Abstract: The embodiments described herein provide scanning laser devices that include a relay optic between scanning surfaces. In general, the relay optic is configured to reimage the laser beam reflecting from a first scanner onto the second scanner. Specifically, the relay optic is configured to reimage a laser beam reflected from over an angular range from a first scanning surface of a first scanner onto the scanning surface of the second scanner. This can effectively make the exit pupil of the scanners substantially coincident, and thus can reduce the exit pupil disparity between the scanners that would otherwise exist.

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

Abstract: Devices and methods are described herein that use a first solid figure element, a polarizing beam splitter, and a second solid figure element or array of mirrors to reduce speckle in projected images. Specifically, laser light is generated and split into two portions having orthogonal polarizations. The first portion of laser light is reflected in the second solid figure element or the array of mirrors and is then spatially recombined with the second portion of laser light in the first solid figure element. The difference in path length followed by the two portions generates a temporal incoherence in the recombined laser light beam, and that temporal incoherence reduces speckle in the projected image.

Abstract: The embodiments described herein provide scanning laser devices that include an output optic configured to reduce image distortion. Specifically, the output optic is configured to reduce the distortions that could otherwise occur at relatively short projection distances, while also providing good image quality at relatively long projection distances. In general, the output optic includes a prism having a first surface, a second surface, and a third surface. The prism is configured such that the laser light interacts with each of these three surfaces while being transmitted through the prism and outputted to the display surface. The first, second, and third surfaces are each formed to have a freeform rotationally asymmetric shape, and these freeform rotationally asymmetric shapes are configured to work together to correct distortion in projected images.

Abstract: A scanning projector includes one or more scanning mirrors that reflect a light beam to create an image. The beam is created by multiple laser light sources, at least two of which create light at substantially the same color. The multiple laser light sources are used alternately to illuminate successive pixels, lines, and/or frames. Speckle reduction is achieved because of spatial overlap of the light beams produced by the multiple laser light sources.

Abstract: A scanning projector and method is provided that generates a feedback signal from at least one photodetector. In the scanning projector, a scanning mirror is configured to reflect laser light into an image region and an over scanned region. The at least one photodetector is configured to receive a portion of the reflected laser light impacting the over scanned region, and provides the feedback signal responsive to the received portion of light. This feedback signal can then be used to provide precise control of the scanning mirror.

Abstract: An inspection method includes the following steps: identifying a plurality of patterns within an image; and comparing the plurality of patterns with each other for measurement values thereof. The above-mentioned inspection method uses the pattern within the image as a basis for comparison; therefore, measurement values of the plurality of pixels constructing the pattern can be processed with statistical methods and then compared, and the false rate caused by variation of a few pixels is decreased significantly. An inspection system implementing the above-mentioned method is also disclosed.

Abstract: A structure for grounding an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for grounding an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and back side. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUV mask is grounded. The reflective surface of the EUV mask on a continuously moving stage is scanned by using the electron beam simultaneously. The moving direction of the stage is perpendicular to the scanning direction of the electron beam.

Abstract: A scanning projector and method is provided that that uses at least one multi-stripe laser to generate the laser light for the scanned image. Specifically, the multi-stripe laser includes at least a first laser element and a second laser element formed together on a semiconductor die. The first laser element is configured to output a first laser light beam, and the second laser element is configured to output a second laser light beam. At least one scanning mirror is configured to reflect the first laser light beam and the second laser light beam, and a drive circuit is configured to provide an excitation signal to excite motion of the at least one scanning mirror. Specifically, the motion is excited such that the at least one scanning mirror reflects the first laser light beam and the second laser light beam in a raster pattern of scan lines.

Abstract: A laser drive circuit compensates for laser diode dynamics. A compensation value is determined from a sum of weighted basis functions. The basis functions may be a function of current desired optical powers and/or past desired optical powers. The weights may be updated periodically based at least in part on accumulated basis function outputs and measured optical powers.

Abstract: A new multi-beam apparatus with a total FOV variable in size, orientation and incident angle, is proposed. The new apparatus provides more flexibility to speed the sample observation and enable more samples observable. More specifically, as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry, the new apparatus provide more possibilities to achieve a high throughput and detect more kinds of defects.

Abstract: A projection system emits light pulses in a field of view and measures properties of reflections. Properties may include time of flight and return amplitude. Foreground objects and background surfaces are distinguished, distances between foreground objects and background surfaces are determined based on reflections that are occluded by the foreground objects and other properties of the projection system.

Abstract: A structure for discharging an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for discharging an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and bottom. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUU mask is grounded.

Abstract: This invention provides a charged particle source, which comprises an emitter and means for generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

Abstract: The present invention provides apparatuses to inspect small particles on the surface of a sample such as wafer and mask. The apparatuses provide both high detection efficiency and high throughput by forming Dark-field BSE images. The apparatuses can additionally inspect physical and electrical defects on the sample surface by form SE images and Bright-field BSE images simultaneously. The apparatuses can be designed to do single-beam or even multiple single-beam inspection for achieving a high throughput.

Abstract: The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen, a deflection system including a plurality of deflection units situated along the optical axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the objective lens, and a detection unit to capture secondary electron (SE) and backscattered electrons (BSE).

Abstract: Briefly, in accordance with one or more embodiments, a MEMS scanned beam projector includes a light source to emit a light beam, a scanning platform to redirect the light beam impinging on the platform, and a display controller to control the light source and the scanning platform to cause the scanning platform to scan the light beam in a vertical direction and a horizontal direction in a scan pattern to project an image onto a projection surface. The display controller is configured to correct for image distortion in the projected image by providing a compensated drive signal to the scanning platform to compensate for the image distortion.

Abstract: Devices and methods are described herein that use a first solid figure element, a polarizing beam splitter, and a second solid figure element to reduce speckle in projected images. Specifically, laser light is generated and split into two portions having orthogonal polarizations. The first portion of laser light is internally reflected off at least three internal faces of the second solid figure element and is then spatially recombined with the second portion of laser light in the first solid figure element. The difference in path length followed by the two portions generates a temporal incoherence in the recombined laser light beam, and that temporal incoherence reduces speckle in the projected image.

Abstract: A wafer grounding apparatus and method adaptable to a charged particle beam apparatus is disclosed. A wafer substrate is supported by a wafer mount. A pulse current pin is arranged to be in contact with a backside film formed on a backside of the wafer substrate. A grounding pulse generator provides at least one pulse to drive the pulse current pin such that dielectric breakdown occurring at the backside film leads to establishment of a current path through the backside films. Accordingly, a current flows in the wafer substrate through this current path and then flows out of the wafer substrate via at least one current return path formed from capacitive coupling between the wafer substrate and the wafer mount.

Abstract: An inspection method includes the following steps: identifying a plurality of patterns within an image; and comparing the plurality of patterns with each other for measurement values thereof. The above-mentioned inspection method uses the pattern within the image as a basis for comparison; therefore, measurement values of the plurality of pixels constructing the pattern can be processed with statistical methods and then compared, and the false rate caused by variation of a few pixels is decreased significantly. An inspection system implementing the above-mentioned method is also disclosed.