Abstract: A non-destructive and simple analytical method is provided which allows in situ monitoring of plasma damage during the plasma processing such as resist stripping. If a low-k film is damaged during plasma processing, one of the reaction products is water, which is remained adsorbed onto the low-k film (into pores), if the temperature is lower than 100-150 C. A plasma (e.g. He) that emits high energy EUV photons (E>20 eV) which is able to destruct water molecules forming electronically excited oxygen atoms is used to detect the adsorbed water. The excited oxygen is detected from optical emission at 777 nm. Therefore, the higher the adsorbed water concentration (higher damage), a more intensive (oxygen) signal is detected. Therefore, intensity of oxygen signal is a measure of plasma damage in the previous strip step.

Abstract: An improved reaction chamber cleaning process is provided for removing water residues that makes use of noble-gas plasma reactions. The method is easy applicable and may be combined with standard cleaning procedure. A noble-gas plasma (e.g. He) that emits high energy EUV photons (E>20 eV) which is able to destruct water molecules to form electronically excited oxygen atoms is used to remove the adsorbed water.

Abstract: A signal processing device adapted for simultaneous processing of at least two process threads in a multi-processing manner is disclosed. In one embodiment, the device comprises a plurality of functional units capable of executing word- or subword-level operations on data. The device further comprises means for interconnecting the plurality of functional units, the means for interconnecting supporting a plurality of dynamically switchable interconnect arrangements, and at least one of the interconnect arrangements interconnects the plurality of functional units into at least two non-overlapping processing units each with a pre-determined topology. The device further comprises at least two control modules each assigned to one of the processing units.

Abstract: One inventive aspect is related to an atomic force microscopy probe. The probe comprises a tip configuration with two probe tips on one cantilever arm. The probe tips are electrically isolated from each other and of approximately the same height with respect to the cantilever arm. The outer surface of the tip configuration has the shape of a body with a base plane and an apex. The body is divided into two sub-parts by a gap located approximately symmetrically with respect to the apex and approximately perpendicular to the base plane. Another inventive aspect related to methods for producing such an AFM probe.

Abstract: A method is disclosed for relaxing strain in a multi-gate device, the method comprising providing a substrate with a strained material, patterning a plurality of fins in the strained material, defining a first region comprising at least one fin, defining a second region comprising at least one fin, providing a diffusion barrier layer on the first region, performing a hydrogen anneal such that the strain in the second region is relaxed.

Abstract: Methods of producing a composite substrate and devices made by the methods are disclosed. One of the methods comprises providing a flexible sacrificial layer, producing one or more patterned conducting layers on the flexible sacrificial layer, bending the sacrificial layer into a predetermined shape, providing a stretchable and/or flexible material on top of and in between features of the one or more patterned layers.

Abstract: A method of making at least one marker (MX) for double gate SOI processing on a SOI wafer is disclosed. The marker has a diffracting structure in a first direction and the diffracting structure is configured to generate an asymmetrical diffraction pattern during use in an alignment and overlay detection system for detection in the first direction.

Abstract: A method for determining an estimate of statistical properties of an electronic system comprising individual components subject to manufacturing process variability is disclosed. In one aspect, the method comprises obtaining statistical properties of the performance of individual components of the electronic system, obtaining information about execution of an application on the system, simulating execution of the application based on the obtained information about execution of the application on the system for a simulated electronic system realization constructed by selecting individual components with the obtained statistical properties determining the delay and energy of the electronic system, and determining the statistical properties of the delay and energy of the electronic system.

Abstract: A method of determining the behavior of an electronic system comprising electronic components under variability is disclosed. In one aspect, the method comprises for at least one parameter of at least one of the electronic components, showing variability defining a range and a population of possible values within the range, each possible value having a probability of occurrence, thereby defining an input domain. The method further comprises selecting inputs randomly from the input domain, wherein the probability to sample (PTS) is obtained from the probability of occurrence (PTOIR). The method further comprises performing simulation to obtain the performance parameters of the electronic system, thereby defining an output domain sample.

Abstract: A dual workfunction semiconductor device which comprises a first and second control electrode comprising a metal-semiconductor compound, e.g. a silicide or a germanide, and a dual workfunction semiconductor device thus obtained are disclosed. In one aspect, the method comprises forming a blocking region for preventing diffusion of metal from the metal-semiconductor compound of the first control electrode to the metal-semiconductor compound of the second control electrode, the blocking region being formed at a location where an interface between the first and second control electrodes is to be formed or is formed. By preventing metal to diffuse from the one to the other control electrode the constitution of the metal-semiconductor compounds of the first and second control electrodes may remain substantially unchanged during e.g. thermal steps in further processing of the device.

Abstract: A method for forming a semiconductor device on a substrate having a first major surface lying in a plane and the semiconductor device are disclosed. In one aspect, the method comprises, after patterning the substrate to form at least one structure extending from the substrate in a direction substantially perpendicular to a major surface of the substrate, forming locally modified regions at locations in the substrate not covered by the structure, thus locally increasing etching resistance of these regions. Forming locally modified regions may prevent under-etching of the structure during further process steps in the formation of the semiconductor device.

Abstract: The preferred embodiments provide a method for forming at least one metal comprising elongated nanostructure on a substrate. The method comprises exposing a metal halide compound surface to a photon comprising ambient to initiate formation of the at least one metal comprising elongated nanostructure. The preferred embodiments also provide metal comprising elongated nanostructures obtained by the method according to preferred embodiments.

Abstract: Preferred embodiments provide a method for removing at least part of a copper comprising layer from a substrate, the substrate comprising at least a copper comprising surface layer. The method comprises in a first reaction chamber converting at least part of the copper comprising surface layer into a copper halide surface layer and in a second reaction chamber removing at least part of the copper halide surface layer by exposing it to a photon comprising ambient, thereby initiating formation of volatile copper halide products. During exposure to the photon comprising ambient, the method furthermore comprises removing the volatile copper halide products from the second reaction chamber to avoid saturation of the volatile copper halide products in the second reaction chamber. The method according to preferred embodiments may be used to pattern copper comprising layers.

Abstract: A method of configuring communication with a plurality of non-overlapping channels and between communication units with first communication units and second communication units is disclosed. The first communication units are privileged with respect to the second communication units, the second communication units having dynamically adaptable transceivers enabling channel switching, at least one of the second communication units being within the communication range of one of the first communication units. In one aspect, the method comprises determining information on the availability of the channels of the communication system for communication by the second communication units, based at least in part on information regarding whether the first communication units are active or not on the channels.

Abstract: A method and device for determining the quality of the interface surface between a layer of a dielectric material and the top surface of the semiconductor substrate are disclosed. In one aspect, the method comprises providing a semiconductor substrate with a top surface whereon a layer of a dielectric material is deposited thereby forming an interface surface, the surface of the layer of the dielectric material being or not in direct contact with the semiconductor substrate defining a top surface. A charge is then applied on a dedicated area of the top surface. A voltage Vs is measured on the top surface. The dedicated area is illuminated to define an illuminated spot. The photovoltage is measured inside and outside the determined illuminated spot during the illumination of the area.

Abstract: A method for improving run-time execution of an application on a platform based on application metadata is disclosed. In one embodiment, the method comprises loading a first information in a standardized predetermined format describing characteristics of at least one of the applications. The method further comprises generating the run-time manager, based on the first information, the run-time manager comprising at least two run-time sub-managers, each handling the management of a different resource. The information needed to generate the two run-time sub-managers is at least partially shared.

Abstract: A method is disclosed to measure the permeability of films or coatings towards solvents (e.g. water). First a substrate comprising an absorption or container layer is provided, preferably the material is a porous material. To study water permeability, the porous material is hydrophilic or is made hydrophilic by means of e.g. an anneal process. To study the permeability of the film or coating, the coating is deposited on top of the porous material. The substrate comprising the film or coating on top of the absorption or container layer is then brought into a pressurizable chamber subsequently filled with the gaseous substance of the solvent (e.g. water vapor). By increasing/decreasing the vapor pressure in the chamber between zero and the equilibrium vapor pressure of the solvent used, the permeability (penetration) of solvent through the film or coating can be determined. The amount of solvent that can penetrate through the film or coating can be measured by means of ellipsometry, mass spectrometry, etc.

Abstract: In one aspect, a virtually multi-threaded distributed instruction memory hierarchy that can support the execution of multiple incompatible loops in parallel is disclosed. In addition to regular loops, irregular loops with conditional constructs and nested loops can be mapped. The loop buffers are clustered, each loop buffer having its own local controller, and each local controller is responsible for indexing and regulating accesses to its loop buffer.

Abstract: A device and method for calibrating MIMO systems are disclosed. In one aspect, a calibration circuit comprises at least a first and a second input/output port, each arranged for being connected to a different transmitter/receiver pair of a multiple input multiple output (MIMO) system. The circuit further comprises at least a third and a fourth input/output port, each arranged for being connected to a different antenna. The circuit further comprises an attenuator having a first attenuator port and a second attenuator port. The circuit further comprises a first and a second non-reciprocal switch, the first switch being arranged for establishing a connection between the first input/output port and either the third input/output port or the first attenuator port, and the second switch arranged for establishing a connection between the second input/output port and either the fourth input/output port or the second attenuator port.

Abstract: Embodiments of the invention are related to methods for and devices for performing electrical spin detection. A method for spin detection of charged carriers having a spin and forming a flux in a medium is disclosed, the method comprises measuring a first current on a first contact on the medium that has a first spin selectivity, measuring a second current on a second contact on the medium that has a second spin selectivity, comparing the first measured current and the second measured current, and deriving the average or statistically relevant spin state of the flux of charge carriers. Corresponding devices are disclosed.