Patents Assigned to Microvision, Inc.
  • Patent number: 10380731
    Abstract: A method and system for inspecting defects saves scanned raw data as an original image so as to save time for repeated scanning and achieve faster defect inspection and lower false rate by reviewing suspicious defects and other regions of interest in the original image by using the same or different image-processing algorithm with the same or different parameters.
    Type: Grant
    Filed: April 27, 2015
    Date of Patent: August 13, 2019
    Assignee: HERMES MICROVISION INC.
    Inventors: Wei Fang, Jack Jau
  • Patent number: 10382732
    Abstract: A resonant scanning mirror includes a sensor to provide position information. A parameter estimation circuit estimates parameters from the position information. The parameter estimation circuit includes wideband analog circuits that have poles far removed from the resonant frequency of the scanning mirror. The parameter estimation circuit also includes an analog-to-digital converter that samples at a high sample rate, and digital filters that exhibit near perfect linearity.
    Type: Grant
    Filed: July 11, 2017
    Date of Patent: August 13, 2019
    Assignee: Microvision, Inc.
    Inventor: Patrick J. McVittie
  • Patent number: 10303044
    Abstract: A scanning mirror resonates on a first axis and moves on a second axis at a frequency dictated by a sync signal. The period of movement on the second axis is not necessarily an integer multiple of the period of movement on the first axis. A drive circuit excites movement of the mirror. The drive circuit adds a position offset to the signal that excites movement on the second axis. The position offset is capable of causing the resonant movement on the first axis to scan a substantially identical trajectory for at least a portion of each period on the second axis.
    Type: Grant
    Filed: September 26, 2017
    Date of Patent: May 28, 2019
    Assignee: Microvision, Inc.
    Inventors: Jonathan A. Morarity, Damon M. Domjan
  • Patent number: 10286607
    Abstract: The embodiments described herein provide improved techniques for laser welding. These techniques can provide improved weld strength while reducing the potential for damage at the welding surface. In general, the techniques use a mask to selectively block a portion of the laser beam during welding. Specifically, the mask is made to include at least one laser light blocking feature and at least one laser light passing feature. The mask is positioned to be in contact with the plastic bodies that are to be welded together, with the laser light blocking feature and laser light passing feature proximate to the area that is to be welded. Then during welding the laser beam is operated to simultaneously impact the laser light blocking feature and pass through the laser light passing feature.
    Type: Grant
    Filed: December 19, 2017
    Date of Patent: May 14, 2019
    Assignee: Microvision, Inc.
    Inventors: Naili Yue, Thomas Byeman, Sumit Sharma, Nara Va
  • Patent number: 10276347
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
    Type: Grant
    Filed: October 22, 2018
    Date of Patent: April 30, 2019
    Assignee: HERMES MICROVISION INC.
    Inventors: Weiming Ren, Shuai Li, Xuedong Liu, Zhongwei Chen
  • Patent number: 10274537
    Abstract: A structure, for defect inspection, is provided, which includes a scanning pad scanned by an electron beam inspection tool and a test key. The structure can be located in the scribe line. A virtual grounding pad is further provided if the test key is located in the dummy pattern regions.
    Type: Grant
    Filed: December 21, 2016
    Date of Patent: April 30, 2019
    Assignee: HERMES MICROVISION INC.
    Inventor: Chang-Chun Yeh
  • Patent number: 10236156
    Abstract: A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.
    Type: Grant
    Filed: March 23, 2016
    Date of Patent: March 19, 2019
    Assignee: HERMES MICROVISION INC.
    Inventors: Weiming Ren, Shuai Li, Xuedong Liu, Zhongwei Chen, Jack Jau
  • Patent number: 10218951
    Abstract: Briefly, in accordance with one or more embodiments, a MEMS scanned beam projector includes a light source to emit a light beam, a scanning platform to redirect the light beam impinging on the platform, and a display controller to control the light source and the scanning platform to cause the scanning platform to scan the light beam in a vertical direction and a horizontal direction in a scan pattern to project an image onto a projection surface. The display controller is configured to correct for image distortion in the projected image by providing a compensated drive signal to the scanning platform to compensate for the image distortion.
    Type: Grant
    Filed: May 18, 2018
    Date of Patent: February 26, 2019
    Assignee: Microvision, Inc.
    Inventors: Jari Honkanen, Robert James Jackson, P. Selvan Viswanathan, Jonathan A. Morarity, David W. Armour
  • Patent number: 10209510
    Abstract: The embodiments described herein provide scanners with a modular construction that includes a separately formed scan plate coupled to a microelectromechanical system (MEMS) flexure structure. Such modular scanners, when incorporated into laser scanning devices, reflect laser light into a pattern of scan lines. In general, the modular scanner includes a scan plate that is formed separately from the flexure structure. The scan plate and flexure structure each include coupling features that serve to couple the scan plate to the flexure structure. The flexure structure includes flexure arms that facilitate rotation of the scan plate to reflect laser light into a pattern of scan lines.
    Type: Grant
    Filed: March 9, 2017
    Date of Patent: February 19, 2019
    Assignee: Microvision, Inc.
    Inventors: Matthew Ellis, Jason B. Tauscher
  • Patent number: 10200683
    Abstract: Devices and methods are described herein for providing foveated image projection. In general, at least one source of laser light is used to generate a laser beam, and scanning mirror(s) that reflect the laser beam into a pattern of scan lines. The source of light is controlled to selectively generate projected image pixels during a first portion of the pattern of scan lines, and to selectively generate depth mapping pulses during a second portion of the pattern of scan lines. The projected image pixels generate a projected image, while the depth mapping pulses are reflected from the surface, received, and used to generate a 3-dimensional point clouds that describe the measured surface depth at each point. Thus, during each scan of the pattern both a projected image and a surface depth map can be generated, with the surface depth map used to modify some portion of the projected pixels.
    Type: Grant
    Filed: December 21, 2016
    Date of Patent: February 5, 2019
    Assignee: Microvision, Inc.
    Inventors: P. Selvan Viswanathan, Jari Honkanen, Douglas R. Wade, Bin Xue
  • Patent number: 10176967
    Abstract: A load lock system for charged particle beam imaging with a particle shielding plate, a bottom seal plate and a plurality of sensor units is provided. The sensor units are located above the wafer, the shield plate is designed to have a few number of screws, and the bottom seal plate contains no cable, no contact sensors and fewer screws used. In the invention, the system is designed to improve the contamination particles from components in the load lock system of charged particle beam inspection tool and also to simplify its assembly.
    Type: Grant
    Filed: February 23, 2017
    Date of Patent: January 8, 2019
    Assignee: HERMES MICROVISION, INC.
    Inventors: Hsuan-Bin Huang, Chun-Liang Lu, Chin-Fa Tu, Wen-Sheng Lin, You-Jin Wang
  • Patent number: 10145680
    Abstract: Devices and methods are described herein for combining image projection with surface scanning. In general, the devices and methods utilize at least one source of laser light to generate a laser beam, and scanning mirror(s) that reflect the laser beam into a pattern of scan lines. The source of light is controlled to selectively generate projected image pixels during a first portion of the pattern of scan lines, and to selectively generate depth mapping pulses during a second portion of the pattern of scan lines. The projected image pixels generate a projected image, while the depth mapping pulses are reflected from the surface, received, and used to generate a 3-dimensional point clouds that describe the measured surface depth at each point. Thus, during each scan of the pattern both a projected image and a surface depth map can be generated.
    Type: Grant
    Filed: August 12, 2016
    Date of Patent: December 4, 2018
    Assignee: Microvision, Inc.
    Inventors: P. Selvan Viswanathan, Jari Honkanen, Douglas R. Wade, Bin Xue
  • Patent number: 10141160
    Abstract: A secondary projection imaging system in a multi-beam apparatus is proposed, which makes the secondary electron detection with high collection efficiency and low cross-talk. The system employs one zoom lens, one projection lens and one anti-scanning deflection unit. The zoom lens and the projection lens respectively perform the zoom function and the anti-rotating function to remain the total imaging magnification and the total image rotation with respect to the landing energies and/or the currents of the plural primary beamlets. The anti-scanning deflection unit performs the anti-scanning function to eliminate the dynamic image displacement due to the deflection scanning of the plural primary beamlets.
    Type: Grant
    Filed: November 30, 2016
    Date of Patent: November 27, 2018
    Assignee: HERMES MICROVISION, INC.
    Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhongwei Chen
  • Patent number: 10114215
    Abstract: The embodiments described herein provide scanning laser devices that include a relay optic between scanning surfaces. In general, the relay optic is configured to reimage the laser beam reflecting from a first scanner onto the second scanner. Specifically, the relay optic is configured to reimage a laser beam reflected from over an angular range from a first scanning surface of a first scanner onto the scanning surface of the second scanner. This can effectively make the exit pupil of the scanners substantially coincident, and thus can reduce the exit pupil disparity between the scanners that would otherwise exist.
    Type: Grant
    Filed: April 17, 2017
    Date of Patent: October 30, 2018
    Assignee: Microvision, Inc.
    Inventors: Nenad Nestorovic, Roeland Collet
  • Patent number: 10115559
    Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.
    Type: Grant
    Filed: January 11, 2017
    Date of Patent: October 30, 2018
    Assignee: HERMES MICROVISION, INC.
    Inventors: Xuedong Liu, Weiming Ren, Shuai Li, Zhongwei Chen
  • Patent number: 10110863
    Abstract: A scanning projector includes one or more scanning mirrors that reflect a light beam to create an image. The beam is created by multiple laser light sources, at least two of which create light at substantially the same color. The multiple laser light sources are used alternately to illuminate successive pixels, lines, and/or frames. Speckle reduction is achieved because of spatial overlap of the light beams produced by the multiple laser light sources.
    Type: Grant
    Filed: November 30, 2016
    Date of Patent: October 23, 2018
    Assignee: Microvision, Inc.
    Inventors: Dale Eugene Zimmerman, Matthieu Saracco, Jonathan A. Morarity
  • Patent number: 10109456
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
    Type: Grant
    Filed: June 26, 2017
    Date of Patent: October 23, 2018
    Assignee: HERMES MICROVISION INC.
    Inventors: Weiming Ren, Shuai Li, Xuedong Liu, Zhongwei Chen
  • Patent number: 10108022
    Abstract: Devices and methods are described herein that use a first solid figure element, a polarizing beam splitter, and a second solid figure element or array of mirrors to reduce speckle in projected images. Specifically, laser light is generated and split into two portions having orthogonal polarizations. The first portion of laser light is reflected in the second solid figure element or the array of mirrors and is then spatially recombined with the second portion of laser light in the first solid figure element. The difference in path length followed by the two portions generates a temporal incoherence in the recombined laser light beam, and that temporal incoherence reduces speckle in the projected image.
    Type: Grant
    Filed: May 21, 2018
    Date of Patent: October 23, 2018
    Assignee: Microvision, Inc.
    Inventors: Matthieu Saracco, Roeland Collet, Alga Lloyd Northern, III
  • Patent number: 10110866
    Abstract: The embodiments described herein provide scanning laser devices that include an output optic configured to reduce image distortion. Specifically, the output optic is configured to reduce the distortions that could otherwise occur at relatively short projection distances, while also providing good image quality at relatively long projection distances. In general, the output optic includes a prism having a first surface, a second surface, and a third surface. The prism is configured such that the laser light interacts with each of these three surfaces while being transmitted through the prism and outputted to the display surface. The first, second, and third surfaces are each formed to have a freeform rotationally asymmetric shape, and these freeform rotationally asymmetric shapes are configured to work together to correct distortion in projected images.
    Type: Grant
    Filed: June 23, 2017
    Date of Patent: October 23, 2018
    Assignee: Microvision, Inc.
    Inventors: Matthieu Saracco, Roeland Collet, Alga Lloyd Nothern, III, Nenad Nestorovic, Jack H. Schmidt
  • Patent number: 10102619
    Abstract: An inspection method includes the following steps: identifying a plurality of patterns within an image; and comparing the plurality of patterns with each other for measurement values thereof. The above-mentioned inspection method uses the pattern within the image as a basis for comparison; therefore, measurement values of the plurality of pixels constructing the pattern can be processed with statistical methods and then compared, and the false rate caused by variation of a few pixels is decreased significantly. An inspection system implementing the above-mentioned method is also disclosed.
    Type: Grant
    Filed: June 12, 2015
    Date of Patent: October 16, 2018
    Assignee: HERMES MICROVISION, INC.
    Inventors: Wei Fang, Zhao-Li Zhang, Jack Jau