Abstract: An electron microscope includes an electron optical system, and a control unit that controls the electron optical system. The control unit performs processing for determining a standard deviation of a brightness distribution of an electron microscope image; processing for determining an optimum value of a parameter of the electron optical system such that the standard deviation becomes the maximum, by Gaussian process regression; and processing for capturing the electron microscope image with setting a value of the parameter to the optimum value. The control unit repeats the processing for determining the standard deviation, the processing for determining the optimum value, and the processing for capturing the electron microscope image to determine a value of the parameter.

Abstract: The present invention is intended to provide a compound useful to analyze a vitamin D compound. The present invention provides an alkyne compound represented by Formula (I): where in Formula (I), A is a linear carbon chain having an alkynyl group at an end and having a vinyl group at another end; X1 is CH or 13CH; X2 is CHY, CDY, 13CHY, 13CDY, CO, 13CO, C18O, or 13C18O; m is an integer from 1 to 4; when m is 2 or more, X2s are identical or different; Y is H, D, NH2, 15NH2, OH, 18OH, SH, OR, O(CO)R, OSO3H, OSO3Na, or a sugar substituent; when Formula (I) contains two or more Ys, Ys are identical or different; R is an alcohol protective group, an alkyl group, an alkenyl group, or an aryl group; X3 is C or 13C; and at least one selected from the group consisting of X1, X2(s), and X3 is modified with a stable isotope D, 13C, 18O, or 15N.

Abstract: A plurality of records are registered in a database. Each record includes emission information and a peak energy sequence. A fitting unit fits, for each peak energy sequence, a calculated spectrum which is based on the peak energy sequence with respect to an actual spectrum which is acquired from a sample. An analyzer analyzes the sample based on the emission information correlated to the calculated spectrum satisfying a fitting condition.

Abstract: An analyzing method using an analyzer including a wavelength-dispersive X-ray spectrometer that has an analyzing element to analyze an X-ray emitted from a specimen and detects an X-ray of energy corresponding to a position of the analyzing element. The analyzing method includes acquiring a plurality of map data by repeatedly performing a mapping analysis while changing the position of the analyzing element, the mapping analysis being an analysis to detect an X-ray of specific energy with the position of the analyzing element fixed to acquire map data while scanning the specimen with an electron beam; and generating, based on the plurality of map data, a spectrum map in which a position on the specimen and an X-ray spectrum are associated with each other.

Abstract: A method of adjusting a charged particle optical system in a charged particle beam apparatus provided with the charged particle optical system including an aberration corrector in which multipole elements disposed in three or more stages and transfer optical systems are alternately disposed. The method includes adjusting aberration using at least two of the multipole elements without using at least one of the multipole elements, and adjusting parameters of the charged particle optical system other than aberration using at least one of the transfer optical systems that is not disposed between the at least two of the multipole elements used.

Abstract: A sample cartridge has a sample stand and an inclining mechanism. A sample cartridge holding apparatus has a housing part which is inclined. When the sample cartridge is inserted into the housing part, a contact portion contacts a lever of the inclining mechanism, and the sample stand is inclined by a predetermined angle. With this process, an appropriate inclination angle is realized for the sample stand.

Abstract: A charged particle beam apparatus that forms a probe with a charged particle beam and scans a specimen with the probe to acquire a scanning image. The charged particle beam apparatus includes an optical system for scanning the specimen with the probe; a detector that detects a signal generated from the specimen through the scanning of the specimen with the probe; and a control unit that controls the optical system. The control unit performs correction processing of acquiring a reference image obtained by the scanning of the specimen with the probe, comparing the reference image to a criterion image to determine a drift amount, and correcting a displacement of an irradiation position with the probe on the specimen based on the drift amount; and processing of setting a frequency with which the correction processing is to be performed based on the drift amount.

Abstract: A pre-processor applies a pre-process to an original mass image produced through mass spectrometry of a sample, to produce a model input image. An image quality converter has an image quality conversion model produced through machine learning based on a group of images produced by a scanning electron microscope, and produces a model output image through image quality conversion of the model input image. A post-processor applies a post-process to the model output image, to produce a mass image after image quality conversion.

Abstract: In various embodiments of the invention, a cooled-NMR probe can utilize a non-tapered sliding band capacitor which can be moved relative to the inner conducting skirt of a parent coil to adjust the inductance of the parent coil and thereby the frequency of the parent coil to allow the parent coil to detect the resonance of at a nucleus without requiring leads between the parent coil and a lock coil. The cooled-NMR probe can be provided without the disadvantages of prior art cooled-NMR probes. In an embodiment of the invention, the sliding band capacitor comprises a diamagnetic insulator with a first volume magnetic susceptibility, at least one paramagnetic metal with a second volume magnetic susceptibility and at least one diamagnetic metal with a third volume magnetic susceptibility, where the sum of the first volume magnetic susceptibility, the second volume magnetic susceptibility and the third volume magnetic susceptibility is approximately zero.

Abstract: An electron microscope includes an irradiation optical system that irradiates a specimen with an electron beam, a specimen stage that supports the specimen, an image forming optical system that forms an image of electrons transmitted through the specimen, an imaging apparatus that captures an image formed by the image forming optical system, and a control unit that controls inclination of the specimen with respect to an incident direction of the electron beam. The irradiation optical system includes an aperture that cuts off a part of the electron beam to be irradiated to the specimen. The control unit acquires an image including Kikuchi bands that appear in a shadow region of the aperture, detects the Kikuchi bands in the shadow region of the aperture in the image, and controls inclination of the specimen with respect to the incident direction of the electron beam, based on the detected Kikuchi bands.

Abstract: Provided is a charged particle beam system capable of scanning a sample in a short time. The charged particle beam system is operative to scan the sample with a charged particle beam and to obtain a scanned image, and includes a magnetic deflector for producing a magnetic field to deflect the beam, an electrostatic deflector for producing an electric field to deflect the beam, and a controller for controlling both magnetic deflector and electrostatic deflector. The controller causes the magnetic deflector to deflect the beam in a first direction and to draw a first scan line, causes the magnetic deflector to deflect the beam in a second direction perpendicular to the first direction, causes the electrostatic deflector to deflect the beam in a third direction opposite to the first direction, and causes the magnetic deflector to deflect the beam in the first direction and to draw a second scan line.

Abstract: Ions ejected from a collision cell are detected by a detector. An evaluation unit generates a temporary calibration curve based on an intensity of a detection signal and evaluates an ion accumulation time of the collision cell based on the temporary calibration curve. When the evaluation unit determines signal saturation, the ion accumulation time of the collision cell is reduced. When the evaluation unit determines sensitivity insufficiency, the ion accumulation time of the collision cell is increased.

Abstract: A partial structure estimation apparatus is configured to generate a first explanatory variable by performing composition estimation for each peak in a mass spectrum acquired from a sample, and to generate a second explanatory variable by performing composition estimation for each peak interval in the mass spectrum. The partial structure estimation apparatus is further configured to then estimate a partial structure as an objective variable based on the first explanatory variable and the second explanatory variable. In a partial structure estimation model generation apparatus, a partial structure estimation model is generated through machine learning using a training data set.

Abstract: An aberration corrector includes a first multipole element for producing a hexapole field, a second multipole element for producing a hexapole field, and a transfer lens system disposed between the first and second multipole elements. The first and second multipole elements are arranged along an optical axis. At least one of the hexapole fields respectively produced by the first multipole element and the second multipole element varies in strength along the optical axis.

Abstract: An electron microscope includes an electron source for emitting an electron beam, an illumination lens for focusing the beam, an aberration corrector for correcting aberrations, an illumination deflector assembly disposed between the illumination lens and the aberration corrector and operating to deflect the beam and to vary its tilt relative to a sample, a scanning deflector for scanning the sample with the beam, an objective lens, a detector for detecting electrons transmitted through the sample and producing an image signal, a control section for controlling the illumination deflector assembly, and an image generating section for receiving the image signal and generating a differential phase contrast (DPC) image. The tilt of the beam is varied by the illumination deflector assembly such that the image generating section generates a plurality of DPC images at different tilt angles of the beam and creates a final image based on the DPC images.

Abstract: A superconducting coil device according to one embodiment of the present invention includes: A superconducting coil device including: a bobbin having a tubular body; superconducting wires, a part of which constitutes a wound portion where the superconducting wires are wound on the bobbin; a bobbin-side guide portion holding the superconducting wires extending from the bobbin, the bobbin-side guide portion being provided to extend in a bobbin axial direction, which is an axial direction of the body of the bobbin; a first guide portion holding the superconducting wires extending from the bobbin-side guide portion, the first guide portion being arranged on an outer side of the bobbin-side guide portion in a direction intersecting the bobbin axial direction and provided to extend in the direction intersecting the bobbin axial direction; and a second guide portion capable of holding the superconducting wires extending from the first guide portion, the second guide portion being provided to extend in a direction in

Abstract: A lithography system for drawing patterns on a substrate (2) by irradiating the substrate with a beam of charged particles includes a stage for supporting the substrate, at least one conduction pin (16, 26) for connecting the substrate to a reference potential, and at least one actuator (12, 22) for moving the respective conduction pin. The at least one actuator (12, 22) is configured to move the respective conduction pin (16, 26) between a position where it contacts the substrate and a position where it does not contact the substrate. A resistance measurement circuit can measure the resistance between the first and second conduction pins, and if the resistance value is not less than a threshold value, the actuators are operated so as to lower the resistance value below the threshold value.

Abstract: A charged particle beam apparatus for scanning a specimen with a charged particle beam and acquiring a scan image. The charged particle beam apparatus including: an optical system that includes a pulse mechanism for illuminating the specimen with pulses of the charged particle beam, and a deflector that deflects the charged particle beam and scans the specimen with the deflected charged particle beam; and a control unit that controls the optical system. The control unit controls the optical system so as to satisfy T=n×t (n is a natural number). T represents a dwell time of the charged particle beam in each pixel of the scan image, and t represents a cycle of pulses of the charged particle beam.