Patents Assigned to MiCell Technologies
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Publication number: 20110190864Abstract: Stent delivery systems having improved deliverability comprising an elongate member having an inflation lumen and a guidewire lumen therein; a balloon having an interior that is in fluid communication with the inflation lumen; and a stent comprising a coating mounted on the balloon. Methods for making stent delivery systems having improved deliverability. Methods for delivering two stent delivery systems concurrently through a guiding catheter, each stent delivery system comprising elongate member having an inflation lumen and a guidewire lumen therein, a balloon having an interior that is in fluid communication with the inflation lumen, and a stent comprising a coating mounted on the balloon. Stent coatings may comprise a pharmaceutical agent at least a portion of which is in crystalline form.Type: ApplicationFiled: January 26, 2011Publication date: August 4, 2011Applicant: Micell Technologies, Inc.Inventors: James B. McClain, Douglas Taylor, David Enscore
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Publication number: 20100030261Abstract: The invention relates to increasing the strength of bio-absorbable surgical sutures. The invention allows for delayed bioabsorption of suture materials to allow maintenance of mechanical strength of the suture for example in ‘barbed’ form.Type: ApplicationFiled: October 2, 2007Publication date: February 4, 2010Applicant: Micell Technologies, Inc.Inventor: Jim McClain
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Patent number: 7648818Abstract: Methods for carrying out lithography with a carbon dioxide development system are described. This invention involves methods for preferential removal of the darkfield region of conventional chemically amplified positive tone resists. The carbon dioxide development systems include one or more derivatizing agents, which may be an onium salt or a neutral compound.Type: GrantFiled: February 6, 2006Date of Patent: January 19, 2010Assignee: MiCell Technologies, Inc.Inventors: Mark Wagner, James DeYoung
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Patent number: 7592035Abstract: A method of coating a substrate comprises the steps of: (a) providing a substrate in an enclosed vessel, the substrate having a surface portion; (b) at least partially filling the enclosed vessel with a first supercritical fluid so that said first supercritical fluid contacts the surface portion, with the first supercritical fluid carrying or containing a coating component; then (c) adding a separate compressed gas atmosphere to the reaction vessel so that a boundary is formed between the first supercritical fluid and the separate compressed gas atmosphere, said separate compressed gas atmosphere having a density less than said first supercritical fluid; and then (d) displacing said first supercritical fluid from said vessel by continuing adding said separate compressed gas atmosphere to said vessel so that said boundary moves across said surface portion and a thin film of coating component is deposited on said microelectronic substrate.Type: GrantFiled: October 28, 2005Date of Patent: September 22, 2009Assignee: Micell Technologies, Inc.Inventors: James P. DeYoung, James B. McClain, Stephen M. Gross, Doug Taylor, Mark I. Wagner, David Brainard
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Publication number: 20090062909Abstract: A coated coronary stent, comprising: a stainless steel sent framework coated with a primer layer of Parylene C; and a rapamycin-polymer coating having substantially uniform thickness disposed on the stent framework, wherein the rapamycin-polymer coating comprises polybutyl methacrylate (PBMA), polyethylene-co-vinyl acetate (PEVA) and rapamycin, wherein substantially all of the rapamycin in the coating is in amorphous form and substantially uniformly dispersed within the rapamycin-polymer coating.Type: ApplicationFiled: July 14, 2006Publication date: March 5, 2009Applicant: Micell Technologies, Inc.Inventors: Doug Taylor, James Deyoung, Jim McCain
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Patent number: 7410751Abstract: Methods for carrying out lithography with a carbon dioxide development system are described. In some embodiments the methods involve preferential removal of a darkfield region; in other embodiments the methds involve preferential removal of a light field region. The carbon dioxide development systems include a quaternary ammonium salt, preferably a quaternary ammonium hydroxide, halide, or carbonate. Compositions for carrying out the methods are also described. The quaternary ammonium salts preferably contain at least one CO2-philic group, such as a siloxane-containing group or a fluorine-containing group.Type: GrantFiled: January 28, 2005Date of Patent: August 12, 2008Assignee: Micell Technologies, Inc.Inventors: James DeYoung, Mark Wagner
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Patent number: 7407703Abstract: An air permeable composite article that in one embodiment includes a porous base membrane that includes a plurality of nodes and fibrils defining a plurality of interconnecting pores extending through the porous base membrane with each node and fibril having a surface. The composite article also includes a precipitated coating material deposited on the surfaces of the plurality of nodes and fibrils. The coating material includes a copolymer formed from a fluorinated acrylate or methacrylate, an n-alkyl acrylate or methacrylate, and an isocyanate crosslinker. The precipitated coating material provides oil and contaminating agent resistance of at least a number six measured in accordance with AATCC 118 test method.Type: GrantFiled: August 15, 2005Date of Patent: August 5, 2008Assignees: BHA Group, Inc., Micell Technologies, Inc.Inventors: James DeYoung, Robert J. Klare
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Patent number: 7329483Abstract: A method for carrying out positive tone lithography with a carbon dioxide development system is carried out by: (a) providing a substrate, the substrate having a polymer resist layer formed thereon, (b) exposing at least one portion of the polymer resist layer to radiant energy causing a chemical shift to take place in the exposed portion and thereby form at least one light field region in the polymer resist layer while concurrently maintaining at least one portion of the polymer layer unexposed to the radiant energy to thereby form at least one dark field region in the polymer resist layer; (c) optionally baking the polymer resist layer; (d) contacting the polymer resist layer to a carbon dioxide solvent system, the solvent system comprising a polar group, under conditions in which the at least one light field region is preferentially removed from the substrate by the carbon dioxide solvent system as compared to the at least one dark field region; wherein the carbon dioxide solvent system comprises a first pType: GrantFiled: March 12, 2007Date of Patent: February 12, 2008Assignee: Micell Technologies, Inc.Inventors: Mark Wagner, James DeYoung, Merrick Miles, Chris Harbinson
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Publication number: 20070154848Abstract: A method for carrying out positive tone lithography with a carbon dioxide development system is carried out by: (a) providing a substrate, the substrate having a polymer resist layer formed thereon, (b) exposing at least one portion of the polymer resist layer to radiant energy causing a chemical shift to take place in the exposed portion and thereby form at least one light field region in the polymer resist layer while concurrently maintaining at least one portion of the polymer layer unexposed to the radiant energy to thereby form at least one dark field region in the polymer resist layer; (c) optionally baking the polymer resist layer; (d) contacting the polymer resist layer to a carbon dioxide solvent system, the solvent system comprising a polar group, under conditions in which the at least one light field region is preferentially removed from the substrate by the carbon dioxide solvent system as compared to the at least one dark field region; wherein the carbon dioxide solvent system comprises a first pType: ApplicationFiled: March 12, 2007Publication date: July 5, 2007Applicant: Micell Technologies, Inc.Inventors: Mark Wagner, James DeYoung, Merrick Miles, Chris Harbinson
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Patent number: 7235347Abstract: A method for carrying out positive tone lithography with a carbon dioxide development system is carried out by: (a) providing a substrate, the substrate having a polymer resist layer formed thereon, (b) exposing at least one portion of the polymer resist layer to radiant energy causing a chemical shift to take place in the exposed portion and thereby form at least one light field region in the polymer resist layer while concurrently maintaining at least one portion of the polymer layer unexposed to the radiant energy to thereby form at least one dark field region in the polymer resist layer; (c) optionally baking the polymer resist layer; (d) contacting the polymer resist layer to a carbon dioxide solvent system, the solvent system comprising a polar group, under conditions in which the at least one light field region is preferentially removed from the substrate by the carbon dioxide solvent system as compared to the at least one dark field region; wherein the carbon dioxide solvent system comprises a first pType: GrantFiled: May 19, 2005Date of Patent: June 26, 2007Assignee: Micell Technologies, Inc.Inventors: Mark Wagner, Merrick Miles, Chris Harbinson
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Patent number: 7141496Abstract: A method of treating a dielectric surface portion of a semiconductor substrate, comprising the steps of: (a) providing a semiconductor substrate having a dielectric surface portion; and then (b) treating said dielectric surface portion with a coating reagent, the coating reagent comprising a reactive group coupled to a coordinating group, with the coordinating group having a metal bound thereto, so that the metal is deposited on the dielectric surface portion to produce a surface portion treated with a metal.Type: GrantFiled: January 22, 2004Date of Patent: November 28, 2006Assignee: MiCell Technologies, Inc.Inventors: James P. DeYoung, James B. McClain, Stephen M. Gross, Doug Taylor, Mark I. Wagner, David Brainard
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Patent number: 7114508Abstract: Cleaning apparatus having multiple wash tanks for washing articles in a carbon dioxide dry cleaning system employing a liquid carbon dioxide cleaning solution are provided. Cleaning apparatus having multiple wash tanks of the present invention may provide improved thermodynamic efficiency by allowing carbon dioxide vapor to be transferred between wash tanks rather than condensed. Cleaning apparatus having multiple wash tanks of the present invention may have a lower capital cost than multiple cleaning systems having single wash tanks. Cleaning apparatus having multiple wash tanks of the present invention include a first wash tank for contacting a first article with liquid carbon dioxide cleaning solution, and a second wash tank for contacting a second article with liquid carbon dioxide cleaning solution. The second wash tank is in fluid communication with the first wash tank. Methods of utilizing such cleaning apparatus are also provided.Type: GrantFiled: March 28, 2003Date of Patent: October 3, 2006Assignee: Micell TechnologiesInventors: Steve Lee Worm, James B. McClain
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Publication number: 20060112738Abstract: A method of utilizing a divided pressure vessel in a processing system employing a carbon dioxide based solvent includes transferring a first carbon dioxide based treating solution from a first liquid chamber in a divided pressure vessel having a plurality of liquid chambers to a processing vessel, returning the first treating solution from the processing vessel to the divided pressure vessel, transferring a second carbon dioxide based treating solution having a composition different from the first treating solution from a second liquid chamber in the divided pressure vessel to a processing vessel, and returning the second treating solution from the processing vessel to the divided pressure vessel. A divided pressure vessel may allow multiple solvent baths each having a different chemical composition to be stored and/or processed in a single pressure vessel while maintaining the different chemical compositions of the multiple solvent baths.Type: ApplicationFiled: October 19, 2005Publication date: June 1, 2006Applicant: Micell TechnologiesInventors: Steven Worm, James DeYoung, James McClain, David Brainard
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Patent number: 7044143Abstract: Microelectronic substrate processing systems include a microelectronic substrate processing chamber that is configured to contain therein at least one microelectronic substrate. A carbon dioxide supply system is configured to supply densified carbon dioxide to the microelectronic substrate processing chamber. A detergent supply system is configured to supply detergent to the microelectronic substrate processing chamber.Type: GrantFiled: September 27, 2002Date of Patent: May 16, 2006Assignee: Micell Technologies, Inc.Inventors: James P. DeYoung, James B. McClain, Stephen M. Gross
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Patent number: 6989172Abstract: A method of coating a substrate comprises the steps of: (a) providing a substrate in an enclosed vessel, the substrate having a surface portion; (b) at least partially filling the enclosed vessel with a first supercritical fluid so that said first supercritical fluid contacts the surface portion, with the first supercritical fluid carrying or containing a coating component; then (c) adding a separate compressed gas atmosphere to the reaction vessel so that a boundary is formed between the first supercritical fluid and the separate compressed gas atmosphere, said separate compressed gas atmosphere having a density less than said first supercritical fluid; and then (d) displacing said first supercritical fluid from said vessel by continuing adding said separate compressed gas atmosphere to said vessel so that said boundary moves across said surface portion and a thin film of coating component is deposited on said microelectronic substrate.Type: GrantFiled: October 8, 2003Date of Patent: January 24, 2006Assignee: Micell Technologies, Inc.Inventors: James P. DeYoung, James B. McClain, Stephen M. Gross, Doug Taylor, Mark I. Wagner, David Brainard
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Patent number: 6982007Abstract: A method of utilizing a divided pressure vessel in a processing system employing a carbon dioxide based solvent includes transferring a first carbon dioxide based treating solution from a first liquid chamber in a divided pressure vessel having a plurality of liquid chambers to a processing vessel, returning the first treating solution from the processing vessel to the divided pressure vessel, transferring a second carbon dioxide based treating solution having a composition different from the first treating solution from a second liquid chamber in the divided pressure vessel to a processing vessel, and returning the second treating solution from the processing vessel to the divided pressure vessel. A divided pressure vessel may allow multiple solvent baths each having a different chemical composition to be stored and/or processed in a single pressure vessel while maintaining the different chemical compositions of the multiple solvent baths.Type: GrantFiled: October 29, 2003Date of Patent: January 3, 2006Assignee: Micell TechnologiesInventors: Steven L. Worm, James P. DeYoung, James B. McClain, David E. Brainard
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Patent number: 6953041Abstract: Compositions useful for cleaning metal from a substrate or coating metal onto a substrate are described: Such compositions comprise (a) a densified carbon dioxide continuous phase; (b) a polar discrete phase in said carbon dioxide continuous phase; (c) a metal in said discrete phase (i.e., a metal removed from the substrate, or to be coated onto the substrate); (d) at least one ligand in said continuous phase, said discrete phase, or both said continuous and said discrete phase.Type: GrantFiled: October 9, 2002Date of Patent: October 11, 2005Assignee: MiCell Technologies, Inc.Inventors: James P. DeYoung, James B. McClain, Stephen M. Gross, Mark I. Wagner
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Patent number: 6921420Abstract: A method for conserving carbon dioxide vapor in a carbon dioxide dry cleaning system employing a liquid carbon dioxide cleaning solution to clean articles, where the method includes removing carbon dioxide vapor from a wash tank to a vapor tank, storing the carbon dioxide vapor in the vapor tank; and charging the wash tank with carbon dioxide vapor from the vapor tank. The method may be performed as part of a wash cycle that includes filling the wash tank with cleaning solution, washing articles to be cleaned in the wash tank, and emptying the cleaning solution out of the wash tank.Type: GrantFiled: July 19, 2004Date of Patent: July 26, 2005Assignee: Micell TechnologiesInventors: David E. Brainard, James B. McClain, Michael E. Cole, Steve L. Worm
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Patent number: 6919167Abstract: A method for carrying out positive tone lithography with a carbon dioxide solvent system is carried out by (a) providing a substrate having a polymer resist layer formed thereon; (b) exposing at least one portion of the polymer resist layer to radiant energy to form at least one light field region in the polymer resist layer; and then (c) contacting the polymer resist layer to a carbon dioxide solvent system, the solvent system preferably comprising a polar group, under conditions in which the at least one light field region is preferentially removed.Type: GrantFiled: November 14, 2002Date of Patent: July 19, 2005Assignee: MiCell TechnologiesInventors: James DeYoung, James B. McClain
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Patent number: 6905555Abstract: A method of displacing a supercritical fluid from a pressure vessel (e.g., in a microelectronic manufacturing process), with the steps of: providing an enclosed pressure vessel containing a first supercritical fluid (said supercritical fluid preferably comprising carbon dioxide); adding a second fluid (typically also a supercritical fluid) to said vessel, with said second fluid being added at a pressure greater than the pressure of the first supercritical fluid, and with said second fluid having a density less than that of the first supercritical fluid; forming an interface between the first supercritical fluid and the second fluid; and displacing at least a portion of the first supercritical fluid from the vessel with the pressure of the second, preferably fluid while maintaining the interface therebetween.Type: GrantFiled: May 30, 2003Date of Patent: June 14, 2005Assignee: MiCell Technologies, Inc.Inventors: James P. DeYoung, James B. McClain, Stephen M. Gross, Mark I. Wagner