Abstract: A processing load required for updating and searching data is to be reduced in an ERP system. A database is configured so as to include a process flow table PT in which process flow data containing various kinds of data regarding a process flow including a plurality of business processes are registered wherein: the process flow data contain status data, common data and process unique data; the status data are data indicating a progress situation of each of a plurality of business processes (for example, a received order, a shipment instruction, delivery, delivery acceptance inspection and sales) included in the process flow; the common data are data common among business processes included in the same process flow; the process unique data are data unique to each of the business processes included in the same process flow; and the status data are updated in the case where the process unique data are updated.

Abstract: A processing load required for updating and searching data is to be reduced in an ERP system. A database is configured so as to include: a process flow table PT in which process flow data containing various kinds of data regarding a process flow including a plurality of business processes are registered; and an update condition table UT in which update condition data indicating an update condition of the process flow data are registered, wherein the process flow data contain status data indicating a progress situation of each of a plurality of business processes included in the process flow, common data common among business processes included in the same process flow, and process unique data unique to each of the business processes included in the same process flow; wherein the status data are updated in the case where the process unique data are updated; and the update condition data are data indicating a state of the status data.

Abstract: In a database storing an index table in which index data used for retrieval of slip data that are generated for every business unit in a business process are registered. The index data are data containing a plurality of slip processed data respectively corresponding to the slip data. The slip processed data are data in which a specific item, which contains a predetermined item suitable for grasp of a business process in each business and a key item defined in advance in each business. The content of the specific item among items respectively set up to the slip data on various kinds of businesses are associated with each other in unit of slip data.

Abstract: Provided are a showerhead assembly for depositing a thin film on a substrate and a thin film deposition apparatus having the same. The showerhead assembly includes a plurality of gas injection units radially disposed above a substrate, each of the plurality of gas injection units comprising a receiving part configured to receive a gas supplied from the outside and a plurality of injection holes configured to inject the gas within the receiving part.

Abstract: Disclosed is an apparatus for manufacturing semiconductors, to be used for various processes in semiconductor manufacture processing, such as the forming of layers on wafers. A tube has a processing space therein and a discharge hole at a side thereof. A boat can be loaded and unloaded through a lower opening of the tube. Susceptors are vertically separated from one another and supported within the boat, have a central hole defined in the respective centers of rotation thereof, and have a plurality of wafers stacked around a central perimeter on the respective top surfaces thereof. A supply tube is installed at the top of the boat and passes through each central hole of the susceptors, and defines discharge holes for discharging processing gas supplied from the outside onto each top surface of the susceptors.

Abstract: Provided are a gas injection device and substrate processing apparatus using the same. The gas injection device includes a plurality of gas injection units disposed above a substrate support part rotatably disposed within a chamber to support a plurality of substrates, the plurality of gas injection units being disposed along a circumference direction with respect to a center point of the substrate support part to inject a process gas onto the substrates. Each of the plurality of gas injection units includes a top plate in which an inlet configured to introduce the process gas is provided and an injection plate disposed under the top plate to define a gas diffusion space between the injection plate and the top plate along a radius direction of the substrate support part, the injection plate having a plurality of gas injection holes under the gas diffusion space to inject the process gas introduced through the inlet and diffused in the gas diffusion space onto the substrate.

Abstract: Provided are a gas injection device and substrate processing apparatus using the same. The gas injection device includes a plurality of gas injection units disposed above a substrate support part rotatably disposed within a chamber to support a plurality of substrates, the plurality of gas injection units being disposed along a circumference direction with respect to a center point of the substrate support part to inject a process gas onto the substrates. Wherein each of the plurality of gas injection units includes a top plate in which an inlet configured to introduce the process gas is provided and an injection plate disposed under the top plate to define a gas diffusion space between the injection plate and the top plate along a radius direction of the substrate support part, the injection plate having a plurality of gas injection holes under the gas diffusion space to inject the process gas introduced through the inlet and diffused in the gas diffusion space onto the substrate.

Abstract: [Problems] It is allowed to make a variety of inquiries into reports at a low cost without requiring a complex report program.

Abstract: Disclosed is an apparatus for manufacturing semiconductors, to be used for various processes in semiconductor manufacture processing, such as the forming of layers on wafers. A tube has a processing space therein and a discharge hole at a side thereof. A boat can be loaded and unloaded through a lower opening of the tube. Susceptors are vertically separated from one another and supported within the boat, have a central hole defined in the respective centers of rotation thereof, and have a plurality of wafers stacked around a central perimeter on the respective top surfaces thereof. A supply tube is installed at the top of the boat and passes through each central hole of the susceptors, and defines discharge holes for discharging processing gas supplied from the outside onto each top surface of the susceptors.