comprising a light source generating a light beam, a beam splitter splitting the light beam into an object beam along an object beam path and a reference beam along a reference beam path, and a detector. The imaging device defines a sample position. The object beam is propagated through the sample position, and the detector is arranged to prevent non-scattered object light, passing through the sample position without being scattered by the sample, from being incident onto the detector. The reference beam is propagated through the sample position, and the detector is arranged so that non-scattered reference light, passing through the sample position without being scattered by the sample, is incident onto the detector. The detector detects an interference pattern formed by scattered object light and the non-scattered reference light.Type: GrantFiled: November 30, 2022Date of Patent: June 23, 2026Assignee: IMEC VZWInventors: Ziduo Lin, Richard Stahl, Geert Vanmeerbeeck, Abdulkadir Yurt
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Patent number: 12648213Abstract: A method for forming a stacked transistor device is disclosed, in which a nanosheet field-effect transistor (FET) structure and a fin FET structure are formed. The method comprises forming a first fin structure and a second fin structure from a vertical stack, wherein the second fin structure is arranged above the first fin structure, and wherein the vertical stack comprises a middle layer arranged between the first and second fin structures. The method further comprises forming, from above, a gate structure across a channel region of the second fin structure, forming, from below, a gate structure across a channel region of the first fin structure, and forming source and drain regions for the first and second fin structures.Type: GrantFiled: June 28, 2023Date of Patent: June 2, 2026Assignee: IMEC VZWInventor: Sujith Subramanian
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Patent number: 12648165Abstract: The present disclosure relates to at least one multilayer structure that is produced on a semiconductor donor wafer, by growing e.g. group III-V material in a cavity formed in a dielectric support layer. A template layer embeds the multilayer structure. The multilayer structure comprises a release layer that is accessible from the sides. The method further comprises the production of a device and the production of conductive paths connected to the device and terminating in a number of contact pads which are coplanar with a first dielectric bonding surface. The donor wafer is then bonded to a carrier wafer. TSV openings are then produced from the back side of the carrier wafer and an etchant is provided for selectively removing layers of the multilayer structure. The etchant is supplied through the TSV openings for the removal of the release layer. The donor wafer is thereby released to form separate semiconductor chips.Type: GrantFiled: June 2, 2023Date of Patent: June 2, 2026Assignee: Imec vzwInventors: Abhitosh Vais, Bertrand Paravais, Guillaume Boccardi, Bernardette Kunert, Yves Mols, Sachin Yadav
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Patent number: 12635263Abstract: A photovoltaic module includes at least one string of solar cells wherein the solar cells are electrically connected in series using a plurality of connecting elements, wherein each connecting element electrically connects a frontside of one of the solar cells of the at least one string with a backside of the neighboring solar cell of the at least one string; a weave of electrically insulating yarns on which the solar cells are positioned; at least one electronic device comprising a first terminal, and a second terminal, wherein the at least one electronic device is fixed to the weave and wherein the first terminal, and the second terminal are respectively electrically connected with the connecting elements at the backsides of neighboring solar cells of the at least one string.Type: GrantFiled: September 12, 2024Date of Patent: May 19, 2026Assignees: IMEC VZW, UNIVERSITEIT HASSELTInventors: Tom Borgers, Jonathan Govaerts
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Patent number: 12635211Abstract: In one aspect, a method of forming a semiconductor device including a plurality of stacked transistor devices having a bottom transistor device and a top transistor device can include: forming a plurality of parallel fin structures on a substrate; forming a sacrificial gate across the fin structures; forming bottom source/drain bodies for each bottom transistor device by epitaxy; forming a bottom dummy contact layer covering the bottom source/drain bodies; forming top source/drain bodies for each top transistor device over the bottom dummy contact layer by epitaxy; depositing an insulating material over the bottom dummy contact layer and the top source/drain bodies; replacing the sacrificial gate with a functional gate stack by a replacement metal gate process; patterning holes extending through the insulating material, with each hole exposing an upper surface portion of the bottom dummy contact layer; replacing the bottom dummy contact layer with one or more contact metals, which can include etching the dummType: GrantFiled: June 26, 2023Date of Patent: May 19, 2026Assignee: IMEC vzwInventors: Hans Mertens, Sujith Subramanian
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Patent number: 12631934Abstract: A device for dielectric material characterization of a test sample is provided. The device includes a resonator block having a groove at at least one side of the resonator block, wherein the groove comprises at least a first inclined surface and a second inclined surface and is configured to contact the test sample via the first inclined surface and/or the second inclined surface. In this regard, the resonator block is configured to generate a rotational electric field coupled between the first inclined surface and the second inclined surface of the groove and further to propagate the rotational electric field partially or fully through the test sample in order to perform dielectric material characterization of the test sample.Type: GrantFiled: October 18, 2023Date of Patent: May 19, 2026Assignee: Imec vzwInventor: Qingzhong Deng
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Patent number: 12625136Abstract: A device (1) for sensing an analyte, the device (1) comprises at least a sample inlet (10) for receiving a sample, affinity probes (111) selected to have a preferential binding to the analyte, a transducer (11) sensitive to a characteristic of the analyte and/or a label attached to the analyte, the transducer not being a FET transducer, and a desalting unit (13) for desalting the received sample.Type: GrantFiled: December 2, 2021Date of Patent: May 12, 2026Assignee: Imec vzwInventors: Willem Van Roy, Tim Stakenborg, Kris Covens
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Patent number: 12627298Abstract: A circuitry for generating output clock signals with increasing phase delays comprises: an input receiving input clock signals with increasing phase delays, wherein the output clock signals are twice as many as the input clock signals; logic components connected in a loop with an output from a component connected as a first input to a following component, wherein the output is further connected as a second input to an oppositely positioned component; wherein each component receives the first, the second and a third input signal; wherein pairs of oppositely positioned components receive a common input clock signal and mask out the third input clock signal based on logic state of first and second input signals such that the outputs are phase shifted by 180 degrees; and wherein the circuitry outputs the output clock signals based on outputs from each component.Type: GrantFiled: February 19, 2024Date of Patent: May 12, 2026Assignee: IMEC VZWInventors: Shun Nagata, Ewout Martens, Jan Craninckx
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Patent number: 12626481Abstract: A method for light field rendering includes: obtaining an n-dimensional mixture model, with n a natural number equal to or larger than 4, of a light field. The model is made of kernels wherein each kernel represents light information and is expressed by parameter values; mathematically reducing the n-dimensional mixture model into a 2-dimensional mixture model of an image given a certain point of view, wherein the 2-dimensional model is also made of kernels; rendering a view in a pixel domain from the 2-dimensional model made of kernels.Type: GrantFiled: May 5, 2021Date of Patent: May 12, 2026Assignees: UNIVERSITEIT GENT, IMEC VZWInventors: Martijn Courteaux, Glenn Van Wallendael, Peter Lambert
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Patent number: 12618152Abstract: In one aspect, a method of depositing a transition metal dichalcogenide is provided. The method includes depositing a layer of the transition metal dichalcogenide on a substrate by a metalorganic chemical vapor deposition process including exposing the substrate to a mixture of reactant gases including a transition metal precursor and a chalcogen precursor. The mixture further includes a gas-phase halogen-based reactant to volatilize transition metal adatoms deposited on the substrate.Type: GrantFiled: October 9, 2023Date of Patent: May 5, 2026Assignees: IMEC VZW, Katholieke Universiteit LeuvenInventors: Benjamin Groven, Vladislav Voronenkov, Dries Vranckx
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Patent number: 12618752Abstract: A collecting device (200) for collecting airborne particles comprises: a first (202) and second layer (220) spaced apart for forming a particle collection chamber (240; 340) therebetween: wherein inlets (210; 310) and outlets (230; 330) are configured for transporting a flow of air (104) into and out of the particle collection chamber (240; 340) and configured for allowing capturing airborne particles by impaction. The collecting device (200) further comprises at least one liquid access port (260; 260a, 260b; 360a-360h) for filling the particle collection chamber (240; 340) with a reagent; and wherein the particle collection chamber (240; 340) comprises at least one side wall (246; 346) for defining flow of the reagent, such that a first portion (248a; 348a) and a second portion (248b; 348b) of the particle collection chamber (240; 340) are arranged on opposite sides of the at least one side wall (246; 346).Type: GrantFiled: April 20, 2022Date of Patent: May 5, 2026Assignee: IMEC VZWInventors: Ahmed Taher, Benjamin Jones, Sophie Roth
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Patent number: 12620550Abstract: A method includes generating, by a SEM, sets of frames corresponding to regions of a microfabrication pattern, for each set of frames, estimating feature data representing edge positions, linewidths, or centerline positions of one or more features of each region of the pattern, and computing a preliminary estimate of a roughness parameter from the feature data. The roughness parameter is indicative of a line edge roughness, a linewidth roughness, or a pattern placement roughness of the one or more features. The method further includes fitting a model equation to the preliminary estimates of the roughness parameter using a model parameter dependent on the number of frames of each set of frames, the model equation relating the model parameter to the roughness parameter; and computing a final estimate of the roughness parameter as an asymptotic value of the fitted model equation.Type: GrantFiled: March 15, 2023Date of Patent: May 5, 2026Assignees: Imec vzw, Katholieke Universiteit LeuvenInventors: Joren Severi, Gian Francesco Lorusso, Danilo De Simone
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Patent number: 12613276Abstract: According to an aspect there is provided an optical monitoring device comprising: a first input for receiving a portion of a first optical signal coupled from a first waveguide into the first input; a second input for receiving at least a portion of a second optical signal coupled into the second input; a mixing unit for controlling combining of the portion of the first optical signal with the at least a portion of the second optical signal into a combined signal at an output from the mixing unit; and at least one photodetector for detecting the combined signal. The optical monitoring device is configured to apply a modulation signal to modulate at least one of a phase of the portion of the first and/or second optical signal, a coupling of the portion of the first and/or second optical signal into the respective input, or an amplitude of the portion of the first and/or second optical signal being transferred into the combined signal.Type: GrantFiled: May 13, 2024Date of Patent: April 28, 2026Assignees: IMEC VZW, Universiteit GentInventors: Wim Bogaerts, Liu Yichen, Yancan Wu