Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that comprise one or more base reactive groups and (i) one or more polar groups distinct from the base reactive groups, and/or (ii) at least one of the base reactive groups is a non-perfluorinated base reactive group. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.

Abstract: The present development is a reactor system for the production of nanostructures. The reactor system comprises a conical reactor body designed to maintain an upwardly directed vertical plasma flame and hydrocarbon flame. The reactor system further includes a metal powder feed that feeds into the plasma flame, a cyclone and a dust removal unit. The system is designed to produce up to 100 grams of metal oxide nanomaterials per minute.

Abstract: Display substrates having a hard coat layer on a colorless polyimide substrate are formed from hard coat compositions having certain organic solvents that do not substantially impact the optical and mechanical properties of the colorless polyimide substrate.

Abstract: A method of manufacturing a semiconductor device comprising: providing a semiconductor device substrate having a relief image on a surface of the substrate, the relief image having a plurality of gaps to be filled; applying a coating composition to the relief image to provide a coating layer, wherein the coating composition comprises (i) a polyarylene oligomer comprising as polymerized units one or more first monomers having two or more cyclopentadienone moieties and one or more second monomers having an aromatic moiety and two or more alkynyl moieties; wherein the polyarylene oligomer has a Mw of 1000 to 6000 Da, a PDI of 1 to 2, and a molar ratio of total first monomers to total second monomers of 1:>1; and (ii) one or more organic solvents; curing the coating layer to form a polyarylene film; patterning the polyarylene film; and transferring the pattern to the semiconductor device substrate.

Abstract: A positive electrode active material comprises a Li-transition metal-layered oxide represented by the formula: Lia(NibCocAldMee)O2 (in which Me=Mn, Mg, Ti, Ru, Zr, Nb, Mo, W; 1.00?a?1.15; 0.25<b<1; 0<c?0.30; 0?d?0.05; 0?e?0.40), and is constituted of secondary particles formed by aggregation of primary particles. As to a compositional ratio of Li which is derived from unreacted substances or decomposed products in the secondary particles, a variation coefficient (Standard deviation value/Average value) of a Li-compositional ratio: Li/M (M=Ni+Co+Al+Me) is 30% or less. The positive electrode active material hardly deteriorates even if repeatedly charged/discharged, and enables stable charge/discharge, and then a non-aqueous electrolyte secondary battery is enabled to have an excellent output property and a long lifetime.

Abstract: A cross-corrugated support structure includes a sheet having a first and a second set of corrugations. The first set of corrugations is defined by a series of alternating ridges and grooves that extend the length of the sheet in a first direction. The second set of corrugations is also defined by a series of ridges and grooves that extend the length of the sheet in a second direction that intersects with the first direction. The intersection of the first and second set of corrugations creates cross-corrugations throughout the sheet. To provide compressive and tensile strengths suitable for large-scale construction applications, the sheet may be made of a carbonaceous material such as carbon fiber or graphite treated to rigidly retain a shape including the first and second set of corrugations within the sheet. The sheet may be reinforced by securing support members or additional corrugated sheets to the sheet.

Abstract: A pattern formation method, comprising: (a) providing a semiconductor substrate; (b) forming a photoresist pattern over the semiconductor substrate, wherein the photoresist pattern is formed from a photoresist composition comprising: a first polymer comprising acid labile groups; and a photoacid generator; (c) coating a pattern overcoat composition over the photoresist pattern, wherein the pattern overcoat composition comprises a second polymer and an organic solvent, wherein the organic solvent comprises one or more ester solvents, wherein the ester solvent is of the formula R1—C(O)O—R2, wherein R1 is a C3-C6 alkyl group and R2 is a C5-C10 alkyl group; (d) baking the coated photoresist pattern; and (e) rinsing the coated photoresist pattern with a rinsing agent to remove the second polymer. The methods find particular applicability in the manufacture of semiconductor devices.

Abstract: Copper electroplating baths containing primary alcohol alkoxylate block copolymers and ethylene oxide/propylene oxide random copolymers having specific HLB ranges are suitable for filling vias with copper, where such copper deposits are substantially void-free and substantially free of surface defects.

Abstract: Improved dental appliances and polymeric sheet compositions are disclosed. The polymeric sheet compositions are useful for making dental appliances having outer layers comprised of a material having a modulus of from about 1,000 MPA to 2,500 MPA (“hard”) and an inner core comprised of elastomeric material or materials having a modulus of from about 50 MPa to 500 MPa (“soft”), which exhibit improved flexibility and strength, and better stain and tear resistance than currently available materials and dental appliances.

Abstract: A polymer composite comprising quantum dots; said polymer composite comprising: (a) quantum dots; (b) polymerized units of a first compound having at least one readily polymerizable vinyl group, a molecular weight from 300 to 20,000 and at least one continuous acyclic hydrocarbyl chain of at least five carbon atoms; and (c) polymerized units of a second compound having at least one readily polymerizable vinyl group and a molecular weight from 100 to 750; wherein a readily polymerizable vinyl group is part of a (meth)acrylate ester group or is attached directly to an aromatic ring, and the molecular weight of the first compound minus the molecular weight of the second compound is at least 100.

Abstract: Photoresist compositions are provided comprising a radiation sensitive component and at least two distinct novolak resins. In one aspect, photoresists of the invention exhibit notably high dissolution rates, such as in excess of 800 angstroms per second in aqueous developer solution. In another aspect, photoresists of the invention can exhibit good photospeeds, such as 100 mJ/cm2 or less.

Abstract: A patterning process, comprises: (i) forming a radiation-sensitive film on a substrate, wherein the radiation-sensitive film comprises: (a) a resin, (b) a photoacid generator, (c) a first quencher, and (d) a second quencher; (ii) patternwise exposing the radiation-sensitive film to activating radiation; and (iii) contacting the radiation-sensitive film with an alkaline developing solution to form a resist pattern; wherein the resin comprises the following repeat units: wherein: R1 is selected from a hydrogen atom, an alkyl group having from 1 to 4 carbon atoms, a cyano group or a trifluoromethyl group; Z is a non-hydrogen substituent that provides an acid-labile moiety; n is from 40 to 90 mol %; m is from 10 to 60 mol %; and the total combined content of the two repeat units in the resin is 80 mol % or more based on all repeat units of the resin; and the first quencher is selected from benzotriazole or a derivative thereof.

Abstract: A curable organopolysiloxane composition containing dynamic covalent organopolysiloxanes which yields, upon cure, a silicone rubber having adaptive elastomeric and viscous characteristics is claimed. The silicone may be an elastomer or foam. A method of making the silicone rubber and a shaped article made of the cured adaptive viscoelastic silicone rubber composition are also claimed.

Abstract: Technologies are generally described for hybrid acoustic damping materials that may be used in noise, vibration, and harshness mitigation. In some examples, solvated acrylic, silicone, and/or urethane materials may be blended in selected proportions to form a hybrid acoustic damping material. Characteristics of the components of the hybrid acoustic damping material such as viscosity and proportions may be selected for a desired composite loss factor vs. temperature characteristic of the material. In some examples, a broad temperature range of damping or a targeted temperature region may be achieved based on the composition of the hybrid acoustic damping material. To achieve a uniform stable blend with a consistent viscosity, individual component materials may be selected with similar molecular weight/viscosity. Compatible solvents may be added during blending of the components.

Abstract: A retaining wall system includes a face panel having a first end beam and a second end beam extending in parallel to the first end beam. The face panel extends a height defined from the first end beam to the second end beam when the face panel is oriented in an upright position. The face panel further includes a backfill side and is configured to retain a backfill material on the backfill side of the face panel. The retaining wall system further includes a support leg having a bracket for receiving the first end beam therein and an extension platform transversely oriented to the height of the face panel when the first end beam is received within the bracket. The extension platform extends away from the bracket and is configured to anchor the face panel in the upright position.

Abstract: Provided is a method of creating an image on an array of optoelectronic elements comprising (a) providing a device comprising an array of optoelectronic elements and circuitry connected to each optoelectronic element, wherein the optoelectronic element comprises plural quantum dots or plural nanorods, and wherein the circuitry is configured to be capable of switching each optoelectronic element independently between an effective forward bias configuration and a reverse-bias configuration, (b) imposing an effective reverse bias on two or more of the optoelectronic elements, (c) providing circuitry that will detect the onset of photocurrent from an individual effective reverse biased optoelectronic element and that will respond to the photocurrent by changing the bias on the individual optoelectronic element to an effective forward bias.

Abstract: Improved dental appliances and polymeric sheet compositions are disclosed. The polymeric sheet compositions are useful for making dental appliances having outer layers comprised of a material having a modulus of from about 1,000 MPA to 2,500 MPA (“hard”) and an inner core comprised of elastomeric material or materials having a modulus of from about 50 MPa to 500 MPa (“soft”), which exhibit improved flexibility and strength, and better stain and tear resistance than currently available materials and dental appliances.