Patents Assigned to JEOL Ltd.
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Patent number: 12687599Abstract: In a frequency converter, a transmission signal having a first frequency component and a second frequency component is multiplied by a local signal, to thereby frequency-convert the transmission signal. In a power amplifier, the frequency-converted transmission signal is amplified. A demultiplexing circuit generates a first transmission signal and a second transmission signal from the amplified transmission signal. A controller is configured to set for a transmission section a frequency set suitable for two irradiation frequencies.Type: GrantFiled: October 27, 2022Date of Patent: July 21, 2026Assignee: JEOL Ltd.Inventors: Kenichi Hachitani, Nobuaki Nemoto, Junpei Hamatsu, Fumihiro Yamazaki, Takayuki Suzuki
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Patent number: 12688611Abstract: An electron microscope includes an electron optical system that irradiates a sample with an electron beam to form an image with electrons transmitted through the sample, a camera that includes an image sensor having sensor pixels and captures frame images that are based on output values output from each of the sensor pixels by incidence of the electrons on the image sensor, and a correction coefficient calculation unit that calculates correction coefficients for correcting sensitivities of the sensor pixels. The correction coefficient calculation unit determines, from the frame images captured under a condition under which the electrons incident on the image sensor follow a Poisson process, a mode value of the output values for each of the sensor pixels, and calculates the correction coefficients based on the mode value determined for each of the sensor pixels.Type: GrantFiled: August 15, 2024Date of Patent: July 21, 2026Assignee: JEOL Ltd.Inventor: Yuji Konyuba
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Patent number: 12678862Abstract: An additive manufacturing development method includes predicting a defect that occurs in a product based on a combination of a plurality of design data and a plurality of manufacturing conditions, collecting defect detection data for defect detection by monitoring the product during manufacturing in accordance with the combination of the plurality of design data and the plurality of manufacturing conditions, and generating a process map in which the plurality of manufacturing conditions are plotted using the predicted defect and the collected defect detection data. The method further includes collecting defect repair data for defect repair by monitoring the product during manufacturing and repairing a defect detected from the product, and storing the defect and the defect repair data in association with each other using the defect repair data and a repair result.Type: GrantFiled: February 26, 2021Date of Patent: July 14, 2026Assignee: JEOL LTD.Inventors: Kenta Aoyagi, Akihiko Chiba, Hideki Kyogoku, Shin-ichi Kitamura, Michiaki Hashitani
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Patent number: 12665158Abstract: Provided is a charged particle beam source having an emitter that can be replaced easily. The charged particle beam source includes an electron gun chamber; a first unit including both a supportive insulative member mechanically supporting a cable and a first set of terminals electrically connected to the cable; and a second unit including both the emitter that releases charged particles and a second set of terminals electrically connected to the emitter. The chamber has a side wall provided with a through-hole in which the first unit is secured. The second unit can be detachably mounted to the first unit. Within the chamber, the emitter is placed on an optical axis, so that the first and second sets of terminals are brought into contact with each other.Type: GrantFiled: March 15, 2023Date of Patent: June 23, 2026Assignee: JEOL Ltd.Inventors: Kyouichi Kamino, Tomohisa Fukuda, Norikazu Arima, Yasuyuki Okano, Keiichi Yamamoto
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Patent number: 12663404Abstract: A second polymer is prepared through derivatization of a first polymer. Kendrick Mass Defect (KMD) analysis is applied on a mass spectrum of the second polymer, to thereby produce a plot. Meanwhile, a plurality of mass candidates for a non-primary-chain segment are calculated based on a mass spectrum of the first polymer. The KMD analysis is applied on the plurality of mass candidates, to thereby produce reference images. A mass of the non-primary-chain segment is identified through matching of two KMD analysis results.Type: GrantFiled: September 28, 2023Date of Patent: June 23, 2026Assignee: JEOL Ltd.Inventors: Takaya Satoh, Masahiro Hashimoto, Haruo Iwabuchi
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Patent number: 12640339Abstract: An electron microscope includes an electron optical system, and a control unit that controls the electron optical system. The control unit performs processing for determining a standard deviation of a brightness distribution of an electron microscope image; processing for determining an optimum value of a parameter of the electron optical system such that the standard deviation becomes the maximum, by Gaussian process regression; and processing for capturing the electron microscope image with setting a value of the parameter to the optimum value. The control unit repeats the processing for determining the standard deviation, the processing for determining the optimum value, and the processing for capturing the electron microscope image to determine a value of the parameter.Type: GrantFiled: February 6, 2024Date of Patent: May 26, 2026Assignee: JEOL Ltd.Inventors: Motofumi Saitoh, Ryusuke Sagawa
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Patent number: 12631581Abstract: A plurality of records are registered in a database. Each record includes emission information and a peak energy sequence. A fitting unit fits, for each peak energy sequence, a calculated spectrum which is based on the peak energy sequence with respect to an actual spectrum which is acquired from a sample. An analyzer analyzes the sample based on the emission information correlated to the calculated spectrum satisfying a fitting condition.Type: GrantFiled: March 17, 2022Date of Patent: May 19, 2026Assignee: JEOL Ltd.Inventors: Shogo Koshiya, Takanori Murano
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Patent number: 12630505Abstract: The present invention is intended to provide a compound useful to analyze a vitamin D compound. The present invention provides an alkyne compound represented by Formula (I): where in Formula (I), A is a linear carbon chain having an alkynyl group at an end and having a vinyl group at another end; X1 is CH or 13CH; X2 is CHY, CDY, 13CHY, 13CDY, CO, 13CO, C18O, or 13C18O; m is an integer from 1 to 4; when m is 2 or more, X2s are identical or different; Y is H, D, NH2, 15NH2, OH, 18OH, SH, OR, O(CO)R, OSO3H, OSO3Na, or a sugar substituent; when Formula (I) contains two or more Ys, Ys are identical or different; R is an alcohol protective group, an alkyl group, an alkenyl group, or an aryl group; X3 is C or 13C; and at least one selected from the group consisting of X1, X2(s), and X3 is modified with a stable isotope D, 13C, 18O, or 15N.Type: GrantFiled: December 23, 2022Date of Patent: May 19, 2026Assignees: JEOL Ltd., Tokyo University of Agriculture and TechnologyInventors: Akiko Nagata, Yuka Mizumoto, Ryota Sakamoto, Kazuo Nagasawa, Masaki Takiwaki, Yoshikuni Kikutani, Koji Takahashi, Seketsu Fukuzawa
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Patent number: 12631578Abstract: An analyzing method using an analyzer including a wavelength-dispersive X-ray spectrometer that has an analyzing element to analyze an X-ray emitted from a specimen and detects an X-ray of energy corresponding to a position of the analyzing element. The analyzing method includes acquiring a plurality of map data by repeatedly performing a mapping analysis while changing the position of the analyzing element, the mapping analysis being an analysis to detect an X-ray of specific energy with the position of the analyzing element fixed to acquire map data while scanning the specimen with an electron beam; and generating, based on the plurality of map data, a spectrum map in which a position on the specimen and an X-ray spectrum are associated with each other.Type: GrantFiled: November 1, 2023Date of Patent: May 19, 2026Assignee: JEOL Ltd.Inventors: Koki Kato, Shinya Fujita, Takanori Murano, Shigeru Honda
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Patent number: 12633491Abstract: A method of adjusting a charged particle optical system in a charged particle beam apparatus provided with the charged particle optical system including an aberration corrector in which multipole elements disposed in three or more stages and transfer optical systems are alternately disposed. The method includes adjusting aberration using at least two of the multipole elements without using at least one of the multipole elements, and adjusting parameters of the charged particle optical system other than aberration using at least one of the transfer optical systems that is not disposed between the at least two of the multipole elements used.Type: GrantFiled: October 30, 2023Date of Patent: May 19, 2026Assignee: JEOL Ltd.Inventors: Shigeyuki Morishita, Yuji Kohno
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Patent number: 12609266Abstract: A sample cartridge has a sample stand and an inclining mechanism. A sample cartridge holding apparatus has a housing part which is inclined. When the sample cartridge is inserted into the housing part, a contact portion contacts a lever of the inclining mechanism, and the sample stand is inclined by a predetermined angle. With this process, an appropriate inclination angle is realized for the sample stand.Type: GrantFiled: January 25, 2023Date of Patent: April 21, 2026Assignee: JEOL Ltd.Inventors: Norimasa Sakuta, Tomohisa Fukuda, Osamu Suzuki, Masateru Shibata
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Patent number: 12597582Abstract: A charged particle beam apparatus that forms a probe with a charged particle beam and scans a specimen with the probe to acquire a scanning image. The charged particle beam apparatus includes an optical system for scanning the specimen with the probe; a detector that detects a signal generated from the specimen through the scanning of the specimen with the probe; and a control unit that controls the optical system. The control unit performs correction processing of acquiring a reference image obtained by the scanning of the specimen with the probe, comparing the reference image to a criterion image to determine a drift amount, and correcting a displacement of an irradiation position with the probe on the specimen based on the drift amount; and processing of setting a frequency with which the correction processing is to be performed based on the drift amount.Type: GrantFiled: March 14, 2023Date of Patent: April 7, 2026Assignee: JEOL Ltd.Inventors: Kenichi Tsutsumi, Tatsuya Uchida, Kazushiro Yokouchi, Nobuyuki Ikeo, Konomi Ikita
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Patent number: 12586169Abstract: A pre-processor applies a pre-process to an original mass image produced through mass spectrometry of a sample, to produce a model input image. An image quality converter has an image quality conversion model produced through machine learning based on a group of images produced by a scanning electron microscope, and produces a model output image through image quality conversion of the model input image. A post-processor applies a post-process to the model output image, to produce a mass image after image quality conversion.Type: GrantFiled: May 17, 2023Date of Patent: March 24, 2026Assignee: JEOL Ltd.Inventors: Masahiko Takei, Takaya Satoh
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Patent number: 12584981Abstract: In various embodiments of the invention, a cooled-NMR probe can utilize a non-tapered sliding band capacitor which can be moved relative to the inner conducting skirt of a parent coil to adjust the inductance of the parent coil and thereby the frequency of the parent coil to allow the parent coil to detect the resonance of at a nucleus without requiring leads between the parent coil and a lock coil. The cooled-NMR probe can be provided without the disadvantages of prior art cooled-NMR probes. In an embodiment of the invention, the sliding band capacitor comprises a diamagnetic insulator with a first volume magnetic susceptibility, at least one paramagnetic metal with a second volume magnetic susceptibility and at least one diamagnetic metal with a third volume magnetic susceptibility, where the sum of the first volume magnetic susceptibility, the second volume magnetic susceptibility and the third volume magnetic susceptibility is approximately zero.Type: GrantFiled: March 8, 2024Date of Patent: March 24, 2026Assignee: JEOL LTD.Inventor: Anthony Ting Ann Siaw
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Patent number: 12586752Abstract: An electron microscope includes an irradiation optical system that irradiates a specimen with an electron beam, a specimen stage that supports the specimen, an image forming optical system that forms an image of electrons transmitted through the specimen, an imaging apparatus that captures an image formed by the image forming optical system, and a control unit that controls inclination of the specimen with respect to an incident direction of the electron beam. The irradiation optical system includes an aperture that cuts off a part of the electron beam to be irradiated to the specimen. The control unit acquires an image including Kikuchi bands that appear in a shadow region of the aperture, detects the Kikuchi bands in the shadow region of the aperture in the image, and controls inclination of the specimen with respect to the incident direction of the electron beam, based on the detected Kikuchi bands.Type: GrantFiled: September 7, 2023Date of Patent: March 24, 2026Assignee: JEOL Ltd.Inventors: Motofumi Saitoh, Shuji Kawai
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Patent number: 12586750Abstract: Provided is a charged particle beam system capable of scanning a sample in a short time. The charged particle beam system is operative to scan the sample with a charged particle beam and to obtain a scanned image, and includes a magnetic deflector for producing a magnetic field to deflect the beam, an electrostatic deflector for producing an electric field to deflect the beam, and a controller for controlling both magnetic deflector and electrostatic deflector. The controller causes the magnetic deflector to deflect the beam in a first direction and to draw a first scan line, causes the magnetic deflector to deflect the beam in a second direction perpendicular to the first direction, causes the electrostatic deflector to deflect the beam in a third direction opposite to the first direction, and causes the magnetic deflector to deflect the beam in the first direction and to draw a second scan line.Type: GrantFiled: April 20, 2023Date of Patent: March 24, 2026Assignee: JEOL Ltd.Inventor: Takamitsu Saito
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Patent number: 12555762Abstract: Ions ejected from a collision cell are detected by a detector. An evaluation unit generates a temporary calibration curve based on an intensity of a detection signal and evaluates an ion accumulation time of the collision cell based on the temporary calibration curve. When the evaluation unit determines signal saturation, the ion accumulation time of the collision cell is reduced. When the evaluation unit determines sensitivity insufficiency, the ion accumulation time of the collision cell is increased.Type: GrantFiled: October 27, 2022Date of Patent: February 17, 2026Assignee: JEOL Ltd.Inventors: Shinichi Mukousaka, Junkei Kou, Kiyotaka Konuma
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Patent number: 12542265Abstract: A partial structure estimation apparatus is configured to generate a first explanatory variable by performing composition estimation for each peak in a mass spectrum acquired from a sample, and to generate a second explanatory variable by performing composition estimation for each peak interval in the mass spectrum. The partial structure estimation apparatus is further configured to then estimate a partial structure as an objective variable based on the first explanatory variable and the second explanatory variable. In a partial structure estimation model generation apparatus, a partial structure estimation model is generated through machine learning using a training data set.Type: GrantFiled: February 23, 2023Date of Patent: February 3, 2026Assignee: JEOL Ltd.Inventors: Ayumi Kubo, Masaaki Ubukata, Kenji Nagatomo
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Patent number: D1129525Type: GrantFiled: August 5, 2024Date of Patent: June 9, 2026Assignee: JEOL Ltd.Inventor: Yuji Yamazaki
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Patent number: D1135985Type: GrantFiled: August 5, 2024Date of Patent: July 21, 2026Assignee: JEOL Ltd.Inventor: Yuji Yamazaki