Abstract: An image pickup apparatus having a higher resolution and S/N ratio by use of a line confocal optical system and a photomask defect inspection system using the same. A first spatial filter having a plurality of slits extending in a direction perpendicular to a direction of movement of a sample is arranged in front of a light source and illuminates the sample with lines of light. The transmitted light or reflected light from the sample is received by an image sensor through a second spatial filter having slits substantially the same as the first spatial filter. Each image sensor has light receiving elements arranged in a two-dimensional array and transfers charges stored in the light receiving elements for each line. A charge transfer speed of the image sensors and speed of movement of the sample are linked with each other. The sample is illuminated a plurality of times, the charge produced by each illumination is accumulated, and the cumulative charge is output.

Abstract: A laser microscope for picking up an image of a specimen at a high speed and a pattern checking apparatus for checking a pattern at a high speed with a high sensitivity can be provided. A plurality of light beams aligned in a first direction are produced from a light source device (1, 10), and these light beams are projected onto a specimen (7, 30) by an objective lens (6, 29) to form a light spot array on the specimen. The specimen is moved in a direction perpendicular to the light spot array or the light beams are moved by a beam deflecting device in said direction to scan the specimen two-dimensionally. Light beams emanating from the light spots on the specimen are made incident upon corresponding light receiving elements of a linear image sensor (11, 33). In case of checking periodic patterns such as memory cell patterns, a pitch of the light spots is corresponded to a pitch of the patterns, and defects in the patterns can be detected by comparing output signals from respective light receiving elements.

Abstract: A laser microscope for picking up an image of a specimen at a high speed and a pattern checking apparatus for checking a pattern at a high speed with a high sensitivity can be provided. A plurality of light beams aligned in a first direction are produced from a light source device (1, 10), and these light beams are projected onto a specimen (7, 30) by an objective lens (6, 29) to form a light spot array on the specimen. The specimen is moved in a direction perpendicular to the light spot array or the light beams are moved by a beam deflecting device in said direction to scan the specimen two-dimensionally. Light beams emanating from the light spots on the specimen are made incident upon corresponding light receiving elements of a linear image sensor (11, 33). In case of checking periodic patterns such as memory cell patterns, a pitch of the light spots is corresponded to a pitch of the patterns, and defects in the patterns can be detected by comparing output signals from respective light receiving elements.

Abstract: An interferometer of Mach-Zehnder type includes a first half mirror dividing an entrance light flux into first and second light fluxes, a first reflection mirror reflecting the first light flux toward a second half mirror, and a second reflection mirror reflecting the second light flux toward the second half mirror. At the second half mirror, the first and second light fluxes are mixed to derive an exit light flux including interference fringes. The first half mirror and first reflection mirror are secured to opposing side walls of a first hollow supporting block made of ceramics, and the second half mirror and second reflection mirror are secured to a second hollow supporting blocks made of ceramics. The first and second supporting blocks are coupled with each other at their side walls and an assembly of the supporting blocks is mounted on a surface of an optical bench by means of kinetic mounts.